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1. 发明申请

US20110266255A1 IMPRINT LITHOGRAPHY 有权
公开(公告)号：US20110266255A1
公开(公告)日：2011-11-03
申请号：US13181084
申请日：2011-07-12
申请人： Sander Frederik WUISTER , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Ivar Schram
发明人： Sander Frederik WUISTER , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Ivar Schram
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method of making an imprint template includes providing a transfer layer on a substrate and providing a layer of imprintable medium on the transfer layer, using a master imprint template to imprint a pattern into the imprintable medium, polymerizing the imprintable medium by exposing it to actinic radiation, then etching the resulting polymer layer, the transfer layer and the substrate such that the imprinted pattern is transferred to the substrate, the substrate thereby becoming an imprint template bearing a pattern which is the inverse of a pattern provided on the master imprint template.
摘要翻译：制作印模模板的方法包括在基底上提供转移层并在转印层上提供可压印介质层，使用主印模模板将图案压印到可压印介质中，通过将可印迹介质暴露于光化反应来聚合可印迹介质辐射，然后蚀刻所得聚合物层，转印层和基底，使得印记图案转印到基底上，基底由此变成具有与母版印模板上提供的图案相反的图案的印模模板。

2. 发明申请

US20100193994A1 IMPRINT LITHOGRAPHY METHOD AND APPARATUS 有权
标题翻译：印刷方法和装置
公开(公告)号：US20100193994A1
公开(公告)日：2010-08-05
申请号：US12698368
申请日：2010-02-02
申请人： Sander Frederik WUISTER , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Leendert Van Der Tempel
发明人： Sander Frederik WUISTER , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Leendert Van Der Tempel
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is provided. The method includes undertaking first and second imprints, which comprises for each imprint: for an area of a substrate provided with a plurality of drops of imprintable medium in respectively first and second configurations, imprinting a pattern in the imprintable medium using a same imprint template, pockets being formed between the drops of the imprintable medium, the imprint template and the substrate during the imprinting of the pattern, wherein the first configuration of drops of imprintable medium is different from the second configuration of drops of imprintable medium, such that pockets formed during the second imprint are formed at different locations relative to the imprint template to pockets formed during the first imprint.
摘要翻译：提供压印光刻方法。该方法包括进行第一和第二印记，其包括用于每个印记：对于分别具有多个可压印介质的第一和第二配置的液滴的基板的区域，使用相同的印模模板将图案压印在可压印介质中，在压印图案期间，在可压印介质的液滴，压印模板和基板之间形成凹穴，其中可压印介质的液滴的第一配置不同于可压印介质的液滴的第二配置，第二印记形成在相对于印模模板的不同位置，形成在第一印记中形成的凹坑。

3. 发明申请

US20110049097A1 IMPRINT LITHOGRAPHY METHOD AND APPARATUS 有权
标题翻译：印刷方法和装置
公开(公告)号：US20110049097A1
公开(公告)日：2011-03-03
申请号：US12869381
申请日：2010-08-26
申请人： Sander Frederik WUISTER , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
发明人： Sander Frederik WUISTER , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
IPC分类号： B44C1/22
CPC分类号： B29C43/34 , B29C43/021 , B29C43/58 , B29C2043/025 , B29K2101/12 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
摘要翻译：在一个实施例中，提供了压印光刻方法，其包括在衬底的第一区域上提供第一量的可压印介质，当固定时，第一量的可压印介质具有第一蚀刻速率; 以及在所述基板的第二不同区域上提供第二量的可压印介质，所述第二量的可压印介质在固定时具有第二不同的蚀刻速率。

4. 发明申请

US20110076352A1 IMPRINT LITHOGRAPHY 有权
公开(公告)号：US20110076352A1
公开(公告)日：2011-03-31
申请号：US12891422
申请日：2010-09-27
申请人： Arie Jeffrey DEN BOEF , Vadim Yevgenyevich BANINE , Andre Bernardus JEUNINK , Sander Frederik WUISTER , Yvonne Wendela KRUIJT-STEGEMAN
发明人： Arie Jeffrey DEN BOEF , Vadim Yevgenyevich BANINE , Andre Bernardus JEUNINK , Sander Frederik WUISTER , Yvonne Wendela KRUIJT-STEGEMAN
IPC分类号： B29C59/02 , G01B11/14
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7049 , G03F9/7076
摘要： A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.
摘要翻译：公开了一种使用压印模板上的对准光栅和衬底上的对准光栅来确定压印模板和衬底之间的偏移的方法。该方法包括使压印模板对准光栅和衬底对准光栅足够靠近在一起，使得它们形成复合光栅，在调制压印模板和衬底的相对位置的同时调整复合光栅处的对准辐射束，检测强度从复合光栅反射的对准辐射，并通过分析检测强度的调制来确定偏移。

5. 发明申请

US20110266706A1 IMPRINT LITHOGRAPHY METHOD AND APPARATUS 有权
标题翻译：印刷方法和装置
公开(公告)号：US20110266706A1
公开(公告)日：2011-11-03
申请号：US13098759
申请日：2011-05-02
申请人： Johan Frederik DIJKSMAN , Arie Jeffrey DEN BOEF , Sander Frederik WUISTER , Martinus Bernardus VAN DER MARK
发明人： Johan Frederik DIJKSMAN , Arie Jeffrey DEN BOEF , Sander Frederik WUISTER , Martinus Bernardus VAN DER MARK
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042 , G03F9/7049 , G03F9/7076
摘要： A method of aligning a substrate and an imprint template is disclosed. The method includes directing an alignment radiation beam towards an imprint template alignment mark and an adjacent substrate alignment mark, the imprint template alignment mark and the substrate alignment mark each including a grating which extends in a first direction and a grating which extends in a second direction, providing relative movement between the imprint template and the substrate in the first direction and in the second direction, using an intensity detector to detect the intensity of alignment radiation redirected in the zero-order direction by the imprint template alignment mark and the substrate alignment mark during the relative movement in the first direction and in the second direction, and determining an aligned position of the imprint template alignment mark and the substrate alignment mark based upon the detected intensity.
摘要翻译：公开了一种对准衬底和压印模板的方法。该方法包括将对准辐射束引向印模模板对准标记和相邻的衬底对准标记，印模模板对准标记和衬底对准标记各自包括在第一方向上延伸的光栅和沿第二方向延伸的光栅使用强度检测器，通过压印模板对准标记和基板对准标记来检测在零级方向上重定向的对准辐射的强度，在第一方向和第二方向上提供压印模板和基板之间的相对移动在第一方向和第二方向的相对移动期间，基于检测到的强度确定压印模板对准标记和基板对准标记的对准位置。

6. 发明申请

US20110076351A1 IMPRINT LITHOGRAPHY 有权
公开(公告)号：US20110076351A1
公开(公告)日：2011-03-31
申请号：US12891397
申请日：2010-09-27
申请人： Sander Frederik WUISTER
发明人： Sander Frederik WUISTER
IPC分类号： B29C59/02 , C03C25/68
CPC分类号： G03F7/0002 , B29C43/021 , B82Y10/00 , B82Y40/00
摘要： A method of forming an imprint template using a substrate having an inorganic release layer and a layer of imprintable medium is disclosed. The method includes using a master imprint template to imprint a pattern into the imprintable medium, causing the imprintable medium to solidify, and etching the imprintable medium and the inorganic release layer to form a pattern in the inorganic release layer.
摘要翻译：公开了一种使用具有无机剥离层和可压印介质层的基材形成压印模板的方法。该方法包括使用主印模模板将图案印迹到可压印介质中，使可压印介质固化，并蚀刻可压印介质和无机剥离层以在无机剥离层中形成图案。

7. 发明申请

US20110200795A1 IMPRINT LITHOGRAPHY 有权
公开(公告)号：US20110200795A1
公开(公告)日：2011-08-18
申请号：US13026574
申请日：2011-02-14
申请人： Jeroen Herman LAMMERS , Sander Frederik WUISTER , Roelof KOOLE
发明人： Jeroen Herman LAMMERS , Sander Frederik WUISTER , Roelof KOOLE
IPC分类号： B32B33/00 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/24802
摘要： An imprint lithography template is disclosed. The imprint lithography template includes a plurality of pattern features extending from a plane of a body of the imprint lithography template, and away from that body, the pattern features to be used to apply a pattern into an imprintable medium. The imprint lithography template further includes a plurality of assist features in the form of recesses extending from the plane of that body of the imprint lithography template, and into that body. A method for forming the assist features in the imprint lithography template, using self-assembled block copolymers as an etch resist, is also disclosed.
摘要翻译：公开了压印光刻模板。压印光刻模板包括从压印光刻模板的主体的平面延伸并远离该主体的多个图案特征，所述图案特征用于将图案应用于可压印介质。压印光刻模板还包括从压印光刻模板的该主体的平面延伸并且进入该主体的凹部形式的多个辅助特征。还公开了使用自组装嵌段共聚物作为抗蚀剂来形成压印光刻模板中的辅助特征的方法。

8. 发明申请

US20110129930A1 INSPECTION METHOD AND APPARATUS 有权
标题翻译：检验方法和装置
公开(公告)号：US20110129930A1
公开(公告)日：2011-06-02
申请号：US12955550
申请日：2010-11-29
申请人： Sander Frederik WUISTER
发明人： Sander Frederik WUISTER
IPC分类号： G01N23/00
CPC分类号： G01N21/91
摘要： In an embodiment, there is disclosed an inspection method for detecting the presence of imprintable medium on an imprint lithography template. The method includes contacting the imprint lithography template with a marker, the marker being attachable to imprintable medium that may be on the imprint lithography template, the marker being configured to interact with incident radiation when attached to the imprintable medium, directing radiation at the imprint lithography template, and measuring radiation re-directed by the imprint lithography template to attempt to detect presence of a marker that has attached to the imprintable medium, from the interaction of the marker with the incident radiation, and thus detect the presence of imprintable medium to which the marker is attached.
摘要翻译：在一个实施例中，公开了一种用于在压印光刻模板上检测可压印介质的存在的检查方法。所述方法包括使压印光刻模板与标记物接触，所述标记可附接到可压印介质上，所述可压印介质可以在压印光刻模板上，所述标记被配置为在附着到可压印介质时与入射辐射相互作用，在刻印光刻时引导辐射模板和测量由压印光刻模板重新引导的辐射，以从标记与入射辐射的相互作用中尝试检测附着于可压印介质的标记物的存在，从而检测可压印介质的存在，附加标记。

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