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    • 1. 发明授权
    • Electron beam type pattern transfer apparatus
    • 电子束式图案转印装置
    • US4366383A
    • 1982-12-28
    • US165618
    • 1980-07-03
    • Shunichi SanoToshiaki ShinozakiIchiro Mori
    • Shunichi SanoToshiaki ShinozakiIchiro Mori
    • H01L21/027H01J37/317H01L21/30A61K27/02G01N21/64
    • H01J37/3175B82Y10/00B82Y40/00H01L21/30H01J2237/04735H01J2237/04922H01J2237/142H01J2237/31779Y10S505/879
    • An electron beam type pattern transfer apparatus has a photoelectric mask and a sample in a vacuum container made of non-magnetic material. The photoelectric mask is adapted to receive an ultraviolet ray from a light source and emit photoelectrons corresponding to a predetermined transfer pattern and the sample is disposed in parallel with the photoelectric mask with a predetermined distance left therebetween and illuminated with the photoelectrons to form a resist image thereon which corresponds to the transfer pattern. A power source for applying a voltage for accelerating the photoelectrons emitted is connected between the photoelectric mask and the sample. A pair of focusing magnets are disposed around the axis of the vacuum container such that they are located one at one outer side and one in an opposite outer side of the vacuum container to permit a vertical magnetic field to be created between the photoelectric mask and the sample. The focusing magnets have superconductive coils and are driven in a persistent mode.
    • 电子束型图案转印装置在由非磁性材料制成的真空容器中具有光电掩模和样品。 光电掩模适于从光源接收紫外线并发射对应于预定转印图案的光电子,并且将样品与光电掩模平行放置并保持在预定距离处并用光电子照射以形成抗蚀剂图像 对应于转印图案。 用于施加用于加速发射的光电子的电压的电源连接在光电掩模和样品之间。 一对聚焦磁铁设置在真空容器的轴线周围,使得它们位于真空容器的一个外侧和一个在相对的外侧中,从而允许在光电面罩和 样品。 聚焦磁体具有超导线圈并以持续模式驱动。
    • 2. 发明授权
    • Electron beam pattern transfer device and method for aligning mask and
semiconductor wafer
    • 用于对准掩模和半导体晶片的电子束图案转移装置和方法
    • US4469949A
    • 1984-09-04
    • US374724
    • 1982-05-04
    • Ichiro MoriKazuyoshi SugiharaToshiaki ShinozakiToru Tojo
    • Ichiro MoriKazuyoshi SugiharaToshiaki ShinozakiToru Tojo
    • H01L21/027H01J37/304H01L21/30H01J37/00
    • H01L21/30H01J37/3045
    • According to the invention an electron beam pattern transfer device with an improved alignment means is provided.A first and a second mark M.sub.1, M.sub.2 for alignment purposes are formed on the surface of the wafer and the wafer holder, respectively. The first mark M.sub.1 is formed on the wafer by conventional lithographic technique and the second mark M.sub.2 consists of a hole or a heavy metal, such as Ta or Ta.sub.2 O.sub.5. A third alignment mark M.sub.3 is provided on the photocathode mask having a position corresponding to M.sub.2 on the wafer holder and spaced a known distance L.sub.2 from an imaginary reference position M.sub.4 on the mask. The first step of the alignment process requires the detection of a relative distance L.sub.1 between the first and second marks M.sub.1, M.sub.2 by conventional detecting means, such as an optical measuring means. In the next step, the relative position of the photocathode mask and the wafer holder is adjusted so that the distance between the marks M.sub.2 and M.sub.3 is made substantially equal to the difference between the distance L.sub.1 and the known distance L.sub. 2.
    • 根据本发明,提供了具有改进的对准装置的电子束图案转印装置。 分别在晶片和晶片保持器的表面上形成用于对准目的的第一和第二标记M1,M2。 第一标记M1通过常规平版印刷技术在晶片上形成,第二标记M2由孔或重金属如Ta或Ta2O5组成。 第三对准标记M3设置在光电阴极掩模上,其具有对应于晶片保持器上的M2的位置,并且与掩模上的假想参考位置M4隔开已知距离L2。 对准处理的第一步骤需要通过诸如光学测量装置的常规检测装置检测第一和第二标记M1,M2之间的相对距离L1。 在下一步骤中,调整光电阴极掩模和晶片保持器的相对位置,使得标记M2和M3之间的距离基本上等于距离L1和已知距离L 2之间的差。
    • 5. 发明授权
    • Fixed-slit type photoelectric microscope
    • 固定狭缝型光电显微镜
    • US4560278A
    • 1985-12-24
    • US513452
    • 1983-07-13
    • Toshiaki ShinozakiIchiro Mori
    • Toshiaki ShinozakiIchiro Mori
    • G01B9/04G01B11/00G02B21/00G02B26/04G02F1/09H01L21/027H01L21/66
    • G01B9/04G02B21/00G02B26/04
    • A fixed-slit type photoelectric microscope comprises an irradiation system for irradiating a linear pattern with light beam, an objective for forming an image of the linear pattern, a single slit disposed at a point conjugate to the linear pattern with respect to the objective, a photoelectric conversion element for converting the light beam from the slit into an electrical signal, a rectifying circuit for rectifying an electrical signal from the photoelectric conversion element, and an indicator for visualizing the rectified signal. The irradiation system generates a pair of polarized light beams with planes of polarization orthogonal to each other and alternately illuminates the linear pattern with the pair of polarized light beams at fixed periods. For deflecting the pair of polarized light beams from the linear pattern in different directions, an optical deflecting element is provided between the linear pattern and the slit. Different portions of the slit are illuminated by the pair of polarized light beams deflected by the optical deflecting elements.
    • 固定狭缝型光电显微镜包括用于用光束照射线性图案的照射系统,用于形成线状图案的图像的目标,设置在与该物镜相对应的线状图案的点处的单个狭缝, 用于将来自狭缝的光束转换成电信号的光电转换元件,用于对来自光电转换元件的电信号进行整流的整流电路和用于可视化整流信号的指示器。 照射系统产生一对具有彼此正交的偏振平面的偏振光束,并且以固定的周期以一对偏振光束交替地照射线状图案。 为了沿着不同的方向偏转来自线状图案的一对偏振光束,在线状图案和狭缝之间设置有光学偏转元件。 狭缝的不同部分由被光学偏转元件偏转的一对偏振光束照射。