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    • 1. 发明申请
    • Manufacturing method for variable shape mirror
    • 变形镜的制造方法
    • US20080291519A1
    • 2008-11-27
    • US11889025
    • 2007-08-08
    • Shigeo MaedaKatushiko TanakaAkira IshiiSusumu Sugiyama
    • Shigeo MaedaKatushiko TanakaAkira IshiiSusumu Sugiyama
    • G02B26/08B29D11/00
    • G02B26/0858G02B26/06Y10S359/90
    • Manufacturing method for variable shape mirrors suitable for mass production includes steps: for forming first grooves and second grooves along boundaries between areas to be variable shape mirrors on a surface of first wafer to be support substrate and a surface of second wafer to be mirror substrate; for arranging first and second wafer so that support pillars and piezoelectric elements are sandwiched between first and second wafer at areas with surface on which second grooves are formed facing inward for bonding; for dividing second wafer into mirror substrates by flattening process of outer surface of second wafer until at least reaching second groove; for dividing first wafer into the support substrates by breaking first wafer along first grooves; and for forming reflection film on outer surface of each of mirror substrates obtained by the dividing step.
    • 适用于批量生产的可变形状镜的制造方法包括以下步骤:在待支撑衬底的第一晶片的表面上形成作为可变形状镜的区域之间的边界的第一槽和第二槽以及第二晶片作为镜衬底的表面; 用于布置第一和第二晶片,使得支撑柱和压电元件被夹在第一和第二晶片之间的表面处,其上形成有第二凹槽的面向内以用于粘合; 用于通过第二晶片的外表面的平坦化处理将第二晶片分成镜基板,直到至少到达第二凹槽; 用于通过沿第一凹槽断开第一晶片将第一晶片分成支撑基板; 并且用于在通过分割步骤获得的每个镜面基板的外表面上形成反射膜。
    • 2. 发明授权
    • Manufacturing method for variable shape mirror
    • 变形镜的制造方法
    • US07635191B2
    • 2009-12-22
    • US11889025
    • 2007-08-08
    • Shigeo MaedaKatushiko TanakaAkira IshiiSusumu Sugiyama
    • Shigeo MaedaKatushiko TanakaAkira IshiiSusumu Sugiyama
    • G02B5/08G02B7/182H01L21/00
    • G02B26/0858G02B26/06Y10S359/90
    • Manufacturing method for variable shape mirrors suitable for mass production includes steps: for forming first grooves and second grooves along boundaries between areas to be variable shape mirrors on a surface of first wafer to be support substrate and a surface of second wafer to be mirror substrate; for arranging first and second wafer so that support pillars and piezoelectric elements are sandwiched between first and second wafer at areas with surface on which second grooves are formed facing inward for bonding; for dividing second wafer into mirror substrates by flattening process of outer surface of second wafer until at least reaching second groove; for dividing first wafer into the support substrates by breaking first wafer along first grooves; and for forming reflection film on outer surface of each of mirror substrates obtained by the dividing step.
    • 适用于批量生产的可变形状镜的制造方法包括以下步骤:在待支撑衬底的第一晶片的表面上形成作为可变形状镜的区域之间的边界的第一槽和第二槽以及第二晶片作为镜衬底的表面; 用于布置第一和第二晶片,使得支撑柱和压电元件被夹在第一和第二晶片之间的表面处,其上形成有第二凹槽的面向内以用于粘合; 用于通过第二晶片的外表面的平坦化处理将第二晶片分成镜基板,直到至少到达第二凹槽; 用于通过沿第一凹槽断开第一晶片将第一晶片分成支撑基板; 并且用于在通过分割步骤获得的每个镜面基板的外表面上形成反射膜。