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1. 发明申请

US20130014699A1 DEPOSITION APPARATUS AND METHOD FOR MANUFACTURING FILM BY USING DEPOSITION APPARATUS 审中-公开
标题翻译：沉积装置和使用沉积装置制造薄膜的方法
公开(公告)号：US20130014699A1
公开(公告)日：2013-01-17
申请号：US13549166
申请日：2012-07-13
申请人： Sadayuki Okazaki , Kazuyoshi Honda , Tomofumi Yanagi , Shoichi Imashiku
发明人： Sadayuki Okazaki , Kazuyoshi Honda , Tomofumi Yanagi , Shoichi Imashiku
IPC分类号： C23C16/54
CPC分类号： C23C14/562 , C23C14/02 , C23C14/226 , H01M4/0421 , H01M4/1395 , H01M10/052
摘要： A vapor deposition device including an evaporation source for evaporating a vapor-depositing material; a transportation section including first and second rolls for holding the substrate in the state of being wound therearound and a guide section for guiding the substrate; and a shielding section, located in a vapor deposition possible zone, for forming a shielded zone which is not reachable by the vapor-depositing material from the evaporation source. Vapor deposition zones include a planar transportation zone for transporting the substrate such that the surface of the substrate to be subjected to the vapor-depositing material is planar; and the transportation section is located with respect to the evaporation source such that the vapor-depositing material is not incident on the substrate in a direction of the normal to the substrate in the vapor deposition possible zone excluding the shielded zone.
摘要翻译：一种气相沉积装置，包括用于蒸发气相沉积材料的蒸发源; 一个传送部分，包括用于保持基片的卷绕在其周围的第一和第二滚筒以及用于引导基片的引导部分; 以及位于气相沉积可能区域中的屏蔽部分，用于形成从气相沉积材料不能从蒸发源到达的屏蔽区域。蒸镀区域包括用于输送基板的平面输送区域，使得要经历气相沉积材料的基板的表面是平面的; 并且运送部相对于蒸发源设置，使得气相沉积材料在除了屏蔽区之外的气相沉积可能区域中不与基板的法线方向入射到基板上。

2. 发明授权

US08241699B2 Deposition apparatus and method for manufacturing film by using deposition apparatus 失效
标题翻译：沉积装置及其制造方法
公开(公告)号：US08241699B2
公开(公告)日：2012-08-14
申请号：US12516328
申请日：2008-03-10
申请人： Sadayuki Okazaki , Kazuyoshi Honda , Tomofumi Yanagi , Shoichi Imashiku
发明人： Sadayuki Okazaki , Kazuyoshi Honda , Tomofumi Yanagi , Shoichi Imashiku
IPC分类号： C23C16/52
CPC分类号： C23C14/562 , C23C14/02 , C23C14/226 , H01M4/0421 , H01M4/1395 , H01M10/052
摘要： A vapor deposition device 100 for moving a sheet-like substrate 4 in a roll-to-roll system in a chamber 2 to continuously form a vapor deposition film on the substrate 4. The vapor deposition device 100 comprises an evaporation source 9 for evaporating a vapor-depositing material; a transportation section including first and second rolls 3 and 8 for holding the substrate 4 in the state of being wound therearound and a guide section for guiding the substrate 4; and a shielding section, located in a vapor deposition possible zone, for forming a shielded zone which is not reachable by the vapor-depositing material from the evaporation source 9. Vapor deposition zones 60a through 60d include a planar transportation zone for transporting the substrate 4 such that the surface of the substrate 4 to be subjected to the vapor-depositing material is planar; and the transportation section is located with respect to the evaporation source 9 such that the vapor-depositing material is not incident on the substrate 4 in a direction of the normal to the substrate in the vapor deposition possible zone excluding the shielded zone.
摘要翻译：一种气相沉积装置100，用于在室2中的辊对辊系统中移动片状基底4，以在基底4上连续地形成气相沉积膜。气相沉积装置100包括蒸发源9 气相沉积材料; 一个传送部分，包括用于将基片4保持在其周围的状态的第一和第二辊子3和8;以及用于引导衬底4的引导部分; 以及位于气相沉积可能区域中的屏蔽部分，用于形成从蒸发源9不能通过气相沉积材料到达的屏蔽区域。蒸镀区域60a至60d包括用于输送基板4的平面输送区域使得要经历气相沉积材料的基板4的表面是平面的; 并且运送部分相对于蒸发源9定位，使得气相沉积材料在除了屏蔽区域之外的气相沉积可能区域中不与基板的法线方向入射到基板4上。

3. 发明申请

US20110268893A1 THIN FILM MANUFACTURING DEVICE AND THIN FILM MANUFACTURING METHOD 审中-公开
标题翻译：薄膜制造装置和薄膜制造方法
公开(公告)号：US20110268893A1
公开(公告)日：2011-11-03
申请号：US13143284
申请日：2010-04-02
申请人： Kazuyoshi Honda , Tomofumi Yanagi , Yasuharu Shinokawa , Sadayuki Okazaki
发明人： Kazuyoshi Honda , Tomofumi Yanagi , Yasuharu Shinokawa , Sadayuki Okazaki
IPC分类号： C23C14/30
CPC分类号： C23C14/24 , C23C14/243 , C23C14/246 , C23C14/30 , C23C14/562 , F27B14/02 , F27B14/04
摘要： The present invention provides a thin film manufacturing device capable of preventing crack damage of a crucible by, while maintaining a melt state of a film formation material in the crucible, tilting the crucible to discharge substantially the entire amount of film formation material from the crucible. The thin film manufacturing device of the present invention includes: a film forming source 9 including a storage portion having an opening at an upper portion thereof to hold a film formation material 3; an electron gun 5 configured to irradiate the film formation material in the storage portion with an electron beam 6 to melt the film formation material, generate a melt, and evaporate the film formation material; a tilt mechanism 8 configured to tilt the film forming source 9 from a film formation posture to an inclined posture to discharge the melt from the storage portion, the inclined posture being a posture by which the storage portion is not able to hold the melt; a vacuum chamber 22 in which the film forming source and the tilt mechanism are accommodated and a thin film is formed on a substrate; and a vacuum pump 34 configured to discharge air in the vacuum chamber. A trajectory of tilting of the film forming source 9 or a trajectory of the electron beam 6 is controlled such that the melt in the storage portion is continuously irradiated with the electron beam 6 while the film forming source 9 is tilted from the film formation posture to the inclined posture.
摘要翻译：本发明提供一种薄膜制造装置，其能够通过在保持坩埚内的成膜材料的熔融状态的同时，使坩埚倾斜，从坩埚中大量排出成膜材料，能够防止坩埚的龟裂损伤。本发明的薄膜制造装置包括：成膜源9，其具有在其上部具有保持成膜材料3的开口部的收容部; 电子枪5，被配置为用电子束6照射存储部分中的成膜材料，以熔化成膜材料，产生熔体并使成膜材料蒸发; 倾斜机构8，其被配置为将成膜源9从成膜姿势倾斜到倾斜姿势，以将熔体从储存部排出，倾斜姿势是储存部不能保持熔体的姿势; 在其上容纳有成膜源和倾斜机构的真空室22，在基板上形成薄膜; 以及构造成将真空室内的空气排出的真空泵34。控制成膜源9的倾斜轨迹或电子束6的轨迹，使得成膜源9从成膜姿势倾斜而使储存部分中的熔体连续地被电子束6照射，倾斜的姿势。

4. 发明申请

US20130189424A1 HEATING APPARATUS, VACUUM-HEATING METHOD AND METHOD FOR MANUFACTURING THIN FILM 审中-公开
标题翻译：加热装置，真空加热方法和制造薄膜的方法
公开(公告)号：US20130189424A1
公开(公告)日：2013-07-25
申请号：US13820141
申请日：2012-06-28
申请人： Sadayuki Okazaki , Kazuyoshi Honda
发明人： Sadayuki Okazaki , Kazuyoshi Honda
IPC分类号： H01M10/04
CPC分类号： H01M10/04 , C23C14/24 , C23C14/243 , C23C14/562
摘要： Provided is a heating apparatus including: an object to be heated under vacuum; a heating body separable from the object to be heated, the heating body being configured so that a gap is formed between the heating body itself and the object to be heated; and a gas introduction channel for introducing a heat transfer gas into the gap. The object to be heated is heated by the heating body via the heat transfer gas. An example of the heating apparatus is a deposition apparatus 30. An example of the object to be heated is a storage container 9 that holds a deposition material and that has an opening for allowing the deposition material that has been vaporized to pass therethrough. An example of the heating body is a heating container 10 that detachably accommodates the storage container 9 and that has a heater 20 for heating the deposition material in the storage container 9. An example of the gas introduction channel is the gas introduction tube 11.
摘要翻译：本发明提供一种加热装置，包括：真空加热对象物; 加热体，其与被加热物体分离，所述加热体构造成在所述加热体本体与被加热体之间形成间隙，以及用于将传热气体引入到间隙中的气体导入通道。待加热物体由加热体通过传热气体加热。加热装置的一个实例是沉积装置30.被加热物体的一个实例是保持沉积材料的储存容器9，并且具有允许已被蒸发的沉积材料通过的开口。加热体的一个实例是可拆卸地容纳储存容器9的加热容器10，并且具有用于加热储存容器9中的沉积材料的加热器20.气体导入通道的一个例子是气体导入管11。

5. 发明申请

US20110281029A1 METHOD FOR FORMING THIN FILM 有权
标题翻译：形成薄膜的方法
公开(公告)号：US20110281029A1
公开(公告)日：2011-11-17
申请号：US13132023
申请日：2009-12-10
申请人： Kazuyoshi Honda , Yasuharu Shinokawa , Hiromasa Yagi , Satoshi Shibutani , Sadayuki Okazaki , Yuko Ogawa , Daisuke Suetsugu
发明人： Kazuyoshi Honda , Yasuharu Shinokawa , Hiromasa Yagi , Satoshi Shibutani , Sadayuki Okazaki , Yuko Ogawa , Daisuke Suetsugu
IPC分类号： C23C16/44 , C23C16/04
CPC分类号： C23C14/042 , C23C14/14 , C23C14/24 , C23C14/243 , C23C14/541 , C23C14/562
摘要： Deterioration of the degree of vacuum in a vacuum chamber is prevented while securing adequate cooling performance by gas cooling. A substrate 21 is provided in a vacuum, and the cooling body 1 is provided close to a film non-formation surface of the substrate 21. A thin film is formed by depositing a film forming material on a film formation surface of the substrate 21 while introducing a cooling gas into between the substrate 21 and the cooling body 1. At this time, a gas which reacts with the film forming material is introduced as the cooling gas.
摘要翻译：在通过气体冷却确保足够的冷却性能的同时防止真空室中的真空度恶化。在真空中设置基板21，将冷却体1设置在基板21的膜非形成面附近。通过在基板21的成膜面上沉积成膜材料而形成薄膜，同时将冷却气体引入到基板21和冷却体1之间。此时，引入与成膜材料反应的气体作为冷却气体。

6. 发明授权

US07781101B2 Electrode for nonaqueous electrolyte secondary battery, method for producing same, and nonaqueous electrolyte secondary battery comprising such electrode for nonaqueous electrolyte secondary battery 有权
标题翻译：非水电解质二次电池用电极及其制造方法以及非水电解质二次电池用电极的非水电解质二次电池
公开(公告)号：US07781101B2
公开(公告)日：2010-08-24
申请号：US11994562
申请日：2007-02-13
申请人： Sadayuki Okazaki , Kazuyoshi Honda , Masaya Ugaji
发明人： Sadayuki Okazaki , Kazuyoshi Honda , Masaya Ugaji
IPC分类号： H01M4/58
CPC分类号： H01M4/134 , H01M4/04 , H01M4/366 , H01M4/485 , H01M10/058
摘要： An electrode for a non-aqueous electrolyte secondary battery 6 according to the present invention includes: a current collector 3; a first active material layer 2 formed on the current collector 3; and a second active material layer 5 provided on the first active material layer 2, the second active material layer 5 including a plurality of active material particles 4. The plurality of active material particles 4 is mainly of a chemical composition represented as SiOx (0≦x x). The area in which the first active material layer 2 is in contact with the plurality of active material particles 4 is smaller than the area in which the current collector 3 is in contact with the first active material layer 2.
摘要翻译：本发明的非水电解质二次电池用电极6具备：集电体3，形成在集电体3上的第一活性物质层2; 以及设置在第一活性物质层2上的第二活性物质层5，具有多个活性物质粒子4的第二活性物质层5.多个活性物质粒子4主要以SiO x（0＆amp; x <1.2）。第一活性物质层2主要由以SiO y表示的化学组成（1.0＆amp; nl; y <2.0，y> x）。第一活性物质层2与多个活性物质粒子4接触的区域比集电体3与第一活性物质层2接触的面积小。

7. 发明申请

US20050141170A1 Thin-film laminated body, thin-film cell, capacitor, and method and equipment for manufacturing thin-film laminated body 审中-公开
标题翻译：薄膜层叠体，薄膜电池，电容器以及薄膜层叠体的制造方法和设备
公开(公告)号：US20050141170A1
公开(公告)日：2005-06-30
申请号：US10508060
申请日：2003-03-24
申请人： Kazuyoshi Honda , Yoriko Takai , Sadayuki Okazaki , Junichi Inaba , Syuuji Itoh , Hiroshi Higuchi , Hitoshi Sakai , Shinji Mino
发明人： Kazuyoshi Honda , Yoriko Takai , Sadayuki Okazaki , Junichi Inaba , Syuuji Itoh , Hiroshi Higuchi , Hitoshi Sakai , Shinji Mino
IPC分类号： B32B27/08 , C23C14/04 , H01G4/14 , H01G4/30 , H01M10/05 , H01M10/0562 , H01M10/0585 , H01M2/00 , H01G4/06
CPC分类号： H01M10/058 , B32B27/08 , B32B2457/10 , C23C14/042 , H01G4/145 , H01G4/306 , H01M4/139 , H01M10/052 , H01M10/0562 , H01M10/0585
摘要： A thin film layered product is composed of at least two deposition units, each of which includes at least a first thin film layer and a second thin film layer. At least one of the first thin film layer and the second thin film layer in each of the at least two deposition units is laminated so as to have an area decreased in a direction from a lower layer toward an upper layer. Thus, the reliability of connection between layers can be improved, and when a protective layer is formed on side faces, the formability and adhesion strength can be improved.
摘要翻译：薄膜层积体由至少两个沉积单元组成，每个沉积单元至少包括第一薄膜层和第二薄膜层。在至少两个沉积单元中的每一个中的第一薄膜层和第二薄膜层中的至少一个被层叠，以便在从下层朝向上层的方向上具有减小的面积。因此，可以提高层之间的连接的可靠性，并且当在侧面上形成保护层时，可以提高成形性和粘合强度。

8. 发明授权

US6066240A Method and device for manufacturing a thin film and magnetic recording medium 失效
标题翻译：用于制造薄膜和磁记录介质的方法和装置
公开(公告)号：US6066240A
公开(公告)日：2000-05-23
申请号：US4078
申请日：1998-01-07
申请人： Kazuyoshi Honda , Yoshiharu Maezawa , Masaru Odagiri , Sadayuki Okazaki
发明人： Kazuyoshi Honda , Yoshiharu Maezawa , Masaru Odagiri , Sadayuki Okazaki
IPC分类号： C23C14/08 , C23C14/00 , C23C14/56 , G11B5/64 , G11B5/65 , G11B5/66 , G11B5/85 , G11B5/851
CPC分类号： G11B5/85 , C23C14/0026 , C23C14/562 , G11B5/656 , Y10S428/90 , Y10T428/2495 , Y10T428/24992 , Y10T428/265
摘要： A method and a device for manufacturing a thin film by a vacuum deposition method, and a magnetic recording medium produced thereby are disclosed. A thin film of high quality is mass-produced while introducing reaction gas to a thin film forming section from a nozzle consisting of minute tubes, so that the flow of evaporated atoms is not disturbed by the reaction gas.
摘要翻译：公开了一种通过真空沉积方法制造薄膜的方法和装置，以及由此制造的磁记录介质。在由微细管组成的喷嘴将反应气体引入薄膜形成部分的同时大量生产高质量的薄膜，使得蒸发原子的流动不被反应气体干扰。

9. 发明授权

US5962066A Method and device for manufacturing a thin film and magnetic recording medium 失效
公开(公告)号：US5962066A
公开(公告)日：1999-10-05
申请号：US4088
申请日：1998-01-07
申请人： Kazuyoshi Honda , Yoshiharu Maezawa , Masaru Odagiri , Sadayuki Okazaki
发明人： Kazuyoshi Honda , Yoshiharu Maezawa , Masaru Odagiri , Sadayuki Okazaki
IPC分类号： C23C14/00 , C23C14/56 , G11B5/64 , G11B5/85 , C23C4/00
CPC分类号： G11B5/656 , C23C14/0026 , C23C14/562 , G11B5/85 , Y10S428/90
摘要： A method and a device for manufacturing a thin film by a vacuum deposition method, and a magnetic recording medium produced thereby are disclosed. A thin film of high quality is mass-produced while introducing reaction gas to a thin film forming section from a nozzle consisting of minute tubes, so that the flow of evaporated atoms is not disturbed by the reaction gas.

10. 发明申请

US20110039017A1 METHOD FOR MANUFACTURING THIN FILM 审中-公开
标题翻译：制造薄膜的方法
公开(公告)号：US20110039017A1
公开(公告)日：2011-02-17
申请号：US12989628
申请日：2009-05-21
申请人： Sadayuki Okazaki , Kazuyoshi Honda
发明人： Sadayuki Okazaki , Kazuyoshi Honda
IPC分类号： H01M4/04
CPC分类号： H01M4/1391 , C23C14/24 , C23C14/54 , C23C14/562 , H01M4/0421 , H01M4/1395 , H01M10/0525
摘要： The present invention provides a thin film manufacturing method for improving a production volume by predicting expansion of a hole defect or a crack on a substrate and preventing the substrate from tearing. The thin film manufacturing method includes the steps of: depositing a deposition material on a surface of the substrate in a deposition region to form a thin film while carrying out take-up travel of the substrate between a first roll and a second roll; irradiating a predetermined portion of the surface of the substrate with an electromagnetic wave or a particle beam at a location in front of the deposition region and/or a location behind the deposition region between the first roll and the second roll and detecting the electromagnetic wave or particle beam, which has been transmitted through the substrate or reflected by the substrate; storing information regarding the detected electromagnetic wave or particle beam and the predetermined portion; determining based on the detected electromagnetic wave or particle beam whether or not a defect of the substrate at the predetermined portion is increasing; and carrying out an operation of preventing the substrate from tearing, in accordance with a determination result of the determining step.
摘要翻译：本发明提供一种通过预测基板上的孔缺陷或裂纹的膨胀并防止基板撕裂来提高生产体积的薄膜制造方法。该薄膜制造方法包括以下步骤：在沉积区域中的沉积材料的表面上沉积以形成薄膜，同时在第一辊和第二辊之间执行基板的卷取行进; 在沉积区域前面的位置和/或第一辊和第二辊之间的沉积区域后面的位置用电磁波或粒子束照射基板的表面的预定部分，并检测电磁波或已经透过基板或由基板反射的粒子束; 存储关于检测到的电磁波或粒子束以及预定部分的信息; 基于检测到的电磁波或粒子束确定基板在预定部分的缺陷是否增加; 并且根据确定步骤的确定结果执行防止基板撕裂的操作。

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