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1. 发明专利

JP2003329320A Extreme-cold refrigerating device 有权
标题翻译：超冷却制冷装置
公开(公告)号：JP2003329320A
公开(公告)日：2003-11-19
申请号：JP2002131883
申请日：2002-05-07
申请人： Shin Meiwa Ind Co Ltd , 新明和工業株式会社
发明人： ONISHI YASUHIRO , TAKAHASHI MASAYUKI , TOMOSAWA AKIRA
IPC分类号： F25B7/00 , F25B1/00
摘要： PROBLEM TO BE SOLVED: To rapidly cool a main cooler to an extremely low temperature in a transition period until the main cooler temperature is stabilized, in a mixed refrigerant type extreme-cold refrigerating device. SOLUTION: When a refrigerant having executed a cooling action in the main cooler 52 is returned to a compressor 20, the refrigerant is returned to a third cascade heat exchanger 37 on the side hotter than a fourth cascade heat exchanger 43 in the final stage, and returned to the compressor 20 via cascade heat exchangers 31 and 25. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：在混合制冷剂型极冷制冷装置中，在主冷却器温度稳定的过渡期间，将主冷却器快速冷却至极低温度。解决方案：当在主冷却器52中执行冷却作用的制冷剂返回到压缩机20时，制冷剂返回到比最终的第四级联热交换器43更热侧的第三级联热交换器37 并通过级联热交换器31和25返回到压缩机20.版权所有（C）2004，JPO

2. 发明专利

JP2005195258A Refrigeration system and vacuum deposition device 审中-公开
标题翻译：制冷系统和真空沉积装置
公开(公告)号：JP2005195258A
公开(公告)日：2005-07-21
申请号：JP2004002344
申请日：2004-01-07
申请人： Shin Meiwa Ind Co Ltd , 新明和工業株式会社
发明人： TAKAHASHI MASAYUKI , TOMOSAWA AKIRA
IPC分类号： F25B7/00
摘要： PROBLEM TO BE SOLVED: To provide an ultra-deep refrigerator R using a mixed refrigerant obtained by mixing two or more kinds of refrigerants different in boiling point, securing a flow rate of a liquid refrigerant to a super cooling device 31 and increasing the cooling efficiency of a cryocoil 32.
SOLUTION: In a main refrigerant circuit 38 provided with the cryocoil 32 and a capillary tube 29 and a sub-refrigerant circuit 39, the upstream end of which is diverged and connected to the upstream end of the main refrigerant circuit 38 and provided with a capillary tube 28, the height of the sub-refrigerant circuit 39 is set lower than the height of the main refrigerant circuit 39. The flow rate of the refrigerant put in the gas-liquid mixed state discharged from the primary side 31a of the super cooling device 31 to flow into the sub-refrigerant circuit 39 is made larger than the flow rate to the main refrigerant circuit 39, whereby the flow rate of the liquid refrigerant to the sub-refrigerant circuit 39 is increased more than that to the main refrigerant circuit 38.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种使用通过混合两种或更多种不同沸点的制冷剂获得的混合制冷剂的超深冷藏库R，将液体制冷剂的流量确保到超级冷却装置31并增加冷冻机32的冷却效率。解决方案：在设置有冷冻机32的主制冷剂回路38和毛细管29以及副制冷剂回路39中，其上游端分散并连接到上游端在主制冷剂回路38中设置有毛细管28，副制冷剂回路39的高度被设定为低于主制冷剂回路39的高度。制成气液混合状态的制冷剂的流量从超级冷却装置31的一次侧31a排出的流入副制冷剂回路39的流量比通过主制冷剂回路39的流量大，制冷剂回路39比主制冷剂回路38增加得更多。（C）2005年，JPO＆NCIPI

3. 发明专利

JP2003322433A Refrigerating system 有权
标题翻译：制冷系统
公开(公告)号：JP2003322433A
公开(公告)日：2003-11-14
申请号：JP2002128393
申请日：2002-04-30
申请人： Shin Meiwa Ind Co Ltd , 新明和工業株式会社
发明人： TAKAHASHI MASAYUKI , TOMOSAWA AKIRA , ONISHI YASUHIRO
IPC分类号： F25B1/00 , F25B6/04 , F25B41/00
摘要： PROBLEM TO BE SOLVED: To restrain a refrigerating capacity difference between both coolers by easily equalizing a mass flow rate of a liquid refrigerant flowing to both branch parts when supplying the liquid refrigerant having a boiling point of the lowest temperature to the coolers by branching off into a plurality in a cryogenic refrigerator having a refrigerant circuit using a non-azeotropic mixing refrigerant.
SOLUTION: An inlet pipe 36 communicates with the inlet side of a branch pipe 37, and is inclined so as to turn in the vertical lower direction toward the refrigerant flowing directional downstream side. Among the refrigerant flowing in the branch pipe 37 in a gas-liquid mixing state, the liquid refrigerant is made to flow in a state of gathering to the passage lower side by the inlet pipe 36 to equalize the mass flow rate of the liquid refrigerant after branching.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：为了通过容易地平衡流向两个分支部分的液体制冷剂在向冷却器供应具有最低温度的沸点的液体制冷剂时的质量流量，从而抑制两个冷却器之间的制冷能力差异。在具有使用非共沸混合制冷剂的制冷剂回路的低温冰箱中分支成多个。
解决方案：入口管36与分支管37的入口侧连通，并且倾斜成朝着垂直向下方向转向朝向制冷剂流向下游侧的制冷剂。在气液混合状态下在分支管37中流动的制冷剂中，液体制冷剂通过入口管36在向下方通过的状态下流动，使得液体制冷剂的质量流量平衡后，分枝。版权所有（C）2004，JPO

4. 发明专利

JP2005207637A Extremely low temperature refrigerating device 审中-公开
标题翻译：极低温制冷装置
公开(公告)号：JP2005207637A
公开(公告)日：2005-08-04
申请号：JP2004012692
申请日：2004-01-21
申请人： Shin Meiwa Ind Co Ltd , 新明和工業株式会社
发明人： TAKAHASHI MASAYUKI , TOMOSAWA AKIRA
IPC分类号： F25B7/00 , F25B9/00 , F25B43/02 , F25B47/02
摘要： PROBLEM TO BE SOLVED: To provide an extremely low temperature refrigerating device with a defrost circuit, preventing the supply of lubricating oil to a cooler by reliably removing the lubricating oil without impairing the cooling efficiency thereof.
SOLUTION: In the extremely low temperature refrigerating device, a first oil separator 15 is connected to a discharge portion of a compressor 20 and the first oil separator 15 is connected to an inlet side of a cryo-coil 52 via the defrost circuit 60. To the defrost circuit 60, a second oil separator 16 is connected for separating from gas refrigerant the lubricating oil which is not completely removed by the first oil separator 15.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供具有除霜回路的极低温制冷装置，通过可靠地除去润滑油而不损害其冷却效率，防止向冷却器供给润滑油。解决方案：在极低温制冷装置中，第一油分离器15连接到压缩机20的排出部分，第一油分离器15通过除霜回路连接到冷冻线圈52的入口侧在除霜回路60中，连接有第二油分离器16，用于与气体制冷剂分离未被第一油分离器15完全除去的润滑油。（C）2005，JPO＆NCIPI

5. 发明专利

JP2004002492A Refrigerant compsition and ultra-deep freezer 审中-公开
公开(公告)号：JP2004002492A
公开(公告)日：2004-01-08
申请号：JP2002106351
申请日：2002-04-09
申请人： Shin Meiwa Ind Co Ltd , 新明和工業株式会社
发明人： ONISHI YASUHIRO , TOMOSAWA AKIRA , IKEDA MASAHIKO , TAKAHASHI MASAYUKI
IPC分类号： F25B1/00 , C09K5/04 , F25B7/00
摘要： PROBLEM TO BE SOLVED: To provide a refrigerant composition without possibility of damaging a ozone layer and an ultra-deep freezer using the refrigerant composition. SOLUTION: A mixed refrigerant includes a first component comprising any of 1, 1, 1, 3, 3-pentafluoropropropane (HFC245fa) or 1, 1, 1, 3, 3-pentafluorobutane (HFC365mfc), a second component comprising any of 1, 1, 1, 2-tetrafluoroethane (HFC134a), 1, 1, 1-trifluoroethane (HFC143a), or 1, 1, 1, 2, 2-pentafluoroethane (HFC125), a third component comprising trifluoromethane (HFC23), a fourth component comprising perfluoromethane (HFC14), a fifth component comprising Krypton (Kr), and a sixth component comprising Argon (Ar). COPYRIGHT: (C)2004,JPO

6. 发明专利

JP2003042076A Synchronous rotation type scroll fluid machine 审中-公开
标题翻译：同步旋转式滚动流体机
公开(公告)号：JP2003042076A
公开(公告)日：2003-02-13
申请号：JP2001233371
申请日：2001-08-01
申请人： Shin Meiwa Ind Co Ltd , 新明和工業株式会社
发明人： HASHIMOTO MASATOSHI , HATASAKI YOSHIYUKI , TOMOSAWA AKIRA , ENOMOTO JUNYA
IPC分类号： F04C29/00 , F04C18/02
CPC分类号： F04C18/023
摘要： PROBLEM TO BE SOLVED: To provide a synchronous rotation type scroll fluid machine of high reliability with long life, which does not causes damage to a bearing even when a clamp pin runs-out sideways.
SOLUTION: One end of a crank pin 17 connecting respective outer peripheral parts of a driving scroll 11 and a driven scroll 12 is rotatably supported to the driving scroll 11 by an angular contact ball bearing 18, and the other end of the crank pin 17 is rotatably supported to the driven scroll 12 by a radial ball bearing 19.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种寿命长的高可靠性的同步旋转式涡旋流体机械，即使当夹紧销向侧面弯曲时也不会对轴承造成损坏。解决方案：连接驱动涡旋件11和从动涡旋件12的各个外围部分的曲柄销17的一端通过角接触球轴承18可旋转地支撑在驱动涡旋件11上，而曲柄销17的另一端是通过径向球轴承19可旋转地支撑在从动涡旋盘12上。

7. 发明专利

JP2002001152A GARBAGE TREATMENT DEVICE 失效
公开(公告)号：JP2002001152A
公开(公告)日：2002-01-08
申请号：JP2000188953
申请日：2000-06-23
申请人： SHIN MEIWA IND CO LTD
发明人： NODA KATSUNORI , TOMOSAWA AKIRA , YAMAMOTO KANJI , TAKAKUBO KENTARO
IPC分类号： B02C18/00 , E03C1/266 , B02C18/42
摘要： PROBLEM TO BE SOLVED: To provide a garbage treatment device which is capable of easily adjusting the supply water flow rate to a pulverizing chamber so as to attain an adequate value and is simple in constitution. SOLUTION: This garbage treatment device is constituted by freely attachably and detachably providing a garbage feeding port 3 for feeding garbage into a pulverizing chamber 11 with a cap 10 having a water flow path 15. This water flow path 15 has a vertical hole part 15a opened atop the cap 10 at a size at which its inside is substantially visually recognizable. The water flow path is so formed that the supply water flow rate from the water flow path 15 to the pulverizing chamber 11 attains the adequate value when the level of the water poured into the water flow path 15 exists at the top end 15c (or near the same) of the vertical hole part 15.

8. 发明专利

JP2001121019A GARBAGE TREATMENT APPARATUS 失效
公开(公告)号：JP2001121019A
公开(公告)日：2001-05-08
申请号：JP30117799
申请日：1999-10-22
申请人： SHIN MEIWA IND CO LTD
发明人： NODA KATSUNORI , YAMAMOTO KANJI , TOMOSAWA AKIRA , TAKAKUBO KENTARO
IPC分类号： B02C18/00 , B02C13/18 , B02C18/40
摘要： PROBLEM TO BE SOLVED: To provide a garbage treatment apparatus capable of reducing the particle size of ground garbage without bringing about the lowering of grinding efficiency and capable of preventing the locking of a rotary plate. SOLUTION: In a garbage treatment apparatus, swing hammers 5, 7 are provided on the upper and rear surfaces of the rotary plate 1 rotationally driven by a motor 3 and garbage is ground by the swing hammers 5, 7 and the grooves 9a of the fixed blade 9 provided corresponding to the swing hammers 5, 7.

9. 发明专利

JP2001029836A DEVICE FOR TREATING KITCHEN WASTE 失效
公开(公告)号：JP2001029836A
公开(公告)日：2001-02-06
申请号：JP20600899
申请日：1999-07-21
申请人： SHIN MEIWA IND CO LTD
发明人： TAKAKUBO KENTARO , TOMOSAWA AKIRA , NODA KATSUNORI , SATONAKA YUKIO , KUNIHARA TAKASHI , YAMAMOTO KANJI , ARAKAWA YOSHIKI
IPC分类号： B02C18/00 , B02C23/04 , E03C1/266 , B02C18/42
摘要： PROBLEM TO BE SOLVED: To make the safety of the subject device greater by effectively preventing a malfunction owing to magnetic force. SOLUTION: This device is provided with a crushing part 11 below a kitchen waste charging port 6, and in the middle of a passage of the port 6, an attaching stage part 8 to which a splash guard 9 having a charging part and for preventing the kitchen waste crushed in the part 11 from jumping out is freely detachably attached and a non-magnetic force sensing type guard detecting switch 15 for detecting the attached state of the guard 9 are provided. A cover body 17 with a magnetic body 19 buried is freely attachably/detachably provided at the upper end part of the port 6 and a lead switch 20 is also provided at the upper end part of the port 6 for sensing the magnetic force of the body 19 in the attached state of the body 17. A drive control part 16 is provided for driving the part 11 by detecting both the attached states of the guard 9 by the switch 15 and of the body 17 by the switch 20.

10. 发明专利

JPH0238562A SHUTTER MECHANISM AND VACUUM VAPOR DEPOSITION APPARATUS HAVING THE SAME 失效
公开(公告)号：JPH0238562A
公开(公告)日：1990-02-07
申请号：JP18749788
申请日：1988-07-27
申请人： SHIN MEIWA IND CO LTD
发明人： TOMOSAWA AKIRA
IPC分类号： C23C14/24 , C23C14/22
摘要： PURPOSE:To improve the feed precision of evaporation material by forming an arm of a shutter for shutting off the trajectory of an evaporation material in a vacuum vapor deposition apparatus by the use of a spring material, displacing the shutter arm by means of an electromagnet, etc., and displacing the shutter arm to the position to shut off the trajectory of the evaporation material by means of the amount of vapor deposition onto a substrate by means of spring force. CONSTITUTION:At the time of vapor-depositing Ag vapor from an evaporation source 3 onto the surface of rock crystal 6 as a work to be treated in a vacuum chamber 2 of a vacuum vapor deposition apparatus, a shutter arm 15 made of magnetic spring material fitted with a shutter blade 16 shutting off the trajectory P of the Ag vapor at one end is fixed to a base 11 at the opposite end. Before vapor deposition is initiated, the spring force of the arm 15 is controlled by means of a bolt 18 of a stopper 14 so that the shutter blade 16 comes to the position to shut off the trajectory P of the Ag vapor. When vapor deposition is initiated, an electromagnet 13 is energized to attract the shutter arm 15 and the Ag vapor trajectory P shut off by means of the shutter blade 16 is opened. When required amounts of Ag are vapor-deposited on the rock crystal 6 and the frequency of vibration reaches the prescribed number, the above is detected and the electric current for the electromagnet 13 is turned off to return the shutter arm 15 by means of its spring force to the position where the Ag vapor trajectory P is shut off by the blade 16, by which Ag can be vapor-deposited on the rock crystal 6 with high precision.

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