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    • 3. 发明专利
    • Optical element and display device
    • 光学元件和显示设备
    • JP2007206373A
    • 2007-08-16
    • JP2006025103
    • 2006-02-01
    • Sony Corpソニー株式会社
    • OKUYAMA KENTAROSATO HARUMIIWASAKI HIROSHITSUBO RIE
    • G02F1/1334G02F1/13
    • G02F1/133377G02F1/1323G02F1/1334
    • PROBLEM TO BE SOLVED: To provide a lightweight and thin type optical element of low costs capable of controlling a light direction while suppressing reduction of luminance and to provide a display device.
      SOLUTION: The optical element (light controlling element) 11 has first regions 14 patterned between a pair of transparent base materials 12 ans 13 and composed of a light transmissible material and second regions 15 disposed between the first regions and comprising a liquid crystal material by which a light transmitting state and a light scattering or absorbing state can be selectively switched. The optical element 11 is used as e.g. the light controlling element adjusting a visual field angle of a liquid crystal display and enables electric switching of wide and narrow visual field angles by the light transmitting state and the light scattering or absorbing state of the second regions 15. The luminance in the front direction especially in a narrow visual field angle mode is heightened and high definition of an image is attained by making the width W1 of the first regions 14 wider than the width W2 of the second regions 15.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种能够在抑制亮度降低的同时控制光线方向并且提供显示装置的低成本的重量轻且薄型的光学元件。 解决方案:光学元件(光控制元件)11具有在一对透明基材12和13之间图案化并由透光材料构成的第一区域14和设置在第一区域之间的第二区域15,并且包括液晶 可以选择性地切换透光状态和光散射或吸收状态的材料。 光学元件11用作例如。 所述光控制元件调节液晶显示​​器的视场角,并且能够通过第二区域15的光透射状态和光散射或吸收状态来实现宽视场和窄视角的电切换。特别是前方的亮度 通过使第一区域14的宽度W1比第二区域15的宽度W2宽,可以提高视野的窄视角模式,并且可以实现图像的高清晰度。(C)2007,JPO&INPIT
    • 9. 发明专利
    • Patterned structure and pattern forming method
    • 图形结构和图案形成方法
    • JP2008064812A
    • 2008-03-21
    • JP2006239706
    • 2006-09-05
    • Sony Corpソニー株式会社
    • SATO HARUMIOKUYAMA KENTARO
    • G03F7/11G03F7/09H01L21/027
    • PROBLEM TO BE SOLVED: To provide a patterned structure and a pattern forming method by which a microscopic resist pattern having a high aspect ratio can be formed on a glass or film. SOLUTION: The pattern forming method includes exposing and developing a photosensitive resist material 13B to form a patterned layer 15, wherein before a step of applying the photosensitive resist material 13B on a substrate 11, an underlayer 13A comprising the same or another photosensitive resist material is formed on the substrate. By preparing the underlayer 13A as a base for the patterned layer 15, adhesion between the substrate 11 and the patterned layer 15 is enhanced and the microscopic patterned layer 15 having a high aspect ratio can be formed. In order to enhance adhesion between the substrate 11 and the underlayer 13A, an adhesive layer 12 comprising HMDS (hexamethyldisilazane) is preferably interposed. COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供一种图案化结构和图案形成方法,通过该方法可以在玻璃或薄膜上形成具有高纵横比的微观抗蚀剂图案。 解决方案:图案形成方法包括曝光和显影光敏抗蚀剂材料13B以形成图案化层15,其中在将光敏抗蚀剂材料13B施加到基板11上的步骤之前,将包含相同或另一种光敏层 在基板上形成抗蚀剂材料。 通过制备作为图案层15的底层的底层13A,增强了基板11和图案层15之间的粘附,并且可以形成具有高纵横比的微观图案层15。 为了增强基板11和底层13A之间的粘附性,优选插入包含HMDS(六甲基二硅氮烷)的粘合剂层12。 版权所有(C)2008,JPO&INPIT