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1. 发明授权

US07705304B2 Scanning electron microscope and three-dimensional shape measuring device that used it 有权
标题翻译：扫描电子显微镜和使用它的三维形状测量装置
公开(公告)号：US07705304B2
公开(公告)日：2010-04-27
申请号：US12120053
申请日：2008-05-13
申请人： Shigeru Kawamata , Yoshinobu Hoshino , Asako Kaneko
发明人： Shigeru Kawamata , Yoshinobu Hoshino , Asako Kaneko
IPC分类号： H01J49/40
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/22 , H01J2237/24465 , H01J2237/24578
摘要： In three-dimensional shape measurement, a backscattered electron detection signal and selection signal generator in a control section controls, by selection signal, a signal switching section and a frame memory so that: detection signals from respective semiconductor elements are sequentially switched in the signal switching section in synchronization with a scanning frame of an electron beam on a sample; and the detection signals from the respective semiconductor elements can be sequentially recorded in recording addresses in the frame memory which correspond to the respective semiconductor elements. After four electron beam scanning sessions, each image data for three-dimensional shape measurement is recorded in the frame memory, and processed in a computing processing section for three-dimensional shape measurement, and the result can be displayed in a display section. The backscattered electron detection signal and selection signal generator in the control section is configured to include, for example, a counter updated in frame scanning units, and can be composed of a very simple circuit or software.
摘要翻译：在三维形状测量中，控制部分中的反向散射电子检测信号和选择信号发生器通过选择信号控制信号切换部分和帧存储器，使得：来自各个半导体元件的检测信号在信号切换与样品上的电子束的扫描帧同步; 并且来自各个半导体元件的检测信号可以被顺序记录在对应于各个半导体元件的帧存储器中的记录地址中。在四个电子束扫描会话之后，将用于三维形状测量的每个图像数据记录在帧存储器中，并在用于三维形状测量的计算处理部分中进行处理，并且可以将结果显示在显示部分中。控制部中的背散射电子检测信号和选择信号发生器被配置为包括例如以帧扫描单位更新的计数器，并且可以由非常简单的电路或软件组成。

2. 发明申请

US20080283747A1 Scanning Electron Microscope and Three-Dimensional Shape Measuring Device That Used It 有权
标题翻译：扫描电子显微镜和使用它的三维形状测量装置
公开(公告)号：US20080283747A1
公开(公告)日：2008-11-20
申请号：US12120053
申请日：2008-05-13
申请人： Shigeru Kawamata , Yoshinobu Hoshino , Asako Kaneko
发明人： Shigeru Kawamata , Yoshinobu Hoshino , Asako Kaneko
IPC分类号： G01N23/225
CPC分类号： H01J37/28 , H01J37/265 , H01J2237/22 , H01J2237/24465 , H01J2237/24578
摘要： In three-dimensional shape measurement, a backscattered electron detection signal and selection signal generator in a control section controls, by selection signal, a signal switching section and a frame memory so that: detection signals from respective semiconductor elements are sequentially switched in the signal switching section in synchronization with a scanning frame of an electron beam on a sample; and the detection signals from the respective semiconductor elements can be sequentially recorded in recording addresses in the frame memory which correspond to the respective semiconductor elements. After four electron beam scanning sessions, each image data for three-dimensional shape measurement is recorded in the frame memory, and processed in a computing processing section for three-dimensional shape measurement, and the result can be displayed in a display section. The backscattered electron detection signal and selection signal generator in the control section is configured to include, for example, a counter updated in frame scanning units, and can be composed of a very simple circuit or software.
摘要翻译：在三维形状测量中，控制部分中的反向散射电子检测信号和选择信号发生器通过选择信号控制信号切换部分和帧存储器，使得：来自各个半导体元件的检测信号在信号切换与样品上的电子束的扫描帧同步; 并且来自各个半导体元件的检测信号可以被顺序记录在对应于各个半导体元件的帧存储器中的记录地址中。在四个电子束扫描会话之后，将用于三维形状测量的每个图像数据记录在帧存储器中，并在用于三维形状测量的计算处理部分中进行处理，并且可以将结果显示在显示部分中。控制部中的背散射电子检测信号和选择信号发生器被配置为包括例如以帧扫描单位更新的计数器，并且可以由非常简单的电路或软件组成。

3. 发明申请

US20130220806A1 ION MILLING DEVICE 审中-公开
标题翻译：离子切割装置
公开(公告)号：US20130220806A1
公开(公告)日：2013-08-29
申请号：US13883539
申请日：2011-11-02
申请人： Toru Iwaya , Hirobumi Muto , Hisayuki Takasu , Atsushi Kamino , Asako Kaneko
发明人： Toru Iwaya , Hirobumi Muto , Hisayuki Takasu , Atsushi Kamino , Asako Kaneko
IPC分类号： H01J37/20 , H01J37/30 , H01J37/305
CPC分类号： H01J37/3053 , H01J37/20 , H01J37/3005 , H01J37/3007 , H01J37/304 , H01J2237/20207 , H01J2237/20214 , H01J2237/26
摘要： An ion milling device of the present invention is provided with a tilt stage (8) which is disposed in a vacuum chamber (15) and has a tilt axis parallel to a first axis orthogonal to an ion beam, a drive mechanism (9, 51) which has a rotation axis and a tilt axis parallel to a second axis orthogonal to the first axis and rotates or tilts a sample (3), and a switching unit which enables switching between a state in which the ion beam is applied while the sample is rotated or swung while the tilt stage is tilted, and a state in which the ion beams is applied while the tilt stage is brought into an untilted state and the sample is swung. Consequently, the ion milling device capable of performing cross-section processing and flat processing of the sample in the same vacuum chamber is implemented.
摘要翻译：本发明的离子铣削装置设置有倾斜台（8），其设置在真空室（15）中并具有平行于与离子束正交的第一轴线的倾斜轴线，驱动机构（9,51 ），其具有旋转轴线和平行于与所述第一轴线正交的第二轴线的倾斜轴线，并且使样本（3）旋转或倾斜;以及切换单元，其能够在所述样本之间切换所述离子束的状态在倾斜台倾斜时旋转或摆动，并且在倾斜台进入直到状态并且样品摆动的同时施加离子束的状态。因此，实现了能够在相同的真空室中对样品进行横截面加工和平坦处理的离子铣削装置。

4. 发明授权

US08552407B2 Ion milling device 有权
标题翻译：离子铣削装置
公开(公告)号：US08552407B2
公开(公告)日：2013-10-08
申请号：US13386980
申请日：2010-07-14
申请人： Asako Kaneko , Hirobumi Muto , Atsushi Kamino
发明人： Asako Kaneko , Hirobumi Muto , Atsushi Kamino
IPC分类号： G01N1/32
CPC分类号： H01J37/09 , G01N1/286 , H01J37/20 , H01J37/305 , H01J37/31
摘要： Disclosed is a shield (8, 10) disposed between an ion source (1) of an ion milling device and a sample (7) so as to be in contact with the sample. The shield is characterized by having a circular shape having an opening at the center, and by being capable of rotating about an axis (11) extending through the opening. Further, a groove is provided in the ion source-side surface of an end portion of the shield, and an inclined surface is provided on an end portion of the shield. Thus, an ion milling device having a shield, wherein the maximum number of machining operations can be increased, and the position of the shield can be accurately adjusted.
摘要翻译：公开了设置在离子铣削装置的离子源（1）和样品（7）之间以与样品接触的屏蔽（8,10）。该屏蔽的特征在于具有在中心具有开口的圆形形状，并且能够绕延伸穿过开口的轴线（11）旋转。此外，在屏蔽的端部的离子源侧表面设置有槽，并且在屏蔽的端部设置有倾斜面。因此，具有屏蔽件的离子铣削装置，其中可以增加最大数量的加工操作，并且可以精确地调节护罩的位置。

5. 发明申请

US20120126146A1 ION MILLING DEVICE 有权
标题翻译：离子切割装置
公开(公告)号：US20120126146A1
公开(公告)日：2012-05-24
申请号：US13386980
申请日：2010-07-14
申请人： Asako Kaneko , Hirobumi Muto , Atsushi Kamino
发明人： Asako Kaneko , Hirobumi Muto , Atsushi Kamino
IPC分类号： G21K5/00 , G21F3/00
CPC分类号： H01J37/09 , G01N1/286 , H01J37/20 , H01J37/305 , H01J37/31
摘要： Disclosed is a shield (8, 10) disposed between an ion source (1) of an ion milling device and a sample (7) so as to be in contact with the sample. The shield is characterized by having a circular shape having an opening at the center, and by being capable of rotating about an axis (11) extending through the opening. Further, a groove is provided in the ion source-side surface of an end portion of the shield, and an inclined surface is provided on an end portion of the shield. Thus, an ion milling device having a shield, wherein the maximum number of machining operations can be increased, and the position of the shield can be accurately adjusted.
摘要翻译：公开了设置在离子铣削装置的离子源（1）和样品（7）之间以与样品接触的屏蔽（8,10）。该屏蔽的特征在于具有在中心具有开口的圆形形状，并且能够绕延伸穿过开口的轴线（11）旋转。此外，在屏蔽的端部的离子源侧表面设置有槽，并且在屏蔽的端部设置有倾斜面。因此，具有屏蔽件的离子铣削装置，其中可以增加最大数量的加工操作，并且可以精确地调节护罩的位置。

6. 发明申请

US20140124367A1 SAMPLE PREPARATION APPARATUS, SAMPLE PREPARATION METHOD, AND CHARGED PARTICLE BEAM APPARATUS USING THE SAME 审中-公开
标题翻译：样品制备装置，样品制备方法和使用其的带电粒子束装置
公开(公告)号：US20140124367A1
公开(公告)日：2014-05-08
申请号：US14128646
申请日：2012-04-25
申请人： Shuichi Takeuchi , Hisayuki Takasu , Asako Kaneko
发明人： Shuichi Takeuchi , Hisayuki Takasu , Asako Kaneko
IPC分类号： H01J37/30 , H01J37/16 , H01J37/305
CPC分类号： H01J37/3005 , G01N1/286 , G01N1/32 , H01J37/16 , H01J37/20 , H01J37/3056 , H01J2237/31 , H01J2237/31745
摘要： There is provided an apparatus as well as a method for polishing, observing, and additionally polishing a sample in a vacuum with a charged particle beam apparatus furnished with no other apparatus.The charged particle beam apparatus has a vacuum chamber equipped with a liquid bath containing an ion liquid and a supersonic vibration means. With the ion liquid kept in contact with a polishing target area of the sample, supersonic vibration is propagated in the ion liquid to polish the sample.Because the charged particle beam apparatus permits polishing, observation, and additional polishing of the sample in a vacuum without being furnished with any additional apparatus, throughput is improved and the effects of the atmosphere on the sample are prevented.
摘要翻译：提供了一种装置以及用没有其他装置的带电粒子束装置在真空中抛光，观察和附加抛光样品的方法。带电粒子束装置具有配备有含有离子液体和超音速振动装置的液体浴的真空室。当离子液体与样品的抛光目标区域保持接触时，在离子液体中传播超音速振动以抛光样品。由于带电粒子束装置允许在没有任何附加装置的情况下在真空中抛光，观察和附加抛光样品，因此提高了生产能力并防止了样品对样品的影响。

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