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1. 发明申请

US20130063523A1 LIQUID RECORDING HEAD AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：液体记录头及其制造方法
公开(公告)号：US20130063523A1
公开(公告)日：2013-03-14
申请号：US13596634
申请日：2012-08-28
申请人： Shimpei Otaka , Takayuki Ono , Masao Furukawa , Jun Hinami , Takeshi Shibata , Ryo Shimamura , Takanori Enomoto , Tomohiro Takahashi , Masashi Ishikawa
发明人： Shimpei Otaka , Takayuki Ono , Masao Furukawa , Jun Hinami , Takeshi Shibata , Ryo Shimamura , Takanori Enomoto , Tomohiro Takahashi , Masashi Ishikawa
IPC分类号： B41J2/135 , B44C1/22
CPC分类号： B41J2/14024 , B41J2/1623
摘要： Provided is a liquid recording head in which a protective layer having resistance to liquid and an adhesiveness improving film are disposed on a second surface opposite to a first surface of a silicon substrate. The first surface and the second surface have a plane direction. The protective layer is disposed in a peripheral region of an opening of a liquid supply port. A liquid ejection chip is bonded to a head substrate with an adhesive so that the liquid supply port communicates to a liquid introduction port on a side of the second surface of the silicon substrate.
摘要翻译：提供了一种液体记录头，其中在与硅衬底的第一表面相对的第二表面上设置有耐液体保护层和粘合性改进膜。第一表面和第二表面具有平面方向。保护层设置在液体供给口的开口的周边区域。液体喷射芯片用粘合剂粘合到头基板上，使得液体供给口与硅基板的第二表面侧的液体导入口连通。

2. 发明授权

US08714711B2 Liquid recording head and method of manufacturing the same 有权
标题翻译：液体记录头及其制造方法
公开(公告)号：US08714711B2
公开(公告)日：2014-05-06
申请号：US13596634
申请日：2012-08-28
申请人： Shimpei Otaka , Takayuki Ono , Masao Furukawa , Jun Hinami , Takeshi Shibata , Ryo Shimamura , Takanori Enomoto , Tomohiro Takahashi , Masashi Ishikawa
发明人： Shimpei Otaka , Takayuki Ono , Masao Furukawa , Jun Hinami , Takeshi Shibata , Ryo Shimamura , Takanori Enomoto , Tomohiro Takahashi , Masashi Ishikawa
IPC分类号： B41J2/05 , B41J2/14 , B41J2/16
CPC分类号： B41J2/14024 , B41J2/1623
摘要： A liquid recording head includes a protective layer having resistance to liquid and an adhesiveness improving film disposed on a second surface of a silicon substrate, opposite to a first surface. The first surface and the second surface have a plane direction (100). The protective layer is disposed in a peripheral region of an opening of a liquid supply port. A liquid ejection chip is bonded to a head substrate with an adhesive so that the liquid supply port communicates with a liquid introduction port on a side of the second surface of the silicon substrate.
摘要翻译：液体记录头包括具有耐液体的保护层和设置在硅基板的与第一表面相对的第二表面上的粘合性改进膜。第一表面和第二表面具有平面方向（100）。保护层设置在液体供给口的开口的周边区域。液体喷射芯片用粘合剂粘合到头基板上，使得液体供给口与硅基板的第二表面侧的液体导入口连通。

3. 发明申请

US20110279550A1 LIQUID JET HEAD AND METHOD FOR MANUFACTURING LIQUID JET HEAD 有权
标题翻译：液体喷射头和制造液体喷射头的方法
公开(公告)号：US20110279550A1
公开(公告)日：2011-11-17
申请号：US13106276
申请日：2011-05-12
申请人： Shimpei Otaka , Takayuki Ono
发明人： Shimpei Otaka , Takayuki Ono
IPC分类号： B41J2/04
CPC分类号： B41J2/155 , B41J2002/14362 , B41J2002/14491 , B41J2202/20 , Y10T29/49401
摘要： A liquid discharge head includes a recording element substrate including an energy generating element, a wiring substrate including wiring, a support substrate for supporting the recording element substrate and the wiring substrate so that a side end portion of the recording element substrate and a side end portion of the wiring substrate are adjacent to each other, and a sealing member, wherein the side end portion of the wiring substrate has a step portion, a distance between a second portion of the step portion on the side opposite to the support substrate and the side end portion of the recording element substrate is larger than a distance between a first portion of the step portion on the side of the support substrate and the side end portion of the recording element substrate, and a part of the wiring is formed in the first portion.
摘要翻译：液体排出头包括具有能量产生元件的记录元件基板，包括布线的布线基板，用于支撑记录元件基板的支撑基板和布线基板，使得记录元件基板的侧端部和侧端部布线基板的彼此相邻的距离，以及密封构件，其中，所述布线基板的侧端部具有台阶部，所述台阶部的与所述支撑基板相反的一侧的第二部分与所述侧面记录元件基板的端部大于支撑基板一侧的台阶部的第一部分与记录元件基板的侧端部之间的距离，并且一部分布线形成在第一部分中。

4. 发明授权

US08342655B2 Liquid jet head and method for manufacturing liquid jet head 有权
标题翻译：液体喷头和液体喷头的制造方法
公开(公告)号：US08342655B2
公开(公告)日：2013-01-01
申请号：US13106276
申请日：2011-05-12
申请人： Shimpei Otaka , Takayuki Ono
发明人： Shimpei Otaka , Takayuki Ono
IPC分类号： B41J2/14 , B41J2/16
CPC分类号： B41J2/155 , B41J2002/14362 , B41J2002/14491 , B41J2202/20 , Y10T29/49401
摘要： A liquid discharge head includes a recording element substrate including an energy generating element, a wiring substrate including wiring, a support substrate for supporting the recording element substrate and the wiring substrate so that a side end portion of the recording element substrate and a side end portion of the wiring substrate are adjacent to each other, and a sealing member, wherein the side end portion of the wiring substrate has a step portion, a distance between a second portion of the step portion on the side opposite to the support substrate and the side end portion of the recording element substrate is larger than a distance between a first portion of the step portion on the side of the support substrate and the side end portion of the recording element substrate, and a part of the wiring is formed in the first portion.
摘要翻译：液体排出头包括具有能量产生元件的记录元件基板，包括布线的布线基板，用于支撑记录元件基板的支撑基板和布线基板，使得记录元件基板的侧端部和侧端部布线基板的彼此相邻的距离，以及密封构件，其中，所述布线基板的侧端部具有台阶部，所述台阶部的与所述支撑基板相反的一侧的第二部分与所述侧面记录元件基板的端部大于支撑基板一侧的台阶部的第一部分与记录元件基板的侧端部之间的距离，并且一部分布线形成在第一部分中。

5. 发明授权

US08613862B2 Method for manufacturing liquid discharge head substrate 有权
标题翻译：液体排出头基板的制造方法
公开(公告)号：US08613862B2
公开(公告)日：2013-12-24
申请号：US12203612
申请日：2008-09-03
申请人： Kazuhiro Asai , Hirokazu Komuro , Satoshi Ibe , Takuya Hatsui , Shimpei Otaka , Hiroto Komiyama , Keisuke Kishimoto
发明人： Kazuhiro Asai , Hirokazu Komuro , Satoshi Ibe , Takuya Hatsui , Shimpei Otaka , Hiroto Komiyama , Keisuke Kishimoto
IPC分类号： G01D15/00 , G11B5/127
CPC分类号： B41J2/1603 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , B41J2/1635 , B41J2/1639 , B41J2/1645
摘要： A manufacturing method, for a liquid discharge head substrate that includes a silicon substrate in which a liquid supply port is formed, includes the steps of: preparing the silicon substrate, on one face of which a mask layer, in which an opening has been formed, is deposited; forming a first recessed portion in the silicon substrate, so that the recessed portion is extended through the opening from the one face of the silicon substrate to the other, reverse face of the silicon substrate; forming a second recessed portion by performing wet etching for the substrate, via the first recessed portion, using the mask layer; and performing dry etching for the silicon substrate in a direction from the second recessed portion to the other face.
摘要翻译：一种液体排出头基板的制造方法，其特征在于，具备形成有液体供给口的硅基板的液体排出头基板的制造方法，其特征在于，包括以下工序：制作所述硅基板，在其一面上形成有开口的掩模层，存放在所述硅衬底中形成第一凹部，使得所述凹部从所述硅衬底的一个面向所述开口延伸到所述硅衬底的另一面; 通过使用掩模层经由第一凹部对基板进行湿法蚀刻来形成第二凹部; 并且在从第二凹部到另一面的方向上对硅衬底进行干蚀刻。

6. 发明授权

US08210650B2 Liquid discharge head 有权
标题翻译：排液头
公开(公告)号：US08210650B2
公开(公告)日：2012-07-03
申请号：US12128327
申请日：2008-05-28
申请人： Kazunari Ishizuka , Shimpei Otaka , Isao Imamura
发明人： Kazunari Ishizuka , Shimpei Otaka , Isao Imamura
IPC分类号： B41J2/16
CPC分类号： B41J2/162 , B41J2/1433 , B41J2/1628 , B41J2/1631 , B41J2/164
摘要： A liquid discharge head comprises a discharge port forming member having formed therein a discharge port arranged corresponding to an energy generating element which generates energy to eject a liquid and a flow path forming member for forming a flow path to supply ink to the discharge port. At least one of the discharge port forming member and the flow path forming member is made of a cured material of a composition containing an epoxy resin and a phenol resin having a higher oxygen equivalent than that of the epoxy resin.
摘要翻译：液体排出头包括排出口形成部件，其中形成有排出口，该排出口对应于产生能量以排出液体的能量产生元件，以及流路形成部件，用于形成用于向排出口供给墨水的流路。排出口形成构件和流路形成构件中的至少一个由含有环氧树脂和具有比环氧树脂的氧当量高的酚醛树脂的组合物的固化材料制成。

7. 发明授权

US07687552B2 Resin composition, resin cured product, and liquid discharge head 失效
标题翻译：树脂组合物，树脂固化物和排液头
公开(公告)号：US07687552B2
公开(公告)日：2010-03-30
申请号：US12612659
申请日：2009-11-04
申请人： Shimpei Otaka , Kazunari Ishizuka , Isamu Horiuchi , Isao Imamura
发明人： Shimpei Otaka , Kazunari Ishizuka , Isamu Horiuchi , Isao Imamura
IPC分类号： C08F2/50 , B41J2/05
CPC分类号： C08F2/50 , B41J2/1603 , B41J2/1626 , B41J2/1631 , B41J2/1639 , B41J2/1645 , C08G59/3218 , C08G59/687 , Y10T428/31504 , Y10T428/31511 , Y10T428/31515
摘要： An epoxy resin composition, including: an epoxy resin (A) represented by Formula (1); an epoxy resin (B) having an epoxy equivalent of 220 or less and having twice or more epoxy groups in a molecule than epoxy groups of the epoxy resin (A); and a photocationic polymerization initiator (C), in which: the epoxy resins (A) and (B) constitute main components; and a weight of the epoxy resin (A) is 40% or more and a weight of the epoxy resin (B) is 30% or more with respect to a total weight of the epoxy resins (A) and (B): where: R represents a hydrogen atom, a methyl group, an ethyl group, a propyl group, or a t-butyl group; represents an integer of 0 or more and 4 or less; and m represents an integer of 1 or more and 3 or less.
摘要翻译：环氧树脂组合物，包括：由式（1）表示的环氧树脂（A）; 环氧当量为220以下，环氧树脂（A）的环氧基分子中环氧基数为2以上的环氧树脂（B）。和光阳离子聚合引发剂（C），其中：环氧树脂（A）和（B）构成主要组分; 环氧树脂（A）的重量为40％以上，环氧树脂（B）的重量相对于环氧树脂（A）和（B）的总重量为30％以上：其中： R表示氢原子，甲基，乙基，丙基或叔丁基; 表示0以上且4以下的整数， m表示1以上3以下的整数。

8. 发明申请

US20070142491A1 Resin composition, resin cured product, and liquid discharge head 失效
标题翻译：树脂组合物，树脂固化物和排液头
公开(公告)号：US20070142491A1
公开(公告)日：2007-06-21
申请号：US11600021
申请日：2006-11-16
申请人： Shimpei Otaka , Kazunari Ishizuka , Isamu Horiuchi , Isao Imamura
发明人： Shimpei Otaka , Kazunari Ishizuka , Isamu Horiuchi , Isao Imamura
IPC分类号： C08G59/68
CPC分类号： C08F2/50 , B41J2/1603 , B41J2/1626 , B41J2/1631 , B41J2/1639 , B41J2/1645 , C08G59/3218 , C08G59/687 , Y10T428/31504 , Y10T428/31511 , Y10T428/31515
摘要： An epoxy resin composition, including: an epoxy resin (A) represented by Formula (1); an epoxy resin (B) having an epoxy equivalent of 220 or less and having twice or more epoxy groups in a molecule than epoxy groups of the epoxy resin (A); and a photocationic polymerization initiator (C), in which: the epoxy resins (A) and (B) constitute main components; and a weight of the epoxy resin (A) is 40% or more and a weight of the epoxy resin (B) is 30% or more with respect to a total weight of the epoxy resins (A) and (B): where: R represents a hydrogen atom, a methyl group, an ethyl group, a propyl group, or a t-butyl group; n represents an integer of 0 or more and 4 or less; and m represents an integer of 1 or more and 3 or less.
摘要翻译：环氧树脂组合物，包括：由式（1）表示的环氧树脂（A）; 环氧当量为220以下，环氧树脂（A）的环氧基分子中环氧基数为2以上的环氧树脂（B）。和光阳离子聚合引发剂（C），其中：环氧树脂（A）和（B）构成主要组分; 环氧树脂（A）的重量为40％以上，环氧树脂（B）的重量相对于环氧树脂（A）和（B）的总重量为30％以上：其中： R表示氢原子，甲基，乙基，丙基或叔丁基; n表示0以上且4以下的整数， m表示1以上3以下的整数。

9. 发明授权

US08597529B2 Method for processing substrate and method for producing liquid ejection head and substrate for liquid ejection head 有权
标题翻译：用于处理基板的方法和用于制造液体喷射头的液体喷射头和基板的方法
公开(公告)号：US08597529B2
公开(公告)日：2013-12-03
申请号：US12484937
申请日：2009-06-15
申请人： Keisuke Kishimoto , Satoshi Ibe , Takuya Hatsui , Shimpei Otaka , Hiroto Komiyama , Hiroyuki Morimoto , Masahiko Kubota , Toshiyasu Sakai
发明人： Keisuke Kishimoto , Satoshi Ibe , Takuya Hatsui , Shimpei Otaka , Hiroto Komiyama , Hiroyuki Morimoto , Masahiko Kubota , Toshiyasu Sakai
IPC分类号： G01D15/00
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1634 , B41J2/1635 , B41J2/1639
摘要： A method for processing a substrate includes preparing a substrate having a first layer on a first surface side thereof, the first layer having a material capable of suppressing transmission of laser light, processing the substrate with laser light from a second surface that is opposite the first surface of the substrate toward the first surface of the substrate, and allowing the laser light to reach the first layer to form a hole in the substrate, and performing etching of the substrate from the second surface through the hole.
摘要翻译：一种处理衬底的方法包括制备在其第一表面侧上具有第一层的衬底，所述第一层具有能够抑制激光透射的材料，用来自与第一层相反的第二表面的激光来处理衬底基板的表面朝向基板的第一表面，并且允许激光到达第一层以在基板中形成孔，并且通过该孔从第二表面进行基板的蚀刻。

10. 发明授权

US08114305B2 Method of manufacturing substrate for liquid discharge head 有权
标题翻译：液体排出头用基板的制造方法
公开(公告)号：US08114305B2
公开(公告)日：2012-02-14
申请号：US12203651
申请日：2008-09-03
申请人： Hiroto Komiyama , Hirokazu Komuro , Satoshi Ibe , Takuya Hatsui , Keisuke Kishimoto , Kazuhiro Asai , Shimpei Otaka
发明人： Hiroto Komiyama , Hirokazu Komuro , Satoshi Ibe , Takuya Hatsui , Keisuke Kishimoto , Kazuhiro Asai , Shimpei Otaka
IPC分类号： G01D15/00 , G11B5/127
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , B41J2/1639
摘要： A method of manufacturing a silicon substrate for a liquid discharge head with a liquid supply opening formed therein includes: forming one processed portion by laser processing on the substrate from one surface of the substrate; expanding the one processed portion to form a recess portion by performing laser processing at a position which overlaps a part of the one processed portion and does not overlap another part of the one processed portion; and etching from the one surface the substrate with the recess portion formed therein to form the liquid supply opening.
摘要翻译：制造其中形成有液体供应开口的液体排出头用硅基板的方法包括：通过激光加工在基板的一个表面上形成一个处理部分; 通过在与所述一个处理部分的一部分重叠的位置处进行激光处理并且不与所述一个处理部分的另一部分重叠来扩展所述一个处理部分以形成凹部; 并且从一个表面蚀刻具有形成在其中的凹部的基板以形成液体供应开口。

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