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1. 发明授权

US6024885A Process for patterning magnetic films 失效
标题翻译：磁性膜图形化处理
公开(公告)号：US6024885A
公开(公告)日：2000-02-15
申请号：US986764
申请日：1997-12-08
申请人： Sandeep Pendharkar , Douglas J. Resnick
发明人： Sandeep Pendharkar , Douglas J. Resnick
IPC分类号： C23F4/00 , G11B5/39 , H01F41/30 , H01F41/34 , H01L21/8246 , H01L27/22 , C23F1/12
CPC分类号： H01F41/34 , B82Y10/00 , B82Y25/00 , B82Y40/00 , C23F4/00 , H01F41/308 , H01L43/12 , G11B2005/3996
摘要： A process of patterning magnetic multilayer films including the steps of successively depositing a plurality of magnetic multilayer films on a supporting substrate, selectively removing portions of the plurality of magnetic multilayer films using a reactive plasma etch including chlorine gas, and passivating in situ, or an adjacent evacuated chamber, remaining portions of the plurality of magnetic multilayer films, i.e. the memory elements, in a post-etch fluorinated plasma.
摘要翻译：一种图案化磁性多层膜的方法，包括以下步骤：在支撑衬底上连续沉积多个磁性多层膜，使用包括氯气的反应性等离子体蚀刻和现场钝化来选择性地去除多个磁性多层膜的部分，相邻的真空室，在蚀刻后的氟化等离子体中的多个磁性多层膜的剩余部分，即存储元件。

2. 发明授权

US07906274B2 Method of creating a template employing a lift-off process 有权
标题翻译：使用剥离过程创建模板的方法
公开(公告)号：US07906274B2
公开(公告)日：2011-03-15
申请号：US11943907
申请日：2007-11-21
申请人： Gerard M. Schmid , Douglas J. Resnick , Michael N. Miller
发明人： Gerard M. Schmid , Douglas J. Resnick , Michael N. Miller
IPC分类号： G03F7/00 , G03F7/09 , G03F7/26 , G03F7/40
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method of forming a lithographic template, the method including, inter alia, creating a multi-layered structure, by forming, on a body, a conducting layer, and forming on the conducting layer, a patterned layer having protrusions and recessions, the recessions exposing portions of the conducting layer; depositing a hard mask material anisotropically on the multi-layered structure covering a top surface of the patterned layer and the portions of the conducting layer; removing the patterned layer by a lift-off process, with the hard mask material remaining on the portions of the conducting layer; positioning a resist pattern on the multi-layered structure to define a region of the multi-layered structure; and selectively removing portions of the multi-layered structure in superimposition with the region using the hard mask material as an etching mask.
摘要翻译：一种形成光刻模板的方法，所述方法尤其包括通过在主体上形成导电层并在导电层上形成具有突起和凹陷的图案层，形成多层结构，所述凹陷暴露导电层的部分; 在覆盖图案化层的顶表面和导电层的部分的多层结构上各向异性地沉积硬掩模材料; 通过剥离过程去除图案层，硬掩模材料残留在导电层的部分上; 将抗蚀剂图案定位在所述多层结构上以限定所述多层结构的区域; 并且使用硬掩模材料作为蚀刻掩模选择性地去除与该区域重叠的多层结构的部分。

3. 发明申请

US20100085555A1 In-Situ Cleaning of an Imprint Lithography Tool 有权
标题翻译：印刷平版印刷工具的原位清洁
公开(公告)号：US20100085555A1
公开(公告)日：2010-04-08
申请号：US12563356
申请日：2009-09-21
申请人： Gerard M. Schmid , Ian Matthew McMackin , Byung-Jin Choi , Douglas J. Resnick
发明人： Gerard M. Schmid , Ian Matthew McMackin , Byung-Jin Choi , Douglas J. Resnick
IPC分类号： G03B27/64 , B08B7/00 , B01J19/12
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/70925
摘要： Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.
摘要翻译：压印光刻系统可以提供用于固化位于模板和衬底之间的材料的能量源。此外，能量源和/或附加能量源可用于从模板和/或基底清洁污染物。

4. 发明申请

US20070243655A1 Self-Aligned Process for Fabricating Imprint Templates Containing Variously Etched Features 有权
标题翻译：用于制造包含各种蚀刻特征的印记模板的自对准过程
公开(公告)号：US20070243655A1
公开(公告)日：2007-10-18
申请号：US11693236
申请日：2007-03-29
申请人： Gerard M. Schmid , Nicholas A. Stacey , Douglas J. Resnick , Ronald D. Voisin , Lawrence J. Myron
发明人： Gerard M. Schmid , Nicholas A. Stacey , Douglas J. Resnick , Ronald D. Voisin , Lawrence J. Myron
IPC分类号： H01L21/467
CPC分类号： G03F7/0005 , B82Y10/00 , B82Y40/00 , G02B3/0012 , G03F7/0002
摘要： A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have been created, it is possible that the various structures will exist at different planes/elevations relative to the template surface. The elevations of the various structures may be adjusted independently by selectively exposing “higher” structures to an anisotropic etch that reduces the overall elevation of the structures, while preserving the structural topography.
摘要翻译：能够在多个独立蚀刻步骤中产生的结构共面化的工艺。通过仅选择性地将某些图案暴露于特定的蚀刻条件来独立地执行各种蚀刻。在这些结构已被创建之后，可能各种结构将相对于模板表面存在于不同的平面/高度处。可以通过选择性地将“较高”结构暴露于各向异性蚀刻来独立地调节各种结构的高度，从而降低结构的整体高度，同时保留结构形貌。

5. 发明授权

US5590239A Planar uniform heating surface with additional circumscribing ring 失效
标题翻译：平面均匀加热表面，带附加外接环
公开(公告)号：US5590239A
公开(公告)日：1996-12-31
申请号：US254845
申请日：1994-06-06
申请人： Douglas J. Resnick , William A. Johnson , Kevin D. Cummings , Hector T. H. Chen
发明人： Douglas J. Resnick , William A. Johnson , Kevin D. Cummings , Hector T. H. Chen
IPC分类号： G03F1/22 , G03F7/20 , G21K1/06 , G21K5/04 , H01L21/00 , H05B1/00 , G21K5/00
CPC分类号： H01L21/67103 , G03F1/22 , G03F7/70866 , G21K1/06 , H01J2237/2001
摘要： A uniform heating fixture and method of use is provided. A heat conductive member having a first plane surface, a second surface and a third plane surface is formed. The first plane surface and the third plane surface are parallel and are connected by a second surface. The third plane surface circumscribes and extends away from the first plane surface, thereby enabling uniform heating of an X-ray mask.
摘要翻译：提供均匀的加热夹具和使用方法。形成具有第一平面，第二表面和第三平面的导热构件。第一平面和第三平面平行并通过第二表面连接。第三平面表面限定并远离第一平面，从而能够均匀地加热X射线掩模。

6. 发明授权

US5266183A Method for plating an x-ray mask 失效
标题翻译：电镀X射线掩模的方法
公开(公告)号：US5266183A
公开(公告)日：1993-11-30
申请号：US881111
申请日：1992-05-11
申请人： William J. Dauksher , Douglas J. Resnick
发明人： William J. Dauksher , Douglas J. Resnick
IPC分类号： G03F1/16 , C25D3/48 , G21K3/00 , H01L21/027
CPC分类号： C25D3/48
摘要： A method for making an x-ray mask having a low-stress absorber layer. A substrate is placed in an electroplating system and an electroplating solution is provided to the electroplating system. The electroplating solution has a gold sulfite based component and a thallium based component. The thallium based component is at a concentration of at least 20 milligrams per liter of electroplating solution. A gold containing absorber layer is electrodeposited onto the substrate. A high concentration of thallium produces an absorber layer insensitive to the brightener concentration in the electroplating solution and having a stress less than approximately 1.times.10.sup.8 dynes/cm.sup.2. In addition, the absorber has a small grain size, a low surface roughness, and a low defect density. Thus, the absorber layer is easier to inspect and, if required, to repair.
摘要翻译：一种制造具有低应力吸收层的X射线掩模的方法。将基板放置在电镀系统中，并将电镀溶液提供给电镀系统。电镀溶液具有亚硫酸金属组分和基于铊的组分。基于铊的组分的浓度为每升电镀溶液至少20毫克。将含金吸收层电沉积到基底上。高浓度的铊产生对电镀溶液中的增白剂浓度不敏感并具有小于约1×10 8达因/ cm 2的应力的吸收层。此外，吸收体具有小的晶粒尺寸，低表面粗糙度和低缺陷密度。因此，吸收层更容易检查，如果需要，进行修理。

7. 发明授权

US08556616B2 Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template 有权
标题翻译：模板具有不同的厚度以便于排出位于基板和模板之间的气体
公开(公告)号：US08556616B2
公开(公告)日：2013-10-15
申请号：US13073533
申请日：2011-03-28
申请人： Douglas J. Resnick , Mario Johannes Meissl , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Douglas J. Resnick , Mario Johannes Meissl , Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B29C59/02
CPC分类号： H01L21/67126 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6715
摘要： A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
摘要翻译：一种纳米压印光刻模板，其特别包括具有第一和第二相对侧的主体，第一表面设置在第一侧上，第二侧具有设置在其中的凹部，该主体具有第一和第二区域，第二区域围绕第一所述凹部与所述第一区域叠加，所述第一表面的与所述第一区域重叠的部分与所述第二侧面间隔开第一距离，并且所述第一表面的与所述第二区域重叠的部分间隔开从第二侧排出第二距离，第二距离大于第一距离; 以及模具，其设置在所述主体的第一侧上，以叠加所述第一区域的一部分。

8. 发明授权

US08394203B2 In-situ cleaning of an imprint lithography tool 有权
标题翻译：压印光刻工具的原位清洗
公开(公告)号：US08394203B2
公开(公告)日：2013-03-12
申请号：US12563356
申请日：2009-09-21
申请人： Gerard M. Schmid , Ian Matthew McMackin , Byung-Jin Choi , Douglas J. Resnick
发明人： Gerard M. Schmid , Ian Matthew McMackin , Byung-Jin Choi , Douglas J. Resnick
IPC分类号： B08B5/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/70925
摘要： Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.
摘要翻译：压印光刻系统可以提供用于固化位于模板和衬底之间的材料的能量源。此外，能量源和/或附加能量源可用于从模板和/或基底清洁污染物。

9. 发明申请

US20120111832A1 Template Pillar Formation 有权
标题翻译：模板柱形成
公开(公告)号：US20120111832A1
公开(公告)日：2012-05-10
申请号：US13352824
申请日：2012-01-18
申请人： Gary F. Doyle , Gerard M. Schmid , Michael N. Miller , Douglas J. Resnick , Dwayne L. LaBrake
发明人： Gary F. Doyle , Gerard M. Schmid , Michael N. Miller , Douglas J. Resnick , Dwayne L. LaBrake
IPC分类号： B44C1/22 , C23F1/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F1/26
摘要： Methods for forming an imprint lithography template are provided. Materials for forming the imprint lithography template may be etched at different rates based on physical properties of the layers. Additionally, reflectance of the materials may be monitored to provide substantially uniform erosion of the materials.
摘要翻译：提供了形成压印光刻模板的方法。可以基于层的物理性质以不同的速率蚀刻用于形成压印光刻模板的材料。此外，可以监测材料的反射率以提供材料的基本均匀的侵蚀。

10. 发明申请

US20100291257A1 Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template 审中-公开
标题翻译：具有不同厚度的模板以便于排出位于基板和模板之间的气体
公开(公告)号：US20100291257A1
公开(公告)日：2010-11-18
申请号：US12838852
申请日：2010-07-19
申请人： Douglas J. Resnick , Mario J. Meissl , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Douglas J. Resnick , Mario J. Meissl , Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B28B11/08
CPC分类号： H01L21/67126 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6715
摘要： A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
摘要翻译：一种纳米压印光刻模板，其特别包括具有第一和第二相对侧的主体，第一表面设置在第一侧上，第二侧具有设置在其中的凹部，该主体具有第一和第二区域，第二区域围绕第一所述凹部与所述第一区域叠加，所述第一表面的与所述第一区域重叠的部分与所述第二侧面间隔开第一距离，并且所述第一表面的与所述第二区域重叠的部分间隔开从第二侧排出第二距离，第二距离大于第一距离; 以及模具，其设置在所述主体的第一侧上，以叠加所述第一区域的一部分。

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