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    • 4. 发明授权
    • Liquid crystal display device
    • 液晶显示装置
    • US08284340B2
    • 2012-10-09
    • US12537061
    • 2009-08-06
    • Sung Il ParkSang Moo SongDae Hyun Kim
    • Sung Il ParkSang Moo SongDae Hyun Kim
    • G02F1/1333
    • G02F1/1345G02F2001/13456
    • An LCD device preventing a short-circuit of adjacent link lines is disclosed. The LCD device includes a pixel area in which a plurality of gate lines and a plurality of data lines crossing the plurality of gate lines at a right angle are formed, a pad area formed at a side of the pixel area, a gate pad portion and a data pad portion formed in the pad area and respectively connected to the plurality of gate lines and the plurality of data lines, first, second, third, and fourth gate link lines connected to the plurality of gate lines and the gate pad portion and alternately arranged with an insulation layer interposed between the first, second, third, and fourth gate link lines, and first and second auto probe pads electrically connected to the first, second, third, and fourth gate link lines. The first and second gate link lines are connected to the first auto probe pad and the third and fourth gate link lines are connected to the second auto probe pad.
    • 公开了一种防止相邻连接线短路的LCD装置。 LCD装置包括像素区域,其中形成有与栅极线成直角交叉的多条栅极线和多条数据线,形成在像素区域侧的焊盘区域,栅极焊盘部分和 数据焊盘部分,形成在焊盘区域中,并且分别连接到多条栅极线和多条数据线,连接到多条栅极线和栅极焊盘部分的第一,第二,第三和第四栅极连接线, 布置有插入在第一,第二,第三和第四栅极连接线之间的绝缘层,以及电连接到第一,第二,第三和第四栅极连接线的第一和第二自动探针焊盘。 第一和第二栅极连接线连接到第一自动探针焊盘,第三和第四栅极连接线连接到第二自动探针焊盘。
    • 5. 发明授权
    • Method for manufacturing liquid crystal display device
    • 制造液晶显示装置的方法
    • US08030104B2
    • 2011-10-04
    • US12222997
    • 2008-08-21
    • Sung Il ParkDae Lim Park
    • Sung Il ParkDae Lim Park
    • G01R31/26H01L21/66
    • H01L27/1288G02F1/134309G02F1/13458G02F2001/134318G02F2001/136231H01L27/1214H01L27/124
    • A method for manufacturing a liquid crystal display device is disclosed. The method includes forming a gate electrode, a gate pad, a gate line on a substrate by using a first mask; forming a gate insulating film, an active layer, an ohmic contact layer and a conductive layer in sequence above the substrate including the gate electrode, the gate line and the gate pad; forming an active pattern, an ohmic contact pattern, source/drain electrodes, a data line and a data pad by using a second mask; forming a pixel electrode on the gate insulating film in a pixel region by using a third mask, to contact with the drain electrode; exposing the active pattern by etching the ohmic contact pattern using the source/drain electrodes as an etching mask; forming a passivation film above the substrate including the source/drain electrodes, the data line and the data pad; forming a first contact hole for exposing the gate pad and a second contact hole for exposing the data pad by etching the passivation and/or gate insulating films using a fourth mask; and forming a common electrode having a plurality of holes on the substrate by using a fifth mask.
    • 公开了一种制造液晶显示装置的方法。 该方法包括通过使用第一掩模在衬底上形成栅电极,栅极焊盘,栅极线; 在包括栅电极,栅极线和栅极焊盘的衬底上方依次形成栅绝缘膜,有源层,欧姆接触层和导电层; 通过使用第二掩模形成有源图案,欧姆接触图案,源极/漏极电极,数据线和数据焊盘; 通过使用第三掩模在像素区域中的栅极绝缘膜上形成像素电极,以与漏电极接触; 通过使用源极/漏极作为蚀刻掩模蚀刻欧姆接触图案来暴露有源图案; 在包括源极/漏极,数据线和数据焊盘的衬底上方形成钝化膜; 形成用于暴露所述栅极焊盘的第一接触孔和用于通过使用第四掩模蚀刻所述钝化和/或栅极绝缘膜来暴露所述数据焊盘的第二接触孔; 以及通过使用第五掩模在所述基板上形成具有多个孔的公共电极。
    • 9. 发明申请
    • Method for manufacturing liquid crystal display device
    • 制造液晶显示装置的方法
    • US20090081820A1
    • 2009-03-26
    • US12222997
    • 2008-08-21
    • Sung Il ParkDae Lim Park
    • Sung Il ParkDae Lim Park
    • H01L33/00
    • H01L27/1288G02F1/134309G02F1/13458G02F2001/134318G02F2001/136231H01L27/1214H01L27/124
    • A method for manufacturing a liquid crystal display device is disclosed. The method includes forming a gate electrode, a gate pad, a gate line on a substrate by using a first mask; forming a gate insulating film, an active layer, an ohmic contact layer and a conductive layer in sequence above the substrate including the gate electrode, the gate line and the gate pad; forming an active pattern, an ohmic contact pattern, source/drain electrodes, a data line and a data pad by using a second mask; forming a pixel electrode on the gate insulating film in a pixel region by using a third mask, to contact with the drain electrode; exposing the active pattern by etching the ohmic contact pattern using the source/drain electrodes as an etching mask; forming a passivation film above the substrate including the source/drain electrodes, the data line and the data pad; forming a first contact hole for exposing the gate pad and a second contact hole for exposing the data pad by etching the passivation and/or gate insulating films using a fourth mask; and forming a common electrode having a plurality of holes on the substrate by using a fifth mask.
    • 公开了一种制造液晶显示装置的方法。 该方法包括通过使用第一掩模在衬底上形成栅电极,栅极焊盘,栅极线; 在包括栅电极,栅极线和栅极焊盘的衬底上方依次形成栅绝缘膜,有源层,欧姆接触层和导电层; 通过使用第二掩模形成有源图案,欧姆接触图案,源极/漏极电极,数据线和数据焊盘; 通过使用第三掩模在像素区域中的栅极绝缘膜上形成像素电极,以与漏电极接触; 通过使用源极/漏极作为蚀刻掩模蚀刻欧姆接触图案来暴露有源图案; 在包括源极/漏极,数据线和数据焊盘的衬底上方形成钝化膜; 形成用于暴露所述栅极焊盘的第一接触孔和用于通过使用第四掩模蚀刻所述钝化和/或栅极绝缘膜来暴露所述数据焊盘的第二接触孔; 以及通过使用第五掩模在所述基板上形成具有多个孔的公共电极。