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1. 发明授权

US5109089A Radiation-curable liquid resin for secondary coating of lightwave guides 失效
标题翻译：辐射固化液体树脂，用于二次涂漆
公开(公告)号：US5109089A
公开(公告)日：1992-04-28
申请号：US720927
申请日：1991-06-25
申请人： Siegfried Birkle , Hans-Dieter Feucht , Rainer Kamps , Eva Rissel
发明人： Siegfried Birkle , Hans-Dieter Feucht , Rainer Kamps , Eva Rissel
IPC分类号： C08G18/58 , C08G18/81 , C08G59/04 , C08G59/14 , C08G59/17 , C08G59/22 , H01B3/40
CPC分类号： C08G59/1466 , C08G18/581 , C08G18/8116 , C08G59/04 , C08G59/1444 , C08G59/1477 , C08G59/22 , H01B3/40
摘要： The invention provides a radiation-curable liquid resin useful as a secondary coating of lightwave guides. The resin is a reaction product of (meth)acrylic acid or glyceroldi(meth)acrylate or pentaerythritoltri(meth)acrylate with a 2:1 addition compound of a diepoxide and an .alpha.,.omega. -diol with a mean molecular weight between 600 and 3000, or, a reaction product of (meth)acrylic acid or -acid chloride or isocyanatoalkyl-(meth)acrylate with a conversion product of the 2:1 addition compound and a low-molecular monovalent alcohol C.sub.1 to C.sub.10), a low-molecular bivalent alcohol (C.sub.2 to C.sub.4) or water, where the diepoxide is an aromatic diglycidylether and the .alpha.,.omega. -diol is an .alpha.,.omega.-hydroxy-terminated polyoxyalkylene, an .alpha.,.omega. -hydroxy-terminated polyester, an .alpha.,.omega. -hydroxy-terminated polybutadiene or an .alpha.,.omega. -hydroxy-terminated organo-functional polysiloxane.

2. 发明授权

US5015709A Radiation-curable liquid resin for secondary coating lightwave guides 失效
标题翻译：二次涂布光波导的可辐射固化液体树脂
公开(公告)号：US5015709A
公开(公告)日：1991-05-14
申请号：US286461
申请日：1988-12-19
申请人： Siegfried Birkle , Hans-Dieter Feucht , Rainer Kamps , Eva Rissel
发明人： Siegfried Birkle , Hans-Dieter Feucht , Rainer Kamps , Eva Rissel
IPC分类号： C08F2/46 , C08G18/64 , C08G18/81 , C08G59/04 , C08G59/14 , C08G59/17 , C08G59/22 , G02B6/38 , H01B3/40
CPC分类号： H01B3/40 , C08G18/6407 , C08G18/8116 , C08G59/04 , C08G59/1444 , C08G59/1466 , C08G59/1477 , C08G59/22 , G02B6/3801 , Y10S525/92 , Y10S525/921 , Y10S525/922
摘要： The invention provides a radiation-curable liquid resin for use as a secondary coating of lightwave guides which is a reaction product of (meth)acrylic acid or -acid chloride or isocyanatoalkyl-(meth)acrylate with a 1:2 addition compound of a diepoxide with a mean molecular weight.ltoreq.1000 and a short-chain .alpha.,.omega. -diol with a mean molecular weight.ltoreq.700 or with a 1:2 addition compound of a diepoxide with a mean molecular weight.ltoreq.400 and a monovalent aliphatic alcohol with a mean molecular weight.ltoreq.200, where the diepoxide is an aliphatic-aromatic or aromatic diglycidylether, an aliphatic or cycloaliphatic diepoxide or a silicon-organodiepoxide, and where the short-chain .alpha.,.omega. -diol is an .alpha..omega. -hydroxy-terminated polyoxyalkylene, an .alpha.,.omega. -hydroxy-terminated polyester, an .alpha.,.omega. -hydroxy-terminated polybutadiene, an .alpha.,.omega. -hydroxyterminated organo-functional polysiloxane or an .alpha.,.omega. -alkanediol with a mean molecular weight.ltoreq.200.
摘要翻译：本发明提供一种用作光波导二次涂层的可辐射固化液体树脂，它是（甲基）丙烯酸或氯化异氰酸酯基 - （甲基）丙烯酸异氰酸根合烷基酯与二环氧化物加成化合物的反应产物平均分子量为1000，平均分子量为700的短链α，ω-二醇或具有平均分子量为400的二环氧化物的1:2加成化合物，和平均分子量为200的一元脂族醇，其中二环氧化物是脂族 - 芳族或芳族二缩水甘油醚，脂族或环脂族二环氧化物或硅 - 有机二环氧化物，其中短链α，ω-二醇是α ω-羟基封端的聚氧化烯，α，ω-羟基封端的聚酯，α，ω-羟基封端的聚丁二烯，α，ω-羟基封端的有机官能聚硅氧烷或α，ω- / = 200。

3. 发明授权

US5057587A Radiation-curable liquid resin for secondary coating of lightwave guides 失效
标题翻译：辐射固化液体树脂，用于二次涂漆
公开(公告)号：US5057587A
公开(公告)日：1991-10-15
申请号：US286472
申请日：1988-12-16
申请人： Siegfried Birkle , Hans-Dieter Feucht , Rainer Kamps , Eva Rissel
发明人： Siegfried Birkle , Hans-Dieter Feucht , Rainer Kamps , Eva Rissel
IPC分类号： C08G18/58 , C08G18/81 , C08G59/04 , C08G59/14 , C08G59/17 , C08G59/22 , H01B3/40
CPC分类号： C08G59/1466 , C08G18/581 , C08G18/8116 , C08G59/04 , C08G59/1444 , C08G59/1477 , C08G59/22 , H01B3/40
摘要： The invention provides a radiation-curable liquid resin useful as a secondary coating of lightwave guides. The resin is a reaction product of (meth)acrylic acid or glyceroldi (meth)acrylate or Pentaerythritoltri(meth)acrylate with a 2:1 addition compound of a diepoxide and an .alpha., .omega.-diol with a mean molecular weight between 600 and 3000, or, a reaction product of (meth)acrylic acid or -acid chloride or isocyanatoalkyl-(meth)acrylate with a conversion product of the 2:1 addition compound and a low-molecular monovalent alcohol (C.sub.1 to C.sub.10), a low-molecular bivalent alcohol (C.sub.2 to C.sub.4) or water, where the diepoxide is an aromatic diglycidylether and the .alpha.,.omega.-diol is an .alpha., .omega.-hydroxy-terminated polyoxyalkylene, an .alpha., .omega.-hydroxy-terminated polyester, an .alpha.,.omega.-hydroxy-terminated polybutadiene or an .alpha.,.omega.-hydroxy-terminated organo-functional polysiloxane.
摘要翻译：本发明提供了可用作光波导二次涂层的可辐射固化液体树脂。树脂是（甲基）丙烯酸或（甲基）丙烯酸甘油酯或季戊四醇三（甲基）丙烯酸酯与二环氧化物的加成化合物和平均分子量在600和3000之间的α，ω-二醇的2:1的加成化合物的反应产物，或（甲基）丙烯酸或氯化异氰酸酯基 - （甲基）丙烯酸异氰酸根合烷基酯与2:1加成化合物与低分子一价醇（C1〜C10）的转化产物的反应产物，分子二价醇（C2至C4）或水，其中二环氧化物是芳族二缩水甘油醚，α，ω-二醇是α，ω-羟基封端的聚氧化烯，α，ω-羟基封端的聚酯，α，ω 羟基封端的聚丁二烯或α，ω-羟基封端的有机官能聚硅氧烷。

4. 发明授权

US4812200A Method for generating resist structures 失效
标题翻译：生成抗蚀剂结构的方法
公开(公告)号：US4812200A
公开(公告)日：1989-03-14
申请号：US166436
申请日：1988-03-10
申请人： Siegfried Birkle , Recai Sezi , Hans-Dieter Feucht , Rainer Leuschner
发明人： Siegfried Birkle , Recai Sezi , Hans-Dieter Feucht , Rainer Leuschner
IPC分类号： G03C1/72 , G03F7/022 , G03F7/039 , G03F7/075 , H01L21/312 , B44C1/22 , B29C37/00 , C03C15/00 , C03C25/06
CPC分类号： G03F7/0758
摘要： In generating resist structures according to bilayer technology a series of requirements is made of silicon-containing positive resists. The new method is intended to ensure, inter alia, the profile retention respectively the ability of the resist structures to maintain precise dimensions. According to the invention vinyl phenol-vinyl silane copolymers are used as resist materials.
摘要翻译：在根据双层技术生成抗蚀剂结构的过程中，对含硅正性抗蚀剂有一系列要求。新方法旨在确保分别保留抗蚀剂结构保持精确尺寸的能力。根据本发明，使用乙烯基苯酚 - 乙烯基硅烷共聚物作为抗蚀材料。

5. 发明授权

US4791176A Alkenylphenol and alkenylphenol ether copolymers 失效
标题翻译：烯基酚和烯基酚醚共聚物
公开(公告)号：US4791176A
公开(公告)日：1988-12-13
申请号：US166437
申请日：1988-03-10
申请人： Siegfried Birkle , Recai Sezi , Hans-Dieter Feucht
发明人： Siegfried Birkle , Recai Sezi , Hans-Dieter Feucht
IPC分类号： C08F214/00 , C08F12/00 , C08F14/00 , C08F212/10 , C08F212/14 , C08F230/08 , G03F7/075 , C08F30/08
CPC分类号： G03F7/0758 , C08F212/14 , C08F230/08
摘要： The invention relates to new copolymers of alkenyl phenol or alkenyl phenol ether in combination with alkenyl silanes. These copolymers are useful positive photoresists.
摘要翻译：本发明涉及链烯基酚或烯基苯酚醚与烯基硅烷的组合的新共聚物。这些共聚物是有用的阳性光致抗蚀剂。

6. 发明授权

US5703186A Mixed polymers 失效
标题翻译：混合聚合物
公开(公告)号：US5703186A
公开(公告)日：1997-12-30
申请号：US717652
申请日：1996-09-23
申请人： Recai Sezi , Horst Borndoerfer , Hellmut Ahne , Siegfried Birkle , Eberhard Kuehn , Rainer Leuschner , Eva Rissel , Michael Sebald
发明人： Recai Sezi , Horst Borndoerfer , Hellmut Ahne , Siegfried Birkle , Eberhard Kuehn , Rainer Leuschner , Eva Rissel , Michael Sebald
IPC分类号： C08F212/32 , C08F12/00 , C08F220/10 , C08F220/18 , C08F222/06 , G03F7/004 , G03F7/027 , G03F7/038 , G03F7/039 , G03F7/26 , H01L21/027 , C08F222/04 , C08F222/08
CPC分类号： G03F7/265 , C08F220/18 , C08F222/06 , G03F7/039
摘要： Premixed polymers which can serve as base polymers for high-resolution resists are structured from 40 to 99 mole % of a tert. butyl ester of an unsaturated carboxylic acid and 1 to 60 mole % of an anhydride of an unsaturated carboxylic acid.
摘要翻译：可用作高分辨抗蚀剂的基础聚合物的预混合聚合物的结构为40-99摩尔％的叔丁基。不饱和羧酸的丁酯和1〜60摩尔％的不饱和羧酸酐。

7. 发明授权

US5616667A Copolymers 失效
标题翻译：共聚物
公开(公告)号：US5616667A
公开(公告)日：1997-04-01
申请号：US434955
申请日：1995-05-04
申请人： Recai Sezi , Horst Borndoerfer , Hellmut Ahne , Siegfried Birkle , Eberhard Kuehn , Rainer Leuschner , Eva Rissel , Michael Sebald
发明人： Recai Sezi , Horst Borndoerfer , Hellmut Ahne , Siegfried Birkle , Eberhard Kuehn , Rainer Leuschner , Eva Rissel , Michael Sebald
IPC分类号： C08F212/32 , C08F12/00 , C08F220/10 , C08F220/18 , C08F222/06 , G03F7/004 , G03F7/027 , G03F7/038 , G03F7/039 , G03F7/26 , H01L21/027
CPC分类号： G03F7/265 , C08F220/18 , C08F222/06 , G03F7/039
摘要： New mixed polymers which can serve as base polymers for high-resolution resists are structured from 40 to 99 mole % of a tert. butyl ester of an unsaturated carboxylic acid and 1 to 60 mole % of an anhydride of an unsaturated carboxylic acid.
摘要翻译：可用作高分辨抗蚀剂的基础聚合物的新型混合聚合物的结构为40-99摩尔％的叔丁基。不饱和羧酸的丁酯和1〜60摩尔％的不饱和羧酸酐。

8. 发明授权

US5262283A Method for producing a resist structure 失效
标题翻译：抗蚀剂结构体的制造方法
公开(公告)号：US5262283A
公开(公告)日：1993-11-16
申请号：US692364
申请日：1991-04-26
申请人： Recai Sezi , Horst Borndorfer , Eva Rissel , Rainer Leuschner , Michael Sebald , Hellmut Ahne , Siegfried Birkle
发明人： Recai Sezi , Horst Borndorfer , Eva Rissel , Rainer Leuschner , Michael Sebald , Hellmut Ahne , Siegfried Birkle
IPC分类号： G03F7/029 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/26 , G03F7/32 , G03F7/36 , G03F7/38 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L21/312 , G03C5/56
CPC分类号： G03F7/265 , G03F7/039
摘要： High resolution resist structures with steep edges are obtained using standard equipment, with high sensitivity, particularly in the deep UV range. A photoresist layer consisting of a polymer having anhydride groups and blocked imide- or phenolic hydroxyl groups and of a photoactive component which forms a strong acid during irradiation is first deposited on a substrate, followed by irradiation with a patterned image. The irradiated photoresist layer is then treated with a water-based or a water-alcohol-based solution of a polyfunctional amino- or hydroxy-siloxane, and is etched in an oxygen-containing plasma.
摘要翻译：使用标准设备获得具有陡峭边缘的高分辨率抗蚀剂结构，具有高灵敏度，特别是在深紫外范围内。由具有酸酐基和封闭的酰亚胺基或酚羟基的聚合物和在照射期间形成强酸的光活性组分组成的光致抗蚀剂层首先沉积在基底上，随后用图案化图像照射。然后用多官能氨基或羟基 - 硅氧烷的水基或水 - 醇类溶液处理照射的光致抗蚀剂层，并在含氧等离子体中进行蚀刻。

9. 发明授权

US4144360A Method for the currentless catalytic precipitation of aluminum 失效
标题翻译：铝的无电催化沉淀的方法
公开(公告)号：US4144360A
公开(公告)日：1979-03-13
申请号：US820700
申请日：1977-08-01
申请人： Siegfried Birkle , Richard Dotzer , Eva Rissel
发明人： Siegfried Birkle , Richard Dotzer , Eva Rissel
IPC分类号： C04B35/51 , C03C17/10 , C23C18/18 , C23C18/31 , C23C3/02
CPC分类号： C23C18/1889 , C23C18/1841 , C23C18/208 , C23C18/52
摘要： The invention relates to a method for the currentless catalytic precipitation of aluminum. The surface of insulating and conductive materials (substrates) to be aluminized is (1) catalyzed, while a film-forming moisture-insensitive layer is developed, with a compound active at the boundary surfaces, by a brief immersion in a dilute solution of (a) a modified ester or acylate of titanium, zirconium or vanadium, substituted at the metal atom with short- and long-chain organic radicals or (b), a chloride of the transition metals of the IV and V secondary group of the periodic system of the elements and a water-containing metal soap of a polyvalent metal, preferably aluminum soaps; (2) is intensively rinsed with aprotic solvents, preferably having a boiling point of over 100.degree. C.; and (3) is immersed in a 1 to 4% solution of trialkylaminalanes in a solvent mixture of aromatic and highly viscous aliphatic compounds. A homogeneous and strongly adhering aluminum coating is thereby obtained.Insulating and conductive materials and components, e.g., electronic components and reflectors can in this manner be homogeneously coated with strongly adherent aluminum.
摘要翻译：本发明涉及一种无电催化沉淀铝的方法。要镀铝的绝缘和导电材料（基材）的表面是（1）催化，而成膜不透湿层，在边界表面具有化合物活性，通过短暂浸入稀释溶液（ a）在金属原子上被短链和长链有机基团取代的钛，锆或钒的改性酯或酰化物，或（b）周期系统的IV和V二级基团的过渡金属的氯化物的元素和多价金属的含水金属皂，优选铝皂; （2）用非质子溶剂进行浓缩漂洗，优选沸点超过100℃。和（3）浸渍在芳族和高粘度脂族化合物的溶剂混合物中的1至4％的三烷基胺基溶液中。由此获得均质且强粘附的铝涂层。

10. 发明授权

US5229258A Method for producing a resist structure 失效
标题翻译：生产电阻结构的方法
公开(公告)号：US5229258A
公开(公告)日：1993-07-20
申请号：US682142
申请日：1991-04-08
申请人： Recai Sezi , Horst Borndorfer , Eva Rissel , Rainer Leuschner , Michael Sebald , Hellmut Ahne , Siegfried Birkle
发明人： Recai Sezi , Horst Borndorfer , Eva Rissel , Rainer Leuschner , Michael Sebald , Hellmut Ahne , Siegfried Birkle
IPC分类号： G03F7/38 , G03F7/20 , G03F7/26 , G03F7/36 , H01L21/027
CPC分类号： G03F7/2022 , G03F7/265
摘要： High resolution resist structures with steep edges are obtained using standard equipment, even in cases involving critical contact-hole planes. First, a photoresist layer containing a polymer with chemically reactive groups and a photoactive component based on diazoketone or quinone diazide is deposited on a substrate. The photoresist layer is then irradiated with a patterned image and treated with a polyfunctional organic compound having functional groups that can chemically react with the reactive groups of the polymer. This step is followed by a maskless flood exposure. The photoresist layer irradiated in this manner is then treated with a metal-containing organic compound having at least one functional group capable of chemical reaction with the reactive groups of the polymer, followed by etching in an oxygen-containing plasma.
摘要翻译：使用标准设备获得具有陡边的高分辨率抗蚀结构，即使在涉及关键接触孔平面的情况下也是如此。首先，将含有具有化学反应性基团的聚合物和基于重氮酮或醌二叠氮化物的光活性组分的光致抗蚀剂层沉积在基材上。然后用图案化图像照射光致抗蚀剂层，并用具有可与聚合物的反应性基团发生化学反应的官能团的多官能有机化合物处理。此步骤之后是无掩盖的洪水暴露。然后以这种方式照射的光致抗蚀剂层用具有至少一个能够与聚合物的反应性基团进行化学反应的官能团的含金属有机化合物处理，随后在含氧等离子体中进行蚀刻。

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