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1. 发明授权

US08034177B2 Inner electrode for barrier film formation and apparatus for film formation 有权
标题翻译：用于阻挡膜形成的内部电极和用于成膜的装置
公开(公告)号：US08034177B2
公开(公告)日：2011-10-11
申请号：US11660201
申请日：2005-10-17
申请人： Seiji Goto , Hideo Yamakoshi , Atsushi Ueda , Kenichi Okamoto , Yuji Asahara , Minoru Danno
发明人： Seiji Goto , Hideo Yamakoshi , Atsushi Ueda , Kenichi Okamoto , Yuji Asahara , Minoru Danno
IPC分类号： C23C16/00 , C23C16/50 , C23F1/00 , H01L21/306
CPC分类号： C23C16/26 , C23C16/045 , C23C16/505
摘要： An inner electrode for barrier film formation is an inner electrode for barrier film formation that is inserted inside a plastic container having an opening, supplies a medium gas to the inside of the plastic container, and supplies high frequency power to an outer electrode arranged outside the plastic container, thereby generating discharge plasma on the inner surface of the plastic container to form a barrier film on the inner surface of the plastic container, and that is provided with a gas supply pipe (101) having a gas flow path (101a) to supply a medium gas (G) and an insulating member (103) screwed into an end portion of the gas supply pipe (101) to be flush therewith and having a gas outlet (102) communicated with the gas flow path (101a).
摘要翻译：用于形成阻挡膜的内部电极是插入到具有开口的塑料容器内的用于阻挡膜形成的内部电极，将中等气体供应到塑料容器的内部，并将高频电力提供给布置在外部的外部电极塑料容器，从而在塑料容器的内表面上产生放电等离子体，以在塑料容器的内表面上形成阻挡膜，并且设置有气体供给管（101），该气体供给管具有气体流路（101a）供给与气体供给管（101）的端部螺纹连接的中间气体（G）和绝缘构件（103），与该气体供给管（101）齐平并具有与气体流路（101a）连通的气体出口（102）。

2. 发明申请

US20080017113A1 Inner Electrode for Barrier Film Formation and Apparatus for Film Formation 有权
标题翻译：用于阻挡膜形成的内部电极和用于成膜的装置
公开(公告)号：US20080017113A1
公开(公告)日：2008-01-24
申请号：US11660201
申请日：2005-10-17
申请人： Seiji Goto , Hideo Yamakoshi , Atsushi Ueda , Kenichi Okamoto , Yuji Asahara , Minoru Danno
发明人： Seiji Goto , Hideo Yamakoshi , Atsushi Ueda , Kenichi Okamoto , Yuji Asahara , Minoru Danno
IPC分类号： C23C16/513
CPC分类号： C23C16/26 , C23C16/045 , C23C16/505
摘要： An inner electrode for barrier film formation is an inner electrode for barrier film formation that is inserted inside a plastic container having an opening, supplies a medium gas to the inside of the plastic container, and supplies high frequency power to an outer electrode arranged outside the plastic container, thereby generating discharge plasma on the inner surface of the plastic container to form a barrier film on the inner surface of the plastic container, and that is provided with a gas supply pipe (101) having a gas flow path (101a) to supply a medium gas (G) and an insulating member (103) screwed into an end portion of the gas supply pipe (101) to be flush therewith and having a gas outlet (102) communicated with the gas flow path (101a).
摘要翻译：用于形成阻挡膜的内部电极是插入到具有开口的塑料容器内的用于阻挡膜形成的内部电极，将中等气体供应到塑料容器的内部，并将高频电力提供给布置在外部的外部电极塑料容器，从而在塑料容器的内表面上产生放电等离子体，在塑料容器的内表面上形成阻挡膜，并且设置有具有气体流路（101a）的气体供给管（101）供给与气体供给管（101）的端部螺纹连接的中间气体（G）和绝缘部件（103），与该气体流通通路（101a）连通的气体出口（102）。

3. 发明授权

US08418650B2 Inner electrode for barrier film formation and apparatus for film formation 有权
标题翻译：用于阻挡膜形成的内部电极和用于成膜的装置
公开(公告)号：US08418650B2
公开(公告)日：2013-04-16
申请号：US13229393
申请日：2011-09-09
申请人： Seiji Goto , Hideo Yamakoshi , Atsushi Ueda , Kenichi Okamoto , Yuji Asahara , Minoru Danno
发明人： Seiji Goto , Hideo Yamakoshi , Atsushi Ueda , Kenichi Okamoto , Yuji Asahara , Minoru Danno
IPC分类号： C23C16/00 , C23C16/50 , C23F1/00 , H01L21/306
CPC分类号： C23C16/26 , C23C16/045 , C23C16/505
摘要： An inner electrode for barrier film formation is an inner electrode for barrier film formation that is inserted inside a plastic container having an opening, supplies a medium gas to the inside of the plastic container, and supplies high frequency power to an outer electrode arranged outside the plastic container, thereby generating discharge plasma on the inner surface of the plastic container to form a barrier film on the inner surface of the plastic container, and that is provided with a gas supply pipe having a gas flow path to supply a medium gas and an insulating member screwed into an end portion of the gas supply pipe to be flush therewith and having a gas outlet communicated with the gas flow path.
摘要翻译：用于形成阻挡膜的内部电极是插入到具有开口的塑料容器内的用于阻挡膜形成的内部电极，将中等气体供应到塑料容器的内部，并将高频电力提供给布置在外部的外部电极塑料容器，从而在塑料容器的内表面上产生放电等离子体，以在塑料容器的内表面上形成阻挡膜，并且设置有气体供给管，该气体供给管具有供给中等气体的气体流路，绝缘构件螺纹连接到气体供给管的与其齐平的端部并且具有与气体流路连通的气体出口。

4. 发明申请

US20120000771A1 INNER ELECTRODE FOR BARRIER FILM FORMATION AND APPARATUS FOR FILM FORMATION 有权
标题翻译：用于膜片形成的内部电极和用于膜形成的装置
公开(公告)号：US20120000771A1
公开(公告)日：2012-01-05
申请号：US13229393
申请日：2011-09-09
申请人： Seiji GOTO , Hideo Yamakoshi , Atsushi Ueda , Kenichi Okamoto , Yuji Asahara , Minoru Danno
发明人： Seiji GOTO , Hideo Yamakoshi , Atsushi Ueda , Kenichi Okamoto , Yuji Asahara , Minoru Danno
IPC分类号： C23C14/34
CPC分类号： C23C16/26 , C23C16/045 , C23C16/505
摘要： An inner electrode for barrier film formation is an inner electrode for barrier film formation that is inserted inside a plastic container having an opening, supplies a medium gas to the inside of the plastic container, and supplies high frequency power to an outer electrode arranged outside the plastic container, thereby generating discharge plasma on the inner surface of the plastic container to form a barrier film on the inner surface of the plastic container, and that is provided with a gas supply pipe having a gas flow path to supply a medium gas and an insulating member screwed into an end portion of the gas supply pipe to be flush therewith and having a gas outlet communicated with the gas flow path.
摘要翻译：用于形成阻挡膜的内部电极是插入到具有开口的塑料容器内的用于阻挡膜形成的内部电极，将中等气体供应到塑料容器的内部，并将高频电力提供给布置在外部的外部电极塑料容器，从而在塑料容器的内表面上产生放电等离子体，以在塑料容器的内表面上形成阻挡膜，并且设置有气体供给管，该气体供给管具有供给中等气体的气体流路，绝缘构件螺纹连接到气体供给管的与其齐平的端部并且具有与气体流路连通的气体出口。

5. 发明申请

US20100096393A1 BARRIER-FILM FORMING APPARATUS, BARRIER-FILM FORMING METHOD, AND BARRIER-FILM COATED CONTAINER 有权
标题翻译：遮蔽膜形成装置，遮蔽膜形成方法和遮盖膜涂布容器
公开(公告)号：US20100096393A1
公开(公告)日：2010-04-22
申请号：US12524784
申请日：2007-11-22
申请人： Yuji Asahara , Hideo Yamakoshi , Minoru Danno , Seiji Goto , Akira Shirakura , Masaki Nakaya , Kiyoshi Hiroya
发明人： Yuji Asahara , Hideo Yamakoshi , Minoru Danno , Seiji Goto , Akira Shirakura , Masaki Nakaya , Kiyoshi Hiroya
IPC分类号： B65D23/02 , B65D25/14 , C23C16/50 , C23C16/00
CPC分类号： C23C16/503 , B65D23/02 , B65D25/14 , C23C16/045 , C23C16/509 , H01J37/32348 , H01J37/32623 , H05H1/24 , H05H1/2406 , H05H2001/2412
摘要： A barrier-film forming apparatus that forms a barrier film on an inner face of a container (12) having a concave or convex portion (12a) as a processing target, including: a dielectric member (50) having a cavity sized to enclose the container (12), an external electrode (13) covering an outer circumference of the dielectric member (50), an exhaust unit installed on an end face of the external electrode (13) on a side where a mouth (11) of the container (12) is located, with an insulating member (26) interposed therebetween, and depressurizing inside of the container (12) through an exhaust pipe (14), an internal electrode (17) inserted from a side of the exhaust pipe (14) and also serving as a gas blowout unit that blows out medium gas (19) for generating a barrier film into the container (12), and an electric-field applying unit that applies an electric field for generating exhaust between the external electrode (13) and a ground electrode.
摘要翻译：一种在具有作为加工对象的凹部或凸部（12a）的容器（12）的内面上形成阻挡膜的阻隔膜形成装置，包括：电介质部件（50），其具有被设定为包围容器（12），覆盖电介质构件（50）的外周的外部电极（13），安装在外部电极（13）的端面上的容器（12）的侧面上的排气单元（12），其间插入有绝缘构件（26），并且通过排气管（14）向容器（12）的内部减压，从排气管（14）侧插入的内部电极（17）并且还用作将用于产生阻挡膜的介质气体（19）吹出到容器（12）中的气体吹出单元;以及电场施加单元，其在外部电极（13）之间施加用于产生排气的电场，和接地电极。

6. 发明授权

US08950356B2 Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container 有权
标题翻译：阻隔膜形成装置，阻挡膜形成方法和阻隔膜涂覆容器
公开(公告)号：US08950356B2
公开(公告)日：2015-02-10
申请号：US12524784
申请日：2007-11-22
申请人： Yuji Asahara , Hideo Yamakoshi , Minoru Danno , Seiji Goto , Akira Shirakura , Masaki Nakaya , Kiyoshi Hiroya
发明人： Yuji Asahara , Hideo Yamakoshi , Minoru Danno , Seiji Goto , Akira Shirakura , Masaki Nakaya , Kiyoshi Hiroya
IPC分类号： C23C16/00 , H05H1/24 , B65D23/02 , C23C16/04 , C23C16/509 , H01J37/32
CPC分类号： C23C16/503 , B65D23/02 , B65D25/14 , C23C16/045 , C23C16/509 , H01J37/32348 , H01J37/32623 , H05H1/24 , H05H1/2406 , H05H2001/2412
摘要： A barrier-film forming apparatus that forms a barrier film on an inner face of a container having a concave or convex portion as a processing target, including: a dielectric member having a cavity sized to enclose the container, an external electrode covering an outer circumference of the dielectric member, an exhaust unit installed on an end face of the external electrode on a side where a mouth of the container is located, with an insulating member interposed therebetween, and depressurizing inside of the container through an exhaust pipe, an internal electrode inserted from a side of the exhaust pipe and also serving as a gas blowout unit that blows out medium gas for generating a barrier film into the container, and an electric-field applying unit that applies an electric field for generating exhaust between the external electrode and a ground electrode.
摘要翻译：一种阻隔膜形成装置，其在具有凹部或凸部的容器的内表面上形成阻挡膜作为加工对象，所述阻挡膜形成装置包括：电介质构件，其具有用于封闭所述容器的尺寸的空腔，覆盖外周的外部电极所述绝缘构件安装在所述外部电极的位于所述容器的口侧的端面上的排气单元，其间具有绝缘构件，并且通过排气管对所述容器的内部进行减压，所述内部电极从排气管的一侧插入并且还用作将用于产生阻挡膜的介质气体吹出到容器中的气体吹出单元，以及电场施加单元，其在外部电极和外部电极之间施加用于产生排气的电场接地电极。

7. 发明申请

US20090188430A1 Film Forming Apparatus, Matching Device, and Impedance Control Method 审中-公开
标题翻译：成膜装置，匹配装置和阻抗控制方法
公开(公告)号：US20090188430A1
公开(公告)日：2009-07-30
申请号：US11883580
申请日：2006-01-24
申请人： Satoshi Matsuda , Yuji Asahara , Hideo Yamakoshi , Seiji Goto
发明人： Satoshi Matsuda , Yuji Asahara , Hideo Yamakoshi , Seiji Goto
IPC分类号： B05C11/00
CPC分类号： H05H1/46 , C23C16/26 , C23C16/52 , H05H2001/4682
摘要： The present invention realizes an impedance control for avoiding the extinction of a plasma caused due to a sudden change in a load impedance, which may occur immediately after the plasma is generated. A film-forming apparatus of the present invention includes a power supply; a matching circuit; an electrode configured to receive electric power from the power supply through the matching circuit, and to generate a plasma inside a film forming chamber for accommodating a film forming target based on the electric power; and a control section configured to control an impedance of the matching circuit. The control section keeps the impedance of the matching circuit constant during a first period starting at a first time t1 when the power supply starts to supply the electric power to the electrode, and controls the impedance of the matching circuit based on a reflected-wave power from the electrode for a second period starting at a second time t2 when the first period ends.
摘要翻译：本发明实现了一种阻抗控制，用于避免在等离子体产生后立即发生的负载阻抗突然变化引起的等离子体消光。本发明的成膜装置包括：电源; 匹配电路; 电极，被配置为通过匹配电路从电源接收电力，并且在用于基于电力容纳成膜靶的成膜室内产生等离子体; 以及控制部，被配置为控制所述匹配电路的阻抗。控制部在电源开始向电极供给电力时，在从第一时刻t1开始的第一期间保持匹配电路的阻抗恒定，并且基于反射波功率来控制匹配电路的阻抗从第一时段结束时的第二时刻t2开始的第二期间。

8. 发明授权

US07733563B2 Optical properties restoration apparatus, the restoration method, and an optical system used in the apparatus 失效
标题翻译：光学性能恢复装置，恢复方法以及该装置中使用的光学系统
公开(公告)号：US07733563B2
公开(公告)日：2010-06-08
申请号：US11682794
申请日：2007-03-06
申请人： Satoshi Sakai , Shigenori Tsuruga , Hideo Yamakoshi , Shizuma Kuribayashi , Minoru Danno , Hiroshi Futami , Noriko Yamazaki
发明人： Satoshi Sakai , Shigenori Tsuruga , Hideo Yamakoshi , Shizuma Kuribayashi , Minoru Danno , Hiroshi Futami , Noriko Yamazaki
IPC分类号： G02B5/20
CPC分类号： G02B27/0006 , B08B7/0035 , B08B17/00 , G02B1/14
摘要： An optical system has fluoride compounds provided in an environment exposed by vacuum ultraviolet light or plasma light, which has higher photon energy than an absorption wavelength of a base stock of the optical system. 1-layer of a protective film of SiO2 or metal oxides having a film thickness of 2-20 nm is formed at least on the light irradiation side (inner side) of the optical system to prevent the stripping of the fluorine atoms from the surface of the optical system. In addition, the protective film is a 1-layer film selected from one of SiO2, MgO, TiO2, or ZrO2.
摘要翻译：光学系统具有在由真空紫外线或等离子体光暴露的环境中提供的氟化合物，其具有比光学系统的基础材料的吸收波长更高的光子能量。至少在光学系统的光照射侧（内侧）形成有SiO 2的保护膜或膜厚度为2-20nm的金属氧化物的1层，以防止氟原子从表面剥离光学系统。此外，保护膜是选自SiO 2，MgO，TiO 2或ZrO 2中的一层膜。

9. 发明申请

US20050242379A1 Optical properties restoration apparatus, the restoration method, and an optical system used in the apparatus 有权
标题翻译：光学性能恢复装置，恢复方法以及该装置中使用的光学系统
公开(公告)号：US20050242379A1
公开(公告)日：2005-11-03
申请号：US10833998
申请日：2004-04-29
申请人： Satoshi Sakai , Shigenori Tsuruga , Hideo Yamakoshi , Shizuma Kuribayashi , Minoru Danno , Hiroshi Futami , Noriko Yamazaki
发明人： Satoshi Sakai , Shigenori Tsuruga , Hideo Yamakoshi , Shizuma Kuribayashi , Minoru Danno , Hiroshi Futami , Noriko Yamazaki
IPC分类号： B08B7/00 , B08B17/00 , G02B27/00 , H01L29/76
CPC分类号： G02B27/0006 , B08B7/0035 , B08B17/00 , G02B1/14
摘要： The objectives of the present invention are to prevent or inhibit the deterioration of optical systems that determine the longevity of an optical apparatus which delivers effects such as light transmission, diffraction, reflection, spectrum generation, and interference, and these combinations, and by so doing, decrease the frequency of maintenance operations such as window replacement and to reduce the costs for such operations. This invention is characterized by steps of creating a near vacuum zone with a presence of active energy to excite an oxidation reaction of carbon wherein the near vacuum zone faces the lighting surfaces of the optical system; generating negative ions or radicals in the near vacuum zone such as unstable chemical seeds containing oxygen atoms, such as OH radicals, OH− ions, ozone, O2− ions, O-radicals; and removing or reducing the accumulated carbon which deposits on the lighting surface, by reacting the deposited carbon with the negative ions or radicals. More specifically, the method according to this invention is characterized by the step of supplying active energy while supplying a flow of gases containing oxygen atoms such as water gas or oxidizing gas (for example, water vapor, oxygen, hydrogen peroxide, ozone or mixtures of said gases with inactive gases (including air)) into the near vacuum zone, thereby removing or reducing the accumulated carbon which deposits on the lighting surface by exciting the oxidation reaction of the accumulated carbon with the supplied active energy.
摘要翻译：本发明的目的是防止或抑制光学系统的劣化，这些光学系统确定了传递诸如光透射，衍射，反射，光谱产生和干扰的效果的光学装置的寿命，以及这些组合。，减少窗户更换等维护操作的频率，降低这种操作的成本。本发明的特征在于产生具有活性能量的近真空区以激发碳的氧化反应的步骤，其中近真空区面向光学系统的照明表面; 在近真空区域产生负离子或自由基，例如含有氧原子的不稳定的化学种子，例如OH基，OH - ，O 2 - ， - O - 离子，O-自由基; 以及通过使沉积的碳与负离子或自由基反应来除去或减少沉积在照明表面上的积累的碳。更具体地说，根据本发明的方法的特征在于，在供给含有氧原子的气体流（例如水气或氧化气体（例如水蒸气，氧气，过氧化氢，臭氧或混合气体所述具有惰性气体（包括空气）的气体）进入近真空区域，从而通过激发累积的碳与所提供的活性能的氧化反应去除或减少沉积在照明表面上的积聚的碳。

10. 发明授权

US07813036B2 Optical properties restoration apparatus, the restoration method, and an optical system used in the apparatus 有权
标题翻译：光学性能恢复装置，恢复方法以及该装置中使用的光学系统
公开(公告)号：US07813036B2
公开(公告)日：2010-10-12
申请号：US11682776
申请日：2007-03-06
申请人： Satoshi Sakai , Shigenori Tsuruga , Hideo Yamakoshi , Shizuma Kuribayashi , Minoru Danno , Hiroshi Futami , Noriko Yamazaki
发明人： Satoshi Sakai , Shigenori Tsuruga , Hideo Yamakoshi , Shizuma Kuribayashi , Minoru Danno , Hiroshi Futami , Noriko Yamazaki
IPC分类号： G06K7/10
CPC分类号： G02B27/0006 , B08B7/0035 , B08B17/00 , G02B1/14
摘要： An optical system includes a fluoride compound and has surfaces facing and exposed to plasma installed in an optical equipment which has an inner zone where the plasma exists. A 2 nm-20 nm protective film of a highly plasma-resistant material is formed on the surface of the fluoride compound that is exposed to the plasma.
摘要翻译：光学系统包括氟化合物，并且具有面向和暴露于等离子体的表面，该表面安装在具有等离子体存在的内部区域的光学设备中。在暴露于等离子体的氟化物的表面上形成高等离子体材料的2nm-20nm的保护膜。

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