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    • 1. 发明申请
    • PELLICLE AND MASK ADHESIVE THEREFOR
    • 油漆和面膜粘合剂
    • US20120202144A1
    • 2012-08-09
    • US13500513
    • 2010-10-06
    • Shuichi MurakamiTakashi KozekiMinehiro Mori
    • Shuichi MurakamiTakashi KozekiMinehiro Mori
    • G03F1/62C09J123/20
    • C09J123/10C08L23/10C08L23/142C08L23/145C08L23/18C08L2205/02C08L2666/06C08L2666/08C09J153/025G03F1/64
    • Disclosed is a pellicle having a mask adhesive layer having appropriate softness, having a small adhesive residue after being peeled off from a mask, and having good handling characteristics; and a pellicle for preventing position deviation of patterns, in particular in double patterning. The pellicle of the present invention includes a pellicle frame, a pellicle membrane disposed on one end surface of the pellicle frame, and a mask adhesive layer disposed on other end surface of the pellicle frame; wherein the mask adhesive layer includes 35 to 170 weight parts of a hardness adjuster (B) containing a polypropylene (b1) and a propylene based elastomer (b2) per 100 weight parts of a styrene resin (A); and in an electron microscopic photograph of the mask adhesive layer, a phase-separated structure of a continuous phase of the styrene resin (A) and a discontinuous phase of the hardness adjuster (B) is observed.
    • 公开了一种具有适当柔软度的掩模粘合剂层的防护薄膜组件,在从掩模剥离之后具有小的粘合剂残留物,并且具有良好的处理特性; 以及用于防止图案的位置偏移的防护薄片,特别是在双重图案化中。 本发明的防护薄膜组件包括防护薄膜组件框架,设置在防护膜框架的一个端面上的防护薄膜组件和设置在防护薄膜组件框架的另一个端面上的掩模粘合剂层; 其中,所述掩模粘合剂层每100重量份苯乙烯树脂(A)含有35〜170重量份含有聚丙烯(b1)和丙烯系弹性体(b2)的硬度调节剂(B) 并且在掩模粘合剂层的电子显微镜照片中,观察到苯乙烯树脂(A)的连续相的相分离结构和硬度调节剂(B)的不连续相。
    • 2. 发明授权
    • Pellicle and mask adhesive therefor
    • 防护薄膜和面膜粘合剂
    • US08685598B2
    • 2014-04-01
    • US13500513
    • 2010-10-06
    • Shuichi MurakamiTakashi KozekiMinehiro Mori
    • Shuichi MurakamiTakashi KozekiMinehiro Mori
    • G03F1/00C08L23/00
    • C09J123/10C08L23/10C08L23/142C08L23/145C08L23/18C08L2205/02C08L2666/06C08L2666/08C09J153/025G03F1/64
    • Disclosed is a pellicle having a mask adhesive layer having appropriate softness, having a small adhesive residue after being peeled off from a mask, and having good handling characteristics; and a pellicle for preventing position deviation of patterns, in particular in double patterning. The pellicle of the present invention includes a pellicle frame, a pellicle membrane disposed on one end surface of the pellicle frame, and a mask adhesive layer disposed on other end surface of the pellicle frame; wherein the mask adhesive layer includes 35 to 170 weight parts of a hardness adjuster (B) containing a polypropylene (b1) and a propylene based elastomer (b2) per 100 weight parts of a styrene resin (A); and in an electron microscopic photograph of the mask adhesive layer, a phase-separated structure of a continuous phase of the styrene resin (A) and a discontinuous phase of the hardness adjuster (B) is observed.
    • 公开了一种具有适当柔软度的掩模粘合剂层的防护薄膜组件,在从掩模剥离之后具有小的粘合剂残留物,并且具有良好的处理特性; 以及用于防止图案的位置偏移的防护薄片,特别是在双重图案化中。 本发明的防护薄膜组件包括防护薄膜组件框架,设置在防护膜框架的一个端面上的防护薄膜组件和设置在防护薄膜组件框架的另一个端面上的掩模粘合剂层; 其中,所述掩模粘合剂层每100重量份苯乙烯树脂(A)含有35〜170重量份含有聚丙烯(b1)和丙烯系弹性体(b2)的硬度调节剂(B) 并且在掩模粘合剂层的电子显微镜照片中,观察到苯乙烯树脂(A)的连续相的相分离结构和硬度调节剂(B)的不连续相。
    • 4. 发明授权
    • Metal laminate and etching method therefor
    • 金属层压板及其蚀刻方法
    • US07223480B2
    • 2007-05-29
    • US10500846
    • 2003-07-28
    • Koji HirotaMasanao KobayashiMinehiro MoriNaoki Nakazawa
    • Koji HirotaMasanao KobayashiMinehiro MoriNaoki Nakazawa
    • B32B15/08B32B15/18G11B5/00G11B21/00H01B13/00
    • H05K3/002G11B5/4833H05K1/0346H05K1/056H05K3/0041H05K3/385H05K2201/0154H05K2203/0315H05K2203/163Y10T428/12951Y10T428/265Y10T428/31681
    • The present invention relates to a metal laminate which is broadly used for a flexible wiring board or the like and an etching method therefor. In particular, the present invention relates to a metal laminate which includes a layer obtained by laminating a metal layer and an insulating layer, where the insulating layer is subjected to an etching process, wherein, in a surface of the metal layer which is positioned so as to come in contact with the insulating layer, respective concentrations of main metal element and oxygen element constituting the metal layer are measured from the surface of the metal layer towards inside of the metal layer in a time-elapsing manner according to AES (Auger electron spectroscopy) and a value of the thickness of a metal oxide film of the surface of the metal layer measured at a time when atomic concentrations of the main metal element and the oxygen element constituting the metal layer become equal to each other is in a range of at least 0 Å to less than 50 Å.According to the present invention, an etching time of polyimide in the polyimide metal laminate can be calculated and a flexure used for a suspension for a hard disc drive having a high productivity can be provided.
    • 本发明涉及广泛用于柔性布线板等的金属层压体及其蚀刻方法。 特别地,本发明涉及一种金属层压体,其包括通过层压金属层和绝缘层而获得的层,其中绝缘层进行蚀刻处理,其中在该金属层的表面上 为了与绝缘层接触,根据AES(俄歇电子学(俄歇电子学),从金属层的表面到金属层的内部)以时间流逝的方式测量构成金属层的主要金属元素和氧元素的各自浓度 光谱),并且在构成金属层的主金属元素和氧元素的原子浓度变得相等的时刻测量的金属层的表面的金属氧化物膜的厚度的值在 至少从0到小于50。 根据本发明,可以计算聚酰亚胺金属层叠体中的聚酰亚胺的蚀刻时间,并且可以提供用于具有高生产率的硬盘驱动器的悬架的挠曲。
    • 6. 发明申请
    • Metal laminate and method of etching the same
    • 金属层压板及其蚀刻方法
    • US20050087509A1
    • 2005-04-28
    • US10500846
    • 2003-07-28
    • Koji HirotaMasano KobayashiMinehiro MoriNaoki Nakazawa
    • Koji HirotaMasano KobayashiMinehiro MoriNaoki Nakazawa
    • G11B5/48H05K1/03H05K1/05H05K3/00H05K3/38H01B13/00
    • H05K3/002G11B5/4833H05K1/0346H05K1/056H05K3/0041H05K3/385H05K2201/0154H05K2203/0315H05K2203/163Y10T428/12951Y10T428/265Y10T428/31681
    • The present invention relates to a metal laminate which is broadly used for a flexible wiring board or the like and an etching method therefor. In particular, the present invention relates to a metal laminate which includes a layer obtained by laminating a metal layer and an insulating layer, where the insulating layer is subjected to an etching process, wherein, in a surface of the metal layer which is positioned so as to come in contact with the insulating layer, respective concentrations of main metal element and oxygen element constituting the metal layer are measured from the surface of the metal layer towards inside of the metal layer in a time-elapsing manner according to AES (Auger electron spectroscopy) and a value of the thickness of a metal oxide film of the surface of the metal layer measured at a time when atomic concentrations of the main metal element and the oxygen element constituting the metal layer become equal to each other is in a range of at least 0 Å to less than 50 Å. According to the present invention, an etching time of polyimide in the polyimide metal laminate can be calculated and a flexure used for a suspension for a hard disc drive having a high productivity can be provided.
    • 本发明涉及广泛用于柔性布线板等的金属层压体及其蚀刻方法。 特别地,本发明涉及一种金属层压体,其包括通过层压金属层和绝缘层而获得的层,其中绝缘层进行蚀刻处理,其中在该金属层的表面上 为了与绝缘层接触,根据AES(俄歇电子学(俄歇电子学),从金属层的表面到金属层的内部)以时间流逝的方式测量构成金属层的主要金属元素和氧元素的各自浓度 光谱),并且在构成金属层的主金属元素和氧元素的原子浓度变得相等的时刻测量的金属层的表面的金属氧化物膜的厚度的值在 至少从0到小于50。 根据本发明,可以计算聚酰亚胺金属层叠体中的聚酰亚胺的蚀刻时间,并且可以提供用于具有高生产率的硬盘驱动器的悬架的挠曲。
    • 7. 发明授权
    • Aromatic diamine and polyimide thereof
    • 芳族二胺及其聚酰亚胺
    • US06737503B2
    • 2004-05-18
    • US10232744
    • 2002-09-03
    • Yoichi KodamaMinehiro MoriNaoshi NagaiMasaru Kawaguchi
    • Yoichi KodamaMinehiro MoriNaoshi NagaiMasaru Kawaguchi
    • C08G7310
    • C08G73/1071C08G73/1039C08G73/105
    • The aromatic diamine compound of the present invention is represented by the following formula (1), and from the aromatic diamine compound a polyimide having a repeating unit represented by the following formula (4), which has low-temperature adherability, can be obtained. In the formulas (1) and (4), n is an integer of 3 to 7, each R is independently an atom or a group selected from the group consisting of a hydrogen atom, a halogen atom and a hydrocarbon group, the same or different two hetero atoms selected from nitrogen atoms and oxygen atoms bonded to each benzene ring are at the ortho- or meta-positions to each other on at least one benzene ring, and when n is 3, the hetero atoms are at the ortho- or meta-positions to each other on all the benzene rings. In the formula (4), Y is a tetravalent organic group.
    • 本发明的芳香族二胺化合物由下式(1)表示,由芳族二胺化合物得到具有低温粘合性的下述式(4)表示的重复单元的聚酰亚胺。 在式(1)和(4)中,n为3〜7的整数,R各自独立地为选自氢原子,卤素原子和烃基的原子或基团,相同或 选自与每个苯环键合的氮原子和氧原子的不同的两个杂原子在至少一个苯环上彼此相邻或间位,当n为3时,杂原子处于邻位或间隔 在所有苯环上彼此相互排列。 在式(4)中,Y是四价有机基团。