专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06784478B2 Junction capacitor structure and fabrication method therefor in a dual damascene process 有权
标题翻译：板式电容器结构及其制造方法在双镶嵌工艺中
公开(公告)号：US06784478B2
公开(公告)日：2004-08-31
申请号：US10260693
申请日：2002-09-30
申请人： Sailesh M. Merchant , Yifeng W. Yan
发明人： Sailesh M. Merchant , Yifeng W. Yan
IPC分类号： H01L27108
CPC分类号： H01L28/60 , H01L21/76807 , H01L21/76895 , H01L23/5223 , H01L2924/0002 , H01L2924/00
摘要： An apparatus and fabrication process for a capacitor formed in conjunction with a dual damascene process. A bottom capacitor plate is electrically connected to an overlying first conductive via formed according to the dual damascene process. A top capacitor plate is connected to an overlying second conductive via. A dielectric material is disposed between the top and the bottom plates. The capacitor is formed by successively forming the bottom plate, the dielectric layer, and the top plate, patterning these layers as required after their formation. The first conductive via is formed over and electrically connected to the bottom plate and the second conductive via is formed over and connected to the top capacitor plate thereby providing for interconnection of the capacitor to other circuit elements by way of the dual damascene conductive runners connected to the conductive vias.
摘要翻译：一种与双镶嵌工艺结合形成的电容器的装置和制造方法。底部电容器电极电连接到根据双镶嵌工艺形成的上覆的第一导电通孔。顶部电容器板连接到上覆的第二导电通孔。介电材料设置在顶板和底板之间。电容器通过依次形成底板，电介质层和顶板形成，在形成之后根据需要对这些层进行图案化。第一导电通孔形成在底板上并电连接到底板，并且第二导电通孔形成在顶部电容器板上并连接到顶部电容器板，从而通过连接到第二导电通孔的双镶嵌导电流道提供电容器与其它电路元件的互连导电通孔。

2. 发明授权

US06288648B1 Apparatus and method for determining a need to change a polishing pad conditioning wheel 失效
标题翻译：用于确定改变抛光垫调节轮的需要的装置和方法
公开(公告)号：US06288648B1
公开(公告)日：2001-09-11
申请号：US09384506
申请日：1999-08-27
申请人： William G. Easter , John A. Maze , Frank Miceli , Yifeng W. Yan
发明人： William G. Easter , John A. Maze , Frank Miceli , Yifeng W. Yan
IPC分类号： G08B2100
CPC分类号： B24B53/017 , B24B49/16
摘要： The present invention provides a method of manufacturing an integrated circuit using a conditioning wheel status indicator with a polishing apparatus having a conditioning wheel and a polishing pad. In one embodiment, the conditioning wheel status indicator comprises a drive motor, an ammeter, and an indicator. The drive motor is coupled to the conditioning wheel and configured to rotate the conditioning wheel against the polishing pad at a prescribed rotation rate. The ammeter is coupled to the drive motor and configured to measure a current of the drive motor. The current registered is a nominal current when the conditioning wheel is new. The indicator is coupled to the ammeter and configured to register an excess current that exceeds the nominal current when the conditioning wheel has incurred an undesirable degree of wear.
摘要翻译：本发明提供使用具有调理轮和抛光垫的抛光装置的调节轮状态指示器来制造集成电路的方法。在一个实施例中，调节轮状态指示器包括驱动电机，电流表和指示器。驱动电动机联接到调节轮并且构造成以预定的转速将调理轮以抛光垫转动。电流表耦合到驱动电动机并且被配置成测量驱动电动机的电流。当调节轮是新的时，当前注册的是一个额定电流。该指示器耦合到电流表并且被配置为在调节轮已经引起不期望的磨损程度时登记超过标称电流的过电流。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式