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1. 发明授权

US5958809A Fluorine-containing silica glass 失效
标题翻译：含氟硅石玻璃
公开(公告)号：US5958809A
公开(公告)日：1999-09-28
申请号：US915562
申请日：1997-08-21
申请人： Seishi Fujiwara , Hiroyuki Hiraiwa , Kazuhiro Nakagawa , Shouji Yajima , Norio Komine , Hiroki Jinbo
发明人： Seishi Fujiwara , Hiroyuki Hiraiwa , Kazuhiro Nakagawa , Shouji Yajima , Norio Komine , Hiroki Jinbo
IPC分类号： C03B8/04 , C03B19/14 , C03B37/014 , C03C3/06 , C03C4/00 , G03F7/20 , C03C13/04
CPC分类号： C03B19/14 , C03B37/014 , C03B37/0142 , C03C3/06 , C03C4/0085 , G03F7/2004 , C03B2201/07 , C03B2207/66 , C03C2201/12 , C03C2201/21 , C03C2201/23 , C03C2203/42 , C03C2203/46 , Y02P40/57 , Y10S501/905
摘要： The invention relates to fluorine-containing silica glasses, and methods of their production. The silica glass may be used for an ultraviolet light optical system in which light in a wavelength region of 200 nm or less, such as an ArF (193 nm) excimer laser, is used. The invention also relates to a projection exposure apparatus containing fluorine-containing glass of the invention.
摘要翻译：本发明涉及含氟二氧化硅玻璃及其制造方法。石英玻璃可以用于其中使用200nm以下的波长区域的光，例如ArF（193nm）准分子激光器的紫外线光学系统。本发明还涉及包含本发明的含氟玻璃的投影曝光装置。

2. 发明授权

US5699183A Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production 失效
标题翻译：用于UV光刻的二氧化硅玻璃构件，石英玻璃生产方法和石英玻璃构件制造方法
公开(公告)号：US5699183A
公开(公告)日：1997-12-16
申请号：US484863
申请日：1995-06-07
申请人： Hiroyuki Hiraiwa , Seishi Fujiwara , Hiroki Jinbo , Jun Takano , Norio Komine , Kazuhiro Nakagawa , Issey Tanaka
发明人： Hiroyuki Hiraiwa , Seishi Fujiwara , Hiroki Jinbo , Jun Takano , Norio Komine , Kazuhiro Nakagawa , Issey Tanaka
IPC分类号： C03B8/04 , C03B19/14 , C03C3/06 , C03C4/00 , G02B1/00 , G02B13/14 , G03F7/20 , G03B27/42
CPC分类号： C03B19/1423 , C03B19/1453 , C03C3/06 , C03C4/0085 , G02B1/00 , G02B13/143 , G03F7/70241 , G03F7/70958 , C03B2201/07 , C03B2201/21 , C03B2201/23 , C03B2203/22 , C03B2207/06 , C03B2207/12 , C03B2207/20 , C03B2207/36 , C03C2201/21 , C03C2203/44 , C03C2203/52 , Y10S359/90 , Y10S501/905
摘要： Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. The present invention provides a silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also, there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.
摘要翻译：需要最近的UV光刻来提供线宽为0.5μm或更小的精细且清晰的图案。本发明提供一种二氧化硅玻璃构件，其通过考虑本领域中尚未考虑的波面像差的RMS值和折射率的倾斜元素，用作用于UV光刻的光学元件。另外，在二氧化硅玻璃的合成中，通过引入氢分子，而不是使用二次氢气导入来提供对紫外线照射的耐久性优异的二氧化硅玻璃。

3. 发明授权

US5702495A Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production 失效
标题翻译：用于UV光刻的二氧化硅玻璃构件，石英玻璃生产方法和石英玻璃构件制造方法
公开(公告)号：US5702495A
公开(公告)日：1997-12-30
申请号：US479130
申请日：1995-06-07
申请人： Hiroyuki Hiraiwa , Kazuhiro Nakagawa , Hiroki Jinbo , Jun Takano , Seishi Fujiwara
发明人： Hiroyuki Hiraiwa , Kazuhiro Nakagawa , Hiroki Jinbo , Jun Takano , Seishi Fujiwara
IPC分类号： C03B8/04 , C03B19/14 , C03C3/06 , C03C4/00 , G02B1/00 , G02B13/14 , G03F7/20 , C03B20/00
CPC分类号： C03B19/1423 , C03B19/1453 , C03C3/06 , C03C4/0085 , G02B1/00 , G02B13/143 , G03F7/70241 , G03F7/70958 , C03B2201/07 , C03B2201/21 , C03B2201/23 , C03B2203/22 , C03B2207/06 , C03B2207/12 , C03B2207/20 , C03B2207/36 , C03C2201/21 , C03C2203/44 , C03C2203/52 , Y10S359/90 , Y10S501/905
摘要： Recent UV-lithography is required to provide a fine and sharp pattern with a line width of 0.5 .mu.m or less. A silica glass member adapted for use as an optical element for UV-lithography, by giving consideration to the RMS value of wave front aberration and the slant element of refractive index, which have not been considered in the art. Also there is provided a silica glass member excellent in durability to the ultraviolet irradiation, by introduction of hydrogen molecules at the synthesis of the silica glass, instead of using a secondary treatment for hydrogen introduction.
摘要翻译：需要最近的UV光刻来提供线宽为0.5μm或更小的精细且清晰的图案。通过考虑本领域中尚未考虑的波面像差的RMS值和折射率的倾斜元件，适于用作UV光刻的光学元件的二氧化硅玻璃构件。另外，通过在合成二氧化硅玻璃时引入氢分子，可以提供在紫外线照射下的耐久性优异的二氧化硅玻璃构件，而不是二次处理导入氢。

4. 发明授权

US6044664A Synthetic silica glass manufacturing apparatus 有权
标题翻译：合成石英玻璃制造装置
公开(公告)号：US6044664A
公开(公告)日：2000-04-04
申请号：US161490
申请日：1998-09-28
申请人： Shouji Yajima , Norihisa Yamaguchi , Kazuhiro Nakagawa , Hiroki Jinbo
发明人： Shouji Yajima , Norihisa Yamaguchi , Kazuhiro Nakagawa , Hiroki Jinbo
IPC分类号： C03B19/14 , C03B37/018 , F16M11/24
CPC分类号： C03B19/1484 , C03B19/1407 , Y02P40/57
摘要： An apparatus is provided for synthesizing a silica glass ingot. The appartus includes a stage having a target plate thereover, the target plate being rotatable relative to the stage around a predetermined vertical axis, and a furnace for reacting material gas with combustion gas to synthesize the silica glass ingot on the target plate; the furnace having an opening at its bottom. The appratus further includes an elevation system that moves the stage in a vertical direction parallel to the predetermined vertical axis so as to vertically move the target plate through the opening of the furnace, the elevation system supporting the stage from at least one side of the stage and lacking a structure directly below the stage that would substantially interfere with the vertical movement of the stage.
摘要翻译：提供了一种用于合成二氧化硅玻璃锭的装置。该配件包括其上具有靶板的台阶，靶板可相对于围绕预定垂直轴线的台架旋转;以及炉子，用于使材料气体与燃烧气体反应，以在靶板上合成二氧化硅玻璃锭; 炉底部有开口。该装置还包括一个仰角系统，该平台在平行于预定的垂直轴线的垂直方向上移动平台，以使目标板通过炉的开口垂直移动，该升降系统从该平台的至少一侧支撑该台并且没有直接在舞台下方的结构将严重干扰舞台的垂直运动。

5. 发明授权

US06769273B1 Method of manufacturing silica glass member and silica glass member obtained by the method 有权
标题翻译：通过该方法获得的石英玻璃构件和石英玻璃构件的制造方法
公开(公告)号：US06769273B1
公开(公告)日：2004-08-03
申请号：US09786470
申请日：2001-03-05
申请人： Kazuhiro Nakagawa , Hiroyuki Hiraiwa
发明人： Kazuhiro Nakagawa , Hiroyuki Hiraiwa
IPC分类号： G01N2300
CPC分类号： C03B32/00 , C03B19/1423 , C03B19/1453 , C03B19/1469 , C03B19/1484 , C03B2201/02 , C03B2207/62 , C03B2207/70 , C03C3/06 , C03C2203/52 , Y10S501/905
摘要： A silica glass member manufacturing method of the present invention includes the steps of making a silicon compound react in oxyhydrogen flame using a burner having a multi-tubular structure to obtain fine silica glass particles, depositing the fine silica glass particles on a support rotating and placed to oppose the burner to obtain a silica glass ingot with a temperature distribution in at least one plane perpendicular to a rotational axis of the silica glass ingot, the temperature distribution being symmetrical with respect to the rotational axis and having a maximal value between a center and a peripheral portion of the plane, and obtaining a distribution of signed birefringence values on the basis of birefringence values and directions of phase advance axes measured at a plurality of points in the plane perpendicular to the rotational axis of the silica glass ingot and cutting, from the silica glass ingot, a silica glass member whose signed birefringence values monotonously increase from the center to the peripheral portion of the plane.
摘要翻译：本发明的石英玻璃构件制造方法包括以下步骤：使用具有多管状结构的燃烧器，在氢氧焰中反应硅化合物，得到细小的二氧化硅玻璃粒子，将二氧化硅玻璃微粒沉积在旋转放置的载体上与燃烧器相对，以获得在与石英玻璃锭的旋转轴线垂直的至少一个平面中的温度分布的二氧化硅玻璃锭，温度分布相对于旋转轴线对称，并且在中心和基于双折射值和在与石英玻璃锭的旋转轴线垂直的平面上的多个点处测量的相位提前轴的方向并且切割从而获得带符号双折射值的分布，从石英玻璃锭，其双键双折射值单调增加的石英玻璃构件从中心到平面的周边部分。

6. 发明授权

US06829039B2 Optical member for photolithography and method of evaluating the same 有权
标题翻译：光刻用光学部件及其评价方法
公开(公告)号：US06829039B2
公开(公告)日：2004-12-07
申请号：US10362193
申请日：2003-02-21
申请人： Kazumasa Endo , Hiroyuki Hiraiwa , Kazuhiro Nakagawa , Masaaki Mochida
发明人： Kazumasa Endo , Hiroyuki Hiraiwa , Kazuhiro Nakagawa , Masaaki Mochida
IPC分类号： G03B2742
CPC分类号： G03F7/705 , G03F7/706
摘要： A method of evaluating a refractive index homogeneity of an optical member for photolithography, the method comprising: a measurement step of transmitting light having a predetermined wavelength &lgr; through the optical member so as to measure a wavefront aberration; a Zernike fitting step of expanding thus measured wavefront aberration into a polynomial of a Zernike cylindrical function system; a first separating step of separating individual components of the polynomial into a rotationally symmetric element, an odd-symmetric element, and an even-symmetric element; and a second separating step of separating individual components of the polynomial into a plurality of parts according to a degree thereof.
摘要翻译：一种评估光刻用光学部件的折射率均匀性的方法，该方法包括：测量步骤，通过光学部件透射具有预定波长λ的光以测量波前像差; Zernike拟合步骤，波前像差转换成Zernike圆柱函数系统的多项式;第一分离步骤，将多项式的各个分量分离为旋转对称元素，奇对称元素和偶数对称元素; 以及第二分离步骤，根据其多项式将多项式的各个分量分离成多个部分。

7. 发明授权

US6116260A Liquid material supplying apparatus and liquid material supplying method 失效
标题翻译：液体材料供应装置和液体材料供应方法
公开(公告)号：US6116260A
公开(公告)日：2000-09-12
申请号：US51469
申请日：1998-04-15
申请人： Kazuhiro Nakagawa , Hiroyuki Hiraiwa
发明人： Kazuhiro Nakagawa , Hiroyuki Hiraiwa
IPC分类号： B01J4/00 , C01B32/40 , F17D1/18
CPC分类号： B01J4/00 , C01B31/18 , Y10T137/0396 , Y10T137/1729 , Y10T137/3124 , Y10T137/8326 , Y10T137/86035 , Y10T137/86083 , Y10T137/86163
摘要： A liquid material supplying apparatus comprises:vessels 150, 250, each having gas inlet pipe 151, 251, discharge pipe 153, 253, and interconnection pipe 155, 255 capable of making the gas inlet pipe 151, 251 communicate with the discharge pipe 153, 253, the vessels containing a liquid material;a permanent line P comprising gas line connection pipes 113, 213 detachably connected to the gas inlet pipes 151, 251, gas supply pipe 111 connected to the gas line connection pipes 113, 213 and to pressure gas supply 70, material line connection pipes 123, 223 detachably connected to the discharge pipes 153, 253, material supply pipe 127 connected to the material line connection pipes 123, 223 and to vaporizer 91, and by-pass pipes 129, 229 capable of making the gas supply pipe 111 communicate with the material line connection pipe 123, 223; anda vent line 30 comprising exhaust pipes 131, 231 connected to the gas line connection pipes 113, 213 or to the material line connection pipes 123, 223, and a vacuum pump 135 connected to the exhaust pipes 131, 231.
摘要翻译： PCT No.PCT / JP96 / 02360 371日期：1998年4月15日 102（e）1998年4月15日PCT PCT 1996年8月23日PCT公布。公开号WO98 / 07509 日期1998年2月26日液体材料供给装置包括：容器150,250，各自具有气体入口管151,251，排出管153,253和能够使气体导入管151,251的互连管155,255与排出管153,253，容纳液体材料的容器; 永久线P包括可拆卸地连接到气体入口管151,251的气体管线连接管113,213，连接到气体管线连接管113,213的气体供应管111和压力气体供应70，材料管线连接管123， 223可拆卸地连接到排出管153,253，连接到材料管线连接管123,223的材料供应管127和蒸发器91，以及能够使气体供应管111与材料连通的旁通管129,229 线连接管123,223; 以及排气管30，其包括连接到气体管线连接管113,213的排气管131,231，或者连接到排气管131,231的材料管线连接管123,223和真空泵135。

8. 发明授权

US07985595B2 Method for extracting a biosubstance from hair and hair sampling device useful in the method 失效
标题翻译：从该方法中有用的毛发取样装置提取生物体的方法
公开(公告)号：US07985595B2
公开(公告)日：2011-07-26
申请号：US12893483
申请日：2010-09-29
申请人： Takuro Yamamoto , Tomoteru Abe , Kazuhiro Nakagawa , Shiko Yamashita , Haruhiko Soma , Noriyuki Kishii
发明人： Takuro Yamamoto , Tomoteru Abe , Kazuhiro Nakagawa , Shiko Yamashita , Haruhiko Soma , Noriyuki Kishii
IPC分类号： A61B17/50 , A61B17/00
CPC分类号： A61B10/02 , A61B10/00 , A61B2017/00752 , A61B2090/064 , Y10T436/25
摘要： Disclosed herein is a method for extracting a biosubstance from a root of a hair, including the step of using as the hair a hair that has pulling force of at least a predetermined reference value to pull out the hair.
摘要翻译：本发明公开了一种从头发根部提取生物体的方法，包括使头发具有至少预定基准值的拉伸力的头发拉出毛发的步骤。

9. 发明授权

US08326397B2 Mountable unit for biological signal measurement and biological signal measuring method 失效
标题翻译：生物信号测量装置和生物信号测量方法
公开(公告)号：US08326397B2
公开(公告)日：2012-12-04
申请号：US12816709
申请日：2010-06-16
申请人： Kazuhiro Nakagawa
发明人： Kazuhiro Nakagawa
IPC分类号： A61B5/0478 , A61B5/0492
CPC分类号： A61B5/0476 , A61B5/0496 , A61B5/4809 , A61B5/4812 , A61B5/6814
摘要： Disclosed herein is a mountable unit for biological signal measurement, including: three electrodes; and a support body configured to support the three electrodes at positions corresponding to a positional relationship among a predetermined position on a forehead on one side of a face bounded by a midline, a temple position on the one side of the face, and a predetermined position on a zygomatic body on the one side of the face.
摘要翻译：这里公开了一种用于生物信号测量的安装单元，包括：三个电极; 以及支撑体，被配置为将三个电极支撑在与由中线限定的面的一侧上的前额上的预定位置，面部一侧的镜腿位置与预定位置之间的位置关系相对应的位置在面部一侧的z骨体上。

10. 发明申请

US20100291553A1 NUCLEIC ACID STRAND USEFUL IN DETECTING SUBSTANCE AND METHOD THEREOF 审中-公开
标题翻译：核酸链可用于检测物质及其方法
公开(公告)号：US20100291553A1
公开(公告)日：2010-11-18
申请号：US12377560
申请日：2007-08-14
申请人： Kazuhiro Nakagawa
发明人： Kazuhiro Nakagawa
IPC分类号： C12Q1/68
CPC分类号： C12Q1/6804 , C12Q1/6823 , G01N21/6428 , G01N2021/6432 , C12Q2565/1015 , C12Q2525/119 , C12Q2565/101
摘要： To detect an infinitesimal substance with a high sensitivity without amplifying the infinitesimal substance. A nucleic acid strand for detection P having at least a fluorescent substance F which can serve as a donor of resonance excitation energy (fluorescence resonance energy), a quencher substance Q which is located at a position enabling it to receive the resonance excitation energy, and a nucleic acid strand region N which is located between the quencher substance Q and the fluorescent substance F and has an enzyme cleavage site X to be cleaved by an endonuclease; and a detection technique using the nucleic acid strand for detection P.
摘要翻译：以高灵敏度检测无穷大物质，无需扩增无穷大物质。用于检测用的核酸链P具有至少可以作为共振激发能的供体的荧光物质F（荧光共振能），位于能够接收共振激发能的位置的猝灭剂物质Q，以及位于猝灭剂物质Q和荧光物质F之间的核酸链区域N，并且具有被内切核酸酶切割的酶切割位点X. 以及使用该核酸链进行检测的检测技术。

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