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1. 发明授权

US5853947A Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate 失效
标题翻译：使用基本上由3-甲基-3-甲氧基丁醇和丙二醇烷基醚乙酸酯组成的混合溶剂的喹诺酮叠氮化物正光致抗蚀剂
公开(公告)号：US5853947A
公开(公告)日：1998-12-29
申请号：US576748
申请日：1995-12-21
申请人： Stanley F. Wanat , M. Dalil Rahman , Dinesh N. Khanna , Daniel P. Aubin , Sunit S. Dixit
发明人： Stanley F. Wanat , M. Dalil Rahman , Dinesh N. Khanna , Daniel P. Aubin , Sunit S. Dixit
IPC分类号： G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027 , G03C1/61
CPC分类号： G03F7/0048 , G03F7/022 , G03F7/0236
摘要： A photosensitive positive working photosensitive composition suitable for use as a photoresist, which comprises an admixture of at least one water insoluble, aqueous alkali soluble, film forming novolak resin; at least one o-diazonaphthoquinone photosensitizer; and a photoresist solvent mixture comprising a propylene glycol alkyl ether acetate and 3-methyl-3-methoxy butanol and process for producing such a composition.
摘要翻译：适合用作光致抗蚀剂的感光性正性感光性组合物，其包含至少一种不溶于水的碱溶性水溶性成膜酚醛清漆树脂的混合物; 至少一种邻二氮萘醌光敏剂; 以及包含丙二醇烷基醚乙酸酯和3-甲基-3-甲氧基丁醇的光致抗蚀剂溶剂混合物及其制备方法。

2. 发明授权

US5928836A Fractionated novolak resin copolymer and photoresist composition therefrom 失效
标题翻译：分离的酚醛清漆树脂共聚物和其光致抗蚀剂组合物
公开(公告)号：US5928836A
公开(公告)日：1999-07-27
申请号：US939451
申请日：1997-09-29
申请人： M. Dalil Rahman , Stanley F. Wanat , Michelle M. Cook , Douglas S. McKenzie , Sunit S. Dixit
发明人： M. Dalil Rahman , Stanley F. Wanat , Michelle M. Cook , Douglas S. McKenzie , Sunit S. Dixit
IPC分类号： C08G8/00 , C08G8/20 , C08G8/38 , G03F7/023 , G03C1/72
CPC分类号： C08G8/00 , G03F7/0236 , Y10S430/106
摘要： The present invention provides a method for producing a film forming, fractionated novolak resin copolymer exhibiting fast photospeed and superior performance in a photoresist composition. A method is also provided for producing photoresist composition from such a fractionated novolak resin copolymer and for producing semiconductor devices using such a photoresist composition.
摘要翻译：本发明提供了一种在光致抗蚀剂组合物中制备成膜，分级的酚醛清漆树脂共聚物的方法，其具有快速的感光速度和优异的性能。还提供了一种从这种分级酚醛清漆树脂共聚物制备光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的半导体器件的方法。

3. 发明授权

US6121412A Preparation of fractionated novolak resins by a novel extraction technique 失效
$Preparation of fractionated novolak resins by a novel extraction technique$
标题翻译：通过新的提取技术制备分馏的酚醛清漆树脂
公开(公告)号：US6121412A
公开(公告)日：2000-09-19
申请号：US418239
申请日：1999-10-14
申请人： Stanley F. Wanat , M. Dalil Rahman , John J. Kokoszka , Balaji Narasimhan
发明人： Stanley F. Wanat , M. Dalil Rahman , John J. Kokoszka , Balaji Narasimhan
IPC分类号： C08G8/00 , C08G8/08 , G03F7/023 , C08F6/04 , C08F6/22 , C08G14/04
CPC分类号： G03F7/0236
摘要： The present invention provides a method for producing a film forming, fractionated novolak resin, by:a) condensing formaldehyde with one or more phenolic compounds, and thereby producing a novolak resin;b) adding a photoresist solvent, and optionally a water-soluble organic polar solvent;c) feeding the mixture into a liquid/liquid centrifuge and feeding a C.sub.5 -C.sub.8 alkane, water or aromatic hydrocarbon solvent into the liquid/liquid centrifuge at a ratio of optional water-soluble organic polar solvent and photoresist solvent to C.sub.5 -C.sub.8 alkane, water or aromatic solvent, of from 5:1 to 0.5:1;d) rotating the liquid/liquid centrifuge containing the mixture at a speed of at least 500 rpm and thereby separating the mixture into two phases, collecting the two phases;e) optionally separating the lighter phase (L) into two second phases;f) removing residual C.sub.5 -C.sub.8 alkane, water or aromatic hydrocarbon solvent from the heavier phase (H) from step d) and leaving the novolak resin dissolved in the photoresist solvent;A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing microelectronic devices using such a photoresist composition.
摘要翻译：本发明提供一种通过以下方法制备成膜分馏的酚醛清漆树脂的方法：a）将甲醛与一种或多种酚类化合物缩合，从而制备酚醛清漆树脂; b）添加光致抗蚀剂溶剂和任选的水溶性有机极性溶剂; c）将混合物进料到液体/液体离心机中，并将C5-C8烷烃，水或芳烃溶剂以任选的水溶性有机极性溶剂和光致抗蚀剂溶剂与C 5 -C 8烷烃的比例向液/液离心机中进料，水或芳族溶剂为5：1至0.5：1; d）以至少500rpm的速度旋转含有混合物的液/液离心机，从而将混合物分离成两相，收集两相; e）任选地将较轻相（L）分离成两个第二相; f）从步骤d）的较重相（H）除去残留的C5-C8烷烃，水或芳族烃溶剂，并将酚醛清漆树脂溶解在光致抗蚀剂溶剂中; 还提供了用于从这种分级酚醛清漆树脂制备光致抗蚀剂组合物并用于制备使用这种光致抗蚀剂组合物的微电子器件的方法。

4. 发明授权

US06512087B1 Fractionation of resins using a static mixer and a liquid-liquid centrifuge 失效
公开(公告)号：US06512087B1
公开(公告)日：2003-01-28
申请号：US09698724
申请日：2000-10-27
申请人： Stanley F. Wanat , M. Dalil Rahman , Zhong Xiang
发明人： Stanley F. Wanat , M. Dalil Rahman , Zhong Xiang
IPC分类号： C08F604
CPC分类号： C08G8/08 , C08G8/10 , G03F7/0236
摘要： Disclosed is a method for producing low molecular weight oligomers of a film forming resin, which involves: a) providing a solution of the film forming resin in a first solvent system comprising a photoresist solvent, and optionally a water-soluble organic solvent; b) providing a second solvent system comprising at least one substantially pure C5-C8 alkane and/or at least one aromatic compound having at least one hydrocarbyl substituent and/or water/C1-C4 alcohol mixture; and performing steps c)-e) in the following order: c) mixing the solutions from a) and second solvent system from b) in a static mixer for a time period sufficient for efficient mixing; d) feeding the mixture from c) and second solvent system from b) through two separate inlet ports into a liquid/liquid centrifuge, one of the inlet ports feeding the mixture from c), the second inlet port feeding the second solvent system from b) into said liquid/liquid centrifuge at a feed ratio of the mixture from c) to the second solvent system from b) of from about 10/90 to about 90/10, at a temperature of from about 0° C. up to maximum temperature that is less than the boiling point of the lowest boiling solvent in the first or second solvent system; e) rotating the mixture from step d) inside the liquid/liquid centrifuge at a rotational speed sufficient to separate the mixture from step d) into two separate phases, and then collecting the two separate phases, each from two separate outlet ports, into two separate containers, wherein the heavier phase (H) comprises a fractionated film forming resin comprising higher molecular weight fractions of the film forming resin and the lighter phase (L) comprises low molecular weight oligomers of the film forming resin. The present invention also provides a method for producing a photoresist composition, and method for producing a microelectronic device using the aforementioned fractionated resin or low molecular weight oligomers of the film forming resin.

5. 发明授权

US06297352B1 Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge 失效
标题翻译：使用液/液离心机降低成膜树脂的金属离子含量的方法
公开(公告)号：US06297352B1
公开(公告)日：2001-10-02
申请号：US09597440
申请日：2000-06-20
申请人： Stanley F. Wanat , M. Dalil Rahman
发明人： Stanley F. Wanat , M. Dalil Rahman
IPC分类号： C08F604
CPC分类号： B01J45/00 , G03F7/0236
摘要： The present invention provides a method for reducing the metal ion content of a film-forming resin, said method comprising the steps of: a) providing a solution of the film-forming resin in a water-immiscible solvent system comprising at least one water-immiscible solvent; b) providing a washing solution comprising water or a dilute solution of a water-soluble metal ion chelating agent; c) feeding the solutions from a) and b) through two separate inlet ports into a liquid/liquid centrifuge, one of said inlet ports feeding solution from a), the second inlet port feeding the solution from b) into said liquid/liquid centrifuge at a feed rate ratio of the solution from a) to that from b) from about 10/90 to about 90/10, at a temperature of from about 0° C. up to a maximum temperature that is less than the boiling point of the lowest boiling water-immiscible solvent in the water-immiscible solvent system; and d) rotating the mixture from step c) inside said liquid/liquid centrifuge at a rotational speed sufficient to separate the mixture from step c) into two separate phases, and then collecting the two separate phases, each through a separate outlet port, into two separate containers, wherein the heavier phase (H) comprises the film-forming resin having a reduced metal ion content in the water-immiscible solvent system, with a minor amount of water; and the lighter phase (L) comprises: 1) an aqueous solution of metal ions and a minor amount of a mixture of 2) the water-immiscible solvent system, and 3) the film-forming resin. The present invention also provides for a method for producing a photoresist composition and a method for producing a microelectronic device utilizing a film-forming resin produced by the aforementioned method.
摘要翻译：本发明提供了一种降低成膜树脂的金属离子含量的方法，所述方法包括以下步骤：a）将成膜树脂的溶液提供在与水不混溶的溶剂体系中，该溶液体系包含至少一种水 - 不混溶溶剂; b）提供包含水或水溶性金属离子螯合剂的稀溶液的洗涤溶液; c）将来自a）和b）的溶液通过两个单独的入口端口进入液体/液体离心机，所述入口端口中的一个从a）供给溶液，将来自b）的溶液供给到所述液体/液体离心机以a）至b）的溶液的进料速率比为约10/90至约90/10，温度为约0℃至最低温度为低于与水不混溶的溶剂体系中最低沸水不溶混溶剂; 以及d）将所述液体/液体离心机内的步骤c）中的混合物以足以将混合物从步骤c）分离成两个分开的相的旋转速度旋转，然后通过单独的出口端收集两个分离的相，两个单独的容器，其中较重的相（H）包括在与水不混溶的溶剂体系中具有降低的金属离子含量的成膜树脂，少量的水; 轻相（L）包括：1）金属离子的水溶液和少量的2）水不混溶溶剂体系的混合物，和3）成膜树脂。本发明还提供一种光致抗蚀剂组合物的制造方法和利用上述方法制造的成膜树脂的微电子器件的制造方法。

6. 发明授权

US4719169A Protective coating for images 失效
标题翻译：图像保护涂层
公开(公告)号：US4719169A
公开(公告)日：1988-01-12
申请号：US853782
申请日：1986-04-18
申请人： Stephan J. W. Platzer , Mehmet U. Yener , Stanley F. Wanat
发明人： Stephan J. W. Platzer , Mehmet U. Yener , Stanley F. Wanat
IPC分类号： G03C1/00 , G03F3/10 , G03F7/004 , G03F7/09 , G03F7/34 , G03C11/12
CPC分类号： G03F3/10 , Y10S430/151 , Y10S430/162 , Y10T428/1452 , Y10T428/24802 , Y10T428/24843 , Y10T428/24851 , Y10T428/2486
摘要： The invention provides a method for protecting an image which comprises providing a colored image on a substrate and either:A. Applying an antiblocking layer to a release surface of a temporary support; bonding a thermoplastic adhesive layer to said antiblocking layer; laminating said applied support to said colored image via said adhesive; and peeling away said temporary support from said antiblocking layer; orB. applying a thermoplastic adhesive layer to a release surface of a first temporary support; applying an antiblocking layer onto a release surface of a second temporary support, laminating said adhesive onto said colored image and peeling away said first temporary support; and laminating said antiblocking layer onto said adhesive layer and peeling away said second temporary support;wherein said adhesive layer is substantially nontacky at room temperature, is laminated at temperatures between about 60.degree. C. and 90.degree. C., and comprises one or more thermoplastic polymers or copolymers; andwherein said antiblocking layer comprises one or more organic polymers or copolymers, which layer does not cohesively block at about 50.degree. C. or less.
摘要翻译：本发明提供了一种用于保护图像的方法，其包括在基底上提供着色图像，以及：A.将抗粘连层施加到临时支撑体的释放表面; 将热塑性粘合剂层粘合到所述防粘连层上; 通过所述粘合剂将所述涂覆的载体层压到所述着色图像上; 并从所述防粘层剥离所述临时支撑体; 或B.将热塑性粘合剂层施加到第一临时支撑体的释放表面上; 将防粘层施加到第二临时支撑件的释放表面上，将所述粘合剂层压到所述着色图像上并剥离所述第一临时支撑件; 并将所述防粘连层层压到所述粘合剂层上并剥离所述第二临时载体; 其中所述粘合剂层在室温下基本上不粘，在约60℃至90℃的温度下层压，并且包含一种或多种热塑性聚合物或共聚物; 并且其中所述防粘连层包含一种或多种有机聚合物或共聚物，该层在约50℃或更低温度下不共聚嵌段。

7. 发明授权

US4383897A Electrochemically treated metal plates 失效
标题翻译：电化学处理的金属板
公开(公告)号：US4383897A
公开(公告)日：1983-05-17
申请号：US359459
申请日：1982-03-18
申请人： Thomas N. Gillich , John E. Walls , Stanley F. Wanat , William J. Rozell
发明人： Thomas N. Gillich , John E. Walls , Stanley F. Wanat , William J. Rozell
IPC分类号： B41N3/03 , C25D11/06 , C25D11/12 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18
CPC分类号： B41N3/034 , C25D11/06 , C25D11/12 , Y10S205/921
摘要： According to the invention there is provided an electrochemical process for applying a firmly bonded insoluble metal oxide-organic complex on a metal surface by employing the metal as anode and a water-soluble poly basic organic acid as electrolyte together with a strong inorganic acid such as phosphoric acid or further admixed with another strong inorganic acid such as sulfuric. The polybasic acid may be a polyphosphonic acid, polyphosphoric and polycarboxyl acid, or polysulfonic acid and is advantageously polymeric. Polyvinyl phosphonic acid (PVPA) is a preferred electrolyte. Direct current is used. Pulsed plating may optionally be employed. The insoluble metal oxide-organic complex formed is composed of anodic oxide combined with polyacid, which forms a protective layer on the metal of improved corrosion resistance. The metal oxide-organic complex is well-suited to bond light sensitive coatings thereto. The metal may be steel or aluminum. The process is economical and the product novel.
摘要翻译：根据本发明，提供了一种电化学方法，其通过使用金属作为阳极和水溶性聚碱性有机酸作为电解质以及强无机酸如金属表面上施加牢固键合的不溶性金属氧化物 - 有机络合物，例如磷酸还是与另一种强无机酸如硫酸混合。多元酸可以是多膦酸，多磷酸和聚羧酸或聚磺酸，并且有利地是聚合的。聚乙烯基膦酸（PVPA）是优选的电解质。使用直流电。可以选择使用脉冲电镀。形成的不溶性金属氧化物 - 有机络合物由阳极氧化物与多元酸组合，其在金属上形成了改善的耐腐蚀性的保护层。金属氧化物 - 有机络合物非常适用于将光敏涂层粘合到其上。金属可以是钢或铝。该过程是经济的和产品小说。

8. 发明授权

US4157918A Light sensitive film composition 失效
标题翻译：感光膜组成
公开(公告)号：US4157918A
公开(公告)日：1979-06-12
申请号：US836345
申请日：1977-09-26
申请人： Stanley F. Wanat , Oliver A. Barton
发明人： Stanley F. Wanat , Oliver A. Barton
IPC分类号： G03C1/93 , G03F3/10 , G03F7/016 , G03C1/52 , G03C1/78
CPC分类号： G03F3/10 , G03C1/93 , G03F7/016
摘要： Light sensitive coating compositions containing a dyestuff, which compositions exhibit improved adhesion to transparent film substrates, are disclosed. For example, the adhesion between a polyester base film and a light sensitive coating composition containing a light sensitive diazo material, a resinous binder and a dyestuff is improved by additionally incorporating into the composition an effective amount of an adhesion promoter based on a copolyester obtained by the esterification and subsequent polymerization of a lower alkylene glycol with a mixture of terephthalic acid, isophthalic acid, and at least one acyclic dicarboxylic acid. These coating compositions may be readily removed from the base film by appropriate lithographic developer solutions without substantial residual staining of the film by the dyestuff present in the coating composition.
摘要翻译：公开了含有染料的光敏涂料组合物，该组合物对透明膜基材表现出改善的粘附性。例如，通过向组合物中另外加入有效量的粘合促进剂，基于通过以下方法得到的共聚聚酯，改善了聚酯基膜和含有光敏重氮物质，树脂粘合剂和染料的光敏涂料组合物之间的粘合性低级亚烷基二醇与对苯二甲酸，间苯二甲酸和至少一种无环二羧酸的混合物进行酯化和随后的聚合。这些涂料组合物可以通过合适的平版显影剂溶液从基膜中容易地除去，而不会通过涂料组合物中存在的染料基本上残留染色。

9. 发明授权

US4914039A Water developable, negative working overlay or transfer type diazo color proofing system 失效
标题翻译：水可显影，负面工作覆盖或转印型重氮色彩打样系统
公开(公告)号：US4914039A
公开(公告)日：1990-04-03
申请号：US183841
申请日：1988-04-20
申请人： Stanley F. Wanat
发明人： Stanley F. Wanat
IPC分类号： G03F7/021 , G03F3/10 , G03F7/016
CPC分类号： G03F3/10 , G03F7/016
摘要： This invention relates to water developable, negative working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The invention provides both overlay and transfer type proofing sheets which have good fingerprint resistance.

10. 发明授权

US4452674A Electrolytes for electrochemically treated metal plates 失效
标题翻译：用于电化学处理的金属板的电解质
公开(公告)号：US4452674A
公开(公告)日：1984-06-05
申请号：US424707
申请日：1982-09-27
申请人： Thomas N. Gillich , John E. Walls , Stanley F. Wanat , William J. Rozell
发明人： Thomas N. Gillich , John E. Walls , Stanley F. Wanat , William J. Rozell
IPC分类号： B41N3/03 , C25D11/06 , C25D11/12 , C25D11/02 , C25D11/08 , C25D11/10
CPC分类号： C25D11/06 , B41N3/034 , C25D11/12
摘要： According to the invention there is provided an electrochemical process for applying a firmly bonded insoluble metal oxide-organic complex on a metal surface by employing the metal as anode and a water-soluble polybasic organic acid as electrolyte. The polybasic acid may be a polyphosphonic acid, polyphosphoric and polycarboxyl acid, or polysulfonic acid and is advantageously polymeric. Polyvinyl phosphonic acid (PVPA) is a preferred electrolyte. Direct current is used. The insoluble metal oxide-organic complex formed is composed of anodic oxide combined with polyacid, which forms a protective layer on the metal of improved corrosion resistance. The metal oxide-organic complex is well-suited to bond light sensitive coatings thereto. The metal may be steel, aluminum or magnesium. The process is economical and the product novel.
摘要翻译：根据本发明，提供了一种通过使用金属作为阳极和水溶性多元有机酸作为电解质将金属表面上牢固结合的不溶性金属氧化物 - 有机络合物施加到电化学方法。多元酸可以是多膦酸，多磷酸和聚羧酸或聚磺酸，并且有利地是聚合的。聚乙烯基膦酸（PVPA）是优选的电解质。使用直流电。形成的不溶性金属氧化物 - 有机络合物由阳极氧化物与多元酸组合，其在金属上形成了改善的耐腐蚀性的保护层。金属氧化物 - 有机络合物非常适用于将光敏涂层粘合到其上。金属可以是钢，铝或镁。该过程是经济的和产品小说。

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