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    • 5. 发明授权
    • Drive circuit and inverter for voltage driving type semiconductor device
    • 用于电压驱动型半导体器件的驱动电路和逆变器
    • US07782098B2
    • 2010-08-24
    • US12170472
    • 2008-07-10
    • Takayuki HashimotoTakashi HiraoMasaki Shiraishi
    • Takayuki HashimotoTakashi HiraoMasaki Shiraishi
    • H03K3/00
    • H02M3/07H02M1/08H02M7/5387H02M2003/071
    • A drive circuit for driving a semiconductor element is equipped with: a first switch connected to a positive side of a DC power supply; a second switch connected to the other terminal of the first switch and to a negative side of the DC power supply; a third switch connected to the positive side of the DC power supply; a fourth switch connected to the other terminal of the third switch; a fifth switch connected to the other terminal of the fourth switch and to the negative side of the DC power supply; and a capacitor connected to the other terminal of the first switch and to the other terminal of the fourth switch. A gate of the semiconductor element is connected to the other terminal of said third switch; and a source of the semiconductor element is connected to the negative side of the DC power supply.
    • 用于驱动半导体元件的驱动电路配备有:连接到直流电源的正侧的第一开关; 连接到第一开关的另一个端子和直流电源的负极的第二开关; 连接到直流电源的正极的第三开关; 连接到第三开关的另一个端子的第四开关; 连接到第四开关的另一个端子和直流电源的负极的第五开关; 以及电容器,连接到第一开关的另一端子和第四开关的另一端子。 半导体元件的栅极连接到所述第三开关的另一个端子; 并且半导体元件的源极连接到直流电源的负极侧。
    • 10. 发明申请
    • Semiconductor Device and Power Converter
    • 半导体器件和电源转换器
    • US20140334212A1
    • 2014-11-13
    • US14364959
    • 2011-12-15
    • Takayuki HashimotoMutsuhiro Mori
    • Takayuki HashimotoMutsuhiro Mori
    • H01L29/739H01L29/10H02M7/537H01L29/88
    • H01L29/7397H01L27/0727H01L29/0834H01L29/1095H01L29/7395H01L29/861H01L29/88H02M7/537
    • A semiconductor device of this invention (an IGBT with a built-in diode) includes: an n−-type drift layer 1; a p-type channel region 2 that is arranged in contact with the surface side of this n−-type drift layer 1; a gate electrode 5 that is provided in a trench T provided so as to penetrate this p-type channel region 2 and reach to the n−-type drift layer 1 through a gate insulating film 3; an n-type source region 4 that is provided so as to contact the trench T on the surface side of the p-type channel region 2; a high-concentration n-type region 6 that is arranged in contact with the back side of the n−-type drift layer 1; and a high-concentration p-type region 7 that is arranged in contact with the back side of this high-concentration n-type region 6; in which a junction of the high-concentration n-type region 6 and the high-concentration p-type region 7 is a tunnel junction. According to this semiconductor device, it is possible to form the IGBT and the diode on a single chip. Moreover, it is possible to avoid problems of “snap back” and “current concentration.”
    • 本发明的半导体器件(具有内置二极管的IGBT)包括:n型漂移层1; 与该n型漂移层1的表面侧接触的p型沟道区域2; 设置在沟槽T中以设置成穿过该p型沟道区域2并通过栅极绝缘膜3到达n型漂移层1的栅电极5; n型源极区域4,其设置成与p型沟道区域2的表面侧的沟槽T接触; 配置成与n型漂移层1的背面接触的高浓度n型区域6; 以及与该高浓度n型区域6的背面接触的高浓度p型区域7; 其中高浓度n型区域6和高浓度p型区域7的结是隧道结。 根据该半导体器件,可以在单个芯片上形成IGBT和二极管。 此外,可以避免“回弹”和“当前集中”的问题。