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    • 6. 发明授权
    • Plasma etch singulated semiconductor packages and related methods
    • 等离子蚀刻单片半导体封装及相关方法
    • US09559007B1
    • 2017-01-31
    • US14870440
    • 2015-09-30
    • SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
    • Darrell Truhitte
    • H01L21/00H01L21/78H01L21/311H01L23/544H01L21/48
    • H01L24/96H01L21/31138H01L21/4821H01L21/4828H01L21/4853H01L21/56H01L21/561H01L21/78H01L23/544H01L2223/54453
    • A method of forming a plurality of semiconductor packages includes providing an array of unsingulated semiconductor packages that are at least partially encapsulated in an encapsulant. The array of unsingulated semiconductor packages may be coupled with a lead frame or a substrate. A first plurality of singulation lines are simultaneously etched in the encapsulant through slits in an etch mask using a plasma etching process and a fixture coupled with the array. A second plurality of parallel singulation lines may also be etched. The first and second pluralities of singulation lines may include substantially straight or arcuate lines. The second plurality of parallel singulation lines may be substantially perpendicular to the first plurality of parallel singulation lines and be formed using the plasma etching process, the fixture, and an etch mask. The formation of singulation lines in the array singulates the array into a plurality of singulated semiconductor packages.
    • 形成多个半导体封装的方法包括提供至少部分地封装在密封剂中的未折叠半导体封装的阵列。 非引脚半导体封装的阵列可以与引线框架或衬底耦合。 通过使用等离子体蚀刻工艺和与该阵列耦合的固定装置在蚀刻掩模中的狭缝,在密封剂中同时蚀刻第一多个分割线。 也可以蚀刻第二多个平行分割线。 第一和第二多个单行线可以包括基本上直的或弧形的线。 所述第二多个平行分割线可以基本上垂直于所述第一多个并行分离线,并且使用所述等离子体蚀刻工艺,所述夹具和蚀刻掩模形成。 阵列中的分割线的形成将阵列分成多个单个半导体封装。