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1. 发明申请

US20080052777A1 Method and Apparatus for Managing Shared Passwords on a Multi-User Computer 有权
标题翻译：用于在多用户计算机上管理共享密码的方法和装置
公开(公告)号：US20080052777A1
公开(公告)日：2008-02-28
申请号：US11467812
申请日：2006-08-28
申请人： Seiichi Kawano , Tadanobu Inoue , David C. Challener , Philip L. Childs , Norman A. Dion
发明人： Seiichi Kawano , Tadanobu Inoue , David C. Challener , Philip L. Childs , Norman A. Dion
IPC分类号： H04L9/32 , G06F12/14
CPC分类号： H04L9/088
摘要： A method for managing shared passwords on a multi-user computer system is disclosed. A set of shared passwords and an administrator internal key are initially generated. After the receipt of an administrator external key, the administrator internal key is encrypted with the administrator external key. For each user level within the computer system, an internal key is generated by hashing the administrator internal key. For each user level within the computer system, each of the shared passwords encrypted with a respective one of the internal keys. The internal keys and the encrypted shared passwords are then stored in a non-volatile storage device.
摘要翻译：公开了一种在多用户计算机系统上管理共享密码的方法。最初生成一组共享密码和管理员内部密钥。收到管理员外部密钥后，管理员内部密钥由管理员外部密钥加密。对于计算机系统内的每个用户级别，通过散列管理员内部密钥来生成内部密钥。对于计算机系统内的每个用户级别，每个共享密码用相应的一个内部密钥加密。然后将内部密钥和加密的共享密码存储在非易失性存储设备中。

2. 发明授权

US07900252B2 Method and apparatus for managing shared passwords on a multi-user computer 有权
标题翻译：用于在多用户计算机上管理共享密码的方法和装置
公开(公告)号：US07900252B2
公开(公告)日：2011-03-01
申请号：US11467812
申请日：2006-08-28
申请人： Seiichi Kawano , Tadanobu Inoue , David C. Challener , Philip L. Childs , Norman A. Dion, II
发明人： Seiichi Kawano , Tadanobu Inoue , David C. Challener , Philip L. Childs , Norman A. Dion, II
IPC分类号： G06F12/00 , G06F12/14 , H04L9/00 , H04L29/06
CPC分类号： H04L9/088
摘要： A method for managing shared passwords on a multi-user computer system is disclosed. A set of shared passwords and an administrator internal key are initially generated. After the receipt of an administrator external key, the administrator internal key is encrypted with the administrator external key. For each user level within the computer system, an internal key is generated by hashing the administrator internal key. For each user level within the computer system, each of the shared passwords encrypted with a respective one of the internal keys. The internal keys and the encrypted shared passwords are then stored in a non-volatile storage device.
摘要翻译：公开了一种在多用户计算机系统上管理共享密码的方法。最初生成一组共享密码和管理员内部密钥。收到管理员外部密钥后，管理员内部密钥由管理员外部密钥加密。对于计算机系统内的每个用户级别，通过散列管理员内部密钥来生成内部密钥。对于计算机系统内的每个用户级别，每个共享密码用相应的一个内部密钥加密。然后将内部密钥和加密的共享密码存储在非易失性存储设备中。

3. 发明申请

US20080168545A1 Method for Performing Domain Logons to a Secure Computer Network 审中-公开
标题翻译：执行域登录到安全计算机网络的方法
公开(公告)号：US20080168545A1
公开(公告)日：2008-07-10
申请号：US11621288
申请日：2007-01-09
申请人： Tadanobu Inoue , Seiichi Kawano , David C. Challener , Philip L. Childs
发明人： Tadanobu Inoue , Seiichi Kawano , David C. Challener , Philip L. Childs
IPC分类号： H04L9/32 , G06F13/00
CPC分类号： H04L63/0815 , G06F21/41
摘要： A method for performing a domain logon to a computer network is disclosed. A secure storage area containing user identification information and domain password information corresponding to the user identification information is provided. In response to a receipt of a user-entered user identification and a user-entered domain password by a first module of a Windows® operating system, the domain password information stored in the secure storage area and the corresponding user identification information are written to a registry of the Windows® operating system. Authentication for domain logon is then performed by a second module of the Windows® operating system based on the received domain password and the domain password information written to the registry of the Windows® operating system. After the authentication, the domain password information is subsequently removed by the first module of the Windows® operating system from the registry of the Windows® operating system.
摘要翻译：公开了一种对计算机网络执行域登录的方法。提供了包含与用户识别信息对应的用户识别信息和域密码信息的安全存储区域。响应于Windows操作系统的第一模块接收到用户输入的用户标识和用户输入的域密码，存储在安全存储区域中的域密码信息和相应的用户标识信息被写入到Windows（R）操作系统的注册表。基于收到的域密码和写入Windows（R）操作系统的注册表的域密码信息，由Windows（R）操作系统的第二个模块执行域登录验证。在认证之后，域密码信息随后由Windows（R）操作系统的注册表从Windows（R）操作系统的第一模块移除。

4. 发明授权

US08156331B2 Information transfer 有权
标题翻译：信息传递
公开(公告)号：US08156331B2
公开(公告)日：2012-04-10
申请号：US11779750
申请日：2007-07-18
申请人： Seiichi Kawano , Tadanobu Inoue
发明人： Seiichi Kawano , Tadanobu Inoue
IPC分类号： H04L29/06
CPC分类号： H04L9/00 , G06F21/62 , G06F21/6263 , G06F21/6281 , G06F2221/2105 , H04L2209/60 , H04L2209/76
摘要： Methods and apparatus are provided for securely inputting highly confidential information, exchanging the information via a network, and securely reflecting the information in a computer, without the information being stolen by malicious software. Upon a transfer of encrypted information from a server to a computer, the transferred information is stored in a memory of the computer and the computer is switched to a suspended state and immediately thereafter returns to the previous state to be shifted to under the control of a BIOS. The information stored in the memory is decrypted and processed there. Processing information generated based on the processed information is then encrypted and it is transferred to the server after the computer is switched to under the control of the operating system.
摘要翻译：提供方法和装置，用于安全地输入高度机密信息，通过网络交换信息，并将信息安全地反映在计算机中，而不会使信息被恶意软件窃取。在将加密信息从服务器传送到计算机时，所传送的信息被存储在计算机的存储器中，并且计算机被切换到暂停状态，并且立即返回到先前状态以转移到在 BIOS。存储在存储器中的信息在那里被解密和处理。然后，基于处理后的信息生成的处理信息被加密，并且在操作系统的控制下将计算机切换到之后将其传送到服务器。

5. 发明申请

US20080022099A1 INFORMATION TRANSFER 有权
标题翻译：信息转移
公开(公告)号：US20080022099A1
公开(公告)日：2008-01-24
申请号：US11779750
申请日：2007-07-18
申请人： Seiichi Kawano , Tadanobu Inoue
发明人： Seiichi Kawano , Tadanobu Inoue
IPC分类号： H04L9/00
CPC分类号： H04L9/00 , G06F21/62 , G06F21/6263 , G06F21/6281 , G06F2221/2105 , H04L2209/60 , H04L2209/76
摘要： Methods and apparatus are provided for securely inputting highly confidential information, exchanging the information via a network, and securely reflecting the information in a computer, without the information being stolen by malicious software. Upon a transfer of encrypted information from a server to a computer, the transferred information is stored in a memory of the computer and the computer is switched to a suspended state and immediately thereafter returns-to the previous state to be shifted to under the control of a BIOS. The information stored in the memory is decrypted and processed there. Processing information generated based on the processed information is then encrypted and it is transferred to the server after the computer is switched to under the control of the operating system.
摘要翻译：提供方法和装置，用于安全地输入高度机密信息，通过网络交换信息，并将信息安全地反映在计算机中，而不会使信息被恶意软件窃取。在将加密信息从服务器传送到计算机时，传送的信息被存储在计算机的存储器中，并且计算机被切换到暂停状态，并且立即返回到先前状态，以在一个BIOS。存储在存储器中的信息在那里被解密和处理。然后，基于处理后的信息生成的处理信息被加密，并且在操作系统的控制下将计算机切换到之后将其传送到服务器。

6. 发明申请

US20130019211A1 Optimizing lithographic mask for manufacturability in efficient manner 失效
标题翻译：以有效的方式优化光刻面具的可制造性
公开(公告)号：US20130019211A1
公开(公告)日：2013-01-17
申请号：US13183070
申请日：2011-07-14
申请人： Masaharu Sakamoto , Alan E. Rosenbluth , Marc Alan Szeto-Millstone , Tadanobu Inoue , Kehan Tian , Andreas Waechter , Jonathan Lee , David Osmond Melville
发明人： Masaharu Sakamoto , Alan E. Rosenbluth , Marc Alan Szeto-Millstone , Tadanobu Inoue , Kehan Tian , Andreas Waechter , Jonathan Lee , David Osmond Melville
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F2217/12 , Y02P90/265
摘要： Mask layout data of a lithographic mask includes polygons that each include horizontal and vertical edges. Each of a number of target edge pairs is defined by two edges of one or more of the polygons. A search box having a boundary coincident with a given edge of the edges of the polygons is specified. Whether the search box includes at least one edge of the edges of the polygons in addition to the given edge is determined. Where the search box includes at least one edge, at least one of the target edge pairs is specified as including the given edge and one of the at least one edge. For each target edge pair that has been specified, a manufacturability penalty value is determined. A dynamic manufacturability constraint table and a non-zero multiplier table are maintained.
摘要翻译：光刻掩模的掩模布局数据包括各自包括水平和垂直边缘的多边形。多个目标边对中的每一个由一个或多个多边形的两个边界定义。指定具有与多边形的边缘的给定边缘重合的边界的搜索框。确定搜索框是否包括除了给定边缘之外的多边形的边缘的至少一个边缘。在搜索框包括至少一个边缘的情况下，目标边缘对中的至少一个被指定为包括给定边缘和至少一个边缘中的一个边缘。对于已经指定的每个目标边对，确定可制造性惩罚值。维持动态可制造性约束表和非零乘数表。

7. 发明申请

US20100254849A1 MAGNESIUM ALLOY 有权
标题翻译：镁合金
公开(公告)号：US20100254849A1
公开(公告)日：2010-10-07
申请号：US12734001
申请日：2008-10-02
申请人： Toshiji Mukai , Hidetoshi Somekawa , Tadanobu Inoue , Alok Singh
发明人： Toshiji Mukai , Hidetoshi Somekawa , Tadanobu Inoue , Alok Singh
IPC分类号： C22C23/02
CPC分类号： C22F1/06 , C22C1/002 , C22C23/02 , C22F1/00
摘要： An object of the invention is to provide a magnesium alloy having high strength and sufficient formability. A magnesium alloy mainly contains magnesium and has high tensile strength and high compression strength. The crystal grain structure of the alloy has a high angle grain boundary, and the inside of the crystal grain surrounded by the high angle grain boundary is composed of subgrains.
摘要翻译：本发明的目的是提供一种具有高强度和充分成形性的镁合金。镁合金主要含镁，抗拉强度高，抗压强度高。合金的晶粒结构具有高角度晶界，由高角度晶界包围的晶粒内部由亚晶粒构成。

8. 发明申请

US20100153902A1 DETERMINING MANUFACTURABILITY OF LITHOGRAPHIC MASK BY SELECTING TARGET EDGE PAIRS USED IN DETERMINING A MANUFACTURING PENALTY OF THE LITHOGRAPHIC MASK 有权
标题翻译：通过选择用于确定LITHOGRAPHIC MASK的制造性罚款中使用的目标边缘对方法来确定LITHOGRAPHIC MASK的可制造性
公开(公告)号：US20100153902A1
公开(公告)日：2010-06-17
申请号：US12334485
申请日：2008-12-14
申请人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Kehan Tian , Masaharu Sakamoto , Alan E. Rosenbluth
发明人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Kehan Tian , Masaharu Sakamoto , Alan E. Rosenbluth
IPC分类号： G06F17/50
CPC分类号： G03F1/68 , G03F1/78
摘要： The manufacturability of a lithographic mask employed in fabricating instances of a semiconductor device is determined. Target edges are selected from mask layout data of the lithographic mask. The mask layout data includes polygons distributed over cells, where each polygon has edges. The cells include a center cell, two vertical cells above and below the center cell, and two horizontal cells to the left and right of the center cell. Target edge pairs are selected for determining a manufacturing penalty in making the lithographic mask, in a manner that decreases the computational volume in determining the manufacturing penalty. The manufacturability of the lithographic mask, including the manufacturing penalty in making the lithographic mask, is determined based on the target edge pairs selected. The manufacturability of the lithographic mask is output. The manufacturability of the lithographic mask is dependent on the manufacturing penalty in making the lithographic mask.
摘要翻译：确定用于制造半导体器件的实例的光刻掩模的可制造性。从光刻掩模的掩模布局数据中选择目标边缘。掩模布局数据包括分布在单元格上的多边形，其中每个多边形具有边。小区包括中心小区，中心小区上方和下方的两个垂直小区以及中心小区左侧和右侧的两个水平小区。选择目标边对以确定在制作光刻掩模时的制造损失，以减小计算体积来确定制造损失。基于所选择的目标边缘对来确定光刻掩模的可制造性，包括制造光刻掩模的制造损失。输出光刻掩模的可制造性。光刻掩模的可制造性取决于制造光刻掩模的制造损失。

9. 发明授权

US08056026B2 Determining manufacturability of lithographic mask by selecting target edge pairs used in determining a manufacturing penalty of the lithographic mask 有权
标题翻译：通过选择用于确定光刻掩模的制造损失的目标边缘对来确定光刻掩模的可制造性
公开(公告)号：US08056026B2
公开(公告)日：2011-11-08
申请号：US12334485
申请日：2008-12-14
申请人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Kehan Tian , Masahura Sakamoto , Alan E. Rosenbluth
发明人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Kehan Tian , Masahura Sakamoto , Alan E. Rosenbluth
IPC分类号： G06F17/50
CPC分类号： G03F1/68 , G03F1/78
摘要： The manufacturability of a lithographic mask employed in fabricating instances of a semiconductor device is determined. Target edges are selected from mask layout data of the lithographic mask. The mask layout data includes polygons distributed over cells, where each polygon has edges. The cells include a center cell, two vertical cells above and below the center cell, and two horizontal cells to the left and right of the center cell. Target edge pairs are selected for determining a manufacturing penalty in making the lithographic mask, in a manner that decreases the computational volume in determining the manufacturing penalty. The manufacturability of the lithographic mask, including the manufacturing penalty in making the lithographic mask, is determined based on the target edge pairs selected. The manufacturability of the lithographic mask is output. The manufacturability of the lithographic mask is dependent on the manufacturing penalty in making the lithographic mask.
摘要翻译：确定用于制造半导体器件的实例的光刻掩模的可制造性。从光刻掩模的掩模布局数据中选择目标边缘。掩模布局数据包括分布在单元格上的多边形，其中每个多边形具有边。小区包括中心小区，中心小区上方和下方的两个垂直小区以及中心小区左侧和右侧的两个水平小区。选择目标边对以确定在制作光刻掩模时的制造损失，以减小计算体积来确定制造损失。基于所选择的目标边缘对来确定光刻掩模的可制造性，包括制造光刻掩模的制造损失。输出光刻掩模的可制造性。光刻掩模的可制造性取决于制造光刻掩模的制造损失。

10. 发明授权

US08056023B2 Determining manufacturability of lithographic mask by reducing target edge pairs used in determining a manufacturing penalty of the lithographic mask 有权
标题翻译：通过减少用于确定光刻掩模的制造损失的目标边缘对来确定光刻掩模的可制造性
公开(公告)号：US08056023B2
公开(公告)日：2011-11-08
申请号：US12334482
申请日：2008-12-14
申请人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Kehan Tian , Masahura Sakamoto , Alan E. Rosenbluth
发明人： Tadanobu Inoue , David O. Melville , Hidemasa Muta , Kehan Tian , Masahura Sakamoto , Alan E. Rosenbluth
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： The manufacturability of a lithographic mask employed in fabricating instances of a semiconductor device is determined. Target edge pairs are selected from mask layout data of the lithographic mask to determine a manufacturing penalty in making the lithographic mask. The mask layout data includes polygons, where each polygon has edges, and where each target edge pair is defined by two of the edges of one or more of the polygons. The number of the target edge pairs is reduced to decrease computational volume in determining the manufacturing penalty in making the lithographic mask. The manufacturability of the lithographic mask, including the manufacturing penalty in making the lithographic mask, is determined based on the target edge pairs as reduced in number. The manufacturability of the lithographic mask is output. The manufacturability of the lithographic mask is dependent on the manufacturing penalty in making the lithographic mask.
摘要翻译：确定用于制造半导体器件的实例的光刻掩模的可制造性。从光刻掩模的掩模布局数据中选择目标边缘对，以确定在制作光刻掩模时的制造损失。掩模布局数据包括多边形，其中每个多边形具有边缘，并且其中每个目标边对对由一个或多个多边形的两个边缘限定。在确定制作光刻掩模时的制造损失时，减少目标边缘对的数量以减少计算量。基于减少数量的目标边缘对来确定光刻掩模的可制造性，包括制造光刻掩模的制造损失。输出光刻掩模的可制造性。光刻掩模的可制造性取决于制造光刻掩模的制造损失。

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