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1. 发明授权

US07704646B2 Half tone mask and method for fabricating the same 有权
标题翻译：半色调掩模及其制造方法
公开(公告)号：US07704646B2
公开(公告)日：2010-04-27
申请号：US11268032
申请日：2005-11-07
申请人： Sang-Uk Park , Kap-Seok Kang , Keun-Sik Lee , Jae-Woo Park , Yu-Kyung Sim
发明人： Sang-Uk Park , Kap-Seok Kang , Keun-Sik Lee , Jae-Woo Park , Yu-Kyung Sim
IPC分类号： G03F1/08 , G03F1/14
CPC分类号： G03F1/54 , G03F1/50
摘要： A half tone mask having a transparent substrate, a light semitransmission layer, and a light shield layer; and a method for fabricating the same. The halftone mask is applied to multiple cycles of a photolithography process, thus shortening a time taken to fabricate the mask and reducing the production costs of the mask. Since a desired pattern is uniformly formed through a light semitransmission layer of the half tone mask of the present invention according to the uniformity of a chrome oxide (CrxOy) film, i.e., the uniformity in sputtering, the halftone mask is not limited in size.
摘要翻译：具有透明基板，光半透明层和遮光层的半色调掩模; 及其制造方法。将半色调掩模应用于光刻工艺的多个循环，从而缩短制造掩模所需的时间并降低掩模的生产成本。由于根据铬氧化物（CrxOy）膜的均匀性即溅射的均匀性，通过本发明的半色调掩模的半透射层均匀地形成期望的图案，所以半色调掩模的尺寸没有限制。

2. 发明授权

US08133641B2 Half tone mask having multi-half permeation part and a method of manufacturing the same 有权
标题翻译：具有多半渗透部分的半色调掩模及其制造方法
公开(公告)号：US08133641B2
公开(公告)日：2012-03-13
申请号：US12296563
申请日：2007-05-11
申请人： Kap-Seok Kang , Jae-Woo Park , Sang-Uk Park , Yu-Kyung Sim , Keun-Sik Lee
发明人： Kap-Seok Kang , Jae-Woo Park , Sang-Uk Park , Yu-Kyung Sim , Keun-Sik Lee
IPC分类号： G03F1/00
CPC分类号： G03F1/50
摘要： Disclosed are a half tone mask having a multi semi-transmission part and a manufacturing method thereof that can pattern a plurality of layers using one mask, by having at least two or more semi-transmission parts with light transmission that are different from each other. The half tone mask having a multi semi-transmission part comprises a transparent substrate, a light transmission part formed the transparent substrate to transmit irradiation light of a predetermined wavelength band, a light shielding part formed the transparent substrate to shield the irradiation light of the predetermined wavelength band, and at least two or more semi-transmission parts formed by depositing semi-transmission material on the transparent substrate to pass through the irradiation light of the predetermined wavelength band with each different light transmission.
摘要翻译：公开了具有多重半透射部分的半色调掩模及其制造方法，其可以通过具有彼此不同的至少两个或更多个具有光透射的半透射部分，使用一个掩模来图案化多个层。具有多重半透射部分的半色调掩模包括透明基板，形成透明基板以透射预定波长带的照射光的透光部分，形成透明基板的遮光部分，以屏蔽预定波长带的照射光以及通过在透明基板上沉积半透射材料而形成的至少两个或更多个半透射部分，以通过每种不同光透射的预定波长带的照射光。

3. 发明申请

US20060099521A1 Half tone mask, method for fabricating the same, and flat panel display using the same 有权
标题翻译：半色调掩模，其制造方法和使用其的平板显示器
公开(公告)号：US20060099521A1
公开(公告)日：2006-05-11
申请号：US11268032
申请日：2005-11-07
申请人： Sang-Uk Park , Kap-Seok Kang , Keun-Sik Lee , Jae-Woo Park , Yu-Kyung Sim
发明人： Sang-Uk Park , Kap-Seok Kang , Keun-Sik Lee , Jae-Woo Park , Yu-Kyung Sim
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F1/54 , G03F1/50
摘要： A half tone mask having a transparent substrate, a light semitransmission layer, and a light shield layer, a method for fabricating the same, and a flat panel display using the same. The half tone mask is applied to multiple cycles of a photolithography process, thus shortening a time taken to fabricate the mask and reducing the production costs of the mask. Since a desired pattern is uniformly formed through a light semitransmission layer of the half tone mask of the present invention according to the uniformity of a chrome oxide (CrxOy) film, i.e., the uniformity in sputtering, the half tone mask is not limited in size.
摘要翻译：具有透明基板，半透射层和遮光层的半色调掩模，其制造方法和使用该半色调掩模的平板显示器。半色调掩模被应用于光刻工艺的多个循环，从而缩短了制造掩模所需的时间并降低了掩模的生产成本。由于根据本发明的半色调掩模的半透射层，根据铬氧化物（Cr x O x O y O）膜的均匀性均匀地形成所需图案即溅射的均匀性，半色调掩模的尺寸不受限制。

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