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    • 5. 发明授权
    • Precision cleaning apparatus and method
    • 精密清洗装置及方法
    • US5706840A
    • 1998-01-13
    • US398276
    • 1995-03-03
    • Thomas W. SchneiderGregory C. FryeStephen J. Martin
    • Thomas W. SchneiderGregory C. FryeStephen J. Martin
    • B08B3/00G01G3/13G01H13/00B08B3/02
    • B08B3/00G01G3/13G01H13/00
    • A precision cleaning apparatus and method. The precision cleaning apparatus includes a cleaning monitor further comprising an acoustic wave cleaning sensor such as a quartz crystal microbalance (QCM), a flexural plate wave (FPW) sensor, a shear horizontal acoustic plate mode (SH--APM) sensor, or a shear horizontal surface acoustic wave (SH--SAW) sensor; and measurement means connectable to the sensor for measuring in-situ one or more electrical response characteristics that vary in response to removal of one or more contaminants from the sensor and a workpiece located adjacent to the sensor during cleaning. Methods are disclosed for precision cleaning of one or more contaminants from a surface of the workpiece by means of the cleaning monitor that determines a state of cleanliness and any residual contamination that may be present after cleaning; and also for determining an effectiveness of a cleaning medium for removing one or more contaminants from a workpiece.
    • 精密清洗装置及方法。 精密清洁装置包括清洁监视器,还包括声波清洁传感器,例如石英晶体微量天平(QCM),弯曲板波(FPW)传感器,剪切水平声板模式(SH-APM)传感器或剪切 水平声表面波(SH-SAW)传感器; 以及可连接到传感器的测量装置,用于原位测量响应于在清洁期间从传感器和位于传感器附近的工件移除一个或多个污染物而变化的一个或多个电响应特性。 公开了用于通过清洁监视器从工件表面精确地清洁一种或多种污染物的方法,所述清洁监控器确定在清洁之后可能存在的清洁度和任何残留污染物; 并且还用于确定用于从工件去除一种或多种污染物的清洁介质的有效性。