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    • 1. 发明专利
    • BATCH-WISE CONTINUOUS TYPE VACUUM TREATMENT APPARATUS
    • JPS57195753A
    • 1982-12-01
    • JP8235881
    • 1981-05-29
    • SHINETSU CHEM IND COHITACHI LTD
    • UENO SUSUMUKAMATA HIDEAKIIMADA KIYOSHIHATA YOSHITADATOUKAI MASAYAKATOU KENICHI
    • C23C14/20C08J7/00C08J7/04C23C14/56
    • PURPOSE:To make the titled apparatus for performing a plasma treatment, sputtering treatment, etc. on a plastics possible to conduct a batch-wise continuous vacuum treatment, by arranging, before and after vacuum treatment tanks, preliminary vacuum chambers each having a sealing mechanism, and further arranging, before these apparatus, a vacuum chamber including a payoff, and after said apparatuses, a vacuum chamber including a winder. CONSTITUTION:A preliminary vacuum chamber 2 having a pair of upper and lower sealing rolls is positioned before the vacuum treatment tank 101 for continuously performing a surface treatment on a flexible workpiece F under a vacuum, and a preliminary vacuum chamber 3 similar to the chamber 2 is positioned after the vacuum treatment tank 102 having the same function as that of the tank 101, both the tanks 101, 102 being evacuated via exhaust pipes 5, 6. After the completion of treatment, the vacuum in the vacuum chamber 103 including a payoff and the vacuum chamber 104 including a winding is released, the treated workpiece is taken out from the chamber 104 while a next workpiece is put into the chamber 103. Then again the both chambers are evacuated to be prepared for the next treatment. In this arrangement, since the vacuum treatment tanks 101, 102 are kept vacuum, batches can be continuously treated with less waiting period.