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    • 2. 发明授权
    • Device and method for analyzing a materials library
    • 用于分析材料库的设备和方法
    • US07479636B2
    • 2009-01-20
    • US10863068
    • 2004-06-07
    • Gerd ScheyingSteffen KatzenbergerThomas BrinzJoerg Jockel
    • Gerd ScheyingSteffen KatzenbergerThomas BrinzJoerg Jockel
    • G01J5/02
    • G01N21/3151
    • A device for analyzing a materials library includes at least one radiation source for electromagnetic radiation, which is positioned in front of the materials library, and at least two flat detectors operating in parallel, which are operable using high-sensitivity resolution and of which one is sensitive to electromagnetic radiation of a first wavelength range and the other is sensitive to electromagnetic radiation of a second wavelength range. Moreover, a method for analyzing a materials library in which the materials library is simultaneously tested using at least two methods in which electromagnetic radiation of different wavelength ranges is used. The beam is split behind the materials library as a function of wavelength and is deflected in the direction of at least two flat sensors operating using high-sensitivity resolution.
    • 用于分析材料库的装置包括至少一个用于电磁辐射的辐射源,其位于材料库前面,以及平行操作的至少两个平面检测器,其可使用高灵敏度分辨率操作,并且其中一个是 对第一波长范围的电磁辐射敏感,另一个对第二波长范围的电磁辐射敏感。 此外,使用其中使用不同波长范围的电磁辐射的至少两种方法同时测试材料库的材料库的分析方法。 光束在材料库之后被分解为波长的函数,并且在至少两个使用高灵敏度分辨率的平面传感器的方向上偏转。