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    • 3. 发明申请
    • Three-dimensional display
    • 三维显示
    • US20070188517A1
    • 2007-08-16
    • US10594032
    • 2005-03-24
    • Yasuhiro Takaki
    • Yasuhiro Takaki
    • G09G5/00
    • G02B27/2214H04N13/305H04N13/317
    • An object of the present invention is to eliminate color non-uniformity and intensity non-uniformity on a three-dimensional image. The present invention provides a three-dimensional display comprising: a two-dimensional display, which comprises a plurality of color subpixels arranged in rows extending in a horizontal direction and in columns extending in a vertical direction which is substantially perpendicular to the horizontal direction, the color subpixels of red, green and blue being arranged periodically in the rows and the color subpixels of the same color being arranged in the columns; and a lenticular sheet provided on the two-dimensional display and having a plurality of cylindrical lenses through which the color subpixels are viewed and which extend in parallel with one another, the central axis of each cylindrical lens being inclined at an angle of θ to the column of the two-dimensional display, wherein, when a pitch of the color subpixels in the horizontal direction is px, a pitch of the color subpixels in the vertical direction is py, and a color subpixel group constituting one three-dimensional pixel is constituted by 3M×N number of color subpixels where 3M is the number of color subpixels in each row of one of the cylindrical lenses and N is the number of color subpixels in each column of one of the cylindrical lenses, a relationship, θ=tan−1(3px/NPy), is satisfied.
    • 本发明的目的是消除三维图像上的颜色不均匀性和强度不均匀性。 本发明提供一种三维显示器,包括:二维显示器,其包括排列成沿水平方向延伸的行的多个彩色子像素和沿垂直于水平方向的垂直方向延伸的列, 红色,绿色和蓝色的彩色子像素在行中周期性排列,并且相同颜色的彩色子像素排列在列中; 以及设置在二维显示器上并具有多个柱面透镜的双凸透镜片,通过该多个柱面透镜观察着彩色子像素并且彼此平行地延伸,每个柱面透镜的中心轴线以相对于 列,其中,当水平方向上的彩色子像素的间距为p×x 时,垂直方向上的彩色子像素的间距为p < SUB>,并且构成一个三维像素的彩色子像素组由3M×N个彩色子像素构成,其中3M是一个柱面透镜的每行中的彩色子像素的数量,N是每列中的彩色子像素的数量 的一个圆柱透镜,满足θ=tanθ-1(3p×x / NP×Y)的关系。
    • 5. 发明授权
    • Rinse treatment method and development process method
    • 冲洗处理方法和开发工艺方法
    • US07968278B2
    • 2011-06-28
    • US11578055
    • 2005-03-02
    • Yasuhiro TakakiOsamu MiyaharaKeiichi TanakaShinya WakamizuTakashi Terada
    • Yasuhiro TakakiOsamu MiyaharaKeiichi TanakaShinya WakamizuTakashi Terada
    • G03F7/26G03F7/30
    • H01L21/67051G03F7/3021
    • A rinsing method for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon, includes a step (STEP 5) of throwing off a developing solution from the substrate after development; a step (STEP 6) of supplying a water-based cleaning liquid onto the substrate; a step (STEP 7) of supplying a surfactant-containing rinsing liquid onto the substrate to replace liquid remaining on the substrate with the surfactant-containing rinsing liquid; and a step (STEP 8) of rotating the substrate to expand and throw off the surfactant-containing rinsing liquid on the substrate. STEP 8 is arranged to supply the surfactant-containing rinsing liquid for a supply time of 5 seconds or less. STEP 9 is arranged to include a first period with a lower rotation number and a second period with a higher rotation number, and to set the rotation number of the substrate in the first period to be more than 300 rpm and less than 1,000 rpm.
    • 在对其上设置的曝光图案进行显影处理之后,在基板上进行漂洗处理的漂洗方法包括在显影后从显影基板抛出显影液的工序(步骤5) 向基板供给水性清洗液的工序(工序6) 将含表面活性剂的冲洗液供给到基板上以用含表面活性剂的冲洗液取代残留在基板上的液体的步骤(STEP7) 以及使基板旋转以使基板上含表面活性剂的冲洗液体膨胀和脱落的工序(步骤8)。 步骤8被布置成供给含有表面活性剂的冲洗液,供给时间为5秒以下。 步骤9被布置成包括具有较低转数的第一周期和具有较高转数的第二周期,并且将第一周期中的基板的转数设定为大于300rpm且小于1,000rpm。
    • 6. 发明授权
    • Wavefront aberration correcting device and optical pickup equipped with the same
    • 波前像差校正装置和配备其的光学拾取器
    • US07236444B2
    • 2007-06-26
    • US10527053
    • 2004-03-10
    • Yasuhiro TakakiEi-ichiro NishiharaNobuyuki Hashimoto
    • Yasuhiro TakakiEi-ichiro NishiharaNobuyuki Hashimoto
    • G11B7/00
    • G11B7/13927G02F1/13G02F2001/133776G02F2201/38G02F2203/18G11B7/1369
    • An object of the present invention is to provide a wavefront aberration correcting device comprising a liquid crystal device that maximizes transmittance and minimizes light transmittance fluctuations even when the liquid crystal is driven by voltage. Disclosed is a wavefront aberration correcting device for correcting a wavefront aberration of light generated in an optical path of an optical system for irradiating light onto a recording medium or guiding the reflected light reflected by the abovementioned recording medium is characterized in that it comprises a pair of opposing transparent electrode layers provided in the abovementioned optical path; and a liquid crystal sandwiched between the abovementioned transparent electrode layers, for generating phase change in passing light due to voltage applied to the abovementioned transparent electrode layers, the abovementioned transparent electrode layer is arranged on an antireflective body comprising a substrate, and a finestructure formed on a substrate and having a concave-convex structure.
    • 本发明的目的是提供一种波面像差校正装置,其包括使得透射率最大化并使光透射率波动最小化的液晶装置,即使当液晶被电压驱动时。 公开了一种用于校正在光学系统的光路中产生的用于将光照射到记录介质上或引导由上述记录介质反射的反射光的波前像差的波前像差校正装置,其特征在于,它包括一对 设置在上述光路中的相对的透明电极层; 以及夹在上述透明电极层之间的液晶,由于施加到上述透明电极层上的电压而产生通过光的相变,上述透明电极层设置在包括基板的抗反射体上,并且形成在 基板并具有凹凸结构。
    • 7. 发明申请
    • Rinse Treatment Method and Development Process Method
    • 冲洗处理方法和开发过程方法
    • US20080274433A1
    • 2008-11-06
    • US11578055
    • 2005-03-02
    • Yasuhiro TakakiOsamu MiyaharaKeiichi TanakaShinya WakamizuTakashi Terada
    • Yasuhiro TakakiOsamu MiyaharaKeiichi TanakaShinya WakamizuTakashi Terada
    • G03F7/20B08B3/10
    • H01L21/67051G03F7/3021
    • A rinsing method for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon, includes a step (STEP 5) of throwing off a developing solution from the substrate after development; a step (STEP 6) of supplying a water-based cleaning liquid onto the substrate; a step (STEP 7) of supplying a surfactant-containing rinsing liquid onto the substrate to replace liquid remaining on the substrate with the surfactant-containing rinsing liquid; and a step (STEP 8) of rotating the substrate to expand and throw off the surfactant-containing rinsing liquid on the substrate. STEP 8 is arranged to supply the surfactant-containing rinsing liquid for a supply time of 5 seconds or less. STEP 9 is arranged to include a first period with a lower rotation number and a second period with a higher rotation number, and to set the rotation number of the substrate in the first period to be more than 300 rpm and less than 1,000 rpm.
    • 在对其上设置的曝光图案进行显影处理之后,在基板上进行漂洗处理的漂洗方法包括在显影后从显影基板抛出显影液的工序(步骤5) 向基板供给水性清洗液的工序(工序6) 将含表面活性剂的冲洗液供给到基板上以用含表面活性剂的冲洗液取代残留在基板上的液体的工序(STEP7) 以及使基板旋转以使基板上含表面活性剂的冲洗液体膨胀和脱落的工序(步骤8)。 步骤8被布置成供给含有表面活性剂的冲洗液,供给时间为5秒以下。 步骤9被布置成包括具有较低转数的第一周期和具有较高转数的第二周期,并且将第一周期中的基板的转数设定为大于300rpm且小于1,000rpm。
    • 8. 发明申请
    • Three-dimensional display method and device therefor
    • 三维显示方法及其设备
    • US20060227418A1
    • 2006-10-12
    • US11449809
    • 2006-06-09
    • Yasuhiro Takaki
    • Yasuhiro Takaki
    • G02B27/22
    • H04N13/351H04N13/305H04N13/31H04N13/32
    • A three-dimensional display method and a device therefor are provided in which a number of images can be displayed in the horizontal directions while image skips can be eliminated by providing overlaps of display angular ranges between adjacent images having horizontal display directions. A number of images are displayed in horizontal and vertical directions so that the display directions do not agree with each other, and by expanding vertical display angular ranges of entire images with a vertical-direction diffusion plate (17), a vertical display angular range common to the entire images is generated. In this common vertical display angular range, the entire images have different horizontal display directions. Thereby, a number of images can be displayed because image generating sources can be arranged also in the vertical direction in addition to the horizontal directions.
    • 提供一种三维显示方法及其装置,其中可以通过在具有水平显示方向的相邻图像之间提供重叠的显示角度范围来在水平方向上显示多个图像,同时可以消除图像跳过。 在水平和垂直方向上显示多个图像,使得显示方向彼此不一致,并且通过用垂直方向扩散板(17)扩大整个图像的垂直显示角度范围,垂直显示角度范围公共 生成整个图像。 在这个共同的垂直显示角度范围内,整个图像具有不同的水平显示方向。 因此,除了水平方向之外,也可以在垂直方向上设置图像生成源,因此可以显示多个图像。
    • 10. 发明申请
    • Pattern formation method using nanoimprinting and device for carrying out same
    • 使用纳米压印的图案形成方法和进行相同的装置
    • US20070117389A1
    • 2007-05-24
    • US10582101
    • 2004-12-07
    • Yasuhiro Takaki
    • Yasuhiro Takaki
    • C23F1/00B44C1/22H01L21/302
    • B82Y10/00B82Y40/00G03F7/0002H01L21/0271
    • An object of the present invention is to provide a pattern forming method that solves the problems associated with thermal nanoimprinting lithography. The present invention discloses a method for forming a pattern in a resist film on a substrate by using a first mold provided with concave and convex portions, comprising the steps of: (1) pressing the first mold onto the resist film to transfer the concave and convex portions of the first mold to the resist film, while heating the first mold to a predetermined temperature or after having heated the first mold to a predetermined temperature; (2) separating the first mold from the resist film; and (3) etching the resist film to expose a surface of the substrate.
    • 本发明的目的是提供一种解决与热纳米压印光刻有关的问题的图案形成方法。 本发明公开了一种通过使用设置有凹凸部的第一模具在基板上形成抗蚀剂膜的图案的方法,其特征在于,包括以下步骤:(1)将所述第一模具压在所述抗蚀剂膜上, 在将第一模具加热到预定温度或者将第一模具加热到预定温度之后,将第一模具的凸部到抗蚀剂膜, (2)将第一模具与抗蚀剂膜分离; 和(3)蚀刻抗蚀剂膜以暴露衬底的表面。