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1. 发明申请

US20190015868A1 METHOD FOR MANUFACTURING LAMINATE 审中-公开
公开(公告)号：US20190015868A1
公开(公告)日：2019-01-17
申请号：US16066167
申请日：2016-12-27
申请人： Shin-Etsu Chemical Co., Ltd. , TEIJIN LIMITED
发明人： Kohei MASUDA , Masaki TANAKA , Takashi YODA , Tatsuya EKINAKA
IPC分类号： B05D1/38 , B05D3/04 , B05D7/24
CPC分类号： B05D1/38 , B05D1/18 , B05D1/62 , B05D3/0493 , B05D3/141 , B05D5/06 , B05D7/24 , B05D7/546 , B05D2201/02 , B05D2252/00 , B05D2252/10 , B05D2518/10 , B32B7/12 , B32B27/00 , B32B27/18 , B32B27/24 , B32B27/30 , B32B27/304 , B32B27/308 , B32B27/36 , C08J7/042 , C08J7/123 , C08J2433/14 , C08J2443/04 , C08K2003/2241 , C23C16/30
摘要： The present invention provides a method for manufacturing a laminate that exhibits visible light transparency and ultraviolet light shielding properties while maintaining an extremely high degree of scratch resistance, and that has all the necessary weather resistance and durability properties for withstanding long-term outdoor exposure. This method for manufacturing a laminate having the abovementioned properties includes: (1) using active energy rays to cure, on an organic resin substrate, an acrylic silicone resin composition having an inorganic component percentage X of 0.2 to 0.8 to form an intermediate layer, (2) dry-etching the surface of the intermediate layer obtained at step (1) using a non-oxidizing gas plasma of a plasma irradiation amount Y correlated with the inorganic component percentage X; and (3) plasma-polymerizing an organosilicon compound to form a hard coat layer on the surface of the intermediate layer obtained at step (2).

2. 发明申请

US20210008851A1 METHOD FOR PRODUCING SUBSTRATE HAVING HARD COAT LAYER CONTAINING FUNCTIONAL FINE PARTICLES 有权
公开(公告)号：US20210008851A1
公开(公告)日：2021-01-14
申请号：US16968768
申请日：2019-02-12
申请人： TEIJIN LIMITED
发明人： Tatsuya EKINAKA
IPC分类号： B32B27/08 , B32B27/20 , B32B27/24 , B32B27/30 , B32B27/36 , B32B27/28 , B32B7/12
摘要： An object of the present invention is to provide a method for producing a substrate with a hard coat layer that can maintain the properties of the functional fine particles for a long period of time even under a severe use environment and has excellent wear resistance. A method for producing a substrate with a hard coat layer characterized by comprising (1) providing a semi-cured hard coat layer consisting mainly of a resin on the substrate, satisfying the following formula (a): 12≤X≤600 (a), wherein X indicates time in second required for the (A) haze of the glass with the semi-cured hard coat layer to exceed 5%, when the glass with the semi-cured hard coat layer is obtained by layering a 10 μm-thick, semi-cured hard coat layer on one side of 3 mm-thick float-processed soda glass; and then thus obtained glass with the semi-cured hard layer is immersed in an N-methylpyrrolidone solvent in an environment of 40° C., (2) applying a dispersion in which functional fine particles are dispersed in a dispersion solvent satisfying the following formula (b) on the semi-cured hard coat layer: 12 X×(A+0.2)290 (b), wherein X denotes X described in the formula (a), A denotes the difference between the solubility parameter of the dispersion solvent inMPa0.5 unit and the solubility parameter of N-methylpyrrolidone (22.3 MPa0.5), and (3) curing the semi-cured hard coat layer completely.

3. 发明申请

US20170107345A1 POLYMER SUBSTRATE WITH HARD COAT LAYER AND MANUFACTURING METHOD FOR SUCH POLYMER SUBSTRATE 有权
公开(公告)号：US20170107345A1
公开(公告)日：2017-04-20
申请号：US15127035
申请日：2015-03-27
申请人： TEIJIN LIMITED , TSUKISHIMA KIKAI CO., LTD.
发明人： Tatsuichirou KON , Tatsuya EKINAKA , Hiroshi KISHIMOTO , Yume MORITA , Takehiro SUGA , Satoshi OGATA , Masato NAKAGOMI
IPC分类号： C08J7/04 , C23C16/02 , C23C16/40 , C23C16/50 , C08J7/12 , B05D3/02
CPC分类号： C08J7/045 , B05D3/0254 , B05D7/02 , C08J7/047 , C08J7/123 , C08J2369/00 , C08J2433/08 , C08J2483/04 , C09D183/04 , C23C16/02 , C23C16/0254 , C23C16/0272 , C23C16/401 , C23C16/402 , C23C16/45565 , C23C16/45572 , C23C16/50 , C23C16/5096 , C23C16/56 , C23C18/122 , C23C18/1233 , C23C18/1254 , H01J37/32091 , C08K3/36
摘要： The present invention realizes a polymer substrate with hard coating layer comprising a high level of environmental resistance and a high level of abrasion resistance.A polymer substrate with hard coating layer is provided that comprises a polymer substrate (60) having a thickness of 1 mm to 20 mm and a hard coating layer (70,80) on the surface thereof. Here, in this polymer substrate with hard coating layer, the hard coating layer (70,80) is laminated on the surface of the polymer substrate, contains as a main component thereof a hydrolysis-condensation product of an organic silicon compound, has a thickness of 0.1 μm to 20 μm, makes direct contact with a cured underlayer on the opposite side of the polymer substrate, is formed from an organic silicon compound by PE-CVD, and satisfies all of the following requirements (a) to (c): (a) film thickness of the silicon oxide layer is within the range of 3.5 μm to 9.0 μm, (b) maximum indentation depth of the surface of the silicon oxide layer as determined by measuring nanoindentation under conditions of a maximum load of 1 mN is 150 nm or less, and (c) the value of critical compression ratio K of the silicon oxide layer, as defined by formula (1) in a 3-point bending test of the polymer substrate with hard coating layer that imparts indentation displacement in which the surface laminated with the silicon oxide layer becomes concave, is 0.975 or less.

4. 发明申请

US20180265731A1 POLYMER SUBSTRATE WITH HARDCOAT LAYER, AND MANUFACTURING METHOD FOR SAME 审中-公开
公开(公告)号：US20180265731A1
公开(公告)日：2018-09-20
申请号：US15761348
申请日：2016-09-23
申请人： TEIJIN LIMITED , TSUKISHIMA KIKAI CO., LTD.
发明人： Tatsuya EKINAKA , Tatsuichirou KON , Takehiro SUGA , Hiroshi KISHIMOTO , Yume MORITA , Satoshi OGATA , Masato NAKAGOMI
IPC分类号： C09D133/12 , C23C16/56 , C23C16/42 , C23C16/50 , C09D133/10 , C09D7/62
CPC分类号： C09D133/12 , B32B7/02 , B32B9/00 , C08J7/04 , C08J7/047 , C08J2369/00 , C08J2433/00 , C09D7/40 , C09D7/62 , C09D133/10 , C23C16/0218 , C23C16/0272 , C23C16/401 , C23C16/402 , C23C16/42 , C23C16/50 , C23C16/5096 , C23C16/56 , C23C28/00
摘要： The present invention provides a polymer substrate with a hardcoat layer exhibiting excellent environmental resistance and wear resistance. A polymer substrate (60) is 1-20 mm thick and a hardcoat layer (70, 80) on the surface thereof comprises: an underlayer cured layer (70) with a thickness of 1-20 μm, and including 10-90 parts by weight of a multifunctional acrylate, and 90-10 parts by weight of inorganic oxide fine particles and/or a silicon compound hydrolytic condensate; and a silicon oxide layer (80) which is in direct contract with the underlayer cured layer, is formed by PE-CVD with an organosilicon compound as the starter material, and satisfies all of the following conditions (a)-(c): (a) the film thickness of the silicon oxide layer is 3.5-9.0 μm; (b) the maximum indentation depth of the surface of the silicon oxide layer by nanoindentation measurement at a maximum load of 1 mN is 150 nm or less; and (c) the limit compression ratio K of the silicon oxide layer is at most 0.975 in a 3-point bending test of the polymer substrate with a hardcoat layer having been subjected to indentation deformation that causes the surface on which the silicon oxide layer is layered to be indented.

5. 发明申请

US20200377682A1 POLYMER SUBSTRATE WITH HARD COAT LAYER 审中-公开
公开(公告)号：US20200377682A1
公开(公告)日：2020-12-03
申请号：US16497157
申请日：2018-03-28
申请人： TEIJIN LIMITED , TSUKISHIMA KIKAI CO., LTD.
发明人： Tatsuya EKINAKA , Tatsuichirou KON , Hiroshi KISHIMOTO , Yume TAKEDA , Takehiro SUGA , Satoshi OGATA , Masato NAKAGOMI
IPC分类号： C08J7/046 , C23C16/40 , C08J7/04 , C23C16/50
摘要： The present invention is a polymer substrate with a hard coat layer, which is obtained by directly laminating a polymer substrate, a base cured layer and a silicon oxide layer, wherein the base cured layer has a thickness of 1-20 μm and contains 10-90 parts by weight of a polyfunctional acrylate and 90-10 parts by weight of inorganic oxide fine particles and/or a hydrolytic condensation product of a silicon compound or contains a hydrolytic condensation product of an organic silicon compound as a primary component, and the silicon oxide layer satisfies requirement (a1) below at a position 0.04 μm in the thickness direction from the interface between the base cured layer and the silicon oxide layer and satisfies requirement (a3) below at the surface of the silicon oxide layer on the opposite side from the interface, Requirement (a1): when the chemical composition is represented by SiOxCyHz, x falls within the range 1.93-1.98, y falls within the range 0.04-0.15 and z falls within the range 0.10-0.50. Requirement (a3): when the chemical composition is represented by SiOxCyHz, x falls within the range 1.94-2.02, y falls within the range 0.05-0.16 and z falls within the range 0.20-0.50.

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