会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明授权
    • Method of making an address plate
    • 制作地址栏的方法
    • US07642039B2
    • 2010-01-05
    • US11365049
    • 2006-03-01
    • John R. FysonChristopher B. Rider
    • John R. FysonChristopher B. Rider
    • G03F7/26
    • G03F7/0035
    • A method of producing an address plate comprising the steps of; coating a layer of conducting inorganic material onto a substrate, coating a layer of photoresist above this layer of conductive material and curing this layer, exposing, through a mask, the desired pattern of the conductors onto the layer of photoresist, developing the photoresist and etching the layer of the conductive material and coating the resulting etched layer with a layer of dielectric material. A further layer of photoresist is then applied, the thickness of this layer being equal to the desired height of a relief pattern, curing the further layer of photoresist, exposing, through a second mask, the desired structure of the relief pattern onto the layer of photoresist, developing the photoresist and allowing the layer to dry. This results in spacers raised above the layer of dielectric material.
    • 一种产生寻址板的方法,包括以下步骤: 将一层导电无机材料涂覆到基材上,在该导电材料层上涂覆一层光致抗蚀剂并固化该层,通过掩模将导体的所需图案暴露在光致抗蚀剂层上,显影光致抗蚀剂和蚀刻 导电材料层并用一层电介质材料涂覆所得蚀刻层。 然后施加另一层光致抗蚀剂,该层的厚度等于凸版图案的期望高度,固化另外的光致抗蚀剂层,通过第二掩模将浮雕图案的期望结构暴露于 光致抗蚀剂,显影光致抗蚀剂并使层干燥。 这导致在电介质材料层之上升起的间隔物。
    • 6. 发明授权
    • Method of forming a patterned conductive structure
    • 形成图案化导电结构的方法
    • US07501071B2
    • 2009-03-10
    • US11365050
    • 2006-03-01
    • John R. FysonChristopher B. Rider
    • John R. FysonChristopher B. Rider
    • B44C1/22H01L21/302
    • G02F1/136286G02F1/133512
    • A method of producing a patterned mirror on a transparent conductive substrate comprises the steps of; coating a layer of conductive material onto a substrate, coating a layer of metal onto the layer of conductive material, coating a layer of photoresist onto the layer of metal, curing the layer of photoresist, exposing a desired pattern of transparent conductors through a first mask onto the layer of photoresist, developing the photoresist and simultaneously etching the layer of the conductive material and the layer of metal, exposing a desired pattern of metal conductors through a second mask onto the remaining layer of photoresist, developing the photoresist and etching the layer of metal.
    • 在透明导电基板上制造图案化反射镜的方法包括以下步骤: 将一层导电材料涂覆到基底上,将一层金属涂覆到导电材料层上,将光致抗蚀剂层涂覆到金属层上,固化光致抗蚀剂层,通过第一掩模曝光所需图案的透明导体 在光致抗蚀剂层上显影,同时蚀刻导电材料层和金属层,将期望的金属导体图案通过第二掩模暴露在剩余的光致抗蚀剂层上,显影光致抗蚀剂并蚀刻 金属。
    • 7. 发明授权
    • Method of registering a spacer with a conducting track
    • 用导电轨迹配准间隔物的方法
    • US07361379B2
    • 2008-04-22
    • US11365251
    • 2006-03-01
    • John R. FysonChristopher B. Rider
    • John R. FysonChristopher B. Rider
    • B05D5/12
    • G02F1/1339
    • A method of producing a relief structure on a patterned conductor comprises the steps of; coating a layer of conductive material onto a transparent substrate, coating a layer of metal onto the layer of conductive material, coating a layer of photoresist onto the layer of metal, curing the layer of photoresist, exposing a desired pattern of transparent conductors through a first mask onto the layer of photoresist, developing the photoresist and simultaneously etching the layer of the conductive material and the layer of metal, exposing a desired pattern of metal conductors through a second mask onto the remaining layer of photoresist, developing the photoresist and etching the layer of metal, applying a further layer of photoresist, curing the further layer of photoresist, exposing the further layer of photoresist thorough the substrate, developing the photoresist and allowing the layer to dry, resulting in a pattern of spacers/reliefs in registration with the metal conductors.
    • 在图案化导体上制造浮雕结构的方法包括以下步骤: 将一层导电材料涂覆到透明基板上,将一层金属涂覆到导电材料层上,将一层光致抗蚀剂涂覆到金属层上,固化该光致抗蚀剂层,将期望的透明导体图案暴露于第一层 掩模到光致抗蚀剂层上,显影光致抗蚀剂并同时蚀刻导电材料和金属层,将期望的金属导体图案通过第二掩模暴露在剩余的光致抗蚀剂层上,显影光刻胶并蚀刻该层 的金属,施加另外的光致抗蚀剂层,固化另外的光致抗蚀剂层,将另外的光致抗蚀剂层暴露于基底,显影光致抗蚀剂并使该层变干,从而形成与金属对准的间隔物/浮雕的图案 导体