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1. 发明申请

US20080248423A1 Chemically amplified resist composition 有权
公开(公告)号：US20080248423A1
公开(公告)日：2008-10-09
申请号：US12076529
申请日：2008-03-19
申请人： Satoshi YAMAGUCHI , Yoshiyuki TAKATA , Kaoru ARAKI
发明人： Satoshi YAMAGUCHI , Yoshiyuki TAKATA , Kaoru ARAKI
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122
摘要： A chemically amplified resist composition comprising:(A) a salt represented by the formula (I): wherein R21 represents a C1-C30 hydrocarbon group etc., Q1 and Q2 each independently represent a fluorine atom etc., and A+ represents at least one organic cation selected from a cation represented by the formula (Ia): wherein P1, P2 and P3 each independently represent a C1-C30 alkyl group etc., a cation represented by the formula (Ib): wherein P4 and P5 each independently represent a hydrogen atom etc., and a cation represented by the formula (Ic): wherein P10, P11, P12, P13, P14, P15, P16, P17, P18, P19, P20 and P21 each independently represent a hydrogen atom etc., B represents a sulfur or oxygen atom and m represents 0 or 1, (B) a salt represented by the formula (II): A′+−E (II) wherein A′+ represents at least one organic cation selected from cations represented by the above-mentioned formulae (Ia), (Ib) and (Ic), and E− represents at least one organic anion selected from an anion represented by the formula (II-1): −O3SQ3 (II-1) wherein Q3 represents a C1-C10 perfluoroalkyl group, and an anion represented by the formula (II-2): wherein Q4 represents a C1-C10 perfluoroalkyl group, and (C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.

2. 发明申请

US20080193874A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION 有权
标题翻译：化学稳定组分
公开(公告)号：US20080193874A1
公开(公告)日：2008-08-14
申请号：US12021149
申请日：2008-01-28
申请人： Yoshiyuki TAKATA , Satoshi YAMAMOTO , Satoshi YAMAGUCHI
发明人： Yoshiyuki TAKATA , Satoshi YAMAMOTO , Satoshi YAMAGUCHI
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a chemically amplified resist composition comprising:a resin which comprises a structural unit having an acid-labile group and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one —CH2— is substituted with —COO—, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and at least two salts selected from a salt represented by the formula (II): wherein Y1 and Y2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A+ represents an organic counter ion and R21 represents a C1-C30 hydrocarbon group which may be substituted and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —CO— or —O—, and a salt represented by the formula (III): A′+−O3S—R23 (III) wherein R23 represents a C1-C8 linear or branched chain perfluoroalkyl group and A′+ represents an organic counter ion.
摘要翻译：本发明提供一种化学放大抗蚀剂组合物，其包括：树脂，其包含具有酸不稳定基团的结构单元和由式（I）表示的结构单元：其中R 1表示氢原子或甲基，环X表示其中一个-CH 2 - 被-COO-取代的C 3 -C 30环烃基，和C 3 -C 30环烃基中的至少一个氢原子可以被取代，p表示1〜4的整数，其本身在碱性水溶液中不溶或难溶，但通过酸的作用而溶于碱性水溶液中，并且选自：由式（II）表示的盐：其中Y 1和Y 2各自独立地表示氟原子或C 1 -C 6全氟烷基， SUP>表示有机抗衡离子，R 21表示可以被取代的C 1 -C 30烃基， C1-C30烃基中的至少一个-CH 2 - 可以被-CO-或-O-取代，和由式（III）表示的盐：<β在线式描述=“在线公式”end =“lead”？> A'^{+ - O 3 3 -line-formula description =“In-line Formulas”end =“tail”？>其中R 23表示C1-C8直链或支链全氟烷基，A'+ SUP >表示有机抗衡离子。}

3. 发明申请

US20080220369A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION 审中-公开
标题翻译：化学稳定组分
公开(公告)号：US20080220369A1
公开(公告)日：2008-09-11
申请号：US12042242
申请日：2008-03-04
申请人： Satoshi YAMAGUCHI , Yoshiyuki TAKATA , Satoshi YAMAMOTO
发明人： Satoshi YAMAGUCHI , Yoshiyuki TAKATA , Satoshi YAMAMOTO
IPC分类号： G03F7/027
CPC分类号： C07C381/12 , C07C309/06 , C07C309/17 , C07C2603/74 , C07D307/20 , C07D307/77 , C07D309/10 , C07D333/46 , G03F7/0045 , G03F7/0397
摘要： The present invention provides a chemically amplified resist composition containing: (A) a salt represented by the formula (I): A+−O3S-Q1 (I) wherein A+ and Q1 are defined in the specification; (B) a salt represented by the formula (II): wherein R22, A3, A4 and A′+ are defined in the specification; and (C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：本发明提供一种化学放大抗蚀剂组合物，其含有：（A）由式（I）表示的盐：<？in-line-formula description =“In-line formula”end =“lead”？> （I）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中 A +和Q 1是在说明书中定义的; （B）由式（II）表示的盐：其中R 22，A 3，A 4和A'+ 在规范中定义; 和（C）含有具有酸不稳定基团的结构单元的树脂，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

4. 发明申请

US20080274426A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION 有权
标题翻译：化学稳定组分
公开(公告)号：US20080274426A1
公开(公告)日：2008-11-06
申请号：US12052189
申请日：2008-03-20
申请人： Yusuke FUJI , Yoshiyuki TAKATA
发明人： Yusuke FUJI , Yoshiyuki TAKATA
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a chemically amplified resist composition comprising: (A) a resin which comprises (a) a structural unit having an acid-labile group, (b) a structural unit having at least one hydroxyl group, (c) a structural unit having at least one lactone structure, and (d) a structural unit represented by the formula (Ia) or (Ib): wherein R1 represents a hydrogen atom or a methyl group, R3 represents a methyl group, n represents an integer of 0 to 14, and Z represents a single bond or —[CH2]k—COO—, and (B) at least one acid generator.
摘要翻译：本发明提供一种化学放大抗蚀剂组合物，其包含：（A）树脂，其包含（a）具有酸不稳定基团的结构单元，（b）具有至少一个羟基的结构单元，（c）结构单元具有至少一个内酯结构，和（d）由式（Ia）或（Ib）表示的结构单元：其中R 1表示氢原子或甲基，R 3 表示甲基，n表示0〜14的整数，Z表示单键或 - [CH 2 SO 2 -COO-，和（B）至少一种酸发生剂。

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