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    • 3. 发明授权
    • Solid-state image sensor
    • 固态图像传感器
    • US06496223B1
    • 2002-12-17
    • US08953511
    • 1997-10-17
    • Yong Gwan Kim
    • Yong Gwan Kim
    • H04N5335
    • H01L29/76816H01L27/14806
    • A solid-state image sensor in which an interface area between a vertical charge coupled device (VCCD) and a horizontal charge coupled device (HCCD) is formed under the HCCD, thereby maximizing charge-transferring efficiency is disclosed, including a substrate; a well formed in the substrate; a first impurity region formed in the well under the VCCD and the HCCD; and second impurity regions selectively formed in the first impurity region to have a border from the first impurity region under the HCCD, wherein the second impurity regions have a different ion concentration from the first impurity region.
    • 一种固态图像传感器,其中在HCCD之下形成垂直电荷耦合器件(VCCD)和水平电荷耦合器件(HCCD)之间的界面区域,从而最大化电荷转移效率,包括衬底; 在基底中形成良好的; 形成在VCCD和HCCD下的阱中的第一杂质区; 以及选择性地形成在所述第一杂质区域中的与所述HCCD之下的所述第一杂质区域具有边界的第二杂质区域,其中所述第二杂质区域具有与所述第一杂质区域不同的离子浓度。
    • 4. 发明授权
    • Method of manufacturing charge-coupled device having different
light-receiving region and charge-isolating layer structures
    • 制造具有不同光接收区域和电荷隔离层结构的电荷耦合器件的方法
    • US6054341A
    • 2000-04-25
    • US17800
    • 1998-02-03
    • Yong Gwan Kim
    • Yong Gwan Kim
    • H01L29/762H01L21/339H01L27/146H01L27/148H01L31/0352H04N5/335H04N5/361H04N5/365H04N5/369H04N5/372
    • H01L27/14689H01L27/14812H01L27/14825H01L31/03529Y02E10/50
    • A charge-coupled device includes a first P-type well formed in an N-type semiconductor substrate, a second P-type well formed repeatedly the first P-type well region, a charge-transfer region (BCCD) formed within the second P-type well region, an N-type photodiode region (PDN) formed in the upper portion of the first P-type well so as to be isolated from the charge-transfer region, a first high concentration P-type photodiode region (first PDP.sup.+ region) formed in the upper surface of the N-type photodiode region excluding the charge-transfer region and serving as a charge-isolating layer, first and second poly-gates formed repeatedly on the charge-transfer region, and a second high concentration self aligned P-type photodiode region (second PDP.sup.+ region) formed in the surface of the first high concentration P-type photodiode region. The charge-isolating region is thin to extend the potential pocket of each light-conversion PDN region.
    • 电荷耦合器件包括在N型半导体衬底中形成的第一P型阱,重复形成第一P型阱区的第二P型阱,形成在第二P型阱区内的电荷转移区(BCCD) 型阱区,形成在第一P型阱的上部以与电荷转移区隔离的N型光电二极管区(PDN),第一高浓度P型光电二极管区(第一PDP + 区域)形成在除了电荷转移区域之外的N型光电二极管区域的上表面中并且用作电荷隔离层,在电荷转移区域上重复形成的第一和第二多晶硅栅极以及第二高浓度自身 形成在第一高浓度P型光电二极管区域的表面中的P型光电二极管区域(第二PDP +区域)。 电荷隔离区域很薄,以延伸每个光转换PDN区域的势阱。
    • 5. 发明授权
    • Analog/digital converter using a charge coupled device with poly-gates
relatively sized
    • 模/数转换器采用电荷耦合器件,具有多门相对大小
    • US5729233A
    • 1998-03-17
    • US532100
    • 1995-09-22
    • Yong Gwan Kim
    • Yong Gwan Kim
    • H03M1/36H03M1/38
    • H03M1/368
    • An analog-to-digital (A/D) converter using a charge-coupled device (CCD) for converting analog data to digital data, the CCD including a plurality of gates with potential wells, the number of gates corresponding to a number of bits of the digital data, and a size of each potential well corresponding to a given significant bit and being one-half the size of the potential well corresponding to the next most significant bit. The charges of an input analog signal are transmitted to respective potential wells. A plurality of driving circuits apply a voltage to the respective potential wells and output the charges stored in the respective potential wells as digital data.
    • 一种使用电荷耦合器件(CCD)将模拟数据转换为数字数据的模数(A / D)转换器,CCD包括具有势阱的多个门,与多个位对应的门数 的数字数据,以及对应于给定有效位的每个势阱的大小,并且是对应于下一最高有效位的势阱的大小的一半。 输入模拟信号的电荷被发送到相应的电位阱。 多个驱动电路向各个电位阱施加电压,并输出存储在各个电位阱中的电荷作为数字数据。
    • 6. 发明授权
    • Dual-line type charge transfer device
    • 双线式电荷转移装置
    • US06441409B1
    • 2002-08-27
    • US09298845
    • 1999-04-26
    • Yong Gwan Kim
    • Yong Gwan Kim
    • H01L27148
    • H01L27/14812H01L29/768
    • A charge transfer device which comprises vertical charge transfer devices which transfer charges in the vertical direction, first and second horizontal charge transfer devices which transfer the charges from the vertical charge transfer devices in the horizontal direction, and a shift gate which controls the charges from the vertical charge transfer devices to be supplied to one the first horizontal charge device or the second horizontal charge transfer device, wherein the first. horizontal charge transfer device is a semiconductor region between the vertical charge transfer devices and the second horizontal charge transfer device and includes highly-doped regions having tapered portions whose one ends near the second horizontal charge transfer device are broader than another ends near the vertical charge transfer devices.
    • 一种电荷转移装置,包括在垂直方向上传送电荷的垂直电荷转移装置,在水平方向上从垂直电荷转移装置传送电荷的第一和第二水平电荷转移装置,以及控制来自 垂直电荷转移装置被提供给第一水平充电装置或第二水平电荷转移装置中的一个,其中第一水平充电装置或第二水平电荷转移装置。 水平电荷转移装置是垂直电荷转移装置和第二水平电荷转移装置之间的半导体区域,并且包括具有锥形部分的高度掺杂区域,其一端靠近第二水平电荷转移装置比在垂直电荷转移附近的另一端更宽 设备。
    • 9. 发明授权
    • Solid state image sensor
    • 固态图像传感器
    • US6118143A
    • 2000-09-12
    • US038240
    • 1998-03-11
    • Yong Gwan Kim
    • Yong Gwan Kim
    • H01L27/146H01L27/148
    • H01L27/14825
    • A solid state image sensor includes a photodiode, a vertical charge coupled device positioned to a side of the photodiode for transmitting charges generated in the photodiode, a first polygate extending in a horizontal direction and partly overlapping the vertical charge coupled device, and a second polygate extending in a horizontal direction, partly overlapping the vertical charge coupled device and having a second polygate extension, wherein the second polygate extension extends for substantially an entire length of the side of the photodiode.
    • 固态图像传感器包括光电二极管,位于光电二极管侧的用于传输在光电二极管中产生的电荷的垂直电荷耦合器件,在水平方向上延伸并部分地与垂直电荷耦合器件重叠的第一多晶硅栅极和第二多晶硅栅极 在水平方向上延伸,部分地与垂直电荷耦合器件重叠并且具有第二多晶硅延伸部分,其中第二多晶硅延伸延伸延伸到光电二极管侧面的大致整个长度。
    • 10. 发明授权
    • Charge-coupled device having different light-receiving region and charge
isolation layer structures
    • 具有不同光接收区域和电荷隔离层结构的电荷耦合器件
    • US5821574A
    • 1998-10-13
    • US762845
    • 1996-12-10
    • Yong Gwan Kim
    • Yong Gwan Kim
    • H01L29/762H01L21/339H01L27/146H01L27/148H01L31/0352H04N5/335H04N5/361H04N5/365H04N5/369H04N5/372H01L29/768
    • H01L27/14689H01L27/14812H01L27/14825H01L31/03529Y02E10/50
    • A charge-coupled device includes a first P-type well formed in an N-type semiconductor substrate, a second P-type well formed repeatedly the first P-type well region, a charge-transfer region (BCCD) formed within the second P-type well region, an N-type photodiode region (PDN) formed in the upper portion of the first P-type well so as to be isolated from the charge-transfer region, a first high concentration P-type photodiode region (first PDP.sup.+ region) formed in the upper surface of the N-type photodiode region excluding the charge-transfer region and serving as a charge-isolating layer, first and second poly-gates formed repeatedly on the charge-transfer region, and a second high concentration self aligned P-type photodiode region (second PDP.sup.+ region) formed in the surface of the first high concentration P-type photodiode region. The charge-isolating region is thin to extend the potential pocket of each light-conversion PDN region.
    • 电荷耦合器件包括在N型半导体衬底中形成的第一P型阱,重复形成第一P型阱区的第二P型阱,形成在第二P型阱区内的电荷转移区(BCCD) 型阱区,形成在第一P型阱的上部以与电荷转移区隔离的N型光电二极管区(PDN),第一高浓度P型光电二极管区(第一PDP + 区域)形成在除了电荷转移区域之外的N型光电二极管区域的上表面中并且用作电荷隔离层,在电荷转移区域上重复形成的第一和第二多晶硅栅极以及第二高浓度自身 形成在第一高浓度P型光电二极管区域的表面中的P型光电二极管区域(第二PDP +区域)。 电荷隔离区域很薄,以延伸每个光转换PDN区域的势阱。