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1. 发明授权

US09053924B2 Cleaning agent for silicon wafer 有权
标题翻译：硅晶片清洗剂
公开(公告)号：US09053924B2
公开(公告)日：2015-06-09
申请号：US12898185
申请日：2010-10-05
申请人： Soichi Kumon , Takashi Saio , Shinobu Arata , Hidehisa Nanai , Yoshinori Akamatsu , Shigeo Hamaguchi , Kazuhiko Maeda
发明人： Soichi Kumon , Takashi Saio , Shinobu Arata , Hidehisa Nanai , Yoshinori Akamatsu , Shigeo Hamaguchi , Kazuhiko Maeda
IPC分类号： H01L21/02 , B08B3/00 , C11D3/16 , C11D7/50 , H01L21/00 , C09D183/04
CPC分类号： H01L21/02052 , B08B3/00 , C09D183/04 , C11D3/162 , C11D7/5022 , H01L21/00 , H01L21/02054
摘要： A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.
摘要翻译：一种用于硅晶片（第一清洁剂）的清洁剂至少含有一种水基清洗液和一种防水清洗液，用于在清洁过程中至少提供具有防水性的凹凸图案的凹陷部分。水性清洗液是将具有与硅晶片中的Si元素和疏水性基团化学结合的反应性部分的防水化合物和至少含有醇溶剂的有机溶剂混合并包含的液体。利用该清洁剂，可以提高倾向于引起图案塌陷的清洁处理。

2. 发明申请

US20110214685A1 Cleaning Agent For Silicon Wafer 有权
标题翻译：硅晶片清洗剂
公开(公告)号：US20110214685A1
公开(公告)日：2011-09-08
申请号：US12898185
申请日：2010-10-05
申请人： Soichi KUMON , Takashi Saio , Shinobu Arata , Hidehisa Nanai , Yoshinori Akamatsu , Shigeo Hamaguchi , Kazuhiko Maeda
发明人： Soichi KUMON , Takashi Saio , Shinobu Arata , Hidehisa Nanai , Yoshinori Akamatsu , Shigeo Hamaguchi , Kazuhiko Maeda
IPC分类号： B08B3/00 , C11D3/20
CPC分类号： H01L21/02052 , B08B3/00 , C09D183/04 , C11D3/162 , C11D7/5022 , H01L21/00 , H01L21/02054
摘要： A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.
摘要翻译：一种用于硅晶片（第一清洁剂）的清洁剂至少含有一种水基清洗液和一种防水清洗液，用于在清洁过程中至少提供具有防水性的凹凸图案的凹陷部分。水性清洗液是将具有与硅晶片中的Si元素和疏水性基团化学结合的反应性部分的防水化合物和至少含有醇溶剂的有机溶剂混合并包含的液体。利用该清洁剂，可以提高倾向于引起图案塌陷的清洁处理。

3. 发明授权

US09851639B2 Photoacid generating polymers containing a urethane linkage for lithography 有权
公开(公告)号：US09851639B2
公开(公告)日：2017-12-26
申请号：US13436881
申请日：2012-03-31
申请人： Robert David Allen , Phillip Joe Brock , Masaki Fujiwara , Kazuhiko Maeda , Hoa D. Truong
发明人： Robert David Allen , Phillip Joe Brock , Masaki Fujiwara , Kazuhiko Maeda , Hoa D. Truong
IPC分类号： G03F7/004 , C08F228/02 , G03F7/039 , G03F7/11 , G03F7/20
CPC分类号： G03F7/0397 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/11 , G03F7/2041
摘要： A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second repeat unit of capable of forming the photogenerated acid, and iii) a third repeat unit comprising a norbornyl ester, wherein a norbornyl ring of the norbornyl ester comprises a monovalent substituent having the formula *-L′-C(CF3)2(OH). L′ is a divalent linking group comprising at least one carbon and the starred bond of L′ is linked to the norbornyl ring. The first repeat unit, second repeat unit, and the third repeat unit are covalently bound repeat units of the PAG polymer.

4. 发明授权

US09141856B2 Clothing image analysis apparatus, method, and integrated circuit for image event evaluation 有权
标题翻译：服装图像分析装置，图像事件评估方法和集成电路
公开(公告)号：US09141856B2
公开(公告)日：2015-09-22
申请号：US13814813
申请日：2012-07-05
申请人： Kazuhiko Maeda
发明人： Kazuhiko Maeda
IPC分类号： G06K9/00 , G06F17/30
CPC分类号： G06K9/00577 , G06F17/30247 , G06K9/00288 , G06K9/00362
摘要： In an image evaluation apparatus, a clothing recognition unit performs, for each person appearing in each of images included in an image group generated by an image group generation unit, recognition of clothing that the person is wearing. An image event evaluation unit, according to types of clothing recognized by the clothing recognition unit and a frequency of appearance of each type of clothing in the images in the image group, collectively evaluates the images included in the image group.
摘要翻译：在图像评价装置中，服装识别单元对于由图像组生成单元生成的图像组中包含的每个图像中的每个人执行对该人穿着的服装的识别。图像事件评估单元根据由服装识别单元识别的服装的类型和图像组中的图像中的各种服装的出现次数，共同评估包括在图像组中的图像。

5. 发明授权

US08691491B2 Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions 有权
标题翻译：含氟化合物及其聚合物可用于抗反射膜材料和抗蚀剂组合物
公开(公告)号：US08691491B2
公开(公告)日：2014-04-08
申请号：US13094281
申请日：2011-04-26
申请人： Shinichi Sumida , Haruhiko Komoriya , Kazuhiko Maeda
发明人： Shinichi Sumida , Haruhiko Komoriya , Kazuhiko Maeda
IPC分类号： G03F7/004
CPC分类号： C08F20/30 , C08F14/18 , C08F20/28 , C08F216/1408 , C08F220/24 , C08F220/30 , C09D125/16 , C09D133/16 , Y10S430/108 , Y10S430/111 , C08F2/00
摘要： A fluorine-containing compound represented by the formula 1, where R1 is a methyl group or trifluoromethyl group, each of R2 and R3 is independently a hydrogen atom or a group containing (a) a hydrocarbon group having a straight-chain, branched or ring form and having a carbon atom number of 1-25 or (b) an aromatic hydrocarbon group, the group optionally containing at least one of a fluorine atom, an oxygen atom and a carbonyl bond, l is an integer of from 0 to 2, each of m and n is independently an integer of 1-5 to satisfy an expression of m+n≦6, and when at least one of R1, R2 and R3 is in a plural number, the at least one of R1, R2 and R3 may be identical with or different from each other.
摘要翻译：由式1表示的含氟化合物，其中R 1为甲基或三氟甲基，R 2和R 3各自独立地为氢原子或含有（a）具有直链，支链或环的烃基的基团形成并具有1-25的碳原子数或（b）芳族烃基，所述基团任选地含有氟原子，氧原子和羰基键中的至少一个，l是0-2的整数， m和n各自独立地为1-5的整数，以满足m + n＆nlE; 6的表达式，并且当R 1，R 2和R 3中的至少一个为多个时，R 1，R 2和 R3可以彼此相同或不同。

6. 发明授权

US08435717B2 Compound for photoacid generator, resist composition using the same, and pattern-forming method 有权
标题翻译：用于光致酸发生剂的组合物，使用其的抗蚀剂组合物和图案形成方法
公开(公告)号：US08435717B2
公开(公告)日：2013-05-07
申请号：US12527362
申请日：2008-02-14
申请人： Yuji Hagiwara , Jonathan Joachim Jodry , Satoru Narizuka , Kazuhiko Maeda
发明人： Yuji Hagiwara , Jonathan Joachim Jodry , Satoru Narizuka , Kazuhiko Maeda
IPC分类号： G03F7/004 , G03F7/039 , G03F7/038 , G03C1/675 , G03C1/73
CPC分类号： C07C69/003 , C07C69/74 , C07C309/12 , C07C381/12 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.
摘要翻译：由下式（1）表示的磺酸鎓盐可用作抗蚀剂组合物的优异的放射敏感酸发生剂。可以通过使用含有该磺酸鎓盐的抗蚀剂组合物形成良好的图案。在式（1）中，R 1表示一价有机基团，Q +表示锍阳离子或碘鎓阳离子。

7. 发明申请

US20120040294A1 Top Coating Composition 有权
标题翻译：顶涂层组成
公开(公告)号：US20120040294A1
公开(公告)日：2012-02-16
申请号：US13264285
申请日：2010-04-20
申请人： Kazuhiko Maeda , Takamasa Kitamoto , Haruhiko Komoriya , Satoru Narizuka , Yoshimi Isono , Kazunori Mori
发明人： Kazuhiko Maeda , Takamasa Kitamoto , Haruhiko Komoriya , Satoru Narizuka , Yoshimi Isono , Kazunori Mori
IPC分类号： G03F7/20 , C08K5/05 , C09D135/02
CPC分类号： C08F20/22 , G03F7/11 , G03F7/2041
摘要： Disclosed is a top coating composition formed on a resist film, for protecting the resist film, the top coating composition being a top coating composition for photoresist, characterized by containing a fluorine-containing polymer having a repeating unit represented by the following general formula (1). This composition is capable of controlling developing solution solubility and has a high water repellency. [In the formula, R1 represents a hydrogen atom, fluorine atom, methyl group or trifluoromethyl group, R2 represents a heat-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W is a bivalent linking group.]
摘要翻译：公开了一种形成在抗蚀剂膜上的用于保护抗蚀剂膜的顶部涂料组合物，该顶部涂料组合物是用于光致抗蚀剂的顶部涂料组合物，其特征在于含有具有由以下通式（1）表示的重复单元的含氟聚合物）。该组合物能够控制显影溶液的溶解度并具有高斥水性。 [式中，R1表示氢原子，氟原子，甲基或三氟甲基，R2表示热不稳定保护基，R3表示氟原子或含氟烷基，W表示二价连接基。

8. 发明申请

US20100304303A1 Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent 有权
标题翻译：新型磺酸盐及其衍生物，光酸发生剂和抗光材料和图案形成方法使用光酸发生剂
公开(公告)号：US20100304303A1
公开(公告)日：2010-12-02
申请号：US12740780
申请日：2008-10-31
申请人： Kazuhiko Maeda , Yoshimi Isono , Satoru Narizuka
发明人： Kazuhiko Maeda , Yoshimi Isono , Satoru Narizuka
IPC分类号： G03F7/004 , C07C271/24 , G03F7/20
CPC分类号： C07C309/59 , C07C309/12 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D207/46 , C09D133/14 , C09D133/16 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： Disclosed is a fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound having a structure represented by the following general formula (A). In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group; and a indicates 1 or 0. A photoacid generator containing the above fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound shows high sensitivity to an ArF excimer laser or the like, presents no concerns about human body accumulation, can generate an acid (photoacid) of sufficiently high acidity, and exhibits high solubility in a resist solvent and good compatibility with a resist resin.
摘要翻译：公开了具有由以下通式（A）表示的结构的氟化磺酸盐或含氟磺酸基化合物。在该式中，n表示1〜10的整数， R表示取代或未取代的C1-C20直链，支链或环状烷基，取代或未取代的C1-C20直链，支链或环状烯基，取代或未取代的C6-C15芳基或C4-C15杂芳基; a表示1或0.含有上述含氟磺酸盐或含氟磺酸基的化合物的光酸产生剂对ArF准分子激光等具有高灵敏度，不关于人体积累，可产生酸（光酸），并且在抗蚀剂溶剂中表现出高溶解性和与抗蚀剂树脂的良好相容性。

9. 发明授权

US07728103B2 Fluorine-containing polymerizable monomer and polymer compound using same 有权
标题翻译：含氟聚合性单体和使用其的高分子化合物
公开(公告)号：US07728103B2
公开(公告)日：2010-06-01
申请号：US12533024
申请日：2009-07-31
申请人： Hiroshi Saegusa , Satoru Narizuka , Kazuhiko Maeda
发明人： Hiroshi Saegusa , Satoru Narizuka , Kazuhiko Maeda
IPC分类号： C08G63/06
CPC分类号： C07C217/90 , C08G73/1039
摘要： Polymer compounds obtained by polymerization of a fluorine-containing polymerizable monomer represented by the formula [1] in which A represents a single bond, oxygen atom, sulfur atom, CO, CH2, SO, SO2, C(CH3)2, NHCO, C(CF3)2, phenyl, or aliphatic ring; “a” and “b” each independently represent an integer of 0-2, and 1≦a+b≦4. This fluorine-containing polymerizable monomer can be used as an effective polymerizable monomer, which can exhibit water repellency, oil repellency, low water absorptive property, heat resistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index property, low dielectric property, etc., and can be used for advanced polymer material fields.
摘要翻译： A表示单键，氧原子，硫原子，CO，CH 2，SO，SO 2，C（CH 3）2，NHCO，C的式[1]表示的含氟聚合性单体聚合得到的高分子化合物（CF 3）2，苯基或脂族环; “a”和“b”各自独立地表示0-2的整数，1＆nlE; a + b＆nlE; 4。该含氟聚合性单体可以用作有效的可聚合单体，其可以具有防水性，拒油性，低吸水性，耐热性，耐候性，耐腐蚀性，透明性，光敏性，低折射率性，低介电性等，可用于高级聚合物材料领域。

10. 发明申请

US20100035185A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method 有权
标题翻译：光致变色发生剂的组合物，使用其的抗蚀剂组合物和图案形成方法
公开(公告)号：US20100035185A1
公开(公告)日：2010-02-11
申请号：US12527362
申请日：2008-02-14
申请人： Yuji Hagiwara , Jonathan Joachim Jodry , Satoru Narizuka , Kazuhiko Maeda
发明人： Yuji Hagiwara , Jonathan Joachim Jodry , Satoru Narizuka , Kazuhiko Maeda
IPC分类号： G03F7/004 , C07C69/003 , C07C69/74 , C07D207/00 , G03F7/20
CPC分类号： C07C69/003 , C07C69/74 , C07C309/12 , C07C381/12 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.
摘要翻译：由下式（1）表示的磺酸鎓盐可用作抗蚀剂组合物的优异的放射敏感酸发生剂。可以通过使用含有该磺酸鎓盐的抗蚀剂组合物形成良好的图案。在式（1）中，R 1表示一价有机基团，Q +表示锍阳离子或碘鎓阳离子。

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