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1. 发明申请

WO2019166409A1 METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF CARBON, METHOD OF FORMING A PATTERNED LAYER OF MATERIAL 审中-公开
公开(公告)号：WO2019166409A1
公开(公告)日：2019-09-06
申请号：PCT/EP2019/054680
申请日：2019-02-26
申请人： STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN , STICHTING VU , UNIVERSITEIT VAN AMSTERDAM , ASML NETHERLANDS B.V.
发明人： CASTELLANOS ORTEGA, Sonia , VERHOEVEN, Jan , FRENKEN, Joost, Wilhelmus, Maria , ANTONOV, Pavlo , TEN KATE, Nicolaas , LUGIER, Olivier, Christian, Maurice
IPC分类号： C23C16/04 , C23C16/26 , C23C16/48 , C23C16/56
摘要： Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.

2. 发明申请

WO2018007498A1 A SUBSTRATE HOLDER AND A METHOD OF MANUFACTURING A SUBSTRATE HOLDER 审中-公开
标题翻译：一种基板支架和一种制造基板支架的方法
公开(公告)号：WO2018007498A1
公开(公告)日：2018-01-11
申请号：PCT/EP2017/066890
申请日：2017-07-06
申请人： STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN , UNIVERSITEIT VAN AMSTERDAM , STICHTING VU , ASML NETHERLANDS B.V. , ASML HOLDING N.V.
发明人： POIESZ, Thomas , ACHANTA, Satish , AKBAS, Mehmet, Ali , ANTONOV, Pavlo , BOUWKNEGT, Jeroen , FRENKEN, Joost, Wilhelmus, Maria , PACITTI, Evelyn, Wallis , TEN KATE, Nicolaas , TIRRI, Bruce , VERHOEVEN, Jan
IPC分类号： G03F7/20 , H01L21/687
摘要： There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material. The layer of carbon based material provides a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material. The layer of carbon based material covers only part of the distal end surface of at least one of the burls. Alternatively, the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.
摘要翻译：公开了一种衬底保持器，制造衬底保持器的方法，包括该衬底保持器的光刻设备，以及使用该光刻设备制造器件的方法。在一种布置中，提供了一种用于光刻设备中的衬底保持器。衬底支架支撑衬底。衬底支架包括主体。主体具有主体表面。设置从主体表面突出的多个突起。每个钻头都有一个钻头侧表面和一个远端表面。每个套管的远端表面与基底接合。突起的远端表面基本上符合支撑平面并支撑基板。在碳基材料的多个分离区域中提供一层碳基材料。碳基材料层提供比多个碳基材料的分离区域外部的主体表面的一部分具有更低摩擦系数的表面。碳基材料层仅覆盖至少一个突起的远端表面的一部分。或者，碳基材料层覆盖至少一个突起的末端表面和至少一部分突起侧表面。

3. 发明公开

EP3533900A1 METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF CARBON 审中-公开
公开(公告)号：EP3533900A1
公开(公告)日：2019-09-04
申请号：EP18159654.5
申请日：2018-03-02
申请人： Stichting Nederlandse Wetenschappelijk Onderzoek Instituten , ASML Netherlands B.V. , Universiteit van Amsterdam , Stichting VU
发明人： VERHOEVEN, Jan , FRENKEN, Joost, Wilhelmus, Maria , ANTONOV, Pavlo , TEN KATE, Nicolaas
IPC分类号： C23C16/04 , C23C16/26 , C23C16/48 , C23C16/56
摘要： Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.

4. 发明申请

WO2006112699A1 LIQUID IMMERSION LITHOGRAPHY SYSTEM COMPRISING A TILTED SHOWERHEAD 审中-公开
标题翻译：液体倾斜系统包括倾斜式淋浴
公开(公告)号：WO2006112699A1
公开(公告)日：2006-10-26
申请号：PCT/NL2006/000202
申请日：2006-04-19
申请人： ASML Netherlands B.V. , ASML HOLDING N.V. , KHMELICHEK, Aleksandr , SEWELL, Harry , MARKOYA, Louis, John , LOOPSTRA, Erik, Roelof , TEN KATE, Nicolaas
发明人： KHMELICHEK, Aleksandr , SEWELL, Harry , MARKOYA, Louis, John , LOOPSTRA, Erik, Roelof , TEN KATE, Nicolaas
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： A liquid immersion lithography system includes projection optics (PL) and a showerhead (604). The projection optics are configured to expose a substrate (W) with a patterned beam. The showerhead includes a first nozzle (610) and a second nozzle (612) that are configured to be at different distances from a surface of the substrate during an exposure operation.
摘要翻译：液浸光刻系统包括投影光学器件（PL）和喷头（604）。投影光学器件被配置为用图案化的光束曝光衬底（W）。淋浴头包括第一喷嘴（610）和第二喷嘴（612），其被配置为在曝光操作期间与基板的表面不同的距离。

5. 发明申请

WO2021197747A1 METHOD FOR PREPARING A SUBSTRATE AND LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：WO2021197747A1
公开(公告)日：2021-10-07
申请号：PCT/EP2021/055361
申请日：2021-03-03
申请人： ASML NETHERLANDS B.V.
发明人： VAN DER VOORT, Dennis, Dominic , TEN KATE, Nicolaas
IPC分类号： G03F7/20 , G03F7/707 , G03F7/70783 , G03F7/70875
摘要： The invention relates to a method for preparing a substrate for an exposure process of a lithographic manufacturing method, the method comprising imposing different local temperatures across the substrate so as to induce different thermal expansion across the substrate before the exposure process. This method is for compensating for deformation of the substrate induced when the substrate is positioned on a substrate table of a lithographic apparatus. The invention further relates to a local temperature applicator using this method and to a lithographic apparatus comprising such local temperature applicator.

6. 发明申请

WO2021115765A1 METHOD OF MANUFACTURING A SUBSTRATE SUPPORT FOR A ITHOGRAPHIC APPARATUS, SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, METHOD OF USE 审中-公开
公开(公告)号：WO2021115765A1
公开(公告)日：2021-06-17
申请号：PCT/EP2020/082988
申请日：2020-11-20
申请人： ASML NETHERLANDS B.V.
发明人： STEUR, Michael, Marinus, Anna , TEN KATE, Nicolaas , TROMP, Siegfried, Alexander , WINKELS, Koen, Gerhardus , DE GROOT, Antonius, Franciscus, Johannes
IPC分类号： G03F7/20 , H01L21/683
摘要： The disclosure relates to substrate tables and methods of manufacturing substrate supports for substrate tables. In one arrangement, a plurality of holes are formed through a base member. A burl formation member is joined to the base member. A plurality of burl structures are formed in the burl formation member. Each burl structure comprises a distal surface that contacts, in use, a substrate being supported. Each burl structure comprises an opening to at least one of the holes formed through the base member.

7. 发明申请

WO2007057673A1 LITHOGRAPHIC APPARATUS 审中-公开
标题翻译： LITHOGRAPHIC设备
公开(公告)号：WO2007057673A1
公开(公告)日：2007-05-24
申请号：PCT/GB2006/004275
申请日：2006-11-16
申请人： ASML NETHERLANDS B.V. , LEEMING, John, Gerard , OTTENS, Joost, Jeroen , TEN KATE, Nicolaas , KEMPER, Nicolaas, Rudolf , LEENDERS, Martinus, Hendrikus, Antonius , SMEULERS, Johannes, Petrus, Maria , BECKERS, Marcel , SHULEPOV, Sergel , RIEPEN, Michel
发明人： OTTENS, Joost, Jeroen , TEN KATE, Nicolaas , KEMPER, Nicolaas, Rudolf , LEENDERS, Martinus, Hendrikus, Antonius , SMEULERS, Johannes, Petrus, Maria , BECKERS, Marcel , SHULEPOV, Sergel , RIEPEN, Michel
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： A barrier member (10) is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly (70) on a bottom surface configured to face the substrate (W) . The extractor assembly includes a plate (200) configured to split the space between a liquid removal device and the substrate in two such that a meniscus (310) is formed in an upper channel (220) between the liquid removal device and the plate and such that a meniscus (320) is formed in a lower channel (230) below the plate between the plate and the substrate.
摘要翻译：公开了一种用于浸没式光刻中的阻挡构件（10）。阻挡构件包括在被配置为面向衬底（W）的底表面上的抽出器组件（70）。提取器组件包括板（200），其被配置为将液体移除装置和基板之间的空间分成两部分，使得在液体移除装置和板之间的上部通道（220）中形成弯月面（310），并且在板和基板之间的板下方的下通道（230）中形成弯液面（320）。

8. 发明申请

WO2021170320A1 SUBSTRATE SUPPORT AND SUBSTRATE TABLE 审中-公开
公开(公告)号：WO2021170320A1
公开(公告)日：2021-09-02
申请号：PCT/EP2021/051581
申请日：2021-01-25
申请人： ASML NETHERLANDS B.V.
发明人： BALTIS, Coen, Hubertus, Matheus , TEN KATE, Nicolaas , VERMEULEN, Marcus, Martinus, Petrus, Adrianus , TROMP, Siegfried, Alexander , VAN DEN BERKMORTEL, Frank, Pieter, Albert , ROSET, Niek, Jacobus, Johannes , KRAMER, Gijs , BRANTJES, Nicolaas, Petrus, Marcus , FONTEYN, Michiel, Theodorus, Jacobus
IPC分类号： G03F7/20
摘要： A substrate support for supporting a substrate in a lithographic apparatus, the substrate support comprising: a first support body configured to support the substrate; a main body separate from the first support body and configured to support the first support body, the main body comprising a thermal conditioner configured to thermally condition the main body, and/or the support body and/or the substrate; and an extractor body surrounding the main body and the support body, wherein the extractor body comprises a first extraction channel configured to extract fluid from near a peripheral part of the substrate.

9. 发明申请

WO2021164973A1 SUBSTRATE TABLE AND METHOD OF HANDLING A SUBSTRATE 审中-公开
公开(公告)号：WO2021164973A1
公开(公告)日：2021-08-26
申请号：PCT/EP2021/051226
申请日：2021-01-20
申请人： ASML NETHERLANDS B.V.
发明人： TEN KATE, Nicolaas , WINKELS, Koen, Gerhardus , HABETS, Michel, Ben, Isel
IPC分类号： G03F7/20 , H01L21/687
摘要： The disclosure relates to substrate tables for lithography and methods of handling a substrate (W). In one arrangement, a substrate table (WT) comprises one or more membranes (8). An actuation system (4) deforms each membrane to change a height of a portion of the membrane. In another arrangement, a substrate table comprises one or more membranes and a clamping system for clamping a substrate to the substrate table, wherein the clamping deforms each membrane by pressing the substrate against the membrane.

10. 发明申请

WO2021099027A1 A FLUID HANDLING SYSTEM, METHOD AND LITHOGRAPHIC APPARATUS 审中-公开
公开(公告)号：WO2021099027A1
公开(公告)日：2021-05-27
申请号：PCT/EP2020/078599
申请日：2020-10-12
申请人： ASML NETHERLANDS B.V.
发明人： HUANG, Yang-Shan , TEN KATE, Nicolaas
IPC分类号： G03F7/20
摘要： The present invention relates to a fluid handling system. The fluid handling system comprises a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also comprises a mechanism configured to vibrate a vibration component in contact with the immersion liquid.

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