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    • 9. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20130221374A1
    • 2013-08-29
    • US13597299
    • 2012-08-29
    • Ramakrishna RaoStephen Daley ArthurPeter Almern LoseeKevin Sean Matocha
    • Ramakrishna RaoStephen Daley ArthurPeter Almern LoseeKevin Sean Matocha
    • H01L29/16
    • H01L29/1608H01L29/0615H01L29/1095H01L29/66068H01L29/66712H01L29/7802H01L29/7811
    • A semiconductor device includes a substrate comprising a semiconductor material. The substrate has a surface that defines a surface normal direction and includes a P-N junction comprising an interface between a first region and a second region, where the first (second) region includes a first (second) dopant type, so as to have a first (second) conductivity type. The substrate includes a termination extension region disposed adjacent to the P-N junction and having an effective concentration of the second dopant type that is generally the effective concentration of the second dopant type in the second doped region. The substrate includes an adjust region disposed adjacent to the surface and between the surface and at least part of the termination extension region, where the effective concentration of the second dopant type generally decreases when moving from the termination extension region into the adjust region along the surface normal direction.
    • 半导体器件包括包含半导体材料的衬底。 衬底具有限定表面法线方向的表面,并且包括PN结,其包括在第一区域和第二区域之间的界面,其中第一(第二)区域包括第一(第二)掺杂剂类型,以便具有第一 (第二)导电类型。 衬底包括邻近P-N结设置并且具有通常为第二掺杂区域中的第二掺杂剂类型的有效浓度的第二掺杂剂类型的有效浓度的终止延伸区域。 衬底包括与表面相邻并且在表面与终止延伸区域的至少一部分之间布置的调节区域,其中当从端接延伸区域沿着表面移动到调节区域中时,第二掺杂剂类型的有效浓度通常降低 正常方向