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1. 发明授权

US07626671B2 LCD device having scanning lines and common lines 有权
公开(公告)号：US07626671B2
公开(公告)日：2009-12-01
申请号：US11152422
申请日：2005-06-14
申请人： Shigeru Kimura , Hiroaki Tanaka , Akira Fujita , Kiyofumi Kudou , Takahiko Watanabe , Hiroyuki Uchida , Akitoshi Maeda
发明人： Shigeru Kimura , Hiroaki Tanaka , Akira Fujita , Kiyofumi Kudou , Takahiko Watanabe , Hiroyuki Uchida , Akitoshi Maeda
IPC分类号： G02F1/1345
CPC分类号： G02F1/134363 , G02F1/1345
摘要： An active matrix LCD device includes a TFT panel, a counter panel and liquid crystal interposed therebetween. The TFT panel includes a plurality of scanning lines and a plurality of common lines formed in one layer and extending in a row direction, and a plurality of signal lines extending in a column direction. A coupling line for coupling the common lines together is disposed outside the pixel array of the TFT panel, such as in a TCP mounted on the TFT panel and mounting thereon a driver IC for driving the scanning lines.

2. 发明申请

US20050248521A1 LCD device having scanning lines and common lines 有权
公开(公告)号：US20050248521A1
公开(公告)日：2005-11-10
申请号：US11152422
申请日：2005-06-14
申请人： Shigeru Kimura , Hiroaki Tanaka , Akira Fujita , Kiyofumi Kudou , Takahiko Watanabe , Hiroyuki Uchida , Akitoshi Maeda
发明人： Shigeru Kimura , Hiroaki Tanaka , Akira Fujita , Kiyofumi Kudou , Takahiko Watanabe , Hiroyuki Uchida , Akitoshi Maeda
IPC分类号： G02F1/1333 , G02F1/1343 , G02F1/1345 , G02F1/136 , G02F1/1368 , G09F9/00 , G09G3/36
CPC分类号： G02F1/134363 , G02F1/1345
摘要： An active matrix LCD device includes a TFT panel, a counter panel and liquid crystal interposed therebetween. The TFT panel includes a plurality of scanning lines and a plurality of common lines formed in one layer and extending in a row direction, and a plurality of signal lines extending in a column direction. A coupling line for coupling the common lines together is disposed outside the pixel array of the TFT panel, such as in a TCP mounted on the TFT panel and mounting thereon a driver IC for driving the scanning lines.

3. 发明授权

US06930741B2 LCD device having scanning lines and common lines 有权
标题翻译：具有扫描线和公共线的LCD装置
公开(公告)号：US06930741B2
公开(公告)日：2005-08-16
申请号：US09965566
申请日：2001-09-27
申请人： Shigeru Kimura , Hiroaki Tanaka , Akira Fujita , Kiyofumi Kudou , Takahiko Watanabe , Hiroyuki Uchida , Akitoshi Maeda
发明人： Shigeru Kimura , Hiroaki Tanaka , Akira Fujita , Kiyofumi Kudou , Takahiko Watanabe , Hiroyuki Uchida , Akitoshi Maeda
IPC分类号： G02F1/1333 , G02F1/1343 , G02F1/1345 , G02F1/136 , G02F1/1368 , G09F9/00
CPC分类号： G02F1/134363 , G02F1/1345
摘要： An active matrix LCD device includes a TFT panel, a counter panel and liquid crystal interposed therebetween. The TFT panel includes a plurality of scanning lines and a plurality of common lines formed in one layer and extending in a row direction, and a plurality of signal lines extending in a column direction. A coupling line for coupling the common lines together is disposed outside the pixel array of the TFT panel, such as in a TCP mounted on the TFT panel and mounting thereon a driver IC for driving the scanning lines.
摘要翻译：有源矩阵LCD装置包括TFT面板，对面板和插入其间的液晶。 TFT面板包括形成在一个层中并沿行方向延伸的多条扫描线和多条公共线，以及沿列方向延伸的多条信号线。用于将公共线连接在一起的耦合线设置在TFT面板的像素阵列的外部，诸如安装在TFT面板上的TCP中，并且安装用于驱动扫描线的驱动器IC。

4. 发明授权

US06890783B2 Active matrix substrate plate and manufacturing method therefor 失效
标题翻译：有源矩阵基板及其制造方法
公开(公告)号：US06890783B2
公开(公告)日：2005-05-10
申请号：US10242011
申请日：2002-09-12
申请人： Shigeru Kimura , Takahiko Watanabe , Tae Yoshikawa , Hiroyuki Uchida , Shusaku Kido , Shinichi Nakata , Tsutomu Hamada , Hisanobu Shimodouzono , Satoshi Doi , Toshihiko Harano , Akitoshi Maeda , Satoshi Ihida , Hiroaki Tanaka , Takasuke Hayase , Shouichi Kuroha , Hirofumi Ihara , Kazushige Takechi
发明人： Shigeru Kimura , Takahiko Watanabe , Tae Yoshikawa , Hiroyuki Uchida , Shusaku Kido , Shinichi Nakata , Tsutomu Hamada , Hisanobu Shimodouzono , Satoshi Doi , Toshihiko Harano , Akitoshi Maeda , Satoshi Ihida , Hiroaki Tanaka , Takasuke Hayase , Shouichi Kuroha , Hirofumi Ihara , Kazushige Takechi
IPC分类号： G02F1/1343 , G02F1/136 , G02F1/1368 , G09F9/30 , H01L21/00 , H01L21/3205 , H01L21/336 , H01L21/84 , H01L23/52 , H01L29/423 , H01L29/43 , H01L29/49 , H01L29/786 , H01L31/036
CPC分类号： G02F1/134363
摘要： An active matrix substrate plate having superior properties is manufactured at high yield using four photolithographic fabrication steps. In step 1, the scanning line and the gate electrode extending from the scanning line are formed in the glass plate. In step 2, the gate insulation layer and the semiconductor layer comprised by amorphous silicon layer and n+ amorphous silicon layer is laminated to provide the semiconductor layer for the TFT section. In step 3, the transparent conductive layer and the metallic layer are laminated, and the signal line, the drain electrode extending from the signal line, the pixel electrode and the source electrode extending from the pixel electrode are formed, and the n+ amorphous silicon layer of the channel gap is removed by etching. In step 4, the protective insulation layer is formed, and the protective insulation layer and the metal layer above the pixel electrode are removed by etching.
摘要翻译：使用四个光刻制造步骤以高产率制造具有优异性能的有源矩阵基板。在步骤1中，扫描线和从扫描线延伸的栅电极形成在玻璃板中。在步骤2中，层叠由非晶硅层和n + +非晶硅层构成的栅绝缘层和半导体层，以提供TFT部分的半导体层。在步骤3中，层叠透明导电层和金属层，形成信号线，从信号线延伸的漏极，从像素电极延伸的像素电极和源电极，通过蚀刻除去沟道间隙的+非晶硅层。在步骤4中，形成保护绝缘层，通过蚀刻除去保护绝缘层和像素电极上方的金属层。

5. 发明授权

US06632696B2 Manufacturing method of active matrix substrate plate and manufacturing method therefor 有权
标题翻译：有源矩阵基板的制造方法及其制造方法
公开(公告)号：US06632696B2
公开(公告)日：2003-10-14
申请号：US09745657
申请日：2000-12-20
申请人： Shigeru Kimura , Takahiko Watanabe , Tae Yoshikawa , Hiroyuki Uchida , Shusaku Kido , Shinichi Nakata , Tsutomu Hamada , Hisanobu Shimodouzono , Satoshi Doi , Toshihiko Harano , Akitoshi Maeda , Satoshi Ihida , Hiroaki Tanaka , Takasuke Hayase , Shouichi Kuroha , Hirofumi Ihara , Kazushige Takechi
发明人： Shigeru Kimura , Takahiko Watanabe , Tae Yoshikawa , Hiroyuki Uchida , Shusaku Kido , Shinichi Nakata , Tsutomu Hamada , Hisanobu Shimodouzono , Satoshi Doi , Toshihiko Harano , Akitoshi Maeda , Satoshi Ihida , Hiroaki Tanaka , Takasuke Hayase , Shouichi Kuroha , Hirofumi Ihara , Kazushige Takechi
IPC分类号： H01L2100
CPC分类号： G02F1/134363
摘要： An active matrix substrate plate having superior properties is manufactured at high yield using four photolithographic fabrication steps. In step 1, the scanning line and the gate electrode extending from the scanning line are formed in the glass plate. In step 2, the gate insulation layer and the semiconductor layer comprised by amorphous silicon layer and n+ amorphous silicon layer is laminated to provide the semiconductor layer for the TFT section. In step 3, the transparent conductive layer and the metallic layer are laminated, and the signal line, the drain electrode extending from the signal line, the pixel electrode and the source electrode extending from the pixel electrode are formed, and the n+ amorphous silicon layer of the channel gap is removed by etching. In step 4, the protective insulation layer is formed, and the protective insulation layer and the metal layer above the pixel electrode are removed by etching.
摘要翻译：使用四个光刻制造步骤以高产率制造具有优异性能的有源矩阵基板。在步骤 1 中，扫描线和从扫描线延伸的栅电极形成在玻璃板中。在步骤 2 中，将由非晶硅层和n 非晶硅层组成的栅极绝缘层和半导体层层压到提供TFT部分的半导体层。在步骤 3 中，层叠透明导电层和金属层，信号线，从信号线延伸的漏电极，像素电极和源电极延伸形成像素电极，并且通过蚀刻去除通道间隙的n 非晶硅层。在步骤 4 中，形成保护绝缘层，通过蚀刻去除保护绝缘层和像素电极上方的金属层。

6. 发明授权

US08454241B2 Rolling device 有权
标题翻译：滚动装置
公开(公告)号：US08454241B2
公开(公告)日：2013-06-04
申请号：US12302430
申请日：2007-05-31
申请人： Hiroyuki Uchida , Takamasa Ohira , Haruo Kamijo , Tsuyoshi Saito , Dai Kinno , Shingo Higashi , Naohiro Yoshida , Sadayuki Tanaka , Seisuke Takeda , Akitoshi Maeda , Tooru Shouda , Masateru Kondo , Kazunobu Taketa , Tomohiro Motoda
发明人： Hiroyuki Uchida , Takamasa Ohira , Haruo Kamijo , Tsuyoshi Saito , Dai Kinno , Shingo Higashi , Naohiro Yoshida , Sadayuki Tanaka , Seisuke Takeda , Akitoshi Maeda , Tooru Shouda , Masateru Kondo , Kazunobu Taketa , Tomohiro Motoda
IPC分类号： F16C33/62
CPC分类号： G03G15/0935 , B65G39/09 , C23C28/021 , C23C28/023 , C23C28/025 , F16C13/06 , F16C19/52 , F16C23/082 , F16C33/32 , F16C33/34 , F16C33/64 , F16C2204/34 , F16C2204/36 , F16C2204/50 , F16C2223/08 , F16C2223/80 , F16C2240/60 , F16C2300/42 , G03G15/0233 , G03G15/0808 , G03G15/0818 , G03G15/2053 , G03G15/751
摘要： A rolling device in which rust development or damage on a raceway surface or rolling surface is hard to occur even if water and the like intrude is provided. A self-aligning roller bearing comprises an inner ring 1, an outer ring 2, and a plurality of rolling elements 3 disposed rotatably between a raceway surface 1a of the inner ring 1 and a raceway surface 2a of the outer ring 2. At least any one of the inner ring 1, the outer ring 2, and the rolling elements 3 is provided with a metal coating formed by shot peening of a powder of metal less noble than iron at least on a part of its surface.
摘要翻译：即使在水等侵入的情况下也难以发生生锈或轨道面或滚动面的损伤的滚动装置。自调心滚子轴承包括内圈1，外圈2和可旋转地设置在内圈1的滚道表面1a和外圈2的滚道表面2a之间的多个滚动元件3。内圈1，外圈2和滚动元件3中的一个设置有金属涂层，该金属涂层至少在其表面的一部分上通过对比金属更低的金属的粉末喷丸硬化而形成。

7. 发明申请

US20100021097A1 Rolling Device 有权
标题翻译：滚动装置
公开(公告)号：US20100021097A1
公开(公告)日：2010-01-28
申请号：US12302430
申请日：2007-05-31
申请人： Hiroyuki Uchida , Takamasa Ohira , Haruo Kamijo , Tsuyoshi Saito , Dai Kinno , Shingo Higashi , Naohiro Yoshida , Sadayuki Tanaka , Seisuke Takeda , Akitoshi Maeda , Tooru Shouda , Masateru Kondo , Kazunobu Taketa , Tomohiro Motoda
发明人： Hiroyuki Uchida , Takamasa Ohira , Haruo Kamijo , Tsuyoshi Saito , Dai Kinno , Shingo Higashi , Naohiro Yoshida , Sadayuki Tanaka , Seisuke Takeda , Akitoshi Maeda , Tooru Shouda , Masateru Kondo , Kazunobu Taketa , Tomohiro Motoda
IPC分类号： F16C33/62 , F16C33/64
CPC分类号： G03G15/0935 , B65G39/09 , C23C28/021 , C23C28/023 , C23C28/025 , F16C13/06 , F16C19/52 , F16C23/082 , F16C33/32 , F16C33/34 , F16C33/64 , F16C2204/34 , F16C2204/36 , F16C2204/50 , F16C2223/08 , F16C2223/80 , F16C2240/60 , F16C2300/42 , G03G15/0233 , G03G15/0808 , G03G15/0818 , G03G15/2053 , G03G15/751
摘要： A rolling device in which rust development or damage on a raceway surface or rolling surface is hard to occur even if water and the like intrude is provided. A self-aligning roller bearing comprises an inner ring 1, an outer ring 2, and a plurality of rolling elements 3 disposed rotatably between a raceway surface 1a of the inner ring 1 and a raceway surface 2a of the outer ring 2. At least any one of the inner ring 1, the outer ring 2, and the rolling elements 3 is provided with a metal coating formed by shot peening of a powder of metal less noble than iron at least on a part of its surface.
摘要翻译：即使在水等侵入的情况下也难以发生生锈或轨道面或滚动面的损伤的滚动装置。自调心滚子轴承包括内圈1，外圈2和可旋转地设置在内圈1的滚道表面1a和外圈2的滚道表面2a之间的多个滚动元件3。内圈1，外圈2和滚动元件3中的一个设置有金属涂层，该金属涂层至少在其表面的一部分上通过对比金属更低的金属的粉末喷丸硬化而形成。

8. 发明授权

US06800872B2 Active matrix thin film transistor 有权
标题翻译：有源矩阵薄膜晶体管
公开(公告)号：US06800872B2
公开(公告)日：2004-10-05
申请号：US10235493
申请日：2002-09-06
申请人： Hiroaki Tanaka , Hiroyuki Uchida
发明人： Hiroaki Tanaka , Hiroyuki Uchida
IPC分类号： H01L2904
CPC分类号： H01L29/41733 , G02F1/136286 , G02F1/1368 , G02F2001/136236 , H01L27/124 , H01L27/1288 , H01L29/458 , H01L29/66765 , H01L29/78633
摘要： As a configuration of a gate island consisting of a laminated structure including a gate electrode, a gate insulating film and a semiconductor film for constituting a thin film transistor, the gate insulating film and the semiconductor film are formed into a plane shape equal to or smaller than the gate electrode and covered with a channel protection film. Further, a drain electrode and a source electrode are formed to be connected with the semiconductor film through openings provided to the channel protection film. Consequently, side surfaces of the semiconductor film and the gate insulating film can be covered with the channel protection film formed in an upper layer, and impurities existing in a liquid crystal layer can be prevented from entering the semiconductor film by diffusion or an electric field, thereby improving the characteristic of a TFT.
摘要翻译：作为由包括栅电极，栅极绝缘膜和用于构成薄膜晶体管的半导体膜的层叠结构构成的栅极岛的结构，栅极绝缘膜和半导体膜形成为等于或小于比栅电极和通道保护膜覆盖。此外，漏电极和源极电极通过设置在通道保护膜上的开口与半导体膜连接。因此，半导体膜和栅极绝缘膜的侧表面可以被形成在上层中的沟道保护膜覆盖，并且可以防止存在于液晶层中的杂质通过扩散或电场进入半导体膜，从而提高TFT的特性。

9. 发明授权

US06468840B2 Active matrix substrate and manufacturing method thereof 有权
标题翻译：有源矩阵基板及其制造方法
公开(公告)号：US06468840B2
公开(公告)日：2002-10-22
申请号：US09841074
申请日：2001-04-25
申请人： Hiroaki Tanaka , Hiroyuki Uchida
发明人： Hiroaki Tanaka , Hiroyuki Uchida
IPC分类号： H01L2100
CPC分类号： H01L29/41733 , G02F1/136286 , G02F1/1368 , G02F2001/136236 , H01L27/124 , H01L27/1288 , H01L29/458 , H01L29/66765 , H01L29/78633
摘要： As a configuration of a gate island consisting of a laminated structure including a gate electrode, a gate insulating film and a semiconductor film for constituting a thin film transistor, the gate insulating film and the semiconductor film are formed into a plane shape equal to or smaller than the gate electrode and covered with a channel protection film. Further, a drain electrode and a source electrode are formed to be connected with the semiconductor film through openings provided to the channel protection film. Consequently, side surfaces of the semiconductor film and the gate insulating film can be covered with the channel protection film formed in an upper layer, and impurities existing in a liquid crystal layer can be prevented from entering the semiconductor film by diffusion or an electric field, thereby improving the characteristic of a TFT.
摘要翻译：作为由包括栅电极，栅极绝缘膜和用于构成薄膜晶体管的半导体膜的层叠结构构成的栅极岛的结构，栅极绝缘膜和半导体膜形成为等于或小于比栅电极和通道保护膜覆盖。此外，漏电极和源极电极通过设置在通道保护膜上的开口与半导体膜连接。因此，半导体膜和栅极绝缘膜的侧表面可以被形成在上层中的沟道保护膜覆盖，并且可以防止存在于液晶层中的杂质通过扩散或电场进入半导体膜，从而提高TFT的特性。

10. 发明申请

US20150044090A1 Strength Evaluation Method of Die Casting Product and Die Casting Product 审中-公开
标题翻译：压铸产品和压铸产品的强度评估方法
公开(公告)号：US20150044090A1
公开(公告)日：2015-02-12
申请号：US14381917
申请日：2012-07-24
申请人： Munetaka Mitsumura , Shigeru Okita , Hiroyuki Uchida
发明人： Munetaka Mitsumura , Shigeru Okita , Hiroyuki Uchida
IPC分类号： G01N3/22 , E05B15/16 , B60R25/021 , B22D17/00
CPC分类号： G01N3/22 , B22C9/24 , B22C19/04 , B22D17/00 , B60R25/02115 , E05B15/1614 , G01N29/11 , G01N2203/0067 , G01N2291/0234 , G01N2291/02827 , G01N2291/044
摘要： There are provided a strength evaluation method of a die casting product capable of appropriately evaluating the strength of the die casting product, and a die casting product in which the strength is evaluated by the strength evaluation method. A breakage test is performed by a simple strength tester after casting, and then, a strength reduction ratio is estimated based on an area ratio of cold flakes in a broken surface obtained by broken surface observation. Alternatively, ultrasonic flaw detection is performed for an internal defect in a predetermined range of a high stress portion of the die casting product, calculated by stress analysis in advance, and the die casting product is evaluated to have a predetermined strength when a defect ratio obtained by dividing a total area of the internal defect in the predetermined range by a total defect detection area is less than or equal to a predetermined value.
摘要翻译：提供了能够适当地评价压铸产品的强度的压铸产品的强度评价方法和通过强度评价方法评价强度的压铸产品。在铸造后，通过简单的强度试验机进行断裂试验，然后基于通过破碎的表面观察获得的破裂面中的冷片的面积比来估计强度降低率。或者，对于预先通过应力分析计算出的压铸产品的高应力部分的预定范围内的内部缺陷进行超声波探伤，并且当获得的缺陷率获得时，将压铸产品评价为具有预定强度通过将预定范围内的内部缺陷的总面积除以总缺陷检测区域小于或等于预定值。

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