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1. 发明授权

US07535755B2 Magnetic memory device and method for fabricating the same 失效
标题翻译：磁存储器件及其制造方法
公开(公告)号：US07535755B2
公开(公告)日：2009-05-19
申请号：US11528367
申请日：2006-09-28
申请人： Shinjiro Umehara , Hiroshi Ashida , Takao Ochiai , Masashige Sato , Kazuo Kobayashi
发明人： Shinjiro Umehara , Hiroshi Ashida , Takao Ochiai , Masashige Sato , Kazuo Kobayashi
IPC分类号： G11C11/00
CPC分类号： H01L43/08 , B82Y10/00 , H01L27/228 , H01L43/12
摘要： The magnetic memory device includes a magnetic shield film 48, and a magnetoresistive effect element 62 formed over the magnetic shield film 48 and including a magnetic layer 52, a non-magnetic layer 54 and a magnetic layer 56, in which a magnetization direction of the first magnetic layer or the second magnetic layer is reversed by spin injection, and a second magnetic shield film 68 formed over the side wall of the magnetoresistive effect element 62. Thus, the arrival of the leakage magnetic field from the interconnection near the magnetoresistive effect element 62 can be effectively prevented.
摘要翻译：磁存储器件包括磁屏蔽膜48和形成在磁屏蔽膜48上并包括磁性层52，非磁性层54和磁性层56的磁阻效应元件62，其中磁屏蔽膜48的磁化方向第一磁性层或第二磁性层通过自旋注入反转，以及形成在磁阻效应元件62的侧壁上的第二磁屏蔽膜68.因此，来自磁阻效应元件附近的互连的泄漏磁场的到达 62可以有效地防止。

2. 发明申请

US20070241410A1 Magnetic memory device and method for fabricating the same 失效
标题翻译：磁存储器件及其制造方法
公开(公告)号：US20070241410A1
公开(公告)日：2007-10-18
申请号：US11528367
申请日：2006-09-28
申请人： Shinjiro Umehara , Hiroshi Ashida , Takao Ochiai , Masashige Sato , Kazuo Kobayashi
发明人： Shinjiro Umehara , Hiroshi Ashida , Takao Ochiai , Masashige Sato , Kazuo Kobayashi
IPC分类号： H01L29/76 , H01L43/00 , H01L29/00
CPC分类号： H01L43/08 , B82Y10/00 , H01L27/228 , H01L43/12
摘要： The magnetic memory device includes a magnetic shield film 48, and a magnetoresistive effect element 62 formed over the magnetic shield film 48 and including a magnetic layer 52, a non-magnetic layer 54 and a magnetic layer 56, in which a magnetization direction of the first magnetic layer or the second magnetic layer is reversed by spin injection, and a second magnetic shield film 68 formed over the side wall of the magnetoresistive effect element 62. Thus, the arrival of the leakage magnetic field from the interconnection near the magnetoresistive effect element 62 can be effectively prevented.
摘要翻译：磁存储器件包括磁屏蔽膜48和形成在磁屏蔽膜48上并包括磁性层52，非磁性层54和磁性层56的磁阻效应元件62，其中磁屏蔽膜48的磁化方向第一磁性层或第二磁性层通过自旋注入反转，以及形成在磁阻效应元件62的侧壁上的第二磁屏蔽膜68。因此，可以有效地防止来自磁阻效应元件62附近的布线的泄漏磁场的到达。

3. 发明申请

US20070277910A1 Manufacturing method of tunnel magnetoresistance element and manufacturing method of nonvolatile memory device 审中-公开
标题翻译：隧道磁阻元件的制造方法和非易失性存储器件的制造方法
公开(公告)号：US20070277910A1
公开(公告)日：2007-12-06
申请号：US11606164
申请日：2006-11-30
申请人： Takao Ochiai , Shinjiro Umehara , Hiroshi Ashida , Masashige Sato , Kazuo Kobayashi
发明人： Takao Ochiai , Shinjiro Umehara , Hiroshi Ashida , Masashige Sato , Kazuo Kobayashi
IPC分类号： H01F41/22
CPC分类号： H01F10/3254 , B82Y10/00 , B82Y25/00 , B82Y40/00 , G11B5/3163 , G11B5/3906 , G11B5/3909 , G11C11/16 , H01F10/3272 , H01F41/304
摘要： An electrode, an antiferromagnetic film, a ferromagnetic film, a nonmagnetic film, a ferromagnetic film, a tunnel insulating film, a ferromagnetic film, a first Ta film, a Ru film, and a second Ta film are formed in sequence on a substrate. The thickness of the second Ta film is about 0.5 nm. The second Ta film is naturally oxidized after being formed. Then, heat treatment to improve the characteristic of a TMR film is performed. The temperature of this heat treatment is approximately from 200° C. to 300° C. In a conventional manufacturing method, film peeling occurs in this heat treatment, and accompanying this, defects such as occurrence of holes and wrinkles further occur, but in the present method, such an occurrence of defects is prevented since the Ta film is formed at the uppermost surface. Subsequently, the Ta film and so on are patterned.
摘要翻译：在基板上依次形成电极，反铁磁膜，铁磁膜，非磁性膜，铁磁膜，隧道绝缘膜，铁磁膜，第一Ta膜，Ru膜和第二Ta膜。第二Ta膜的厚度为约0.5nm。第二个Ta膜在形成后被自然氧化。然后，进行热处理以提高TMR膜的特性。该热处理的温度约为200℃〜300℃。在以往的制造方法中，在该热处理中发生膜剥离，伴随此，进一步发生孔和褶皱等的缺陷，由于在最上表面形成Ta膜，因此防止了这种缺陷的发生。随后，对Ta膜等进行图案化。

4. 发明申请

US20070242505A1 Magnetic memory device and method for driving the same 审中-公开
标题翻译：磁存储装置及其驱动方法
公开(公告)号：US20070242505A1
公开(公告)日：2007-10-18
申请号：US11446303
申请日：2006-06-05
申请人： Takao Ochiai , Shinjiro Umehara , Hiroshi Ashida , Masashige Sato , Kazuo Kobayashi
发明人： Takao Ochiai , Shinjiro Umehara , Hiroshi Ashida , Masashige Sato , Kazuo Kobayashi
IPC分类号： G11C11/14
CPC分类号： G11C11/14 , G11C11/16 , G11C19/0833 , H01L27/228 , H01L43/08
摘要： The magnetic memory device comprises a magnetoresistive effect element 54 including a magnetic layer 42 having a magnetization direction pinned in a first direction, a non-magnetic layer 50 formed on the magnetic layer 42, and a magnetic layer 52 formed on the non-magnetic layer 50 and having a first magnetic domain magnetized in a first direction and a second magnetic domain magnetized in a second direction opposite to the first direction; and a write current applying circuit for flowing a write current in the second magnetic layer 52 in the first direction or the second direction to shift a magnetic domain wall between the first magnetic domain and the second magnetic domain to control a magnetization direction of a part of the magnetic layer 52, opposed to the magnetic layer 42.
摘要翻译：磁存储器件包括磁阻效应元件54，该磁阻效应元件54包括具有沿第一方向钉扎的磁化方向的磁性层42，形成在磁性层42上的非磁性层50和形成在非磁性层上的磁性层52 并且具有沿第一方向磁化的第一磁畴和沿与第一方向相反的第二方向磁化的第二磁畴; 以及写入电流施加电路，用于沿第一方向或第二方向流动第二磁性层52中的写入电流，以使第一磁畴和第二磁畴之间的磁畴壁移位，以控制第一磁畴和第二磁畴之间的磁化方向磁性层52与磁性层42相对。

5. 发明申请

US20070278603A1 Magnetic memory device and method for fabricating the same 审中-公开
标题翻译：磁存储器件及其制造方法
公开(公告)号：US20070278603A1
公开(公告)日：2007-12-06
申请号：US11633588
申请日：2006-12-05
申请人： Takao Ochiai , Shinjiro Umehara , Hiroshi Ashida , Masashige Sato , Yutaka Shimizu
发明人： Takao Ochiai , Shinjiro Umehara , Hiroshi Ashida , Masashige Sato , Yutaka Shimizu
IPC分类号： H01L43/00
CPC分类号： G11C19/0808 , G11C11/15 , G11C19/0841
摘要： The magnetic memory device comprises a recording layer 70 formed linearly over a substrate 10 and having a plurality of pinning sites 52 for restricting the motion of domain walls 50 formed at a prescribed pitch and having the regions between the plural pinning sites 52 as recording bits 72. The recording layer 70 includes a first recording layer portion 46 and a second recording layer portion 68, and the second recording layer portion 68 is positioned above the first recording layer portion 46 and has one end connected to one end of the first recording layer portion 46. The second recording layer portion 68 is formed above the first recording layer portion 46, and the end of the second recording layer portion 68 is connected to one end of the first recording layer portion 46, whereby the space required to form the recording layer 70 can be small.
摘要翻译：磁存储器件包括在衬底10上线性地形成的记录层70，并且具有多个钉扎位置52，用于限制以预定间距形成的畴壁50的运动，并且具有作为记录位72的多个钉扎位置52之间的区域记录层70包括第一记录层部分46和第二记录层部分68，第二记录层部分68位于第一记录层部分46的上方，其一端连接到第一记录层部分的一端第二记录层部分68形成在第一记录层部分46的上方，第二记录层部分68的端部连接到第一记录层部分46的一端，由此形成记录层所需的空间 70可以小。

6. 发明授权

US07382643B2 Magnetoresistive effect element and magnetic memory device 失效
标题翻译：磁阻效应元件和磁存储器件
公开(公告)号：US07382643B2
公开(公告)日：2008-06-03
申请号：US11338889
申请日：2006-01-25
申请人： Hiroshi Ashida , Masashige Sato , Shinjiro Umehara , Kazuo Kobayashi
发明人： Hiroshi Ashida , Masashige Sato , Shinjiro Umehara , Kazuo Kobayashi
IPC分类号： G11C11/00
CPC分类号： G11C11/16
摘要： The magnetoresistive effect element comprises a pinned magnetic layer 16 having a multilayered synthetic antiferromagnet (SAF) structure, a nonmagnetic spacer layer 18 formed on the pinned magnetic layer 16, a free magnetic layer 20 formed on the nonmagnetic spacer layer 18 and formed of a single ferromagnetic layer, a nonmagnetic spacer layer 22 formed on the free magnetic layer 20, and a pinned magnetic layer 24 of a multilayered SAF structure formed on the nonmagnetic spacer layer 22, wherein a magnetization direction of the ferromagnetic layer 16c of the pinned magnetic layer 16, which is nearest the free magnetic layer 20, and a magnetization direction of the ferromagnetic layer 24a of the pinned magnetic layer 24, which is nearest the free magnetic layer 20, are opposite to each other.
摘要翻译：磁阻效应元件包括具有多层合成反铁磁体（SAF）结构的钉扎磁性层16，形成在钉扎磁性层16上的非磁性间隔层18，形成在非磁性间隔层18上并由单个铁磁层，形成在自由磁性层20上的非磁性间隔层22和形成在非磁性间隔层22上的多层SAF结构的钉扎磁性层24，其中被钉扎的磁性层的铁磁层16c的磁化方向最靠近自由磁性层20的磁性层24的磁化方向与最靠近自由磁性层20的被钉扎磁性层24的磁化方向相反。

7. 发明申请

US20070076469A1 Magnetoresistive effect element and magnetic memory device 失效
标题翻译：磁阻效应元件和磁存储器件
公开(公告)号：US20070076469A1
公开(公告)日：2007-04-05
申请号：US11338889
申请日：2006-01-25
申请人： Hiroshi Ashida , Masashige Sato , Shinjiro Umehara , Kazuo Kobayashi
发明人： Hiroshi Ashida , Masashige Sato , Shinjiro Umehara , Kazuo Kobayashi
IPC分类号： G11C11/00
CPC分类号： G11C11/16
摘要： The magnetoresistive effect element comprises a pinned magnetic layer 16 having a multilayered synthetic antiferromagnet (SAF) structure, a nonmagnetic spacer layer 18 formed on the pinned magnetic layer 16, a free magnetic layer 20 formed on the nonmagnetic spacer layer 18 and formed of a single ferromagnetic layer, a nonmagnetic spacer layer 22 formed on the free magnetic layer 20, and a pinned magnetic layer 24 of a multilayered SAF structure formed on the nonmagnetic spacer layer 22, wherein a magnetization direction of the ferromagnetic layer 16c of the pinned magnetic layer 16, which is nearest the free magnetic layer 20, and a magnetization direction of the ferromagnetic layer 24a of the pinned magnetic layer 24, which is nearest the free magnetic layer 20, are opposite to each other.
摘要翻译：磁阻效应元件包括具有多层合成反铁磁体（SAF）结构的钉扎磁性层16，形成在钉扎磁性层16上的非磁性间隔层18，形成在非磁性间隔层18上并由单个铁磁层，形成在自由磁性层20上的非磁性间隔层22和形成在非磁性间隔层22上的多层SAF结构的钉扎磁性层24，其中被钉扎的磁性层的铁磁层16c的磁化方向最靠近自由磁性层20的磁性层24的磁化方向与最靠近自由磁性层20的被钉扎磁性层24的磁化方向相反。

8. 发明申请

US20060256484A1 Ferromagnetic tunnel junction, magnetic head using the same, magnetic recording device, and magnetic memory device 失效
标题翻译：铁磁隧道结，使用磁头的磁头，磁记录装置和磁记忆装置
公开(公告)号：US20060256484A1
公开(公告)日：2006-11-16
申请号：US11257397
申请日：2005-10-25
申请人： Masashige Sato , Shinjiro Umehara , Hiroshi Ashida , Kazuo Kobayashi
发明人： Masashige Sato , Shinjiro Umehara , Hiroshi Ashida , Kazuo Kobayashi
IPC分类号： G11B5/33 , G11B5/127
CPC分类号： H01L43/08 , B82Y10/00 , B82Y25/00 , G11B5/3906 , G11B5/3909
摘要： A ferromagnetic tunnel junction is disclosed. The ferromagnetic tunnel junction includes a pinned magnetic layer, a tunnel insulating film formed on the pinned magnetic layer, and a free magnetic multilayer body formed on the tunnel insulating film. The free magnetic multilayer body includes a first free magnetic layer, a diffusion barrier layer, and a second free magnetic layer stacked in this order on the tunnel insulating film. The first free magnetic layer and the second free magnetic layer are ferromagnetically coupled with each other. The diffusion barrier layer inhibits the additive element contained in the first free magnetic layer from diffusing into the second free magnetic layer.
摘要翻译：公开了铁磁隧道结。铁磁隧道结包括钉扎磁性层，形成在钉扎磁性层上的隧道绝缘膜，以及形成在隧道绝缘膜上的自由磁性多层体。自由磁性多层体包括在隧道绝缘膜上依次堆叠的第一自由磁性层，扩散阻挡层和第二自由磁性层。第一自由磁性层和第二自由磁性层彼此铁磁耦合。扩散阻挡层抑制包含在第一自由磁性层中的添加元素扩散到第二自由磁性层中。

9. 发明申请

US20060220084A1 Magnetoresistive effect element and method for fabricating the same 审中-公开
标题翻译：磁阻效应元件及其制造方法
公开(公告)号：US20060220084A1
公开(公告)日：2006-10-05
申请号：US11167279
申请日：2005-06-28
申请人： Shinjiro Umehara , Hiroshi Ashida , Masashige Sato , Kazuo Kobayashi
发明人： Shinjiro Umehara , Hiroshi Ashida , Masashige Sato , Kazuo Kobayashi
IPC分类号： H01L29/94
CPC分类号： H01L43/12 , B82Y10/00 , H01L27/228 , H01L43/08
摘要： The magnetoresistive effect element comprises a first ferromagnetic layer 50, a nonmagnetic layer 52 formed on the first ferromagnetic layer 50, a second ferromagnetic layer 54 formed on the nonmagnetic layer 52, and a sidewall insulating film 64 formed on the side wall of the second ferromagnetic layer 54. The end of the first ferromagnetic layer 50 is aligned with the end of the sidewall insulating film 64. Whereby the disalignment between the first ferromagnetic layer and the second ferromagnetic layer can be prevented.
摘要翻译：磁阻效应元件包括第一铁磁层50，形成在第一铁磁层50上的非磁性层52，形成在非磁性层52上的第二铁磁层54和形成在第二铁磁层50的侧壁上的侧壁绝缘膜64 第一铁磁层50的端部与侧壁绝缘膜64的端部对准。由此可以防止第一铁磁层与第二铁磁层之间的不对准。

10. 发明授权

US07466526B2 Ferromagnetic tunnel junction, magnetic head using the same, magnetic recording device, and magnetic memory device 失效
标题翻译：铁磁隧道结，使用磁头的磁头，磁记录装置和磁记忆装置
公开(公告)号：US07466526B2
公开(公告)日：2008-12-16
申请号：US11257397
申请日：2005-10-25
申请人： Masashige Sato , Shinjiro Umehara , Hiroshi Ashida , Kazuo Kobayashi
发明人： Masashige Sato , Shinjiro Umehara , Hiroshi Ashida , Kazuo Kobayashi
IPC分类号： G11B5/39 , H01L29/78 , G11C11/15 , G11C11/00
CPC分类号： H01L43/08 , B82Y10/00 , B82Y25/00 , G11B5/3906 , G11B5/3909
摘要： A ferromagnetic tunnel junction is disclosed. The ferromagnetic tunnel junction includes a pinned magnetic layer, a tunnel insulating film formed on the pinned magnetic layer, and a free magnetic multilayer body formed on the tunnel insulating film. The free magnetic multilayer body includes a first free magnetic layer, a diffusion barrier layer, and a second free magnetic layer stacked in this order on the tunnel insulating film. The first free magnetic layer and the second free magnetic layer are ferromagnetically coupled with each other. The diffusion barrier layer inhibits the additive element contained in the first free magnetic layer from diffusing into the second free magnetic layer.
摘要翻译：公开了铁磁隧道结。铁磁隧道结包括钉扎磁性层，形成在钉扎磁性层上的隧道绝缘膜，以及形成在隧道绝缘膜上的自由磁性多层体。自由磁性多层体包括在隧道绝缘膜上依次堆叠的第一自由磁性层，扩散阻挡层和第二自由磁性层。第一自由磁性层和第二自由磁性层彼此铁磁耦合。扩散阻挡层抑制包含在第一自由磁性层中的添加元素扩散到第二自由磁性层中。

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