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1. 发明专利

JP2009088535A Method and apparatus for cleaning substrate 有权
标题翻译：清洗基板的方法和装置
公开(公告)号：JP2009088535A
公开(公告)日：2009-04-23
申请号：JP2008257351
申请日：2008-10-02
申请人： Semes Co Ltd , セメス株式会社Semes Co., Ltd.
发明人： LEE SE-WON
IPC分类号： H01L21/3065 , H01L21/302 , H01L21/304
CPC分类号： H01L21/67028 , B08B7/0042
摘要： PROBLEM TO BE SOLVED: To provide a method for cleaning a substrate, with which energy efficiency can be improved and a chamber can be prevented from being damaged with a laser-induced plasma shockwave.
SOLUTION: In a method and an apparatus for cleaning a substrate using a laser beam, an inner chamber is disposed in a step chamber to confine a space in which a laser-induced shockwave is generated. The laser beam is focused on a laser focus positioned in the inner chamber, and thus the laser-induced plasma shockwave is generated around the laser focus. The plasma shockwave is reflected from inner surfaces of the inner chamber and the substrate is irradiated through a lower portion of the inner chamber. As a result, the intensity of the plasma shockwave with which the substrate is irradiated is increased, and thus the contaminants on the substrate may be more effectively removed.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于清洁基板的方法，能够提高能量效率并且可以通过激光诱发的等离子体冲击波来防止室被损坏。解决方案：在使用激光束清洗衬底的方法和装置中，将内室设置在台阶室中以限制产生激光诱发的冲击波的空间。激光束聚焦在位于内腔中的激光焦点上，因此在激光焦点周围产生激光诱导的等离子体冲击波。等离子体冲击波从内室的内表面反射，并且基板通过内室的下部被照射。结果，照射基板的等离子体冲击波的强度增加，从而可以更有效地去除基板上的污染物。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2009272604A Substrate washing apparatus and method 审中-公开
标题翻译：基板清洗装置和方法
公开(公告)号：JP2009272604A
公开(公告)日：2009-11-19
申请号：JP2008294391
申请日：2008-11-18
申请人： Semes Co Ltd , セメス株式会社
发明人： LEE SE-WON , JEONG JAE-JEONG , CHO JUNG-GUN
IPC分类号： H01L21/304
CPC分类号： H01L21/67028 , H01J2237/335
摘要： PROBLEM TO BE SOLVED: To provide a substrate washing apparatus and method which can prevent a substrate from being polluted again by damage of an intercepting portion, by preventing a plume generated with an impulse wave and a remaining beam from being concentrated on a specific area of the intercepting portion. SOLUTION: The substrate washing apparatus includes a supporting plate for supporting the substrate and the intercepting portion provided above the substrate and protecting the substrate. In the intercepting portion, a part adjacent to a focus at which light is focused for forming an impulse wave is changed. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种基板清洗装置和方法，其可以通过防止由冲击波产生的羽流和剩余的波束集中在一个基板上，从而防止基板被截断部分的损坏再次被污染拦截部分的特定区域。解决方案：基板清洗装置包括用于支撑基板的支撑板和设置在基板上方的遮蔽部分并保护基板。在截取部分中，改变了与用于形成脉冲波的光聚焦的焦点相邻的部分。版权所有（C）2010，JPO＆INPIT

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