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1. 发明申请

US20100104768A1 METHOD OF MAKING OPTICAL TRANSDUCERS 审中-公开
标题翻译：制造光学传感器的方法
公开(公告)号：US20100104768A1
公开(公告)日：2010-04-29
申请号：US12260228
申请日：2008-10-29
申请人： Shuaigang Xiao , XiaoMin Yang , Keith Mountfield
发明人： Shuaigang Xiao , XiaoMin Yang , Keith Mountfield
IPC分类号： B05D3/06 , B05D5/12
CPC分类号： G11B5/3163 , G11B5/314 , G11B5/6088 , G11B2005/0021
摘要： A process for making an optical transducer that includes depositing a lower molecular weight first layer and a higher molecular weight second layer. E-beam radiation is applied to the first and second layers which are developed to form an aperture. The aperture includes a resist protrusion in the second layer. The resist protrusion protrudes outward beyond the first layer. Metal is evaporated through the aperture to form the optical transducer. The resist protrusion defines a shape of a concave metal transducer corner.
摘要翻译：一种制造光学换能器的方法，包括沉积较低分子量的第一层和较高分子量的第二层。将电子束辐射施加到被显影以形成孔的第一和第二层。孔包括在第二层中的抗蚀剂突起。抗蚀剂突起向外突出超出第一层。金属通过孔被蒸发以形成光学换能器。抗蚀剂突起限定凹形金属转换器角的形状。

2. 发明授权

US08993060B2 Chemical pinning to direct addressable array using self-assembling materials 有权
标题翻译：使用自组装材料进行化学钉扎直接寻址阵列
公开(公告)号：US08993060B2
公开(公告)日：2015-03-31
申请号：US12273791
申请日：2008-11-19
申请人： Shuaigang Xiao , Xiaomin Yang
发明人： Shuaigang Xiao , Xiaomin Yang
IPC分类号： B05D5/00 , G11B5/82 , B05D1/32 , B05D3/06 , B81C1/00 , B82Y10/00 , G11B5/74 , G11B5/855
CPC分类号： G11B5/84 , B05D1/322 , B05D3/00 , B05D3/06 , B05D5/00 , B81C1/00031 , B81C2201/0149 , B82Y10/00 , G03F7/0002 , G11B5/59633 , G11B5/743 , G11B5/746 , G11B5/82 , G11B5/855 , Y10T428/24802
摘要： A method includes: providing a substrate having a plurality of chemically contrasted alignment features, and depositing a self-assembled material on at least a portion of the substrate, wherein the position and/or orientation of substantially spherical or cylindrical domains of the self-assembled material is directed by the alignment features, to form a nanostructure pattern, and wherein the period of the alignment features is between about 2 times and about 10 times the period of the spherical or cylindrical domains. An apparatus fabricated according to the method is also provided.
摘要翻译：一种方法包括：提供具有多个化学对比对准特征的衬底，以及在衬底的至少一部分上沉积自组装材料，其中自组装的基本上球形或圆柱形域的位置和/或取向材料由对准特征引导以形成纳米结构图案，并且其中对准特征的周期在球形或圆柱形区域的周期的约2倍至约10倍之间。还提供了根据该方法制造的装置。

3. 发明申请

US20100124638A1 Chemical Pinning to Direct Addressable Array Using Self-Assembling Materials 有权
标题翻译：使用自组装材料进行直接寻址阵列的化学定位
公开(公告)号：US20100124638A1
公开(公告)日：2010-05-20
申请号：US12273791
申请日：2008-11-19
申请人： Shuaigang Xiao , Xiaomin Yang
发明人： Shuaigang Xiao , Xiaomin Yang
IPC分类号： B32B5/00 , B05D5/00
CPC分类号： G11B5/84 , B05D1/322 , B05D3/00 , B05D3/06 , B05D5/00 , B81C1/00031 , B81C2201/0149 , B82Y10/00 , G03F7/0002 , G11B5/59633 , G11B5/743 , G11B5/746 , G11B5/82 , G11B5/855 , Y10T428/24802
摘要： A method includes: providing a substrate having a plurality of chemically contrasted alignment features, and depositing a self-assembled material on at least a portion of the substrate, wherein the position and/or orientation of substantially spherical or cylindrical domains of the self-assembled material is directed by the alignment features, to form a nanostructure pattern, and wherein the period of the alignment features is between about 2 times and about 10 times the period of the spherical or cylindrical domains. An apparatus fabricated according to the method is also provided.
摘要翻译：一种方法包括：提供具有多个化学对比对准特征的衬底，以及在衬底的至少一部分上沉积自组装材料，其中自组装的基本上球形或圆柱形域的位置和/或取向材料由对准特征引导以形成纳米结构图案，并且其中对准特征的周期在球形或圆柱形区域的周期的约2倍至约10倍之间。还提供了根据该方法制造的装置。

4. 发明申请

US20090279206A1 FABRICATION OF TRAPEZOIDAL POLE FOR MAGNETIC RECORDING 有权
标题翻译：用于磁记录的铁皮石的制造
公开(公告)号：US20090279206A1
公开(公告)日：2009-11-12
申请号：US12116798
申请日：2008-05-07
申请人： XiaoMin Yang , Shuaigang Xiao , Jie Gong , Michael Seigler
发明人： XiaoMin Yang , Shuaigang Xiao , Jie Gong , Michael Seigler
IPC分类号： G11B5/127 , C25D5/02
CPC分类号： G11B5/3163 , C25D5/10 , C25D5/14 , G11B5/1278 , G11B5/3116 , Y10T29/49021
摘要： A method for forming a magnetic write pole with a trapezoidal cross-section is described. The method consists of first forming a magnetic seedlayer on a base followed by depositing a removable material layer on the seedlayer, and then a resist layer on the removable material layer. A trench is then formed in the resist, and the resist is heated to cause the cross-sectional profile of the trench to assume a trapezoidal shape. The resist is then capped with another resist layer and further heated to cause the width of the trapezoidal trench to become narrower. The cap layer and removable material layer at the bottom of the trench are then removed and the trench filled with magnetic material by electroplating. The resist and seedlayer external to the trench are finally removed to form a write pole with a trapezoidal cross-section.
摘要翻译：描述了形成具有梯形截面的磁性写入极的方法。该方法包括首先在基底上形成磁性种子层，然后在种子层上沉积可去除的材料层，然后在可移除材料层上形成抗蚀剂层。然后在抗蚀剂中形成沟槽，并且加热抗蚀剂以使沟槽的横截面轮廓呈现梯形。然后将抗蚀剂用另一抗蚀剂层封盖，并进一步加热，使梯形沟槽的宽度变窄。然后去除沟槽底部的覆盖层和可移除材料层，并通过电镀填充磁性材料的沟槽。最后去除沟槽外部的抗蚀剂和籽晶层以形成具有梯形横截面的写入极。

5. 发明授权

US08404432B2 Lithography process 有权
公开(公告)号：US08404432B2
公开(公告)日：2013-03-26
申请号：US11824124
申请日：2007-06-29
申请人： XiaoMin Yang , Shuaigang Xiao
发明人： XiaoMin Yang , Shuaigang Xiao
IPC分类号： G03F7/20
CPC分类号： G03F7/70 , B82Y10/00 , G03F7/2022 , G03F7/40 , G11B5/743 , G11B5/746 , G11B5/82 , G11B5/855
摘要： A lithography process for manufacturing bit-island storage mediums that results in improved resolution and uniformity between bit-islands. The lithography process includes applying a resist coating polymer to a surface of a substrate. Selected areas of the resist coating polymer are then exposed to an energy source, wherein each selected area is exposed to the energy source multiple times to provide a time-averaged exposure of the selected areas that reduces errors caused by noise associated with the energy source. After exposure of the resist coating to the energy source, a selective developer solution is applied to the resist coating to develop the fully exposed regions of the resist coating while leaving undeveloped the partially exposed regions of the resist coating. A polymer reflow material is applied to the developed resist pattern and heated to a selected temperature. The polymer reflow material and selected temperature induce reflow of the developed resist coating such that such that a circumferential diameter associated with the holes formed in the resist pattern is reduced to a desired value distance. The process of inducing reflow of the resist coating can be repeated as desired to achieve a resist pattern wherein the holes formed in the resist pattern are reduced to a desired size. The resist pattern formed on the substrate is then transferred to a magnetic medium to form the desired pattern of bit-islands.

6. 发明申请

US20130010387A1 POLE FOR MAGNETIC RECORDING 有权
标题翻译：磁记录
公开(公告)号：US20130010387A1
公开(公告)日：2013-01-10
申请号：US13602915
申请日：2012-09-04
申请人： XiaoMin Yang , Shuaigang Xiao , Jie Gong , Michael Seigler
发明人： XiaoMin Yang , Shuaigang Xiao , Jie Gong , Michael Seigler
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , C25D5/10 , C25D5/14 , G11B5/1278 , G11B5/3116 , Y10T29/49021
摘要： A method for forming a magnetic write pole with a trapezoidal cross-section is described. The method consists of first forming a magnetic seedlayer on a base followed by depositing a removable material layer on the seedlayer, and then a resist layer on the removable material layer. A trench is then formed in the resist, and the resist is heated to cause the cross-sectional profile of the trench to assume a trapezoidal shape. The resist is then capped with another resist layer and further heated to cause the width of the trapezoidal trench to become narrower. The cap layer and removable material layer at the bottom of the trench are then removed and the trench filled with magnetic material by electroplating. The resist and seedlayer external to the trench are finally removed to form a write pole with a trapezoidal cross-section.
摘要翻译：描述了形成具有梯形截面的磁性写入极的方法。该方法包括首先在基底上形成磁性种子层，然后在种子层上沉积可去除的材料层，然后在可移除材料层上形成抗蚀剂层。然后在抗蚀剂中形成沟槽，并且加热抗蚀剂以使沟槽的横截面轮廓呈现梯形。然后将抗蚀剂用另一抗蚀剂层封盖，并进一步加热，使梯形沟槽的宽度变窄。然后去除沟槽底部的覆盖层和可移除材料层，并通过电镀填充磁性材料的沟槽。最后去除沟槽外部的抗蚀剂和籽晶层以形成具有梯形横截面的写入极。

7. 发明申请

US20090305173A1 FORMATION OF A DEVICE USING BLOCK COPOLYMER LITHOGRAPHY 有权
标题翻译：使用块状共聚物平台形成装置
公开(公告)号：US20090305173A1
公开(公告)日：2009-12-10
申请号：US12135387
申请日：2008-06-09
申请人： Shuaigang Xiao , Xiaomin Yang
发明人： Shuaigang Xiao , Xiaomin Yang
IPC分类号： G03F7/20
CPC分类号： G03F7/00 , G11C11/14 , H01F41/34 , H01L27/22
摘要： The formation of a device using block copolymer lithography is provided. The formation of the device includes forming a block copolymer structure. The block copolymer structure includes a first polymer and a second polymer. The block copolymer structure also includes a first component deposited between adjacent blocks of the first polymer and a second component deposited between adjacent blocks of the second polymer. A template is developed by removing either the first and second polymers or the first and second components from the block copolymer structure. The formation of the device also includes lithographically patterning the device utilizing the block copolymer structure template. The device may be a data storage medium.
摘要翻译：提供了使用嵌段共聚物光刻法形成装置。该装置的形成包括形成嵌段共聚物结构。嵌段共聚物结构包括第一聚合物和第二聚合物。嵌段共聚物结构还包括沉积在第一聚合物的相邻嵌段之间的第一组分和沉积在第二聚合物的相邻嵌段之间的第二组分。通过从嵌段共聚物结构中除去第一和第二聚合物或第一和第二组分来开发模板。该器件的形成还包括利用嵌段共聚物结构模板对该器件进行光刻图案化。该设备可以是数据存储介质。

8. 发明授权

US08259411B2 Fabrication of trapezoidal pole for magnetic recording 有权
标题翻译：用于磁记录的梯形极的制造
公开(公告)号：US08259411B2
公开(公告)日：2012-09-04
申请号：US12116798
申请日：2008-05-07
申请人： XiaoMin Yang , Shuaigang Xiao , Jie Gong , Michael Seigler
发明人： XiaoMin Yang , Shuaigang Xiao , Jie Gong , Michael Seigler
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , C25D5/10 , C25D5/14 , G11B5/1278 , G11B5/3116 , Y10T29/49021
摘要： A method for forming a magnetic write pole with a trapezoidal cross-section is described. The method consists of first forming a magnetic seedlayer on a base followed by depositing a removable material layer on the seedlayer, and then a resist layer on the removable material layer. A trench is then formed in the resist, and the resist is heated to cause the cross-sectional profile of the trench to assume a trapezoidal shape. The resist is then capped with another resist layer and further heated to cause the width of the trapezoidal trench to become narrower. The cap layer and removable material layer at the bottom of the trench are then removed and the trench filled with magnetic material by electroplating. The resist and seedlayer external to the trench are finally removed to form a write pole with a trapezoidal cross-section.
摘要翻译：描述了形成具有梯形截面的磁性写入极的方法。该方法包括首先在基底上形成磁性种子层，然后在种子层上沉积可去除的材料层，然后在可移除材料层上形成抗蚀剂层。然后在抗蚀剂中形成沟槽，并且加热抗蚀剂以使沟槽的横截面轮廓呈现梯形。然后将抗蚀剂用另一抗蚀剂层封盖，并进一步加热，使梯形沟槽的宽度变窄。然后去除沟槽底部的覆盖层和可移除材料层，并通过电镀填充磁性材料的沟槽。最后去除沟槽外部的抗蚀剂和籽晶层以形成具有梯形横截面的写入极。

9. 发明申请

US20110132867A1 METHOD AND SYSTEM FOR IMPRINT LITHOGRAPHY 审中-公开
标题翻译：用于印刷图的方法和系统
公开(公告)号：US20110132867A1
公开(公告)日：2011-06-09
申请号：US12915583
申请日：2010-10-29
申请人： Henry Hung Yang , Kim Yang Lee , Yautzong Hsu , Shuaigang Xiao , Xiaomin Yang , HongYing Wang , Zhaoning Yu
发明人： Henry Hung Yang , Kim Yang Lee , Yautzong Hsu , Shuaigang Xiao , Xiaomin Yang , HongYing Wang , Zhaoning Yu
IPC分类号： B29C71/04 , B29C59/16
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G11B5/746 , G11B5/82 , G11B5/855
摘要： A method and apparatus of imprint lithography wherein the method includes depositing a material on a patterned surface of a conductive substrate, and pressing a transparent substrate and the conductive substrate together, wherein the pressing causes the material to conform to the patterned surface. Energy is applied to the material to form patterned material from the material. The transparent substrate and the conductive substrate are separated, wherein the patterned material adheres to the transparent substrate.
摘要翻译：压印光刻的方法和装置，其中所述方法包括在导电衬底的图案化表面上沉积材料，并将透明衬底和导电衬底压在一起，其中所述压制使得材料符合图案化表面。能量被施加到材料上以从材料形成图案化材料。分离透明基板和导电基板，其中图案化材料粘附到透明基板。

10. 发明授权

US07713753B2 Dual-level self-assembled patterning method and apparatus fabricated using the method 有权
标题翻译：使用该方法制造的双层自组装图案化方法和装置
公开(公告)号：US07713753B2
公开(公告)日：2010-05-11
申请号：US12203958
申请日：2008-09-04
申请人： Shuaigang Xiao , Xiaomin Yang
发明人： Shuaigang Xiao , Xiaomin Yang
IPC分类号： H01L21/00
CPC分类号： B81C1/00031 , B81C2201/0149 , B82B3/00 , B82Y30/00 , B82Y40/00
摘要： A method of fabricating a device includes: providing a substrate having a patterned surface, depositing a first-level self-assembled material on at least a portion of the patterned surface, wherein the position and/or orientation of the first-level self-assembled material is directed by the patterned surface, to form a first nanostructure pattern, and depositing a second-level self-assembled material on at least a portion of the first nanostructure pattern to form an array of nanostructures of the second-level self-assembled material. An apparatus fabricated using the method is also provided.
摘要翻译：制造器件的方法包括：提供具有图案化表面的衬底，在图案化表面的至少一部分上沉积第一级自组装材料，其中第一级自组装的位置和/或取向材料由图案化的表面引导，以形成第一纳米结构图案，并且在第一纳米结构图案的至少一部分上沉积二级自组装材料以形成二级自组装材料的纳米结构阵列。还提供了使用该方法制造的装置。

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