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    • 2. 发明授权
    • Cycloheptenopyridine derivatives, process for preparation thereof and
antiulcer agents containing the same
    • 环庚烯并吡啶​​衍生物,其制备方法和含有它们的抗溃疡剂
    • US5149702A
    • 1992-09-22
    • US618943
    • 1990-11-27
    • Shin-ichi YamadaTakao GotoRie YoritaEizi ShimanukiTakaji YamaguchiKentaro KogiSenichi Narita
    • Shin-ichi YamadaTakao GotoRie YoritaEizi ShimanukiTakaji YamaguchiKentaro KogiSenichi Narita
    • C07D401/12C07D471/04
    • C07D401/12C07D471/04Y02P20/55Y10S514/926Y10S514/927
    • Provided are cycloheptenopyridine derivatives represented by the general formula ##STR1## [wherein R represents a hydrogen atom or lower alkyl group; R.sup.1 represents a hydrogen atom, halogen atom, lower cycloalkoxy group, amido group, substituted phenoxy group, substituted benzyloxy group, lower alkoxy group optionally containing halogen atoms(s), nitro group, hydroxyl group, lower alkenyloxy group, lower alkylthio group, or a group--NR.sup.4 R.sup.5 (wherein R.sup.4 and R.sup.5 may be the same or different and each represent a hydrogen atom or lower alkyl group, or R.sup.4 and R.sup.5 mutually combine together with the nitrogen atom adjacent thereto to form a 5- or 6-membered heterocyclic group); R.sup.2 represents a hydrogen atom, halogen atom, lower alkyl group optionally containing a halogen atom, lower alkoxy group optionally containing a halogen atom, hydroxyl group, acyl group, lower alkoxycarbonyl group, nitro group or amino group; R.sup.3 represents a hydrogen atom, a lower alkyl group, lower alkoxymethyl group, lower alkylcarbonyl group, lower alkoxycarbonyl group, carbamoyl group, lower alkylcarbamoyl group, lower alkylcarbonylmethyl group, lower alkoxycarbonyl group, lower acyloxymethyl group, lower alkylsulfonyl group, or physiologically acceptable protective group eliminatable in an acid medium or under a physiological condition; n represents 0 or 1; and A represents a methine carbon or nitrogen atom] or their salts. These derivatives and their salts are useful as antiulcer agents.
    • 提供由通式[IMAGE] [I]表示的环庚烯并吡啶​​衍生物[其中R表示氢原子或低级烷基; R1表示氢原子,卤素原子,低级环烷氧基,酰胺基,取代苯氧基,取代的苄氧基,任选含有卤原子的低级烷氧基,硝基,羟基,低级链烯氧基,低级烷硫基,或 基团-NR 4 R 5(其中R 4和R 5可以相同或不同,各自表示氢原子或低级烷基,或者R 4和R 5与与其相邻的氮原子相互结合形成5-或6-元杂环基 ); R2表示氢原子,卤素原子,任选含有卤原子的低级烷基,任选含有卤素原子的低级烷氧基,羟基,酰基,低级烷氧基羰基,硝基或氨基; R3表示氢原子,低级烷基,低级烷氧基甲基,低级烷基羰基,低级烷氧基羰基,氨基甲酰基,低级烷基氨基甲酰基,低级烷基羰基甲基,低级烷氧基羰基,低级酰氧基甲基,低级烷基磺酰基或生理上可接受的保护性 组在酸性培养基中或在生理条件下可消除; n表示0或1; A表示次甲基碳或氮原子]或其盐。 这些衍生物及其盐可用作抗溃疡剂。