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    • 1. 发明申请
    • Optical sensor and semiconductor device
    • 光学传感器和半导体器件
    • US20110013055A1
    • 2011-01-20
    • US12801938
    • 2010-07-02
    • Sang-Chul SulMyung-Bok LeeHoon-Sang OhYoung-Gu Jin
    • Sang-Chul SulMyung-Bok LeeHoon-Sang OhYoung-Gu Jin
    • H04N5/335
    • H01L27/14645H01L27/14621H01L27/14625H01L27/14632
    • Example embodiments are directed to a semiconductor device including a color pixel array on a substrate; a distance pixel array on the substrate; a light-inducing member on the color pixel array and the distance pixel array; an infrared light cut filter on the light-inducing member and configured to block infrared light; a near infrared light filter on the light-inducing member and configured to allow near infrared light to pass; and an RGB filter on the light-inducing member and configured to allow visible light to pass. According to example embodiments, a method of manufacturing a semiconductor device may include forming a color pixel array on a substrate; forming a distance pixel array on the substrate; forming a light-inducing member on the color pixel array and the distance pixel array; forming an infrared light cut filter on the light-inducing member; forming a near infrared light filter on the light-inducing member; forming a RGB filter on the light-inducing member; and forming a plurality of lenses on the infrared light cut filter and the near infrared light filter.
    • 示例性实施例涉及在衬底上包括彩色像素阵列的半导体器件; 衬底上的距离像素阵列; 在所述彩色像素阵列和所述距离像素阵列上的导光构件; 在所述导光部件上的红外光截止滤光器,被配置为阻挡红外光; 在所述导光部件上的近红外光滤光器,其被配置为允许近红外光通过; 以及在所述光诱导构件上的RGB滤光器,并且被配置为允许可见光通过。 根据示例性实施例,制造半导体器件的方法可以包括在衬底上形成彩色像素阵列; 在基板上形成距离像素阵列; 在所述彩色像素阵列和所述距离像素阵列上形成导光部件; 在所述感光构件上形成红外光截止滤光器; 在所述导光部件上形成近红外光滤波器; 在所述感光构件上形成RGB滤光器; 并且在红外线截止滤光器和近红外光滤光器上形成多个透镜。
    • 2. 发明申请
    • IMAGE SENSOR AND METHOD OF MANUFACTURING THE SAME
    • 图像传感器及其制造方法
    • US20110128423A1
    • 2011-06-02
    • US12944272
    • 2010-11-11
    • Myung-Bok LEESang-Chul SulYoung-Gu Jin
    • Myung-Bok LEESang-Chul SulYoung-Gu Jin
    • H04N5/335
    • H04N9/045H01L27/14621H04N5/332
    • An image sensor includes a plurality of color sensors, a plurality of depth sensors, a near-infrared cut filter, a color filter, a pass filter and a rejection filter. The color sensors and depth sensors are formed on a substrate. The near-infrared cut filter and the color filter are formed on the color sensors. The pass filter is formed on the depth sensors, and is adapted to transmit light having a wavelength longer than an upper limit of a visible light wavelength. The pass filter has a multi-layer structure wherein a semiconductor material and a semiconductor oxide material are alternately stacked. The rejection filter is formed over the near-infrared cut filter, the color filter and the pass filter, and is adapted to transmit light having a wavelength shorter than an upper limit of a near-infrared light wavelength.
    • 图像传感器包括多个颜色传感器,多个深度传感器,近红外截止滤光器,滤色器,通过滤光器和拒绝滤光器。 颜色传感器和深度传感器形成在基板上。 近红外截止滤光器和滤色器形成在彩色传感器上。 通过滤波器形成在深度传感器上,并且适于透射波长比可见光波长的上限长的波长。 通过滤波器具有多层结构,其中半导体材料和半导体氧化物材料交替堆叠。 抑制滤波器形成在近红外截止滤波器,滤色器和通过滤波器上,并且适于透射波长短于近红外光波长的上限的光。
    • 4. 发明申请
    • Image sensor and semiconductor device including the same
    • 图像传感器和包括其的半导体器件
    • US20110001205A1
    • 2011-01-06
    • US12801745
    • 2010-06-23
    • Sang-Chul SulYoon-Dong ParkMyung-Bok LeeYoung-Gu Jin
    • Sang-Chul SulYoon-Dong ParkMyung-Bok LeeYoung-Gu Jin
    • H01L31/0232H04N5/225
    • H04N5/3696H01L27/14621H01L27/14625H01L27/14627H01L27/14629H01L31/02162H04N5/2226H04N9/045
    • Example embodiments relate to a three-dimensional image sensor including a color pixel array on a substrate, a distance pixel array on the substrate, an RGB filter on the color pixel array and configured to allow visible light having a first wavelength to pass, a near infrared light filter on the distance pixel array and configured to allow near infrared light having a second wavelength to pass, and a stack type single band filter on the RGB filter and the near infrared light filter and configured to allow light having a third wavelength between the first wavelength and the second wavelength to pass. According to example embodiments, a semiconductor device may include a color pixel array on a substrate; a distance pixel array on the substrate; a light-inducing member on the color pixel array and the distance pixel array; a RGB filter on the light-inducing member and configured to allow visible light to pass; a near infrared light filter on the light-inducing member and configured to allow near infrared light to pass; and a plurality of lenses on the RGB filter and the near infrared light filter.
    • 示例性实施例涉及三维图像传感器,其包括在基板上的彩色像素阵列,基板上的距离像素阵列,彩色像素阵列上的RGB滤光器,并且被配置为允许具有第一波长的可见光通过, 距离像素阵列上的红外光滤光器,并且被配置为允许具有第二波长的近红外光通过;以及在RGB滤光器和近红外光滤光器上的堆叠型单波段滤光器,并且被配置为允许具有第三波长的光 第一波长和第二波长通过。 根据示例性实施例,半导体器件可以在衬底上包括彩色像素阵列; 衬底上的距离像素阵列; 在所述彩色像素阵列和所述距离像素阵列上的导光构件; 在所述光诱导构件上的RGB滤光器,并且被配置为允许可见光通过; 在所述导光部件上的近红外光滤光器,其被配置为允许近红外光通过; 以及RGB滤光器和近红外光滤光器上的多个透镜。