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    • 3. 发明申请
    • METHOD OF MANUFACTURING LIGHT EMITTING DIODE AND LIGHT EMITTING DIODE MANUFACTURED THEREBY
    • 制造发光二极管和发光二极管的方法
    • US20140147954A1
    • 2014-05-29
    • US14167877
    • 2014-01-29
    • SAMSUNG ELECTRONICS CO., LTD.
    • Dong Ju LEEHeon Ho LEEHyun Wook SHIMYoung Sun KIM
    • H01L33/00
    • H01L33/0075H01L33/007H01L33/32
    • There is provided a method of manufacturing a light emitting diode and a light emitting diode manufactured by the same. The method includes growing a first conductivity type nitride semiconductor layer and an undoped nitride semiconductor layer on a substrate sequentially in a first reaction chamber; transferring the substrate having the first conductivity type nitride semiconductor layer and the undoped nitride semiconductor layer grown thereon to a second reaction chamber; growing an additional first conductivity type nitride semiconductor layer on the undoped nitride semiconductor layer in the second reaction chamber; growing an active layer on the additional first conductivity type nitride semiconductor layer; and growing a second conductivity type nitride semiconductor layer on the active layer.
    • 提供了一种制造发光二极管的方法和由其制造的发光二极管。 该方法包括在第一反应室中顺序地在衬底上生长第一导电型氮化物半导体层和未掺杂的氮化物半导体层; 将具有第一导电型氮化物半导体层和其上生长的未掺杂氮化物半导体层的衬底转移到第二反应室; 在第二反应室中的未掺杂的氮化物半导体层上生长附加的第一导电型氮化物半导体层; 在附加的第一导电型氮化物半导体层上生长活性层; 以及在所述有源层上生长第二导电型氮化物半导体层。
    • 5. 发明申请
    • CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF DEPOSITING THIN FILM USING THE SAME
    • 化学蒸气沉积装置及其沉积薄膜的方法
    • US20130236634A1
    • 2013-09-12
    • US13789901
    • 2013-03-08
    • SAMSUNG ELECTRONICS CO., LTD.
    • Sung Min CHOIDong Ju LEEHeon Ho LEEJang Mi KIMOk Hyun KIM
    • C23C16/52
    • C23C16/52
    • There is provided a chemical vapor deposition apparatus, including: a reaction chamber including a support part having a wafer placed thereon and a gas supply part supplying a process gas to a reactive space formed above the support part to allow a thin film to be grown on a surface of the wafer; a heat exchanger changing a temperature of the process gas, supplied to the reactive space through the gas supply part, to allow the process gas to be maintained at a set temperature: and a controller regulating a flow rate of the process gas, and detecting a temperature difference between a temperature of the process gas and the set temperature to thereby control the heat exchanger to supply the process gas to the reactive space while the process gas is maintained at a reference temperature set according to each stage.
    • 提供了一种化学气相沉积设备,包括:反应室,其包括具有放置在其上的晶片的支撑部分,以及将处理气体供应到形成在支撑部分上方的反应空间的气体供应部分,以使薄膜生长在 晶片的表面; 换热器,其通过气体供给部供给至反应空间的工艺气体的温度,使处理气体保持在设定温度;以及控制器,调节处理气体的流量, 处理气体的温度与设定温度之间的温度差,从而控制热交换器以将处理气体供应到反应空间,同时处理气体保持在根据每个阶段设定的参考温度。