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    • 1. 发明授权
    • Signal transmission system with an error control technique
    • 具有误差控制技术的信号传输系统
    • US4149142A
    • 1979-04-10
    • US826053
    • 1977-08-19
    • Satoshi KageyamaKeiji TakeuchiKeisuke Ogi
    • Satoshi KageyamaKeiji TakeuchiKeisuke Ogi
    • H03M7/00H04J1/00H04L1/16H04L1/18H04N1/32H04N7/00H04N19/00G08C25/02
    • H04L1/16H04N1/32619H04L1/1809
    • A signal transmission system embodying this invention which can control errors comprises a selective automatic repeat request (ARQ) system for controlling errors occurring in transmission of data on telephone data communication channels. With this selective ARQ system, an error-controlling signal conducted through a backward channel does not contain a check bit for detection or correction of errors, thereby preventing a time loss which might occur if a error-control signal was repeatedly issued between the transmission and receiving sides. The subject signal-transmitting apparatus is adapted to be used in a static image transmission having a large amount of data and has such a circuit arrangement as attains the efficient transmission of data and the display of an error-free image of good picture quality.
    • 体现本发明的可以控制误差的信号传输系统包括一个选择性自动重复请求(ARQ)系统,用于控制电话数据通信信道上的数据传输中发生的错误。 利用这种选择性ARQ系统,通过反向信道传输的误差控制信号不包含用于检测或校正错误的校验位,从而防止在传输和传输之间重复发出错误控制信号时可能发生的时间损失 接收方。 主体信号发送装置适用于具有大量数据的静态图像传输,并且具有实现数据的有效传输和良好图像质量的无差错图像的显示的电路结构。
    • 2. 发明授权
    • Semiconductor device manufacturing method and semiconductor device
    • 半导体器件制造方法和半导体器件
    • US08618634B2
    • 2013-12-31
    • US13364574
    • 2012-02-02
    • Satoshi Kageyama
    • Satoshi Kageyama
    • H01L27/06H01L27/08H01L21/02H01L21/768
    • H01L28/75H01L21/76816H01L27/0207H01L28/60
    • A semiconductor device manufacturing method includes forming a first capacitance film formed on the lower electrode; forming an intermediate electrode in a first region on the first capacitance film, wherein the first capacitance is interposed between the intermediate electrode and the lower electrode; forming a second capacitance film on the intermediate electrode to be interposed between the first capacitance film and the second capacitance film; and forming an upper electrode, wherein at least a portion of the second capacitance film is interposed between the upper electrode and the intermediate electrode; the upper electrode extending to a second region outside the first region, and having at least the first capacitance film interposed between the upper electrode and the lower electrode in the second region.
    • 一种半导体器件制造方法,包括形成在下电极上形成的第一电容膜; 在所述第一电容膜上的第一区域中形成中间电极,其中所述第一电容介于所述中间电极和所述下电极之间; 在介于所述第一电容膜和所述第二电容膜之间的所述中间电极上形成第二电容膜; 以及形成上电极,其中所述第二电容膜的至少一部分插入在所述上电极和所述中间电极之间; 所述上电极延伸到所述第一区域外的第二区域,并且在所述第二区域中至少具有介于所述上电极和所述下电极之间的所述第一电容膜。
    • 3. 发明授权
    • Semiconductor device having multilayer interconnection structure
    • 具有多层互连结构的半导体器件
    • US08164197B2
    • 2012-04-24
    • US12222309
    • 2008-08-06
    • Yuichi NakaoSatoshi Kageyama
    • Yuichi NakaoSatoshi Kageyama
    • H01L23/535
    • H01L23/522H01L23/53295H01L2924/0002H01L2924/00
    • A semiconductor device according to the present invention includes: a first interlayer dielectric film; a lower wire formed on the first interlayer dielectric film; a second interlayer dielectric film formed on the first interlayer dielectric film and the lower wire; and an upper wire formed on the second interlayer dielectric film to intersect with a prescribed portion of the lower wire in plan view. The first interlayer dielectric film is provided with a groove dug from the upper surface thereof in a region including the prescribed portion in plan view. The prescribed portion enters the groove. At least a portion of the second interlayer dielectric film formed on the lower wire has a planar upper surface.
    • 根据本发明的半导体器件包括:第一层间电介质膜; 形成在所述第一层间电介质膜上的下线; 形成在第一层间电介质膜和下导线上的第二层间绝缘膜; 以及形成在第二层间电介质膜上的上部线,在平面图中与下部电线的规定部分相交。 第一层间电介质膜在平面图中包括从规定部分的区域中从其上表面挖出的沟槽。 规定部分进入凹槽。 形成在下导线上的第二层间绝缘膜的至少一部分具有平坦的上表面。
    • 4. 发明授权
    • Method of measuring superficial chemical species and apparatus for measuring the same
    • 测量表面化学物质的方法及其测量装置
    • US07974670B2
    • 2011-07-05
    • US10590407
    • 2005-02-22
    • Takayuki SoutaKatsuo AizawaAtsushi NakamuraSatoshi KageyamaShinya OhtsuboFumihiko Ichikawa
    • Takayuki SoutaKatsuo AizawaAtsushi NakamuraSatoshi KageyamaShinya OhtsuboFumihiko Ichikawa
    • A61B5/1455
    • A61B5/444A61B5/0059A61B5/0075
    • A method of processing skin surface observation measuring data which is able to address various sicknesses and reduce an error in sickness detection, and a measuring apparatus requiring no filter. The measuring apparatus an irradiator applying a white light to a biological surface as a sample, a detector detecting the spectra of the white light reflected off a plurality of positions on the biological surface, a plotter plotting the absorbances of the above spectra to a light spectrum multi-dimensional space, an analyzer subjecting data in the spectrum multi-dimension space obtained from the plurality of positions to multivariate analysis to determine the eigenvectors of at least first, second and third principal components, and a display projecting data at respective positions in respective eigenvector directions to display their magnitudes on a two-dimension display screen on a gray scale or in colors corresponding to the magnitudes; and a measuring method by the apparatus.
    • 一种能够处理各种疾病并减少疾病检测误差的皮肤表面观察测量数据的处理方法以及不需要过滤器的测量装置。 测量装置是将白光施加到作为样品的生物体表面的照射器,检测从生物体表面上的多个位置反射的白光的光谱的检测器,绘制器将上述光谱的吸光度绘制成光谱 多维空间的分析器,将从多个位置获得的光谱多维空间中的数据进行多元分析的分析器,以确定至少第一,第二和第三主要分量的特征向量,以及在相应的位置上的显示投影数据 特征向量方向,以二维显示屏幕上的灰度或相应于数值的颜色显示其幅度; 以及该装置的测量方法。
    • 5. 发明授权
    • Semiconductor device
    • 半导体器件
    • US07750480B2
    • 2010-07-06
    • US12230618
    • 2008-09-02
    • Satoshi Kageyama
    • Satoshi Kageyama
    • H01L23/52
    • H01L23/53295H01L23/522H01L23/53238H01L2924/0002H01L2924/00
    • The semiconductor device according to the present invention includes: a first wire made of a material mainly composed of Cu; a second wire made of a material mainly composed of Cu; an interlayer dielectric film formed between the first wire and the second wire; a via, made of a material mainly composed of Cu, penetrating through the intermediate dielectric film to be connected to the first wire and the second wire; and a dummy via, made of a material mainly composed of Cu, smaller in via diameter than the via and connected to the first wire while not contributing to electrical connection between the first wire and the second wire.
    • 根据本发明的半导体器件包括:由主要由Cu构成的材料制成的第一线; 由主要由Cu构成的材料制成的第二线; 形成在第一线和第二线之间的层间绝缘膜; 由主要由Cu构成的材料制成的通孔,穿过中间电介质膜连接到第一线和第二线; 以及由主要由Cu组成的材料制成的虚拟通孔,其通孔直径小于通孔,并连接到第一导线,而不对第一线和第二线之间的电连接起作用。
    • 6. 发明申请
    • SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
    • 半导体器件和半导体器件制造方法
    • US20100032837A1
    • 2010-02-11
    • US12445168
    • 2007-10-11
    • Ryosuke NakagawaTakahisa YamahaYuichi NakaoKatsumi SameshimaSatoshi Kageyama
    • Ryosuke NakagawaTakahisa YamahaYuichi NakaoKatsumi SameshimaSatoshi Kageyama
    • H01L23/532H01L21/768
    • H01L21/76808H01L21/2855H01L21/76846H01L23/53238H01L23/53295H01L2924/0002H01L2924/00
    • A semiconductor device according to the present invention includes: a semiconductor substrate; a first copper interconnection provided on the semiconductor substrate; an insulating layer provided over the first copper interconnection and having a hole extending therethrough to the first copper interconnection; a barrier layer composed of a tantalum-containing material and covering at least a sidewall of the hole and a part of the first copper interconnection exposed in the hole; and a second copper interconnection provided in intimate contact with the barrier layer and electrically connected to the first copper interconnection via the barrier layer; wherein the barrier layer has a nitrogen concentration profile such that the concentration of nitrogen contained in the material varies to be lower in a boundary portion of the barrier layer adjacent to the first copper interconnection and in a boundary portion of the barrier layer adjacent to the second copper interconnection and higher in an intermediate portion of the barrier layer defined between the boundary portions.
    • 根据本发明的半导体器件包括:半导体衬底; 设置在半导体衬底上的第一铜互连; 绝缘层,设置在所述第一铜互连上并且具有穿过其延伸到所述第一铜互连的孔; 由含钽材料构成并且覆盖所述孔的至少一个侧壁和暴露在所述孔中的所述第一铜互连的一部分的阻挡层; 以及第二铜互连,其与阻挡层紧密接触并且经由阻挡层电连接到第一铜互连; 其中所述阻挡层具有氮浓度分布,使得所述材料中包含的氮的浓度在与所述第一铜互连相邻的所述阻挡层的边界部分中以及在与所述第二铜互连相邻的所述势垒层的边界部分中变低 铜互连并且在边界部分之间限定的阻挡层的中间部分中较高。
    • 8. 发明授权
    • Bass speaker
    • 低音扬声器
    • US5850460A
    • 1998-12-15
    • US793339
    • 1997-02-26
    • Shoji TanakaKazuaki TamuraSatoshi Kageyama
    • Shoji TanakaKazuaki TamuraSatoshi Kageyama
    • H04R1/22H04R1/26H04R1/28H04R25/00
    • H04R1/2834H04R1/2873H04R1/227H04R2209/027
    • Passive radiators of the same effective vibration area and the same effective vibration mass disposed in mutual opposition, and driver units of the same effective vibration area and the same effective vibration mass disposed in mutual opposition, are mounted to a bandpass type enclosure. The vibration-reaction forces of the opposing passive radiators and opposing driver units on the enclosure are thereby mutually cancelled, and enclosure vibrations are thus greatly reduced. Powerful bass output can be achieved because the diameter of the passive radiators can be increased at will and the use of two passive radiators achieves an extremely large vibration area.
    • PCT No.PCT / JP95 / 01728 Sec。 371日期1997年2月26日 102(e)日期1997年2月26日PCT提交1995年8月31日PCT公布。 公开号WO96 / 07291 日期1996年3月7日具有相同有效振动区域和相互相对设置的相同有效振动质量的相位散热器和相同有效振动区域的驱动单元和相互相对设置的相同有效振动质量被安装到带通型 外壳。 因此,相对的被动辐射器和外壳上的相对的驱动器单元的振动反作用力相互抵消,从而大大降低了外壳的振动。 可以实现强大的低音输出,因为无源辐射器的直径可以随意增加,并且使用两个无源辐射器实现极大的振动面积。