会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明申请
    • Buried pattern substrate and manufacturing method thereof
    • 埋地图案基板及其制造方法
    • US20080009128A1
    • 2008-01-10
    • US11708339
    • 2007-02-21
    • Shuhichi OkabeMyung-Sam KangJung-Hyun ParkHoe-Ku JungJi-Eun Kim
    • Shuhichi OkabeMyung-Sam KangJung-Hyun ParkHoe-Ku JungJi-Eun Kim
    • H01L21/44
    • H05K3/205H05K3/4038H05K3/4617H05K2203/0733H05K2203/1572
    • A buried pattern substrate and a manufacturing method thereof are disclosed. A method of manufacturing a buried pattern substrate having a circuit pattern formed on a surface, in which the circuit pattern is connected electrically by a stud bump, includes (a) forming the circuit pattern and the stud bump by depositing a plating layer selectively on a seed layer of a carrier film, where the seed layer is laminated on a surface of the carrier film, (b) laminating and pressing the carrier film on an insulation layer such that the circuit pattern and the stud bump face the insulation layer, and (c) removing the carrier film and the seed layer, allows the circuit interconnection to be realized using a copper (Cu) stud bump, so that a drilling process for interconnection is unnecessary, the degree of freedom for circuit design is improved, a via land is made unnecessary and the size of a via is small, to allow higher density in a circuit.
    • 公开了掩埋图案基板及其制造方法。 一种制造埋设图形衬底的方法,其中电路图案形成在电路图形通过柱形凸块电连接的表面上,包括:(a)通过在 晶种层层叠在载体膜的表面上的载体膜的种子层,(b)在绝缘层上层叠压制载体膜,使得电路图案和柱状凸块面向绝缘层,和 c)去除载体膜和种子层,允许使用铜(Cu)柱状凸块实现电路互连,使得不需要用于互连的钻孔工艺,提高了电路设计的自由度,通孔焊盘 不必要,并且通孔的尺寸小,以允许电路中的较高密度。