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1. 发明授权

US08323856B2 Mask blanks 有权
标题翻译：面具空白
公开(公告)号：US08323856B2
公开(公告)日：2012-12-04
申请号：US12941491
申请日：2010-11-08
申请人： Shinya Kikugawa , Akira Takada , Satoru Takaki , Yosuke Sato , Yasuhiko Akao
发明人： Shinya Kikugawa , Akira Takada , Satoru Takaki , Yosuke Sato , Yasuhiko Akao
IPC分类号： G03F1/22
CPC分类号： C03C3/06 , C03C17/09 , C03C2201/12 , C03C2201/23 , C03C2217/26 , C03C2218/154 , G03F1/60
摘要： The present invention provides a mask blank which comprises a substrate made of a synthetic quartz glass and a light-shielding film laminated on a surface of the substrate and is for use in a semiconductor device production technique employing an exposure light wavelength of 200 nm or shorter, wherein the mask blank has a birefringence, as measured at a wavelength of 193 nm, of 1 nm or less per substrate thickness. According to the present invention, mask blanks suitable for use in the immersion exposure technique and the polarized illumination technique are provided.
摘要翻译：本发明提供一种掩模板，其包括由合成石英玻璃制成的基板和层叠在基板的表面上的遮光膜，并且用于使用200nm或更短的曝光光波长的半导体器件制造技术其中掩模坯料在193nm波长下测得的每个基片厚度为1nm或更小的双折射。根据本发明，提供适用于浸渍曝光技术和偏振照明技术的掩模坯料。

2. 发明申请

US20080032213A1 MASK BLANKS 审中-公开
公开(公告)号：US20080032213A1
公开(公告)日：2008-02-07
申请号：US11836304
申请日：2007-08-09
申请人： Shinya KIKUGAWA , Akira Takada , Satoru Takaki , Yosuke Sato , Yasuhiko Akao
发明人： Shinya KIKUGAWA , Akira Takada , Satoru Takaki , Yosuke Sato , Yasuhiko Akao
IPC分类号： G03F1/00
CPC分类号： C03C3/06 , C03C17/09 , C03C2201/12 , C03C2201/23 , C03C2217/26 , C03C2218/154 , G03F1/60
摘要： The present invention provides a mask blank which comprises a substrate made of a synthetic quartz glass and a light-shielding film laminated on a surface of the substrate and is for use in a semiconductor device production technique employing an exposure light wavelength of 200 nm or shorter, wherein the mask blank has a birefringence, as measured at a wavelength of 193 nm, of 1 nm or less per substrate thickness. According to the present invention, mask blanks suitable for use in the immersion exposure technique and the polarized illumination technique are provided.
摘要翻译：本发明提供一种掩模板，其包括由合成石英玻璃制成的基板和层叠在基板的表面上的遮光膜，并且用于使用200nm或更短的曝光光波长的半导体器件制造技术其中掩模坯料在193nm波长下测得的每个基片厚度为1nm或更小的双折射。根据本发明，提供适用于浸渍曝光技术和偏振照明技术的掩模坯料。

3. 发明申请

US20110053059A1 MASK BLANKS 有权
公开(公告)号：US20110053059A1
公开(公告)日：2011-03-03
申请号：US12941491
申请日：2010-11-08
申请人： Shinya Kikugawa , Akira Takada , Satoru Takaki , Yosuke Sato , Yasuhiko Akao
发明人： Shinya Kikugawa , Akira Takada , Satoru Takaki , Yosuke Sato , Yasuhiko Akao
IPC分类号： G03F1/00
CPC分类号： C03C3/06 , C03C17/09 , C03C2201/12 , C03C2201/23 , C03C2217/26 , C03C2218/154 , G03F1/60
摘要： The present invention provides a mask blank which comprises a substrate made of a synthetic quartz glass and a light-shielding film laminated on a surface of the substrate and is for use in a semiconductor device production technique employing an exposure light wavelength of 200 nm or shorter, wherein the mask blank has a birefringence, as measured at a wavelength of 193 nm, of 1 nm or less per substrate thickness. According to the present invention, mask blanks suitable for use in the immersion exposure technique and the polarized illumination technique are provided.
摘要翻译：本发明提供一种掩模板，其包括由合成石英玻璃制成的基板和层叠在基板的表面上的遮光膜，并且用于使用200nm或更短的曝光光波长的半导体器件制造技术其中掩模坯料在193nm波长下测得的每个基片厚度为1nm或更小的双折射。根据本发明，提供适用于浸渍曝光技术和偏振照明技术的掩模坯料。

4. 发明授权

US09528695B2 Mirror unit and light source for illumination 有权
标题翻译：镜子单元和照明光源
公开(公告)号：US09528695B2
公开(公告)日：2016-12-27
申请号：US14348233
申请日：2011-09-30
申请人： Kazufumi Adachi , Kazunaga Ida , Taku Ito , Harumi Nakamura , Meiji Kitamura , Takeshi Nakamura , Yosuke Sato , Takuo Shinohara
发明人： Kazufumi Adachi , Kazunaga Ida , Taku Ito , Harumi Nakamura , Meiji Kitamura , Takeshi Nakamura , Yosuke Sato , Takuo Shinohara
IPC分类号： F21V33/00 , A47G1/02 , A45D42/10 , H04R1/02 , F21V23/00 , F21W131/302
CPC分类号： F21V33/004 , A45D42/10 , A47G1/02 , F21V23/003 , F21V33/0056 , F21W2131/302 , H04R1/028 , H04R2201/025
摘要： An illuminated makeup mirror set includes: a mirror unit; a surface light source with adjustable color that is used to illuminate a makeup subject; a setting unit for setting illumination conditions with the surface light source according to an input operation; an adjustment unit for adjusting color and brightness of the surface light source according to the illumination conditions set by the setting unit; a speaker; and a playback unit that stores a plurality of musical pieces as data, plays a musical piece selected from the plurality of musical pieces according to the illumination conditions and time of illumination with the surface light source, and causes the speaker to output the selected musical piece as a reproduced sound.
摘要翻译：照明化妆镜组包括：镜子单元; 用于照亮化妆主体的具有可调颜色的表面光源; 设置单元，用于根据输入操作用面光源设置照明条件; 调整单元，用于根据由设定单元设定的照明条件来调整面光源的颜色和亮度; 演讲者以及将多个音乐作为数据存储的重放单元，根据与面光源的照明条件和照明时间，从多个乐曲中选出的乐曲，并使扬声器输出所选择的乐曲作为再现的声音。

5. 发明授权

US09338859B2 Illuminated makeup mirror set and method of controlling light source 有权
标题翻译：照明化妆镜组和光源控制方法
公开(公告)号：US09338859B2
公开(公告)日：2016-05-10
申请号：US14348210
申请日：2011-09-30
申请人： Kazufumi Adachi , Kazunaga Ida , Taku Ito , Harumi Nakamura , Meiji Kitamura , Takeshi Nakamura , Yosuke Sato , Takuo Shinohara
发明人： Kazufumi Adachi , Kazunaga Ida , Taku Ito , Harumi Nakamura , Meiji Kitamura , Takeshi Nakamura , Yosuke Sato , Takuo Shinohara
IPC分类号： H05B37/02 , A47G1/02 , H05B33/08 , A47G1/00 , F21V33/00 , G01J1/42 , G01J3/50
CPC分类号： H05B37/0218 , A47G1/00 , A47G1/02 , A47G2200/08 , F21V33/004 , G01J1/4204 , G01J3/505 , H05B33/086 , Y02B20/46
摘要： An illuminated makeup mirror set includes: a mirror unit; a surface light source for illumination with adjustable color and adjustable brightness; a memory unit in which illumination conditions corresponding to a plurality of scenes are stored; a detection unit for detecting the color and brightness of ambient light at an installation position of the makeup mirror set; a selection unit for selecting one of the plurality of scenes according to an input operation; an acquisition unit for acquiring, from the memory unit, illumination conditions corresponding to the scene selected through the selection unit; and an adjustment unit for adjusting the color and brightness of the surface light source according to the color and brightness of the ambient light detected by the detection unit and the illumination conditions acquired by the acquisition unit.
摘要翻译：照明化妆镜组包括：镜子单元; 用于照明的表面光源，具有可调节的颜色和可调节的亮度; 存储与多个场景对应的照明条件的存储单元; 检测单元，用于检测化妆镜组的安装位置处的环境光的颜色和亮度; 选择单元，用于根据输入操作来选择所述多个场景中的一个; 获取单元，用于从存储器单元获取与通过选择单元选择的场景相对应的照明条件; 以及调整单元，用于根据由检测单元检测到的环境光的颜色和亮度以及由获取单元获取的照明条件来调整表面光源的颜色和亮度。

6. 发明申请

US20150159856A1 ILLUMINATED MAKEUP MIRROR SET 有权
标题翻译：照明制造镜
公开(公告)号：US20150159856A1
公开(公告)日：2015-06-11
申请号：US14348233
申请日：2011-09-30
申请人： Kazufumi Adachi , Kazunaga Ida , Taku Ito , Harumi Nakamura , Meiji Kitamura , Takeshi Nakamura , Yosuke Sato , Takuo Shinohara
发明人： Kazufumi Adachi , Kazunaga Ida , Taku Ito , Harumi Nakamura , Meiji Kitamura , Takeshi Nakamura , Yosuke Sato , Takuo Shinohara
IPC分类号： F21V33/00 , H04R1/02 , A47G1/02 , F21V23/00
CPC分类号： F21V33/004 , A45D42/10 , A47G1/02 , F21V23/003 , F21V33/0056 , F21W2131/302 , H04R1/028 , H04R2201/025
摘要： An illuminated makeup mirror set includes: a mirror unit; a surface light source with adjustable color that is used to illuminate a makeup subject; a setting unit for setting illumination conditions with the surface light source according to an input operation; an adjustment unit for adjusting color and brightness of the surface light source according to the illumination conditions set by the setting unit; a speaker; and a playback unit that stores a plurality of musical pieces as data, plays a musical piece selected from the plurality of musical pieces according to the illumination conditions and time of illumination with the surface light source, and causes the speaker to output the selected musical piece as a reproduced sound.
摘要翻译：照明化妆镜组包括：镜子单元; 用于照亮化妆主体的具有可调颜色的表面光源; 设置单元，用于根据输入操作用面光源设置照明条件; 调整单元，用于根据由设定单元设定的照明条件来调整面光源的颜色和亮度; 演讲者以及将多个音乐作为数据存储的重放单元，根据与面光源的照明条件和照明时间，从多个乐曲中选出的乐曲，并使扬声器输出所选择的乐曲作为再现的声音。

7. 发明授权

US08841033B2 Ceramic material and preparation method therefor 有权
标题翻译：陶瓷材料及其制备方法
公开(公告)号：US08841033B2
公开(公告)日：2014-09-23
申请号：US12873393
申请日：2010-09-01
申请人： Yoshihiko Yamamura , Tatsuya Hattori , Toshihiro Yoshida , Akihiko Honda , Yosuke Sato
发明人： Yoshihiko Yamamura , Tatsuya Hattori , Toshihiro Yoshida , Akihiko Honda , Yosuke Sato
IPC分类号： H01M6/18 , H01M10/0562 , H01M6/04 , C04B35/00 , C01G33/00 , C04B35/486 , H01M10/052 , C01G35/00
CPC分类号： C01G33/006 , C01G35/006 , C01P2002/72 , C01P2006/40 , C04B35/486 , C04B2235/3203 , C04B2235/3217 , C04B2235/322 , C04B2235/3227 , C04B2235/3251 , C04B2235/764 , C04B2235/77 , H01M10/052 , H01M10/0562 , H01M2300/0071 , Y02E60/122 , Y02P70/54
摘要： The present invention provides a ceramic material capable of demonstrating compactness and Li ion conductivity to an extent that enables the use of the ceramic material as a solid-state electrolyte material for a lithium secondary battery, or the like. A ceramic material containing Li, La, Zr, Nb and/or Ta, as well as O and having a garnet-type or garnet-like crystal structure is used.
摘要翻译：本发明提供一种陶瓷材料，其能够将致密性和Li离子传导性表现为能够将陶瓷材料用作锂二次电池的固态电解质材料等的程度。使用含有Li，La，Zr，Nb和/或Ta以及O且具有石榴石型或石榴石状晶体结构的陶瓷材料。

8. 发明授权

US08806965B2 Headspace sample introduction device 有权
标题翻译：顶空样品引入装置
公开(公告)号：US08806965B2
公开(公告)日：2014-08-19
申请号：US13133626
申请日：2008-12-10
申请人： Yosuke Sato , Manabu Shimomura , Akira Aono
发明人： Yosuke Sato , Manabu Shimomura , Akira Aono
IPC分类号： G01N1/22 , G01N30/16 , G01N1/40 , G01N30/72 , G01N35/10
CPC分类号： G01N1/2226 , G01N1/4022 , G01N30/16 , G01N30/7206 , G01N35/1095 , G01N2001/2229
摘要： A headspace sample introduction device which collects a sample gas from a sample container and introduces the gas into a predetermined analyzer is provided. The device includes a sample tray 10 capable of holding at least one sample container 100 storing a liquid sample or a solid sample, a heating means 30 for heating at least one sample container 100 taken from the sample tray 10, a sample-gas collecting means 40 for collecting a sample gas from the upper space in the sample container 100 held in the heating means 30, and a cooling transfer means 20 for keeping and cooling at least one sample container 100 taken from the heating means 30 and returning the cooled sample container 100 to the sample tray 20. Since the headspace sample introduction device can return the heated sample containers 100 to the sample tray 10 after they are cooled with the cooling transfer means 20, the hot sample containers can be assuredly prevented from contacting the user.
摘要翻译：提供了一种顶空样品引入装置，其从样本容器收集样品气体并将气体引入预定的分析器。该装置包括能够保持至少一个存储液体样品或固体样品的样品容器100的样品盘10，用于加热从样品盘10取出的至少一个样品容器100的加热装置30，样品气体收集装置 40，用于从保持在加热装置30中的样品容器100中的上部空间收集样品气体;以及冷却转移装置20，用于保持和冷却从加热装置30取出的至少一个样品容器100，并将冷却的样品容器由于顶空样品引入装置可以在用冷却传递装置20冷却之后将加热的样品容器100返回到样品盘10，因此可以可靠地防止热样品容器与使用者接触。

9. 发明授权

US08717353B2 Image processing apparatus and method 有权
标题翻译：图像处理装置及方法
公开(公告)号：US08717353B2
公开(公告)日：2014-05-06
申请号：US13207671
申请日：2011-08-11
申请人： Yosuke Sato
发明人： Yosuke Sato
IPC分类号： G06T15/00 , G06T15/40 , G09G5/00 , H04N13/00 , H04N13/02 , G06K9/00
CPC分类号： H04N13/111
摘要： An image processing apparatus calculates a near image distance, corresponding to a distance from a virtual viewpoint to a first viewpoint among viewpoints of a plurality of images, and a far image distance, corresponding to a distance from the virtual viewpoint to a second viewpoint among the viewpoints of the plurality of images, which is relatively distant from the virtual viewpoint compared with the first viewpoint, sets a search range, determines parallax vectors corresponding to search reference block coordinates by executing block matching processing within the search range and by using a first block image, included in a near image and corresponding to the search reference block coordinates and the near image distance, and a second block image, included in a far image and corresponding to the search reference block coordinates and the far image distance, and generates an image viewed from the virtual viewpoint by using the parallax vectors.
摘要翻译：图像处理装置计算与多个图像的视点中的从虚拟视点到第一视点的距离相对应的近图像距离，以及与从虚拟视点到第二视点的距离对应的远距离图像距离通过在搜索范围内执行块匹配处理，并且通过使用第一块来确定与第一视点相比相对远离虚拟视点的多个图像的视点，设置搜索范围，确定与搜索参考块坐标相对应的视差矢量图像，包括在近似图像中并且对应于搜索参考块坐标和近图像距离，以及第二块图像，包括在远图像中并且对应于搜索参考块坐标和远距离图像距离，并且生成图像通过使用视差矢量从虚拟视点观察。

10. 发明授权

US08597776B2 Ceramic material, laminate, member for use in semiconductor manufacturing equipment, and sputtering target member 有权
标题翻译：陶瓷材料，层压板，用于半导体制造设备的构件和溅射靶构件
公开(公告)号：US08597776B2
公开(公告)日：2013-12-03
申请号：US13478508
申请日：2012-05-23
申请人： Morimichi Watanabe , Asumi Jindo , Yuji Katsuda , Yosuke Sato , Yoshinori Isoda
发明人： Morimichi Watanabe , Asumi Jindo , Yuji Katsuda , Yosuke Sato , Yoshinori Isoda
IPC分类号： C04B35/58 , B32B7/02 , C23C14/08 , B32B18/00
CPC分类号： H01L21/67 , B32B18/00 , C04B35/58 , C04B35/581 , C04B35/6261 , C04B35/62655 , C04B35/645 , C04B37/001 , C04B37/003 , C04B2235/3206 , C04B2235/3217 , C04B2235/3222 , C04B2235/3225 , C04B2235/3865 , C04B2235/5445 , C04B2235/77 , C04B2235/80 , C04B2235/96 , C04B2235/9607 , C04B2237/08 , C04B2237/34 , C04B2237/343 , C04B2237/36 , C04B2237/366 , C04B2237/58 , C04B2237/704 , C04B2237/708 , C04B2237/72 , C23C14/3414 , H01L21/6831 , H05B1/00 , H05B3/283 , Y10T428/24942
摘要： A ceramic material mainly contains magnesium, aluminum, oxygen, and nitrogen, in which the ceramic material has a magnesium-aluminum oxynitride phase serving as a main phase, wherein XRD peaks of the magnesium-aluminum oxynitride phase measured with CuKα radiation appear at at least 2θ=47 to 50°.
摘要翻译：陶瓷材料主要含有镁，铝，氧和氮，其中陶瓷材料具有作为主相的镁 - 铝氧氮化物相，其中用CuKalpha辐射测量的镁 - 铝氮氧化物相的XRD峰至少呈现 2θ= 47〜50°。

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