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1. 发明授权

US4388133A Method of manufacturing artificial wood veneer 失效
标题翻译：制造人造木单板的方法
公开(公告)号：US4388133A
公开(公告)日：1983-06-14
申请号：US326618
申请日：1981-12-02
申请人： Shozo Hirao , Yasuhiro Saihara , Toshio Nakanishi , Ichiro Ihara , Yoshio Sano
发明人： Shozo Hirao , Yasuhiro Saihara , Toshio Nakanishi , Ichiro Ihara , Yoshio Sano
IPC分类号： B27D1/08 , B27L5/00 , B44C5/04 , B44F9/02
CPC分类号： B44F9/02 , B27D1/08 , B27L5/00 , B44C5/043 , Y10T156/1059 , Y10T156/1075 , Y10T428/24066 , Y10T428/24438
摘要： A method of manufacturing artificial wood veneers comprises a step in which an artificial flitch formed of laminated material veneers respectively cut out of a certain kind of inexpensive natural wood is sliced in the direction of obtaining straight grain pattern to obtain a collected veneer in which mutual joining surfaces of the material veneers extend in parallel with each other and in the thickness direction, and a step in which many of the collected veneers thus obtained and material veneers cut out of another kind of natural wood are laminated, pressed and collected to form another artificial flitch which is sliced in a direction of obtaining a flat or flowered grain pattern which is very similar to that of a high grade natural wood.
摘要翻译：制造人造木单板的方法包括以下步骤：将由某种廉价天然木材分别切出的层压材料单板形成的人造薄片沿获得直纹图案的方向切片，以获得收集的单板，其中相互接合材料单板的表面彼此平行且在厚度方向上延伸，并且将由此获得的许多收集的薄板和从另一种天然木材切下的材料单板层叠，压制和收集以形成另一人造板的步骤在获得与高级天然木材非常相似的平坦或开花纹理图案的方向上切片的薄纱。

2. 发明授权

US08349227B2 Method of fabricating a mold and method of producing an antireflection film using the mold 有权
标题翻译：使用该模具制造模具的方法和制造抗反射膜的方法
公开(公告)号：US08349227B2
公开(公告)日：2013-01-08
申请号：US12805189
申请日：2010-07-16
申请人： Ichiro Ihara
发明人： Ichiro Ihara
IPC分类号： B29D11/00
CPC分类号： G02B1/118 , B29C33/3842 , B29C33/424 , B29C33/56 , C25D1/10 , C25D11/04 , C25D11/12
摘要： A motheye mold fabrication method of at least one embodiment of the present invention includes the steps of: (a) preparing an Al base in which an Al content is less than 99.99 mass %; (b) partially anodizing the Al base to form a porous alumina layer which has a plurality of very small recessed portions; (c) after step (b), allowing the porous alumina layer to be in contact with an etchant which contains an anodic inhibitor, thereby enlarging the plurality of very small recessed portions of the porous alumina layer; and (d) after step (c), further anodizing the Al base to grow the plurality of very small recessed portions.
摘要翻译：本发明的至少一个实施方案的飞蛾模具制造方法包括以下步骤：（a）制备Al含量小于99.99质量％的Al碱; （b）部分地阳极氧化Al碱以形成具有多个非常小的凹部的多孔氧化铝层; （c）在步骤（b）之后，使多孔氧化铝层与含有阳极抑制剂的蚀刻剂接触，从而扩大多孔氧化铝层的多个非常小的凹部; 和（d）在步骤（c）之后，进一步阳极氧化Al基底以使多个非常小的凹进部分生长。

3. 发明授权

US06788366B2 Display device including corner cube array 有权
标题翻译：显示设备包括角立方体阵列
公开(公告)号：US06788366B2
公开(公告)日：2004-09-07
申请号：US10327951
申请日：2002-12-26
申请人： Yutaka Sawayama , Kiyoshi Minoura , Ichiro Ihara , Koji Taniguchi , Sayuri Fujiwara
发明人： Yutaka Sawayama , Kiyoshi Minoura , Ichiro Ihara , Koji Taniguchi , Sayuri Fujiwara
IPC分类号： G02F11335
CPC分类号： G02F1/133553 , G02B5/124 , G02F1/134309
摘要： A display device includes a light modulating medium layer, a corner cube array and a reflective electrode layer. The corner cube array is provided on one side of the light modulating medium layer and includes multiple corner cubes as its unit elements. The reflective electrode layer is provided on the corner cube array and includes multiple reflective electrodes that are spaced apart from each other and that are used to apply a voltage to the light modulating medium layer. When the display device is viewed from over the corner cube array, an arrangement pattern of the corner cubes matches an arrangement pattern of the reflective electrodes in at least one direction.
摘要翻译：显示装置包括光调制介质层，角立方体阵列和反射电极层。角隅棱镜阵列设置在光调制介质层的一侧，并且包括多个角立方体作为其单元元件。反射电极层设置在角立方体阵列上，并且包括彼此间隔开并且用于向光调制介质层施加电压的多个反射电极。当从角立方体阵列观看显示装置时，角立方体的布置图案与至少一个方向上的反射电极的排列图案一致。

4. 发明授权

US07293884B2 Corner cube reflector, method of making the reflector and reflective display device including the reflector 失效
公开(公告)号：US07293884B2
公开(公告)日：2007-11-13
申请号：US11604856
申请日：2006-11-28
申请人： Yutaka Sawayama , Sayuri Fujiwara , Makoto Kanbe , Kiyoshi Minoura , Ichiro Ihara
发明人： Yutaka Sawayama , Sayuri Fujiwara , Makoto Kanbe , Kiyoshi Minoura , Ichiro Ihara
IPC分类号： G02B5/122
CPC分类号： G02B5/124 , G02F1/133553 , Y10S359/90
摘要： A corner cube reflector includes a two-dimensional arrangement of unit elements. The unit elements are arranged at a pitch of 200 μm or less. As viewed in a direction from which incoming light is coming, each unit element has a peak point and a bottom point. A peak portion, including the peak point, has an excessive portion and/or a missing portion as compared with an ideal peak portion of an ideal corner cube. The level of the peak point is lower than that of the ideal peak point of the ideal corner cube. An average level difference h2 between the level of the bottom point and that of an ideal bottom point of the ideal corner cube is smaller than an average level difference h1 between the level of the peak point and that of the ideal peak point.

5. 发明授权

US07188961B2 Corner cube reflector, method of making the reflector and reflective display device including the reflector 有权
公开(公告)号：US07188961B2
公开(公告)日：2007-03-13
申请号：US10968239
申请日：2004-10-20
申请人： Yutaka Sawayama , Sayuri Fujiwara , Makoto Kanbe , Kiyoshi Minoura , Ichiro Ihara
发明人： Yutaka Sawayama , Sayuri Fujiwara , Makoto Kanbe , Kiyoshi Minoura , Ichiro Ihara
IPC分类号： G02B5/124
CPC分类号： G02B5/124 , G02F1/133553 , Y10S359/90
摘要： A corner cube reflector includes a two-dimensional arrangement of unit elements. The unit elements are arranged at a pitch of 200 μm or less. As viewed in a direction from which incoming light is coming, each unit element has a peak point and a bottom point. A peak portion, including the peak point, has an excessive portion and/or a missing portion as compared with an ideal peak portion of an ideal corner cube. The level of the peak point is lower than that of the ideal peak point of the ideal corner cube. An average level difference h2 between the level of the bottom point and that of an ideal bottom point of the ideal corner cube is smaller than an average level difference h1 between the level of the peak point and that of the ideal peak point.

6. 发明申请

US20110012272A1 Method of fabricating a mold and method of producing an antireflection film using the mold 有权
标题翻译：使用该模具制造模具的方法和制造抗反射膜的方法
公开(公告)号：US20110012272A1
公开(公告)日：2011-01-20
申请号：US12805189
申请日：2010-07-16
申请人： Ichiro Ihara
发明人： Ichiro Ihara
IPC分类号： B29D11/00 , C25F3/04
CPC分类号： G02B1/118 , B29C33/3842 , B29C33/424 , B29C33/56 , C25D1/10 , C25D11/04 , C25D11/12
摘要： A motheye mold fabrication method of at least one embodiment of the present invention includes the steps of: (a) preparing an Al base in which an Al content is less than 99.99 mass %; (b) partially anodizing the Al base to form a porous alumina layer which has a plurality of very small recessed portions; (c) after step (b), allowing the porous alumina layer to be in contact with an etchant which contains an anodic inhibitor, thereby enlarging the plurality of very small recessed portions of the porous alumina layer; and (d) after step (c), further anodizing the Al base to grow the plurality of very small recessed portions.
摘要翻译：本发明的至少一个实施方案的飞蛾模具制造方法包括以下步骤：（a）制备Al含量小于99.99质量％的Al碱; （b）部分地阳极氧化Al碱以形成具有多个非常小的凹部的多孔氧化铝层; （c）在步骤（b）之后，使多孔氧化铝层与含有阳极抑制剂的蚀刻剂接触，从而扩大多孔氧化铝层的多个非常小的凹部; 和（d）在步骤（c）之后，进一步阳极氧化Al基底以使多个非常小的凹进部分生长。

7. 发明申请

US20100283165A1 METHOD OF FABRICATING A MOLD AND METHOD OF PRODUCING AN ANTIREFLECTION FILM USING THE MOLD 有权
标题翻译：制造模具的方法和使用模具生产抗反射膜的方法
公开(公告)号：US20100283165A1
公开(公告)日：2010-11-11
申请号：US12735032
申请日：2009-12-22
申请人： Ichiro Ihara
发明人： Ichiro Ihara
IPC分类号： B29D11/00 , C25D5/02 , C25D11/12
CPC分类号： G02B1/118 , B29C33/3842 , B29C33/424 , B29C33/56 , C25D1/10 , C25D11/04 , C25D11/12
摘要： A motheye mold fabrication method of at least one embodiment of the present invention includes the steps of: (a) preparing an Al base in which an Al content is less than 99.99 mass %; (b) partially anodizing the Al base to form a porous alumina layer which has a plurality of very small recessed portions; (c) after step (b), allowing the porous alumina layer to be in contact with an etchant which contains an anodic inhibitor, thereby enlarging the plurality of very small recessed portions of the porous alumina layer; and (d) after step (c), further anodizing the Al base to grow the plurality of very small recessed portions.
摘要翻译：本发明的至少一个实施方案的飞蛾模具制造方法包括以下步骤：（a）制备Al含量小于99.99质量％的Al碱; （b）部分地阳极氧化Al碱以形成具有多个非常小的凹部的多孔氧化铝层; （c）在步骤（b）之后，使多孔氧化铝层与含有阳极抑制剂的蚀刻剂接触，从而扩大多孔氧化铝层的多个非常小的凹部; 和（d）在步骤（c）之后，进一步阳极氧化Al基底以使多个非常小的凹进部分生长。

8. 发明授权

US07360907B2 Micro corner cube array, method of making the micro corner cube array, and display device 有权
标题翻译：微角立方体阵列，制造微角立方体阵列的方法和显示装置
公开(公告)号：US07360907B2
公开(公告)日：2008-04-22
申请号：US11489506
申请日：2006-07-20
申请人： Ichiro Ihara , Kiyoshi Minoura , Yutaka Sawayama
发明人： Ichiro Ihara , Kiyoshi Minoura , Yutaka Sawayama
IPC分类号： G02B5/124
CPC分类号： B81C1/00547 , G02B5/124 , G02B5/201 , G02B6/0053 , G02B6/0065 , G02F1/133504 , G02F1/133553 , H01L21/30621
摘要： A method of making a micro corner cube array includes the steps of: providing a substrate, at least a surface portion of which consists of cubic single crystals and which has a surface that is substantially parallel to {111} planes of the crystals; and dry-etching the surface of the substrate anisotropically with an etching gas that is reactive with the substrate, thereby forming a plurality of unit elements of the micro corner cube array on the surface of the substrate. Each of the unit elements is made up of a number of crystal planes that have been etched at a lower etch rate than the {111} planes of the crystals.
摘要翻译：制造微角立方体阵列的方法包括以下步骤：提供基底，其至少其表面部分由立方单晶构成，并具有基本上平行于晶体的{111}面的表面; 并且用与基板反应的蚀刻气体各向异性地干蚀刻基板的表面，从而在基板的表面上形成多个单角元件。每个单元元件由已经以比晶体的{111}面更低的蚀刻速率蚀刻的多个晶面组成。

9. 发明授权

US07045278B2 Corner cube array and method of making the corner cube array 有权
标题翻译：角立方体数组和制作角立方体数组的方法
公开(公告)号：US07045278B2
公开(公告)日：2006-05-16
申请号：US10603793
申请日：2003-06-26
申请人： Ichiro Ihara , Kiyoshi Minoura
发明人： Ichiro Ihara , Kiyoshi Minoura
IPC分类号： G02F1/1335
CPC分类号： G02B5/124 , Y10T428/1095 , Y10T428/24479
摘要： A method of making an array of corner cubes includes the steps of: preparing a substrate, at least a surface portion of which is made of a cubic crystalline material and which has a surface that is substantially parallel to {111} planes of the crystalline material; and patterning the surface of the substrate such that a plurality of solid shape elements defines a predetermined pattern on the surface of the substrate. Each of the solid shape elements is defined by a number of concave portions, a number of convex portions or a combination of concave and convex portions. The method further includes the step of supplying a first active species, including an element that is contained in the crystalline material, onto the substrate on which the solid shape elements have been formed.
摘要翻译：制造角立方体阵列的方法包括以下步骤：制备基材，其至少其表面部分由立方晶体材料制成，并具有基本平行于结晶材料的{111}面的表面 ; 以及图案化所述基板的表面，使得多个固体形状元件在所述基板的表面上限定预定图案。每个固体形状元件由多个凹部，多个凸部或凹凸部的组合构成。该方法还包括将包含在结晶材料中的元素的第一活性物质提供到已经形成固体形状元素的基底上的步骤。

10. 发明授权

US08329069B2 Method of fabricating a mold and producing an antireflection film using the mold 有权
标题翻译：使用该模具制造模具并制造抗反射膜的方法
公开(公告)号：US08329069B2
公开(公告)日：2012-12-11
申请号：US12735032
申请日：2009-12-22
申请人： Ichiro Ihara
发明人： Ichiro Ihara
IPC分类号： B29D11/00
CPC分类号： G02B1/118 , B29C33/3842 , B29C33/424 , B29C33/56 , C25D1/10 , C25D11/04 , C25D11/12
摘要： A motheye mold fabrication method of at least one embodiment of the present invention includes the steps of: (a) preparing an Al base in which an Al content is less than 99.99 mass %; (b) partially anodizing the Al base to form a porous alumina layer which has a plurality of very small recessed portions; (c) after step (b), allowing the porous alumina layer to be in contact with an etchant which contains an anodic inhibitor, thereby enlarging the plurality of very small recessed portions of the porous alumina layer; and (d) after step (c), further anodizing the Al base to grow the plurality of very small recessed portions.
摘要翻译：本发明的至少一个实施方案的飞蛾模具制造方法包括以下步骤：（a）制备Al含量小于99.99质量％的Al碱; （b）部分地阳极氧化Al碱以形成具有多个非常小的凹部的多孔氧化铝层; （c）在步骤（b）之后，使多孔氧化铝层与含有阳极抑制剂的蚀刻剂接触，从而扩大多孔氧化铝层的多个非常小的凹部; 和（d）在步骤（c）之后，进一步阳极氧化Al基底以使多个非常小的凹进部分生长。

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