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    • 5. 发明申请
    • BINARY BLAZED DIFFRACTIVE OPTICAL ELEMENT
    • 二进制闪耀衍射光学元件
    • WO2009036941A3
    • 2009-05-28
    • PCT/EP2008007661
    • 2008-09-16
    • ZEISS CARL AGARNOLD RALFKLEEMANN BERNDRUOFF JOHANNES
    • ARNOLD RALFKLEEMANN BERNDRUOFF JOHANNES
    • G02B5/18
    • G02B5/1819G02B5/1833G02B5/189
    • The invention relates to a binary blazed diffractive optical element (10) comprising a plurality of diffractive structures (16) which extend substantially parallel to one another and have a width g that runs perpendicularly to the extension direction and is greater than the effective wavelength of the electromagnetic radiation for which the diffractive optical element (10) is optimised. Each diffractive structure (16) comprises a row of individual sub-structures (18), which when viewed from above take the form of a closed geometric surface. The dimension of said surface running parallel to the extension of the diffractive structures (16) varies perpendicularly to the extension direction of the diffractive structures (16) and the dimension running perpendicularly to the extension of the diffractive structures (16) is greater than the effective wavelength. According to the invention, the individual sub-structures (18) have birefringent structures (26) which reduce the polarisation dependency of the diffraction efficiency of the diffractive optical element (10).
    • 二进制闪耀衍射光学元件(10)具有多个衍射结构(16),其基本上平行于彼此延伸,并垂直于其延伸方向的宽度为g,这比所述电磁辐射的有效波长更大的到该 衍射光学元件(10)被优化。 衍射结构(16)的每一个包括多个单独的子结构(18)具有封闭的几何面积的在平面图中的形状,其平行于所述衍射结构的所述延伸部(16)引导senkecht尺寸的方向衍射结构的延伸方向(16) 而不同,并且其垂直于所述衍射结构(16)的延伸部引导尺寸比有效波长。 Erfindungsgeimäß各个子结构(18)采取的形式双折射结构(26),由此所述衍射光学元件(10)的衍射效率的偏振依赖性降低。
    • 6. 发明申请
    • METHOD OF MANUFACTURING AN OPTICAL ELEMENT
    • 制造光学元件的方法
    • WO2005114101A8
    • 2006-02-09
    • PCT/EP2004005194
    • 2004-05-14
    • ZEISS CARL SMT AGARNOLD RALFDOERBAND BERNDSCHILLKE FRANKBEDER SUSANNE
    • ARNOLD RALFDOERBAND BERNDSCHILLKE FRANKBEDER SUSANNE
    • G01B11/24B24B13/015B24B49/12
    • G01B11/2441
    • A method of manufacturing an optical element (5) includes testing the optical element (5) by using an interferometer optics (1) generating a beam (13) of measuring light illuminating only a sub-aperture of the tested optical element (5). The interferometer optics (1) comprises a hologram. Results of the sub-aperture measurement are stitched together to obtain a measuring result with respect to the full surface of the optical element (5). Further, a method of calibrating the interferometer optics (1) includes performing an interferometric measurement using a calibrating optics having a hologram covering only a sub-aperture of the full cross section of the beam (13) of measuring light generated by the interferometer optics (1) and stitching together the sub-aperture measurements to obtain a result indicative for the full cross section of the interferometer optics (1).
    • 制造光学元件(5)的方法包括通过使用产生仅照射被测光学元件(5)的子孔径的光的光束(13)的干涉仪光学元件(1)来测试光学元件(5)。 干涉仪光学器件(1)包括全息图。 将子孔径测量的结果缝合在一起以获得关于光学元件(5)的整个表面的测量结果。 此外,校准干涉仪光学器件(1)的方法包括使用校准光学器件执行干涉测量,所述校准光学器件具有仅覆盖光束(13)的全横截面的子孔径的测量由干涉仪光学器件产生的光的全息图( 1)并且将子孔径测量结合在一起以获得指示干涉仪光学器件(1)的全部横截面的结果。