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    • 2. 发明申请
    • DISPLAY DEVICE
    • 显示设备
    • US20120287030A1
    • 2012-11-15
    • US13469533
    • 2012-05-11
    • Xiaoxiong TIANJianshe XUEJisheng ZHAOLin LIShi SHU
    • Xiaoxiong TIANJianshe XUEJisheng ZHAOLin LIShi SHU
    • G09G3/34
    • G02B26/026
    • An embodiment of the disclosed technology provides a display device comprising an electrophoresis solution tank containing electrophoresis solution and at least a rolling ball used for display colors, the rolling ball being immerged into the electrophoresis solution; and a shelter layer disposed above and covering the electrophoresis solution tank, the shelter layer being made up of an opaque material. A light transmitting hole is formed in the shelter layer and above the core of the rolling ball, so that the light of the color to be currently displayed on the rolling ball passes through the light transmitting hole for display, while the light of the colors not intended to be displayed is blocked by the shelter layer.
    • 所公开技术的一个实施例提供了一种显示装置,其包括含有电泳溶液的电泳溶液罐和至少一个用于显示颜色的滚球,所述滚球浸入电泳溶液中; 以及设置在电泳溶液罐上方并覆盖电泳溶液罐的防护层,防护层由不透明材料构成。 遮蔽层和滚珠的芯部之上形成透光孔,使得当前显示在滚珠上的颜色的光通过用于显示的透光孔,而不是颜色的光 旨在显示被遮蔽层阻挡。
    • 3. 发明申请
    • ELECTROWETTING DISPLAY
    • 电镀显示
    • US20120307330A1
    • 2012-12-06
    • US13482269
    • 2012-05-29
    • Xiaoxiong TIANJianshe XUEJisheng ZHAO
    • Xiaoxiong TIANJianshe XUEJisheng ZHAO
    • G02B26/02
    • G09G3/348G02B26/005G09G3/2003G09G2300/0426G09G2300/0452
    • An embodiment of the disclosed technology discloses an electrowetting display, comprising a first substrate, a second substrate disposed opposite to and under the first substrate, a plurality of separation walls, a first fluid, and a second fluid, wherein the plurality of separation walls are disposed in grid on the second substrate to define a plurality of pixel units, and the first fluid is filled in the spaces of the grid formed by adjacent separation walls, the first fluid is opaque and does not mix with the second fluid, the second fluid is transparent, has conductivity or polarity, and is filled between the first fluid and the first substrate; and wherein a colored layer is disposed for each pixel unit, and the colored layer has at least one predetermined color and is between the first fluid and the second substrate.
    • 所公开技术的一个实施例公开了一种电润湿显示器,包括第一基板,与第一基板相对设置的第二基板,多个分隔壁,第一流体和第二流体,其中多个分隔壁是 设置在第二基板上的网格中以限定多个像素单元,并且第一流体填充在由相邻分隔壁形成的格栅的空间中,第一流体是不透明的并且不与第二流体混合,第二流体 是透明的,具有导电性或极性,并填充在第一流体和第一基底之间; 并且其中为每个像素单元设置着色层,并且所述着色层具有至少一个预定颜色,并且位于所述第一流体和所述第二基板之间。
    • 6. 发明申请
    • ARRAY SUBSTRATE OF LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
    • 液晶显示装置的阵列基板及其制造方法
    • US20090256158A1
    • 2009-10-15
    • US12419444
    • 2009-04-07
    • Jianshe XUE
    • Jianshe XUE
    • H01L33/00H01L21/336
    • G02F1/1368
    • An array substrate comprising a base substrate, a common electrode, a gate line, a data line, a thin film transistor, a passivation layer and a pixel electrode of “” shape. The thin film transistor comprises a gate electrode, an active layer, a source electrode and a drain electrode; the gate electrode is connected with the gate line; the source electrode is connected with the data line; and the drain electrode is connected with the pixel electrode. A passivation layer is formed on the source electrode, the drain electrode and the data line, and a via hole is formed in the passivation layer over the drain electrode. The pixel electrode of “” shape is formed on the passivation layer and connected with the drain electrode through the via hole in the passivation layer. The data line is provided below the position corresponding to the boundary between the “/” portion and the “\” portion of the pixel electrode of “” shape. The array substrate increases the transmittivity of pixel and improves the display quality.
    • 包括基底基板,公共电极,栅极线,数据线,薄膜晶体管,钝化层和像素电极的阵列基板“”形。 薄膜晶体管包括栅电极,有源层,源电极和漏电极; 栅电极与栅极线连接; 源电极与数据线连接; 漏电极与像素电极连接。 在源电极,漏电极和数据线上形成钝化层,并且在漏电极上的钝化层中形成通孔。 像素电极“”形状。 阵列基板增加像素的透射率并提高显示质量。
    • 7. 发明申请
    • MANUFACTURE METHODS OF THIN FILM TRANSISTOR AND ARRAY SUBSTRATE AND MASK
    • 薄膜晶体管和阵列基板和掩模的制造方法
    • US20120309136A1
    • 2012-12-06
    • US13484835
    • 2012-05-31
    • Weifeng ZHOUJianshe XUE
    • Weifeng ZHOUJianshe XUE
    • H01L21/336G03F1/00G03F7/20
    • H01L29/66765G03F7/70425H01L21/0274H01L21/32139H01L29/41733H01L29/7869H01L51/0018H01L51/0545H01L51/102
    • Embodiments of the disclosed technology disclose manufacture methods of a thin film transistor and an array substrate and a mask therefor are provided. The manufacture method of the thin film transistor comprises: patterning a wire layer by using a exposure machine and a mask with a first exposure amount larger than a normal exposure amount during formation of source and drain electrodes; forming a semiconductor layer on the patterned wire layer; patterning the semiconductor layer by using the exposure machine and the mask with a second exposure amount smaller than the first exposure amount. The mask comprises a source region for forming the source electrode, a drain region for forming the drain electrode and a slit provided between the source region and the drain region, and the width of the slit is smaller than the resolution of the exposure machine.
    • 所公开的技术的实施例公开了薄膜晶体管和阵列基板及其掩模的制造方法。 薄膜晶体管的制造方法包括:在源极和漏极形成期间,通过使用曝光机和具有大于正常曝光量的第一曝光量的掩模来图案化布线层; 在所述图案化的导线层上形成半导体层; 通过使用曝光机和具有小于第一曝光量的第二曝光量的掩模来图案化半导体层。 掩模包括用于形成源电极的源极区域,用于形成漏极电极的漏极区域和设置在源极区域和漏极区域之间的狭缝,并且狭缝的宽度小于曝光机器的分辨率。
    • 10. 发明申请
    • THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR FABRICATING THE THIN FILM TRANSISTOR ARRAY SUBSTRATE
    • 薄膜晶体管阵列基板和制造薄膜晶体管阵列基板的方法
    • US20120280239A1
    • 2012-11-08
    • US13464094
    • 2012-05-04
    • Xiang LIUJianshe XUE
    • Xiang LIUJianshe XUE
    • H01L33/08
    • H01L27/1288G02F1/134336G02F1/1368G02F2001/13685H01L27/1225
    • The present disclosed technology is related to a TFT array substrate and a method for fabricating the TFT array substrate. The method may comprise: depositing a transparent conductive film layer and a source-drain metal layer in this order on a base substrate, and forming source electrodes, drain electrodes, data scan lines and transparent pixel electrodes by a first pattering process, with the transparent conductive film layer being left under the source electrodes, the drain electrodes and the data scan lines; on the resultant substrate, depositing a semiconductor layer and forming a patterned semiconductor layer by a second pattering process; and on the resultant substrate, depositing a gate insulator and a gate metal film in this order, and forming gate electrodes and gate scan lines by a third pattering process, the gate electrodes being located over the patterned semiconductor layer.
    • 本公开的技术涉及TFT阵列基板和制造TFT阵列基板的方法。 该方法可以包括:在基底基板上依次沉积透明导电膜层和源极 - 漏极金属层,并通过第一图案化方法形成源电极,漏电极,数据扫描线和透明像素电极,透明 导电膜层留在源电极,漏电极和数据扫描线之下; 在所得到的衬底上沉积半导体层并通过第二图案形成图案化的半导体层; 并且在所得到的衬底上依次沉积栅极绝缘体和栅极金属膜,并通过第三图案化工艺形成栅电极和栅极扫描线,栅电极位于图案化的半导体层之上。