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1. 发明授权

US08320041B2 Three-dimensional image display device and three-dimensional image display method 有权
标题翻译：三维图像显示装置和三维图像显示方法
公开(公告)号：US08320041B2
公开(公告)日：2012-11-27
申请号：US10782928
申请日：2004-02-23
申请人： Shin-ichi Uehara , Masao Imai , Nobuaki Takanashi , Setsuo Kaneko
发明人： Shin-ichi Uehara , Masao Imai , Nobuaki Takanashi , Setsuo Kaneko
IPC分类号： G02B27/22
CPC分类号： G02B27/2228 , H04N13/31
摘要： A three-dimensional image display device is provided with a display panel. The display panel is provided with a plurality of pixels for the right eyes and pixels for the left eye, and light emitted from the pixels for the right eye is made incident to the right eye of a viewer and light emitted from the pixels for the left eye is made incident to the left eye. When the normal distance between the display panel and the viewer is set to a maximum observation distance, D (mm), then definition X (dpi) of at least one of a vertical direction and a horizontal direction on a display plane of the display panel is set as in the following expression. X ≥ 25.4 D × tan ⁡ ( 1 ′ )
摘要翻译：三维图像显示装置具有显示面板。显示面板设置有用于右眼的多个像素和用于左眼的像素，并且从用于右眼的像素发射的光被入射到观看者的右眼和从左侧的像素发射的光眼睛发生在左眼。当显示面板和观看者之间的正常距离设定为最大观察距离D（mm）时，则在显示面板的显示面上设定垂直方向和水平方向中的至少一个的定义X（dpi）如下表所示设置。 X≥25.4 D×tan⁡（1'）

2. 发明授权

US07643100B2 Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part 失效
公开(公告)号：US07643100B2
公开(公告)日：2010-01-05
申请号：US11927725
申请日：2007-10-30
申请人： Shin-Ichi Uehara , Yuko Sato , Ken Sumiyoshi , Setsuo Kaneko , Jin Matsushima
发明人： Shin-Ichi Uehara , Yuko Sato , Ken Sumiyoshi , Setsuo Kaneko , Jin Matsushima
IPC分类号： G02F1/136 , G02F1/1335 , H01L21/302 , H01L21/461 , B29D11/00
CPC分类号： G02B3/0056 , B81B2207/056 , B81C1/00031 , B81C2201/0133 , B81C2201/0142 , C03C15/00 , C03C17/34 , C03C2204/08 , C03C2218/34 , G02B3/0012 , G02F1/133526 , Y10T428/131 , Y10T428/249969 , Y10T428/315
摘要： In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.

3. 发明授权

US07525732B2 Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part 有权
标题翻译：用于形成精细结构的部件，由此形成的精细结构的部件的方法和使用这种精细结构的部件的产品
公开(公告)号：US07525732B2
公开(公告)日：2009-04-28
申请号：US11843677
申请日：2007-08-23
申请人： Shin-ichi Uehara , Yuko Sato , Ken Sumiyoshi , Setsuo Kaneko , Jin Matsushima
发明人： Shin-ichi Uehara , Yuko Sato , Ken Sumiyoshi , Setsuo Kaneko , Jin Matsushima
IPC分类号： G02B5/08 , G02B3/00
CPC分类号： G02B3/0056 , B81B2207/056 , B81C1/00031 , B81C2201/0133 , B81C2201/0142 , C03C15/00 , C03C17/34 , C03C2204/08 , C03C2218/34 , G02B3/0012 , G02F1/133526 , Y10T428/131 , Y10T428/249969 , Y10T428/315
摘要： In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
摘要翻译：在包含蚀刻控制部件的工件（30）中形成精细结构的形成方法中，使用各向同性蚀刻工序，将具有开口（36）的掩模（32,34）施加到工件上，工件为用蚀刻溶液（38）蚀刻，从而在工件的表面形成对应于开口形状的凹部（40）。由于在各向同性蚀刻工艺期间蚀刻控制部件在凹陷内的蚀刻溶液中从工件中洗脱出来，停止了工件的蚀刻。

4. 发明申请

US20080074564A1 METHOD FOR FORMING FINELY-STRUCTURED PARTS, FINELY-STRUCTURED PARTS FORMED THEREBY, AND PRODUCT USING SUCH FINELY-STRUCTURED PART 失效
标题翻译：形成精细结构部件的方法，形成的精细结构部件以及使用这种精细结构部件的产品
公开(公告)号：US20080074564A1
公开(公告)日：2008-03-27
申请号：US11927725
申请日：2007-10-30
申请人： Shin-Ichi UEHARA , Yuko Sato , Ken Sumiyoshi , Setsuo Kaneko , Jin Matsushima
发明人： Shin-Ichi UEHARA , Yuko Sato , Ken Sumiyoshi , Setsuo Kaneko , Jin Matsushima
IPC分类号： G02F1/1335
CPC分类号： G02B3/0056 , B81B2207/056 , B81C1/00031 , B81C2201/0133 , B81C2201/0142 , C03C15/00 , C03C17/34 , C03C2204/08 , C03C2218/34 , G02B3/0012 , G02F1/133526 , Y10T428/131 , Y10T428/249969 , Y10T428/315
摘要： In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
摘要翻译：在包含蚀刻控制部件的工件（30）中形成精细结构的形成方法中，使用各向同性蚀刻工序，将具有开口（36）的掩模（32,34）施加到工件上，工件为用蚀刻溶液（38）蚀刻，从而在工件的表面形成对应于开口形状的凹部（40）。由于在各向同性蚀刻工艺期间蚀刻控制部件在凹陷内的蚀刻溶液中从工件中洗脱出来，停止了工件的蚀刻。

5. 发明授权

US07678454B2 Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part 失效
标题翻译：用于形成精细结构的部件，由此形成的精细结构的部件的方法和使用这种精细结构的部件的产品
公开(公告)号：US07678454B2
公开(公告)日：2010-03-16
申请号：US11927730
申请日：2007-10-30
申请人： Shin-Ichi Uehara , Yuko Sato , Ken Sumiyoshi , Setsuo Kaneko , Jin Matsushima
发明人： Shin-Ichi Uehara , Yuko Sato , Ken Sumiyoshi , Setsuo Kaneko , Jin Matsushima
IPC分类号： B32B17/00
CPC分类号： G02B3/0056 , B81B2207/056 , B81C1/00031 , B81C2201/0133 , B81C2201/0142 , C03C15/00 , C03C17/34 , C03C2204/08 , C03C2218/34 , G02B3/0012 , G02F1/133526 , Y10T428/131 , Y10T428/249969 , Y10T428/315
摘要： In a formation method for forming a fine structure in a workpiece (30) containing an etching control component, using an isotropic etching process, a mask (32, 34) having an opening (36) is applied to the workpiece, and the workpiece is etched with an etching solution (38) to thereby form a recess (40), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
摘要翻译：在包含蚀刻控制部件的工件（30）中形成精细结构的形成方法中，使用各向同性蚀刻工序，将具有开口（36）的掩模（32,34）施加到工件上，工件为用蚀刻溶液（38）蚀刻，从而在工件的表面形成对应于开口形状的凹部（40）。由于在各向同性蚀刻工艺期间蚀刻控制部件在凹陷内的蚀刻溶液中从工件中洗脱出来，停止了工件的蚀刻。

6. 发明申请

US20070222915A1 OPTICAL ELEMENT, DISPLAY DEVICE, AND TERMINAL DEVICE 审中-公开
标题翻译：光学元件，显示装置和终端装置
公开(公告)号：US20070222915A1
公开(公告)日：2007-09-27
申请号：US11688134
申请日：2007-03-19
申请人： Shinya NIIOKA , Shin-ichi Uehara , Ken Sumiyoshi , Setsuo Kaneko
发明人： Shinya NIIOKA , Shin-ichi Uehara , Ken Sumiyoshi , Setsuo Kaneko
IPC分类号： G02F1/1335
CPC分类号： G02F1/133509 , G02F1/134363 , G02F2201/124
摘要： A plurality of pixels is arranged periodically in the x-axis direction and the y-axis direction in the display panel of a display device, and because light is blocked by the portion other than the open part in each pixel, the display panel has a two-dimensional lattice structure. The pixels are rectangular, and the length Px of the long edges in the x direction is larger than the length Py of the short edges in the y direction. A louver, in which transparent regions and non-transparent regions are arranged periodically in a one-dimensional direction, is provided on the display panel, and the angle formed by the x axis and the one-dimensional period direction of the louver is 45 degrees or less, and preferably 10 degrees or less. This configuration makes it possible to obtain an optical element having high directivity, reduced moiré, and high transmittance. It is also possible to obtain a display device having excellent display quality into which the optical element is incorporated.
摘要翻译：多个像素在显示装置的显示面板中的x轴方向和y轴方向周期性地排列，并且由于光被每个像素中的开放部分以外的部分阻挡，所以显示面板具有二维晶格结构。像素是矩形的，并且长边缘在x方向上的长度Px大于y方向上的短边的长度Py。在显示面板上设置有透明区域和非透明区域在一维方向周期性地布置的百叶窗，并且由x轴和百叶窗的一维周期方向形成的角度为45度以下，优选为10度以下。通过该结构，能够获得具有高方向性，降低的莫尔条纹和高透射率的光学元件。还可以获得具有优异的显示质量的显示装置，其中结合有光学元件。

7. 发明授权

US08773344B2 Surface display device of an arbitrary shape 有权
标题翻译：任意形状的表面显示装置
公开(公告)号：US08773344B2
公开(公告)日：2014-07-08
申请号：US11871173
申请日：2007-10-12
申请人： Hiroshi Haga , Hideki Asada , Setsuo Kaneko
发明人： Hiroshi Haga , Hideki Asada , Setsuo Kaneko
IPC分类号： G09G3/36 , G09G3/00
CPC分类号： G09G3/3648 , G02F1/134336 , G02F1/136286 , G09G3/18 , G09G2300/0426 , G09G2300/043 , G09G2310/0232 , G09G2310/0267 , G09G2320/0214
摘要： Disclosed is a display device for use of a surface display of an arbitrary shape, including a plural number of display element units, each made up of a circuit that forms a single stage of a scanning circuit and a pixel circuit connected to an output of the scanning circuit, are arranged in a unicursal fashion on a display substrate.
摘要翻译：公开了一种使用任意形状的表面显示的显示装置，包括多个显示元件单元，每个显示元件单元由形成扫描电路的单级的电路和连接到扫描电路的输出的像素电路组成扫描电路在显示基板上以单质方式排列。

8. 发明申请

US20080088568A1 DISPLAY DEVICE 有权
标题翻译：显示设备
公开(公告)号：US20080088568A1
公开(公告)日：2008-04-17
申请号：US11871173
申请日：2007-10-12
申请人： Hiroshi Haga , Hideki Asada , Setsuo Kaneko
发明人： Hiroshi Haga , Hideki Asada , Setsuo Kaneko
IPC分类号： G09G3/36
CPC分类号： G09G3/3648 , G02F1/134336 , G02F1/136286 , G09G3/18 , G09G2300/0426 , G09G2300/043 , G09G2310/0232 , G09G2310/0267 , G09G2320/0214
摘要： Disclosed is a display device for use of a surface display of an arbitrary shape, including a plural number of display element units, each made up of a circuit that forms a single stage of a scanning circuit and a pixel circuit connected to an output of the scanning circuit, are arranged in a unicursal fashion on a display substrate.
摘要翻译：公开了一种使用任意形状的表面显示的显示装置，包括多个显示元件单元，每个显示元件单元由形成扫描电路的单级的电路和连接到扫描电路的输出的像素电路组成扫描电路在显示基板上以单质方式排列。

9. 发明授权

US4838654A Liquid crystal display device having display and driver sections on a single board 失效
标题翻译：在单板上具有显示器和驱动器部分的液晶显示装置
公开(公告)号：US4838654A
公开(公告)日：1989-06-13
申请号：US109227
申请日：1987-10-16
申请人： Tsueno Hamaguchi , Yoshihiko Hirai , Setsuo Kaneko
发明人： Tsueno Hamaguchi , Yoshihiko Hirai , Setsuo Kaneko
IPC分类号： G09F9/30 , G02F1/1345 , G02F1/136 , G02F1/1362 , G02F1/1368 , H01L21/02 , H01L21/336 , H01L27/12 , H01L29/78 , H01L29/786
CPC分类号： G02F1/13454 , G02F2202/103 , G02F2202/104 , H01L2221/68368
摘要： A liquid crystal display device includes first board having a reference voltage electrode on one surface, a second board having, on a main surface, a lattice of conductive stripes, a plurality of pairs of a transistor and a picture element electrode, each pair being disposed at each crossing point of the conductive stripes and the transistors being thin film transistors using polycrystalline or amorphous silicon, and a driving circuit for driving the conductive stripes, the driving circuit being formed in a monocrystalline silicon in a form of semiconductor integrated circuit directly connected to the conductive stripes, and a liquid crystal interposed between the one surface of the first board and the main surface of the second board.
摘要翻译：液晶显示装置包括在一个表面上具有参考电压电极的第一板，在主表面上具有导电条纹格，多对晶体管和像素电极的第二板，每对被设置在导电条的每个交叉点处，并且晶体管是使用多晶或非晶硅的薄膜晶体管，以及用于驱动导电条的驱动电路，驱动电路形成为半导体集成电路形式的单晶硅，直接连接到导电条，以及置于第一基板的一个表面和第二基板的主表面之间的液晶。

10. 发明授权

US08488072B2 Liquid crystal display panel and manufacturing method thereof 有权
标题翻译：液晶显示面板及其制造方法
公开(公告)号：US08488072B2
公开(公告)日：2013-07-16
申请号：US12418052
申请日：2009-04-03
申请人： Hiroshi Okumura , Setsuo Kaneko
发明人： Hiroshi Okumura , Setsuo Kaneko
IPC分类号： G02F1/1335 , G02F1/1337 , G02F1/1339 , H01L21/00
CPC分类号： G02F1/133526 , G02B3/0012 , G02B3/005 , G02B27/2214
摘要： To provide a structure and a manufacturing method which can manufacture, at a low cost and with good yield, a liquid crystal display panel having a lenticular lens and a substrate formed in a unified manner. When forming a lenticular lens onto a mother CF substrate by using a wet etching method, substrates are dipped into an etching solution while being raised up in such a manner that the length direction of slit openings of a mask is aligned with a vertical direction and an area having no mask pattern comes on a bottom side. With this, the residuals generated due to glass impurities can be drained towards the lower side along the lenticular lens shape to be discharged to the flat area, which makes it possible to suppress deterioration in the etching processed shape.
摘要翻译：为了提供能够以低成本，高成品率制造具有双凸透镜的液晶显示面板和以统一的方式形成的基板的结构和制造方法。当通过使用湿式蚀刻方法将母体CF基板形成双凸透镜时，将衬底浸入蚀刻溶液中，同时以使得掩模的狭缝开口的长度方向与垂直方向对准的方式升高，并且没有掩模图案的区域在底面。由此，由玻璃杂质产生的残留物可以沿着双凸透镜形状向下侧排出，以排出到平坦区域，这样可以抑制蚀刻加工形状的劣化。

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