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1. 发明授权

US5702861A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US5702861A
公开(公告)日：1997-12-30
申请号：US791166
申请日：1997-01-30
申请人： Satoshi Niikura , Takako Suzuki , Kousuke Doi , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Satoshi Niikura , Takako Suzuki , Kousuke Doi , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7/004 , G03F7/022 , G03F7/023 , H01L21/027
CPC分类号： G03F7/0226
摘要： A positive photoresist composition comprising: (A) an alkali-soluble resin; (B) a quinone diazide group-containing compound; and (C) at least one compound selected from the polyhydroxy compounds, such as 1,3-bis�2-(5-cyclohexyl-2-methyl-4-hydroxyphenyl)-2-propyl!benzene. The composition of the present invention exhibits excellent image contrast between exposed portions and unexposed portions, and actualizes formation of a resist pattern with excellent resolution, exposure range, and focal depth range.
摘要翻译：一种正性光致抗蚀剂组合物，其包含：（A）碱溶性树脂; （B）含醌二叠氮基的化合物; 和（C）至少一种选自多羟基化合物的化合物，例如1,3-双[2-（5-环己基-2-甲基-4-羟基苯基）-2-丙基]苯。本发明的组合物在曝光部分和未曝光部分之间显示出优异的图像对比度，并且实现了具有优异的分辨率，曝光范围和焦深范围的抗蚀剂图案的形成。

2. 发明授权

US06300033B1 Positive photoresist composition and process for forming resist pattern 有权
标题翻译：正型光致抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US06300033B1
公开(公告)日：2001-10-09
申请号：US09318601
申请日：1999-05-26
申请人： Takako Suzuki , Kousuke Doi , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Takako Suzuki , Kousuke Doi , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7023
CPC分类号： G03F7/2002 , G03F7/022
摘要： In a positive photoresist composition including (A) an alkali-soluble resin and (B) a photosensitizer, Ingredient (B) contains (B-1) a quinonediazide ester of, e.g., bis[2,5-dimethyl-3-(2-hydroxy-5-methylbenzyl)-4-hydroxyphenyl]methane or 2,4-bis[4-hydroxy-3-(4-hydroxybenzyl)-5-methylbenzyl]-6-cyclohexylphenol, and (B-2) a quinonediazide ester of, e.g., methyl gallate or 2,2-bis(2,3,4-trihydroxyphenyl)propane. The composition exhibits high sensitivity and definition, and improved focal depth range properties and underexposure margin.
摘要翻译：在包含（A）碱溶性树脂和（B）光敏剂的正性光致抗蚀剂组合物中，成分（B）含有（B-1）例如双[2,5-二甲基-3-（2 - 羟基-5-甲基苄基）-4-羟基苯基]甲烷或2,4-双[4-羟基-3-（4-羟基苄基）-5-甲基苄基] -6-环己基苯酚和（B-2）醌二叠氮化物例如没食子酸甲酯或2,2-双（2,3,4-三羟基苯基）丙烷。该组合物具有高灵敏度和清晰度，改善了焦深范围特性和曝光不足。

3. 发明授权

US06406827B2 Positive photoresist composition and process for forming resist pattern 失效
标题翻译：正型光致抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US06406827B2
公开(公告)日：2002-06-18
申请号：US09322023
申请日：1999-05-28
申请人： Takako Suzuki , Kousuke Doi , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Takako Suzuki , Kousuke Doi , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7023
CPC分类号： G03F7/023 , G03F7/0226
摘要： A positive photoresist composition includes (A) an alkali-soluble resin, (B) a quinonediazide ester of, e.g., bis[2,5-dimethyl-3-(2-hydroxy-5-methylbenzyl)-4-hydroxyphenyl]methane and/or 2,4-bis[4-hydroxy-3-(4-hydroxybenzyl)-5-methylbenzyl]-6-cyclohexylphenol, and (C) 4,4′-bis(diethylamino)benzophenone. The composition exhibits high sensitivity and definition and improved focal depth range properties and underexposure margin.
摘要翻译：正型光致抗蚀剂组合物包括（A）碱溶性树脂，（B）例如双[2,5-二甲基-3-（2-羟基-5-甲基苄基）-4-羟基苯基]甲烷的醌二叠氮化物酯和 /或2,4-双[4-羟基-3-（4-羟基苄基）-5-甲基苄基] -6-环己基苯酚和（C）4,4'-双（二乙基氨基）二苯甲酮。该组合物具有高灵敏度和清晰度，并且改善了焦深范围特性和曝光不足。

4. 发明授权

US6030741A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US6030741A
公开(公告)日：2000-02-29
申请号：US919368
申请日：1997-08-28
申请人： Kousuke Doi , Takako Suzuki , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Kousuke Doi , Takako Suzuki , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7/004 , G03F7/022 , G03F7/039 , G03F7/20 , G03F7/30 , H01L21/027 , G03F7/023
CPC分类号： G03F7/0048 , G03F7/0226
摘要： The present invention provides a positive resist composition and method capable of achieving a resist pattern whose photosensitivity is less variable relative to its thickness, which exhibits small thickness reduction even when the pattern is fine, is capable of coping with irregularities in the exposure value since it has a wide focal-depth range, and exhibits reduced size-deviation from the mask size. The positive resist composition comprises (A) an alkali-soluble resin, (B) a quinonediazide-group-containing compound, and (C) an organic solvent, wherein the ingredient (C) is a mixture solvent containing (i) 2-heptanone, (ii) ethyl lactate, and (iii) a high-boiling organic solvent having a boiling point of 200 to 350.degree. C. The above-described resist pattern can be formed by using the positive resist composition.
摘要翻译：本发明提供一种能够实现光敏性相对于其厚度变化较小的抗蚀剂图案的正型抗蚀剂组合物和方法，即使图案细小也能显示小的厚度减小，因此可以应对曝光值的不规则性具有宽的焦深范围，并且显示出与面罩尺寸的尺寸偏差的减小。正型抗蚀剂组合物包含（A）碱溶性树脂，（B）含醌二叠氮化物基团的化合物和（C）有机溶剂，其中成分（C）是含有（i）2-庚酮，（ii）乳酸乙酯，和（iii）沸点为200〜350℃的高沸点有机溶剂。上述抗蚀剂图案可以通过使用正性抗蚀剂组合物形成。

5. 发明授权

US06379859B2 Positive photoresist composition and process for forming resist pattern using same 失效
公开(公告)号：US06379859B2
公开(公告)日：2002-04-30
申请号：US09322978
申请日：1999-06-01
申请人： Takako Suzuki , Sachiko Tamura , Kousuke Doi , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Takako Suzuki , Sachiko Tamura , Kousuke Doi , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7023
CPC分类号： G03F7/0226 , G03F7/022
摘要： Disclosed are a positive photoresist composition including (A) an alkali-soluble resin, (B) a photosensitizer containing a quinonediazide ester of, e.g., bis[2,5-dimethyl-3-(2-hydroxy-5-methylbenzyl)-4-hydroxyphenyl]methane and (C) e.g., 2,6-bis(2,5-dimethyl-4-hydroxybenzyl)-4-methylphenol; and a process including the steps of coating the composition onto a 8 to 12-inch substrate, drying, exposing and developing the same. The composition which can form a pattern having a good shape whose dimensional changes are minimized in a wide range over surface of the substrate, particularly in processes using a large-diameter substrate, and the process for forming a resist pattern using the composition are provided.

6. 发明授权

US06566031B1 Positive photoresist composition, substrate with a photosensitive film and process for imaging a resist pattern 失效
标题翻译：正性光致抗蚀剂组合物，具有感光膜的基材和用于成像抗蚀剂图案的方法
公开(公告)号：US06566031B1
公开(公告)日：2003-05-20
申请号：US09669589
申请日：2000-09-26
申请人： Takako Suzuki , Kousuke Doi , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Takako Suzuki , Kousuke Doi , Hidekatsu Kohara , Toshimasa Nakayama
IPC分类号： G03F7021
CPC分类号： G03F7/022 , G03F7/0226 , G03F7/0236 , G03F7/091
摘要： A positive photoresist composition includes (A) an alkali-soluble resin, (B) a photosensitizer including, for example, a quinonediazide ester of bis[2,5-dimethyl-3-(2-hydroxy-5-methylbenzyl)-4-hydroxyphenyl]methane, and (C) a compound having a gram absorption coefficient of 5 to 60 with respect to light with a wavelength of 365 nm.
摘要翻译：正型光致抗蚀剂组合物包括（A）碱溶性树脂，（B）光敏剂，其包括例如双[2,5-二甲基-3-（2-羟基-5-甲基苄基）-4- 羟基苯基]甲烷，（C）相对于波长365nm的光，克吸收系数为5〜60的化合物。

7. 发明授权

US06964838B2 Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06964838B2
公开(公告)日：2005-11-15
申请号：US10035137
申请日：2002-01-04
申请人： Masaki Kurihara , Takako Suzuki , Kenji Maruyama , Satoshi Niikura , Kousuke Doi
发明人： Masaki Kurihara , Takako Suzuki , Kenji Maruyama , Satoshi Niikura , Kousuke Doi
IPC分类号： G03F7/039 , G03F7/022 , G03F7/023
CPC分类号： G03F7/022 , G03F7/0226
摘要： A composition includes (A) an alkali-soluble resin, (B) a quinonediazide ester of a compound represented by the following formula: and (C) a compound represented by the following formula: This composition is a positive photoresist composition that is excellent in sensitivity and definition and causes less shrink.
摘要翻译：组合物包括（A）碱溶性树脂，（B）由下式表示的化合物的醌二叠氮化物：（C）由下式表示的化合物：该组合物是阳性光致抗蚀剂组合物，敏感性和定义，并且减少收缩。

8. 发明申请

US20090029291A1 POSITIVE RESIST COMPOSITION FOR THIN-FILM IMPLANTATION PROCESS AND METHOD FOR FORMING RESIST PATTERN 有权
标题翻译：薄膜植入方法的积极抵抗组合物及其形成阻力图的方法
公开(公告)号：US20090029291A1
公开(公告)日：2009-01-29
申请号：US11815205
申请日：2006-02-01
申请人： Takako Suzuki , Ken Tanaka , Koji Yonemura , Shoichi Fujita
发明人： Takako Suzuki , Ken Tanaka , Koji Yonemura , Shoichi Fujita
IPC分类号： G03C1/73 , G03F7/20
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0397 , Y10S430/106
摘要： A positive resist composition for a thin-film implantation process of the present invention includes: a resin component (A) with an acid-dissociable dissolution inhibiting group, whose alkali solubility increases by the action of an acid; an acid generator component (B) which generates an acid by irradiation with radiation; and a compound (C) having a radiation absorbing ability, wherein said resin component (A) comprises a structural unit (a1) derived from a hydroxystyrene and a structural unit (a2) obtained by substituting the hydrogen atom in a hydroxyl group of said structural unit (a1) with an acid-dissociable dissolution inhibiting group, and said acid-dissociable dissolution inhibiting group contains an acid-dissociable dissolution inhibiting group (II) represented by the following general formula (II) as a main component.
摘要翻译：本发明的薄膜注入方法的正型抗蚀剂组合物包括：具有酸解离溶解抑制基团的树脂组分（A），其碱溶解度通过酸的作用而增加; 通过辐射照射产生酸的酸发生剂组分（B）; 和具有放射线吸收能力的化合物（C），其中所述树脂组分（A）包含衍生自羟基苯乙烯的结构单元（a1）和通过将所述结构的羟基中的氢原子取代而获得的结构单元（a2）单元（a1）与酸解离溶解抑制基团，所述酸解离溶解抑制基团含有以下通式（II）表示的酸解离溶解抑制基团（II）作为主要成分。

9. 发明申请

US20090287096A1 Blood pressure meter 审中-公开
标题翻译：血压计
公开(公告)号：US20090287096A1
公开(公告)日：2009-11-19
申请号：US11990328
申请日：2006-07-05
申请人： Kazunari Takahashi , Takako Suzuki
发明人： Kazunari Takahashi , Takako Suzuki
IPC分类号： A61B5/02
CPC分类号： A61B5/022 , A61B5/02141 , A61B5/02225 , A61B2560/0406
摘要： In a blood pressure meter (1) including: a body which is connected through a tube with a cuff and which has a display section (14) which displays a blood pressure value determined by a control section (6) based on a variation in a pressure measurement value by a pressure sensor (5) in the cuff; a spherical hand pump (3) which is attached to the body (2) and which supplies air by a compressing operation to the cuff to inflate the cuff; and a grasp section (16) which is extended from the body (2) along the outer surface of the pump (3) in the direction of the axis of the hand pump (3) and which is capable of being grasped with the pump (3), the display section (14) being placed at the body (2) so that a blood pressure value is visible from a direction substantially normal to the axis of the pump (3), the center line in the width direction of the grasp section (16) is placed at a position at 45° about the axis line of the pump (3) relative to the display (14).
摘要翻译：一种血压计（1），包括：通过具有袖带的管连接的主体，具有显示部（14），所述显示部显示由控制部（6）确定的血压值通过压力传感器（5）在袖带中的压力测量值; 球形手泵（3），其附接到主体（2）并且通过压缩操作将空气供给到所述袖带以使所述袖带膨胀; 以及沿着泵（3）的外表面沿着手泵（3）的轴线的方向从主体（2）延伸并且能够被泵抓住的把持部分（16）如图3所示，显示部（14）被放置在身体（2）处，使得从基本上垂直于泵（3）的轴线的方向可见血压值，把握的宽度方向上的中心线部分（16）相对于显示器（14）被放置在围绕泵（3）的轴线的45°的位置处。

10. 发明申请

US20060035630A1 Audio teleconference system with wireless communication portable terminals 有权
标题翻译：具有无线通信便携式终端的音频电话会议系统
公开(公告)号：US20060035630A1
公开(公告)日：2006-02-16
申请号：US11025790
申请日：2004-12-30
申请人： Hisayuki Morishima , Takako Suzuki , Yuuki Yamamoto , Takashi Ohno , Satoshi Okuyama , Kenichi Horio , Jun Kakuta , Toshinao Gunchi , Yuji Tabuchi
发明人： Hisayuki Morishima , Takako Suzuki , Yuuki Yamamoto , Takashi Ohno , Satoshi Okuyama , Kenichi Horio , Jun Kakuta , Toshinao Gunchi , Yuji Tabuchi
IPC分类号： H04M3/42
CPC分类号： H04M3/566 , H04M3/56 , H04M3/569 , H04M2207/18 , H04M2242/06 , H04W72/005
摘要： This invention is to enable transfer of a right to speak in an audio teleconference in view of usability. In this invention, a PoC server is introduced to achieve new functions, such as transfer of the right to speak, reservation to acquire the right to speak, and deprivation of the right to speak. The PoC server has a teleconference presence manager, a teleconference manager, and a teleconference audio communication manager. The right to speak is managed in a presence data storage of the teleconference presence manager. The teleconference presence manager directly manages the presence data storage, but the teleconference manager manages transfer of the right to speak. In addition, the teleconference manager manages reservation of the right to speak by a storage for a reservation list of the right to speak. The teleconference audio communication manager carries out routing of audio data. At that time, only audio data received from a user holding the right to speak is transferred.
摘要翻译：本发明是鉴于可用性，能够在音频电话会议中转让发言权。在本发明中，引入了PoC服务器来实现新的功能，例如转让发言权，保留以获得发言权，剥夺发言权。 PoC服务器具有电话会议存在管理器，电话会议管理器和电话会议音频通信管理器。在电话会议存在管理器的存在数据存储中管理发言权。电话会议存在管理器直接管理存在的数据存储，但电话会议管理器管理发言权的转移。此外，电话会议管理人员管理通过存储发言权的发言权的保留权。电话会议音频通信管理器执行音频数据的路由。那时，只有从具有说话权的用户接收到的音频数据被传送。

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