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1. 发明授权

US06518534B1 Welding apparatus for forming chromium oxide passivated film at welded portion 失效
标题翻译：焊接部形成氧化铬钝化膜的焊接装置
公开(公告)号：US06518534B1
公开(公告)日：2003-02-11
申请号：US09755379
申请日：2001-01-05
申请人： Sowmya Krishnan , Tadahiro Ohmi
发明人： Sowmya Krishnan , Tadahiro Ohmi
IPC分类号： B23K3538
CPC分类号： C23C8/18 , B23K35/383
摘要： An improved method for welding and passivation forms a chromium oxide passivated film over the welded portion during the welding process. In a shielding step, a backshield gas, preferably argon, is flowed around the welding site. In a welding step, an arc gas, preferably argon with approximately 10% hydrogen and less than 1 ppm moisture content, is flowed through the welding head and a welded joint is formed, for example by high speed tungsten-inert gas (TIG) orbital welding. In the passivation step, a process gas, preferably argon with approximately 30-100 ppm of oxygen and less than 1 ppm moisture content, and preferably less than 1 ppb moisture content, is flowed over the welded portion to form a chromium oxide passivated film on the welded portion. The process gas is passed through a gas purifier prior to being flowed over the welded portion to maintain its moisture level at less than 1 ppb. A welding and passivation apparatus for carrying out the improved method is also described having a welding system, such as a high speed tungsten-inert gas (TIG) orbital tube welding system or the like, and a gas supply system equipped to deliver the backshield gas, arc gas and process gas with the required compositions and with the proper timing during the welding and passivation process. An electronic timing unit controls the gas supply system to release the gases into the welding head at the proper time during the process.
摘要翻译：焊接和钝化的改进方法在焊接过程中在焊接部分上形成氧化铬钝化膜。在屏蔽步骤中，在焊接部位周围流动优选氩气的后挡板气体。在焊接步骤中，电弧气体，优选具有约10％氢气和小于1ppm水分含量的氩气流过焊接头，并且例如通过高速钨惰性气体（TIG）轨道形成焊接接头焊接。在钝化步骤中，处理气体，优选具有大约30-100ppm氧气和小于1ppm水分含量，优选小于1ppb水分含量的氩气流过焊接部分，以形成氧化铬钝化膜焊接部分。工艺气体在流过焊接部分之前通过气体净化器，以保持其水分含量低于1ppb。还描述了一种用于执行改进方法的焊接和钝化装置，其具有诸如高速钨惰性气体（TIG）轨道管焊接系统等的焊接系统，以及配备用于将后挡板气体，电弧气和具有所需组成的工艺气体以及焊接和钝化过程中的适当时机。电子定时单元控制气体供应系统，以在过程中的适当时间将气体释放到焊接头中。

2. 发明授权

US06172320B2 Welding method for forming chromium oxide passivated film at welded portion 失效
标题翻译：焊接部分形成氧化铬钝化膜的焊接方法
公开(公告)号：US06172320B2
公开(公告)日：2001-01-09
申请号：US09163736
申请日：1998-09-30
申请人： Sowmya Krishnan , Tadahiro Ohmi
发明人： Sowmya Krishnan , Tadahiro Ohmi
IPC分类号： B23K3538
CPC分类号： C23C8/18 , B23K35/383
摘要： An improved method for welding and passivation forms a chromium oxide passivated film over the welded portion during the welding process. In a shielding step, a backshield gas, preferably argon, is flowed around the welding site. In a welding step, an arc gas, preferably argon with approximately 10% hydrogen and less than 1 ppm moisture content, is flowed through the welding head and a welded joint is formed, for example by high speed tungsten-inert gas (TIG) orbital welding. In the passivation step, a process gas, preferably argon with approximately 30-100 ppm of oxygen and less than 1 ppm moisture content, and preferably less than 1 ppb moisture content, is flowed over the welded portion to form a chromium oxide passivated film on the welded portion. The process gas is passed through a gas purifier prior to being flowed over the welded portion to maintain its moisture level at less than 1 ppb. A welding and passivation apparatus for carrying out the improved method is also described having a welding system, such as a high speed tungsten-inert gas (TIG) orbital tube welding system or the like, and a gas supply system equipped to deliver the backshield gas, arc gas and process gas with the required compositions and with the proper timing during the welding and passivation process. An electronic timing unit controls the gas supply system to release the gases into the welding head at the proper time during the process.
摘要翻译：焊接和钝化的改进方法在焊接过程中在焊接部分上形成氧化铬钝化膜。在屏蔽步骤中，在焊接部位周围流动优选氩的后挡板气体。在焊接步骤中，电弧气体，优选具有约10％氢气和小于1ppm水分含量的氩气流过焊接头，并且例如通过高速钨惰性气体（TIG）轨道形成焊接接头焊接。在钝化步骤中，处理气体，优选具有大约30-100ppm氧气和小于1ppm水分含量，优选小于1ppb水分含量的氩气流过焊接部分，以形成氧化铬钝化膜焊接部分。工艺气体在流过焊接部分之前通过气体净化器，以保持其水分含量低于1ppb。还描述了一种用于执行改进方法的焊接和钝化装置，其具有诸如高速钨惰性气体（TIG）轨道管焊接系统等的焊接系统，以及配备用于将后挡板气体，电弧气和具有所需组成的工艺气体以及焊接和钝化过程中的适当时机。电子定时单元控制气体供应系统，以在过程中的适当时间将气体释放到焊接头中。

3. 发明申请

US20080009977A1 Apparatus and Method for Monitoring a Chemical-Supply System 审中-公开
标题翻译：化学供应系统监测装置及方法
公开(公告)号：US20080009977A1
公开(公告)日：2008-01-10
申请号：US11775776
申请日：2007-07-10
申请人： Sowmya Krishnan , Hubert Dinh
发明人： Sowmya Krishnan , Hubert Dinh
IPC分类号： G05B21/00
CPC分类号： G05B23/0278 , G05B23/0289
摘要： The present invention provides a processing apparatus having multiple systems, and multiple components in each system. The apparatus includes a monitoring capability for monitoring the components and calculating a Health Index of each system, based on aggregate component performances of the components. The computer may initiate a trouble-shooting routine on components of a system if the Health Index of the system is below a preselected threshold value relative to a signature Health Index of the system. Also disclosed is a method for monitoring the performance characteristics of components in a multi-component chemical-delivery system.
摘要翻译：本发明提供一种具有多个系统的处理装置，以及每个系统中的多个部件。该装置包括基于组件的组合部件性能监视组件和计算每个系统的健康指数的监视能力。如果系统的健康指数相对于系统的签名健康指数低于预选的阈值，则计算机可以启动系统的组件上的故障排除例程。还公开了一种用于监测多组分化学物质输送系统中组分的性能特征的方法。

4. 发明申请

US20090078324A1 GAS-PANEL SYSTEM 审中-公开
标题翻译：气体面板系统
公开(公告)号：US20090078324A1
公开(公告)日：2009-03-26
申请号：US12235112
申请日：2008-09-22
申请人： Hubert Dinh , Sowmya Krishnan , Bruce C. Wier , Mohamed Saleem
发明人： Hubert Dinh , Sowmya Krishnan , Bruce C. Wier , Mohamed Saleem
IPC分类号： F16K31/36
CPC分类号： G05D7/0635 , Y10T137/7761
摘要： The invention involves the introduction of a gas-flow restrictor and reservoir upstream of a mass flow controller (MFC) in a gas-panel stick. The restrictor and reservoir components function to smooth out pressure spikes in the gas line, thus preventing gas-flow irregularities that can occur in an MFC or pressure-insensitive MFC. The restrictor and reservoir components can be integrated into the MFC.
摘要翻译：本发明涉及在气体面板棒中引入质量流量控制器（MFC）上游的气体流量限制器和容器。限流器和储存器部件用于平滑气体管线中的压力尖峰，从而防止在MFC或不敏感的MFC中发生气流不均匀。限流器和储油部件可以集成到MFC中。

5. 发明申请

US20100112814A1 PRE-CERTIFIED PROCESS CHAMBER AND METHOD 审中-公开
标题翻译：预认证过程室和方法
公开(公告)号：US20100112814A1
公开(公告)日：2010-05-06
申请号：US11995925
申请日：2007-09-05
申请人： Sowmya Krishnan
发明人： Sowmya Krishnan
IPC分类号： H01L21/285 , C23C16/54
CPC分类号： B08B9/00 , B08B7/0071
摘要： The present invention relates generally to the field of semiconductor device manufacturing and more specifically to the manufacture and certification of semiconductor processing equipment. Systems and methods are described that establish a baseline contamination levels at each stage of the manufacture, assembly, testing, and installation of a process chamber.
摘要翻译：本发明一般涉及半导体器件制造领域，更具体地涉及半导体加工设备的制造和认证。描述了在制造，组装，测试和安装处理室的每个阶段建立基线污染水平的系统和方法。

6. 发明申请

US20090028781A1 CATALYTIC REACTOR METHOD FOR GENERATING HIGH PURITY WATER VAPOR 审中-公开
标题翻译：用于生产高纯度水蒸汽的催化反应器方法
公开(公告)号：US20090028781A1
公开(公告)日：2009-01-29
申请号：US12240763
申请日：2008-09-29
申请人： Sowmya Krishnan , Mohamed Saleem , Matthew Milburn
发明人： Sowmya Krishnan , Mohamed Saleem , Matthew Milburn
IPC分类号： C01B5/00
CPC分类号： B01J19/0013 , B01J19/002 , B01J19/006 , B01J19/02 , B01J2219/00058 , B01J2219/00069 , B01J2219/00259 , B01J2219/00768 , B01J2219/00777 , B01J2219/0245 , C01B5/00
摘要： A catalytic reactor apparatus produces high purity water vapor by reacting hydrogen and oxygen together within a catalytic reaction chamber. The reactants and an inert gas, such as argon gas or nitrogen, are supplied to the catalytic reaction chamber in a controlled fashion by a gas panel. The cylindrical catalytic reaction chamber is preferably constructed of titanium or stainless steel. The catalytic reaction chamber is filled with high purity ceramic pellets of a nonreactive material coated with a catalyst, such a noble metal catalyst. Screens at each end of the reaction chamber prevent the catalyst pellets from being transported outside reaction chamber. The interior of the reaction chamber has two perpendicular baffle plates traversing the length to increase contact area with the catalytic pellets for electrical charge and thermal transport during the reaction. The temperature of the reaction chamber is maintained below 350 C during operation.
摘要翻译：催化反应器装置通过在催化反应室内一起氢和氧反应而产生高纯度水蒸气。将反应物和惰性气体（例如氩气或氮气）通过气体面板以可控的方式供应到催化反应室。圆柱形催化反应室优选由钛或不锈钢构成。催化反应室装有涂覆有催化剂的这种贵金属催化剂的非反应性材料的高纯度陶瓷颗粒。在反应室的每一端的筛网防止催化剂颗粒被运送到反应室外。反应室的内部具有穿过长度的两个垂直挡板，以增加与催化颗粒的接触面积，用于反应期间的电荷和热传递。在操作过程中，反应室的温度保持在350℃以下。

7. 发明申请

US20090114295A1 GAS-PANEL ASSEMBLY 审中-公开
标题翻译：气体面板组件
公开(公告)号：US20090114295A1
公开(公告)日：2009-05-07
申请号：US11935940
申请日：2007-11-06
申请人： Matthew L. Milburn , Bruce C. Wier , Sowmya Krishnan
发明人： Matthew L. Milburn , Bruce C. Wier , Sowmya Krishnan
IPC分类号： F16K27/00 , B21D39/00 , F16K1/06
CPC分类号： F16K27/003 , Y10T137/5109 , Y10T137/87249
摘要： A gas-panel manifold for use in a gas-panel assembly is disclosed. A manifold in the assembly provides a plurality of support surfaces, each designed for supporting a gas-component thereon, and internal passageways disposed within the manifold body for connecting gas components, with such carried on the manifold, for gas flow through the manifold in a generally downstream direction. The adjacent support surfaces in the manifold are in different planes, representing different heights above the support.
摘要翻译：公开了一种用于气体面板组件的气体面板歧管。组件中的歧管提供多个支撑表面，每个支撑表面设计用于支撑其上的气体部件，以及设置在歧管主体内部的内部通道，用于连接气体部件，并将其携带在歧管上，以便气体流过歧管一般是下游方向。歧管中相邻的支撑表面在不同的平面上，表示支撑件上方不同的高度。

8. 发明申请

US20070224708A1 Mass pulse sensor and process-gas system and method 审中-公开
标题翻译：质量脉冲传感器和工艺气体系统及方法
公开(公告)号：US20070224708A1
公开(公告)日：2007-09-27
申请号：US11386292
申请日：2006-03-21
申请人： Sowmya Krishnan , Mohamed Saleem
发明人： Sowmya Krishnan , Mohamed Saleem
IPC分类号： H01L21/00
CPC分类号： F16K37/0091
摘要： An improved valve device, a valved process-gas apparatus, and a method for confirming operations in a gas-process system are disclosed. The valve device includes an electronically controlled valve designed to cycle between closed and open conditions, with closed-to-open and open-to-closed response times less than about 250 ms, to control the flow of a gas through the valve. A sensor disposed at the downstream side of the valve is operable to (i) detect the presence of at least a threshold amount of gas during the period of the valve's closed-to-open response, and (ii) to detect the absence of at least a threshold amount of gas after the period of the valve's open-to-closed response, thus confirming successful operation of the valve.
摘要翻译：公开了一种改进的阀装置，阀式处理气体装置和用于确认气体处理系统中的操作的方法。阀装置包括设计成在闭合和打开状态之间循环的电子控制阀，具有小于约250ms的闭合打开和开 - 关响应时间，以控制气体通过阀的流动。设置在阀的下游侧的传感器可操作以（i）在阀的闭合 - 打开响应期间检测至少阈值量的气体的存在，以及（ii）检测不存在在阀的开 - 关响应时间之后至少是气体的阈值，从而确认阀的成功运行。

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