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1. 发明授权

US08430967B2 Hydrophobicizing apparatus, hydrophobicizing method and storage medium 有权
标题翻译：疏水装置，疏水化方法和储存介质
公开(公告)号：US08430967B2
公开(公告)日：2013-04-30
申请号：US12859927
申请日：2010-08-20
申请人： Satoshi Shimmura , Tetsuo Fukuoka , Takahiro Kitano
发明人： Satoshi Shimmura , Tetsuo Fukuoka , Takahiro Kitano
IPC分类号： C23C16/00
CPC分类号： C23C16/24 , C23C16/4485
摘要： The hydrophobicizing apparatus includes a vaporizing surface forming member of which surface is located in a vaporizing room; a vaporizing surface heating unit that heats the vaporizing surface forming member; a liquid chemical supply port that supplies a liquid chemical for a hydrophobicizing process on the surface of the vaporizing surface forming member; a gas inlet port that introduces a carrier gas into the vaporizing room; an outlet port that supplies a hydrophobicizing gas vaporized in the vaporizing room; and a processing chamber that performs the hydrophobicizing process on a substrate accommodated therein by the hydrophobicizing gas supplied through the outlet port. With this configuration, the hydrophobicizing gas of a high concentration can be supplied onto the substrate. Further, since the stored liquid chemical is not in contact with the carrier gas when a process is not being performed, degradation of the liquid chemical is suppressed.
摘要翻译：疏水化装置包括表面位于蒸发室内的蒸发表面形成构件; 蒸发表面加热单元，其加热蒸发表面形成构件; 在蒸发表面形成构件的表面上提供用于疏水化处理的液体化学品的液体化学物质供给口; 将载气引入蒸发室的气体入口; 提供在蒸发室中蒸发的疏水化气体的出口; 以及处理室，其通过由出口供给的疏水化气体在容纳在其中的基板上进行疏水化处理。利用这种结构，能够将高浓度的疏水化气体供给到基板上。此外，由于当不进行处理时，储存的液体化学品不与载气接触，所以抑制了液体化学物质的劣化。

2. 发明申请

US20110045166A1 HYDROPHOBICIZING APPARATUS, HYDROPHOBICIZING METHOD AND STORAGE MEDIUM 有权
标题翻译：疏水化设备，疏水化方法和储存介质
公开(公告)号：US20110045166A1
公开(公告)日：2011-02-24
申请号：US12859927
申请日：2010-08-20
申请人： Satoshi Shimmura , Tetsuo Fukuoka , Takahiro Kitano
发明人： Satoshi Shimmura , Tetsuo Fukuoka , Takahiro Kitano
IPC分类号： C23C16/52 , C23C16/22
CPC分类号： C23C16/24 , C23C16/4485
摘要： The hydrophobicizing apparatus includes a vaporizing surface forming member of which surface is located in a vaporizing room; a vaporizing surface heating unit that heats the vaporizing surface forming member; a liquid chemical supply port that supplies a liquid chemical for a hydrophobicizing process on the surface of the vaporizing surface forming member; a gas inlet port that introduces a carrier gas into the vaporizing room; an outlet port that supplies a hydrophobicizing gas vaporized in the vaporizing room; and a processing chamber that performs the hydrophobicizing process on a substrate accommodated therein by the hydrophobicizing gas supplied through the outlet port. With this configuration, the hydrophobicizing gas of a high concentration can be supplied onto the substrate. Further, since the stored liquid chemical is not in contact with the carrier gas when a process is not being performed, degradation of the liquid chemical is suppressed.
摘要翻译：疏水化装置包括表面位于蒸发室内的蒸发表面形成构件; 蒸发表面加热单元，其加热蒸发表面形成构件; 在蒸发表面形成构件的表面上提供用于疏水化处理的液体化学品的液体化学物质供给口; 将载气引入蒸发室的气体入口; 提供在蒸发室中蒸发的疏水化气体的出口; 以及处理室，其通过由出口供给的疏水化气体在容纳在其中的基板上进行疏水化处理。利用这种结构，能够将高浓度的疏水化气体供给到基板上。此外，由于当不进行处理时，储存的液体化学品不与载气接触，所以抑制了液体化学物质的劣化。

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