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    • 5. 发明授权
    • Charged-particle beam system
    • 带电粒子束系统
    • US07820978B2
    • 2010-10-26
    • US11959966
    • 2007-12-19
    • Kazuya Goto
    • Kazuya Goto
    • H01J3/14
    • H01J37/153B82Y10/00B82Y40/00H01J37/10H01J37/147H01J37/3174H01J2237/153H01J2237/28
    • A charged-particle beam system has a demagnifying lens for reducing the dimensions of an electron beam produced from an electron beam source, an objective lens for focusing the demagnified beam onto the surface of a target, a first deflector located before the demagnifying lens, a second deflector placed such that the deflection field produced by it is totally or partially superimposed on the objective lens field, and a third deflector located in a stage following the second deflector. An image of the light source is created by the demagnifying lens. An image of the light source image is formed on the target by the objective lens.
    • 带电粒子束系统具有用于减小从电子束源产生的电子束的尺寸的缩小透镜,用于将缩小的光束聚焦到目标表面上的物镜,位于缩小透镜之前的第一偏转器, 第二偏转器被放置成使得其产生的偏转场全部或部分地叠加在物镜视场上,而第三偏转器位于跟随第二偏转器的阶段中。 光源的图像由缩小透镜产生。 通过物镜在目标上形成光源图像的图像。
    • 9. 发明授权
    • Charged-particle beam instrument
    • 带电粒子束仪
    • US07521688B2
    • 2009-04-21
    • US11640693
    • 2006-12-18
    • Kazuya Goto
    • Kazuya Goto
    • H01J1/50
    • H01J37/147H01J37/153H01J2237/1534H01J2237/28
    • A charged-particle beam instrument is offered which can cancel out deflection aberrations arising from a first deflector or oblique incidence on the surface of a workpiece without (i) increasing the electrode length, (ii) reducing the inside diameter of the electrode, or (iii) increasing the deflection voltage too much. The instrument has an electron source for producing an electron beam, a demagnifying lens for condensing the beam, an objective lens for focusing the condensed beam onto the surface of the workpiece, the first deflector located behind the demagnifying lens, and a second deflector located ahead of the demagnifying lens. The first deflector determines the beam position on the surface of the workpiece. The second deflector cancels out deflection aberrations arising from the first deflector.
    • 提供一种带电粒子束仪器,其可以消除由第一偏转器产生的偏转像差或倾斜入射到工件的表面上,而不会(i)增加电极长度,(ii)减小电极的内径,或( iii)增加偏转电压太多。 仪器具有用于产生电子束的电子源,用于聚光的缩小透镜,用于将凝聚的光束聚焦到工件的表面上的物镜,位于缩小透镜后面的第一偏转器和位于前方的第二偏转器 的减光透镜。 第一偏转器确定工件表面上的光束位置。 第二偏转器抵消由第一偏转器产生的偏转像差。