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    • 1. 发明申请
    • LOW CTE BORO-ALUMINOSILICATE GLASS FOR GLASS CARRIER WAFERS
    • 用于玻璃载体晶片的低CTE硼铝硅酸盐玻璃
    • WO2017132837A1
    • 2017-08-10
    • PCT/CN2016/073212
    • 2016-02-02
    • SCHOTT GLASS TECHNOLOGIES (SUZHOU) CO. LTD.
    • QIAN, PengxiangHOU, YunfeiXUE, JunmingLIEBALD, RainerKUROKI, Hiroshi
    • C03C4/02
    • C03C27/00C03C3/091C03C4/00
    • The invention concerns a low CTE boro-aluminosilicate glass having a low brittleness, in particular for the use in wafer-level-packaging (WLP) applications, with a composition in Mol-%of SiO 2 : 60-85, Al 2 O 3 : 1-17, B 2 O 3 : 8-20, Na 2 O: 0-5, K 2 O: 0-5, MgO: 0-10, CaO: 0-10, SrO: 0-10, BaO: 0-10, wherein the average number of non-bridging oxygen per polyhedron (NBO) is equal or larger than -0.2 and a ratio B 2 O 3 /Al 2 O 3 is equal or larger than 0.5, wherein the NBO is defined as NBO = 2 x O mol / (Si mol +Al mol +B mol ) –4. The invention also concerns a glass carrier wafer made from the low CTE boro-aluminosilicate glass and a use thereof as glass carrier wafer for the processing of a silicon substrate. The invention further concerns a method for providing a low CTE boro-aluminosilicate glass.
    • 本发明涉及具有低脆性的低CTE硼铝硅酸盐玻璃,特别是用于晶片级封装(WLP)应用中的组合物,其组成为SiO 2摩尔% > 2:60-85,Al 2 O 3:1-17,B 2 O 3: 8-20,Na 2 O:0-5,K 2 O:0-5,MgO:0-10,CaO:0-10,SrO :0-10,BaO:0-10,其中每个多面体的非桥连氧的平均数(NBO)等于或大于-0.2并且比率B 2≤0.3, / sub> 2 3 等于或大于0.5,其中NBO定义为NBO = 2×0mol%/( Si摩尔+ Al摩尔+ B摩尔)-4。 本发明还涉及由低CTE硼铝硅酸盐玻璃制成的玻璃载体晶片及其用作用于处理硅衬底的玻璃载体晶片的用途。 本发明还涉及提供低CTE硼铝硅酸盐玻璃的方法。
    • 2. 发明申请
    • LOW CTE GLASS WITH HIGH UV-TRANSMITTANCE AND SOLARIZATION RESISTANCE
    • 具有高紫外线透射和耐光电阻的低CTE玻璃
    • WO2016115685A1
    • 2016-07-28
    • PCT/CN2015/071159
    • 2015-01-20
    • SCHOTT GLASS TECHNOLOGIES (SUZHOU) CO. LTD.
    • XUE, JunmingPING, WenliangFAN, HuiyanZIMMER, JoseKUROKI, Hiroshi
    • C03C3/091
    • C03C3/091C03C4/0085
    • A low CTE glass with a high UV-transmittance and high solarization resistance, a glass carrier wafer made of the low CTE glass and the use of such a glass carrier wafer. The glass comprises an alkaline metal oxide free composition of 50-75 mol%SiO 2 , 3-20 mol%Al 2 O 3 , 5-20 mol%B 2 O 3 , 0-15 mol%MgO, 0-15 mol%CaO, 0-15 mol%SrO, and 0-15 mol%BaO, where MgO+CaO+SrO+BaO amounts to 3 to 25 mol%and the average number of non-bridging oxygen per polyhedron (NBO) is equal or larger than -0.08 and equal or smaller than-0.38, or comprises an alkaline earth metal oxide free composition of 78-85 mol%SiO 2 , 0-7 mol%Al 2 O 3 , 8-15 mol%B 2 O 3 , 0-8 mol%Na 2 O, and 0-5 mol%K 2 O, where the NBO is equal or larger than -0.25 and equal or smaller than -0.10. The glass carrier wafer has a high UV-transmittance at a wavelength of 248 nm and/or 308 nm, good solarization resistance, a long recycling lifetime and reduced processing cost.
    • 具有高紫外线透射率和高耐晒性的低CTE玻璃,由低CTE玻璃制成的玻璃载体晶片和使用这种玻璃载体晶片。 该玻璃包含不含碱金属氧化物的组合物,其组成为50-75mol%SiO 2,3-20mol%Al 2 O 3,5-20mol%B 2 O 3,0-15mol%MgO,0-15mol%CaO,0-15mol% SrO和0-15mol%BaO,其中MgO + CaO + SrO + BaO为3〜25mol%,并且每个多面体(NBO)的平均非桥接氧数等于或大于-0.08且等于或小于 或含有78-85摩尔%SiO 2,0-7摩尔%Al 2 O 3,8-15摩尔%B 2 O 3,0-8摩尔%Na 2 O和0-5摩尔%K 2 O的无碱土金属的氧化物组合物, 其中NBO等于或大于-0.25且等于或小于-0.10。 玻璃载体晶片在波长248nm和/或308nm下具有高的紫外线透射率,良好的耐晒性,长的再循环寿命和降低的加工成本。